EP1360038A1 - Wiping film - Google Patents
Wiping filmInfo
- Publication number
- EP1360038A1 EP1360038A1 EP01986212A EP01986212A EP1360038A1 EP 1360038 A1 EP1360038 A1 EP 1360038A1 EP 01986212 A EP01986212 A EP 01986212A EP 01986212 A EP01986212 A EP 01986212A EP 1360038 A1 EP1360038 A1 EP 1360038A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- film
- wiping
- resin
- backing
- plastic particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002245 particle Substances 0.000 claims abstract description 40
- 229920003023 plastic Polymers 0.000 claims abstract description 24
- 239000004033 plastic Substances 0.000 claims abstract description 24
- 239000011230 binding agent Substances 0.000 claims abstract description 21
- 230000003746 surface roughness Effects 0.000 claims description 13
- 238000011282 treatment Methods 0.000 abstract description 17
- 239000000314 lubricant Substances 0.000 abstract description 10
- 239000000835 fiber Substances 0.000 abstract description 7
- 239000010408 film Substances 0.000 description 85
- 238000000034 method Methods 0.000 description 34
- 239000010410 layer Substances 0.000 description 27
- 230000008569 process Effects 0.000 description 23
- 239000011248 coating agent Substances 0.000 description 22
- 238000000576 coating method Methods 0.000 description 22
- 229920005989 resin Polymers 0.000 description 20
- 239000011347 resin Substances 0.000 description 20
- 229920001577 copolymer Polymers 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 238000004140 cleaning Methods 0.000 description 12
- -1 polyethylene terephthalate Polymers 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 238000001723 curing Methods 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 229920001228 polyisocyanate Polymers 0.000 description 6
- 239000005056 polyisocyanate Substances 0.000 description 6
- 230000001788 irregular Effects 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 229920001225 polyester resin Polymers 0.000 description 5
- 239000004645 polyester resin Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 4
- 239000010954 inorganic particle Substances 0.000 description 4
- 239000012948 isocyanate Substances 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- 230000001050 lubricating effect Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000001029 thermal curing Methods 0.000 description 4
- 239000004952 Polyamide Substances 0.000 description 3
- 229920001807 Urea-formaldehyde Polymers 0.000 description 3
- 229920002678 cellulose Chemical class 0.000 description 3
- 239000001913 cellulose Chemical class 0.000 description 3
- 235000010980 cellulose Nutrition 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- 229920001747 Cellulose diacetate Polymers 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OWNRRUFOJXFKCU-UHFFFAOYSA-N Bromadiolone Chemical compound C=1C=C(C=2C=CC(Br)=CC=2)C=CC=1C(O)CC(C=1C(OC2=CC=CC=C2C=1O)=O)C1=CC=CC=C1 OWNRRUFOJXFKCU-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- QORUGOXNWQUALA-UHFFFAOYSA-N N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 QORUGOXNWQUALA-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 229930182556 Polyacetal Chemical class 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- GZCGUPFRVQAUEE-SLPGGIOYSA-N aldehydo-D-glucose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O GZCGUPFRVQAUEE-SLPGGIOYSA-N 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000010944 ethyl methyl cellulose Nutrition 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 229920003087 methylethyl cellulose Polymers 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Chemical class 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/048—Lapping machines or devices; Accessories designed for working plane surfaces of sliders and magnetic heads of hard disc drives or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
- B24D13/147—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
- B24D3/32—Resins or natural or synthetic macromolecular compounds for porous or cellular structure
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
Definitions
- the present invention relates to a material used for finishing the surface of a magnetic recording medium, and more particularly concerns a wiping film that is used for a cleaning process and a burnishing process carried out on the surface of a magnetic disk.
- magnetic disks are formed as follows: a non-magnetic backing such as an aluminum alloy backing and glass backing is subjected to a sequence of surface treatments such as a lapping treatment, a polishing treatment and a texture treatment so that the surface becomes rough, and on the non-magnetic backing having the roughened surface is formed a magnetic recording layer, and on this magnetic recording layer is further formed a protective film made from carbon, SiO 2 , etc.
