EP1373331A4 - THERMALLY HARDENED LITHOGRAPH LAYER - Google Patents

THERMALLY HARDENED LITHOGRAPH LAYER

Info

Publication number
EP1373331A4
EP1373331A4 EP02733834A EP02733834A EP1373331A4 EP 1373331 A4 EP1373331 A4 EP 1373331A4 EP 02733834 A EP02733834 A EP 02733834A EP 02733834 A EP02733834 A EP 02733834A EP 1373331 A4 EP1373331 A4 EP 1373331A4
Authority
EP
European Patent Office
Prior art keywords
thermally cured
cured underlayer
lithographic application
lithographic
application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02733834A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1373331A2 (en
Inventor
B De Binod
Sanjay Malik
Gregory Dominic Spaziano
John Joseph Biafore
Patrick Foster
Sidney George Slater
Thomas Steinhausler
Andrew J Blakeney
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Electronic Materials USA Inc
Original Assignee
Fujifilm Electronic Materials Co Ltd
Fujifilm Electronic Materials USA Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials Co Ltd, Fujifilm Electronic Materials USA Inc filed Critical Fujifilm Electronic Materials Co Ltd
Publication of EP1373331A2 publication Critical patent/EP1373331A2/en
Publication of EP1373331A4 publication Critical patent/EP1373331A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
EP02733834A 2001-03-13 2002-03-07 THERMALLY HARDENED LITHOGRAPH LAYER Withdrawn EP1373331A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US27552801P 2001-03-13 2001-03-13
US275528P 2001-03-13
PCT/US2002/007136 WO2002073307A2 (en) 2001-03-13 2002-03-07 Thermally cured underlayer for lithographic application

Publications (2)

Publication Number Publication Date
EP1373331A2 EP1373331A2 (en) 2004-01-02
EP1373331A4 true EP1373331A4 (en) 2007-01-17

Family

ID=23052692

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02733834A Withdrawn EP1373331A4 (en) 2001-03-13 2002-03-07 THERMALLY HARDENED LITHOGRAPH LAYER

Country Status (5)

Country Link
EP (1) EP1373331A4 (ko)
JP (1) JP2004534107A (ko)
KR (1) KR100709330B1 (ko)
TW (1) TW574234B (ko)
WO (1) WO2002073307A2 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4798938B2 (ja) * 2003-04-11 2011-10-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フォトレジストシステム
US7416821B2 (en) * 2004-03-12 2008-08-26 Fujifilm Electronic Materials, U.S.A., Inc. Thermally cured undercoat for lithographic application
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
KR101922280B1 (ko) * 2011-10-12 2018-11-26 제이에스알 가부시끼가이샤 패턴 형성 방법 및 레지스트 하층막 형성용 조성물
DE102015119939A1 (de) 2015-11-18 2017-05-18 ALTANA Aktiengesellschaft Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0292215A2 (en) * 1987-05-19 1988-11-23 Hitachi Chemical Co., Ltd. Method for production of methacrylate ester
JPH0539399A (ja) * 1991-08-02 1993-02-19 Nok Corp 透明性アクリルゴム組成物
JPH0593022A (ja) * 1991-09-30 1993-04-16 Nok Corp 透明性アクリルゴム組成物
EP0813114A2 (en) * 1996-06-11 1997-12-17 Shipley Company LLC Antireflective coating compositions
EP0942331A1 (en) * 1997-10-08 1999-09-15 Clariant International Ltd. Antireflection or light-absorbing coating composition and polymer therefor
EP0987600A1 (en) * 1998-09-15 2000-03-22 Shipley Company LLC Antireflective coating compositions
WO2000054105A1 (en) * 1999-03-12 2000-09-14 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 nm lithography
EP1211271A1 (en) * 1999-09-03 2002-06-05 Nippon Soda Co., Ltd. Alkenylphenol copolymer and process for producing the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2520686B2 (ja) * 1988-03-18 1996-07-31 富士写真フイルム株式会社 湿し水不要感光性平版印刷板

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0292215A2 (en) * 1987-05-19 1988-11-23 Hitachi Chemical Co., Ltd. Method for production of methacrylate ester
JPH0539399A (ja) * 1991-08-02 1993-02-19 Nok Corp 透明性アクリルゴム組成物
JPH0593022A (ja) * 1991-09-30 1993-04-16 Nok Corp 透明性アクリルゴム組成物
EP0813114A2 (en) * 1996-06-11 1997-12-17 Shipley Company LLC Antireflective coating compositions
EP0942331A1 (en) * 1997-10-08 1999-09-15 Clariant International Ltd. Antireflection or light-absorbing coating composition and polymer therefor
EP0987600A1 (en) * 1998-09-15 2000-03-22 Shipley Company LLC Antireflective coating compositions
WO2000054105A1 (en) * 1999-03-12 2000-09-14 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 nm lithography
EP1211271A1 (en) * 1999-09-03 2002-06-05 Nippon Soda Co., Ltd. Alkenylphenol copolymer and process for producing the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Week 199320, Derwent World Patents Index; AN 1993-162141, XP002410588 *

Also Published As

Publication number Publication date
KR100709330B1 (ko) 2007-04-20
EP1373331A2 (en) 2004-01-02
JP2004534107A (ja) 2004-11-11
KR20040024853A (ko) 2004-03-22
WO2002073307A3 (en) 2002-11-21
WO2002073307A2 (en) 2002-09-19
TW574234B (en) 2004-02-01

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Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20030714

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

RIN1 Information on inventor provided before grant (corrected)

Inventor name: BIAFORE, JOHN, JOSEPH

Inventor name: FOSTER, PATRICK

Inventor name: BINOD, B., DE

Inventor name: SLATER, SIDNEY, GEORGE

Inventor name: MALIK, SANJAY

Inventor name: BLAKENEY, ANDREW, J.

Inventor name: SPAZIANO, GREGORY, DOMINIC

Inventor name: STEINHAUSLER, THOMAS

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: FUJIFILM ELECTRONIC MATERIALS USA, INC.

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: FUJIFILM ELECTRONIC MATERIALS USA, INC.

A4 Supplementary search report drawn up and despatched

Effective date: 20061219

RIC1 Information provided on ipc code assigned before grant

Ipc: G03F 7/09 20060101AFI20061211BHEP

17Q First examination report despatched

Effective date: 20070829

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20090911