- a non-magnetic backing such as an aluminum alloy backing and glass backing is subjected to a sequence of surface treatments such as a lapping treatment, a polishing treatment and a texture treatment so that the surface becomes rough
- a magnetic recording layer on the non-magnetic backing having the roughened surface is formed a magnetic recording layer, and on this magnetic recording layer is further formed a protective film made from carbon, SiO 2 , etc.
- a film cleaning process is carried out to remove protrusions formed on the surface of the protective film and foreign matters on the surface of the magnetic disk.
- This film cleaning process is generally carried out using an abrasive tape.
- a lubricant of fluorocarbon type is applied to to the protective film to form a lubricating film, and burnishing is carried out thereon to remove adhered matter such as dust on the surface of the magnetic recording medium.
- this burnishing is also carried out by using an abrasive film. Thereafter, these are subjected to predetermined tests so as to produce magnetic recording medium in conformity with the standard.
- a lapping film comprising abrasive grains such as alumina particles and SiC particles carried on a film made of a material, such as polyethylene terephthalate and polyamide.
- Japanese Patent Laid-Open Publication No. 85628/1997, 71572/1998 and 114837/1999 have disclosed a lapping film having such a construction.
- the formation technique of protective films has been improved, and a shift has been made from the sputtering method to the chemical vapor deposition (CVD) method. Accordingly, it has become possible to provide a high precision and high quality film with high density and very thin film thickness.
- the surface of the magnetic disk after the film formation becomes more uniform and more clean, thereby making it possible to provide a high quality disk (with less abnormally grown protrusions and reduced number of dust particles generated during the film formation).
- the lapping film used for film cleaning and burnishing has been improved to meet the change so that the average particle size of abrasive grains used therein, which used to be the level of several ⁇ m, has now become more finer grains of not more than 0.3 ⁇ m.
- the lapping film contains hard inorganic particles as an abrasive material, and in the case when irregular protrusions exist on the surface of a lapping film or when grain detachment, etc. occurs therein, the resulting defect is that scratches occur on the surface of the magnetic disk. Moreover, if detached grains remain on the surface of the disk, these grains might cause a serious defect in which they are embedded in the disk in the succeeding process.
- Japanese Patent Laid-Open Publication No. 66179/1993 discloses a cleaning film for surface-treating a protective film of a magnetic recording medium. This cleaning film is made of a woven cloth with very thin fibers, and this is used for removing dust after the abrasive process using a lapping film.
- the present invention provides a wiping film for removing foreign matter and loose lubricant, without scratching and without depositing fibrous debris on the treatment surface.
- the wiping film may be used in the treatment of magnetic disks and the like.
- the invention provides a wiping film having a flexible film backing, and a wiping layer formed on one surface of the backing, the wiping layer composed of a binder and plastic particles dispersed therein.
- FIG. 1 is a cross-sectional view of an embodiment of a wiping film in accordance with the present invention.
- Fig. 1 is a cross-sectional view of a wiping film according to the present invention.
- Plastic particles 2 are bonded to a surface of a film-shape backing 1 by a hardened binder resin 3 to provide a wiping layer 4.
- This wiping film is used for removing foreign matter and loose lubricant from the surface of a magnetic recording medium, that is, mainly from the surface of the magnetic disk so as to provide a uniform lubricating film formed on the surface of the magnetic disk.
- Film backing is used for removing foreign matter and loose lubricant from the surface of a magnetic recording medium, that is, mainly from the surface of the magnetic disk so as to provide a uniform lubricating film formed on the surface of the magnetic disk.
- the film backing is properly selected from polymer films that have sufficient strength resistant to tape cleaning and burnishing processes as well as strength and heat resistance to coating and drying processes during manufacturing processes, are less susceptible to dimensional change, and have flexibility. Polymer films conventionally used as lapping film backings are preferably used.
- polymer films examples include, polyester resins such as polyethylene terephthalate, polybutylene terephthalate and polyethylene naphthalate; polyolefin resins such as high-density polyethylene and polypropylene; polystyrene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, ethylene- vinylalcohol copolymer, polyacrylonitrile, polyamide, acrylic resins mainly composed of materials such as esters of acrylic acid, or esters of methacrylic acid; polyacetal, cellulose derivatives such as cellulose triacetate and cellulose diacetate; and polycarbonate.
- polyester resins such as polyethylene terephthalate, polybutylene terephthalate and polyethylene naphthalate
- polyolefin resins such as high-density polyethylene and polypropylene
- polystyrene polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, ethylene- vinylalcohol
- the film backing preferably have appropriate flexibility.
- this film backing has a bend elastic modulus of from 500 to 2000 kg/mm 2 measured according to
- JIS K 6911 by using a test piece having a thickness of 1 mm.
- the film backing generally has a thickness of from 5 to 125 ⁇ m and more preferably, 14 to 75 ⁇ m.
- Plastic particles In lapping films conventionally used for tape cleaning and burnishing processes on the surface of a magnetic recording medium, inorganic materials such as alumina have been used as components in the abrasive layer. However, in order to prevent scratches on the treatment surface, in the wiping film of the present invention, plastic particles, which are softer than the inorganic particles, are used. The combination of such plastic particles and a binder allows the surface of the wiping layer to have an uneven irregular structure, thereby providing functions for taking in fine foreign matters and particles and for absorbing loose lubricant, without causing scratches on the polishing treatment subject.
- the plastic particles preferably have a hardness of Ml 0 to Ml 30 in the Rockwell hardness, more preferably, M85 to Ml 05.
- M10 Rockwell hardness of the plastic particles
- the plastic particles become flattened at the time of the application of the wiping film, making it impossible to maintain the irregular structure on the surface. In this case, it is not possible to obtain the wiping effect.
- the Rockwell hardness of the plastic particles is less than M10, the plastic particles become flattened at the time of the application of the wiping film, making it impossible to maintain the irregular structure on the surface. In this case, it is not possible to obtain the wiping effect.
- the Rockwell hardness of the plastic particles is less than M10
- the plastic particles preferably have spherical shape. This shape prevents scratches from occurring on the treatment surface.
- the average particle size is preferably in the range of 0.01 to 100 ⁇ m, more preferably, 0.1 ⁇ m to 10 ⁇ m.
- the average particle size less than 0.01 ⁇ m fails to form the irregularity corresponding to the surface roughness required in designing the surface of the wiping layer of the film.
- the average particle size exceeding 100 ⁇ m makes the surface roughness of the wiping layer of the film too high, resulting in degradation in the wiping function required for the product. In particular, it becomes difficult to take in fine particles in the orders of nm.
- the material of the plastic particles is preferably selected from resins having a proper hardness.
- the material include: esters of polymethacrylic acid, polystyrene, polyolefin, phenolic resin, epoxy resin, acrylonitrile-butadiene-styrene resin, high-density polyethylene resin, urea resin, polyester resin, polyvinylchloride, polyamide and polycarbonate.
- those materials obtained by subjecting these fine particles to a surface modifying treatment, etc. for example, those materials obtained by metal- coating these fine particles or introducing a functional group to these fine particles, may be used.
- inorganic particles such as spherical glass or spherical ceramics, may be mixed into the above-mentioned plastic particles so as to allow the plastic particles to deposit certainly on the backing.
- plastic particles may be used. For example "CHEMISNOW (trade name)" made by Soken Chemical & Engineering Co., Ltd. is listed. Binder
- thermoplastic resin thermocuring resin
- reactive-type resin reactive-type resin
- electronic-ray-curing resin ultraviolet-curing resin
- visible-light-curing resin a mixture of these
- binders in the case of thermocuring type, those which can provide a hardness of 15 to 90, more preferably, 50 to 85, in the Shore D hardness after having been set at room temperature are preferably used.
- thermoplastic resins those having a softening temperature of not more than 150°C, an average molecular weight of 10000 to
- a polymerization degree of at least 50 to 200, in particular, 200 to 700, may be preferably used.
- examples thereof include; vinylchloride-vinylacetate copolymer, vinylchloride copolymer, vinylchloride-vinylacetate-vinylalcohol copolymer, vinylchloride-vinylalcohol copolymer, vinylchloride-vinylidenechloride copolymer, vinylchloride-acrylonitrile copolymer, acrylate-acrylonitrile copolymer, acrylate- vinylidenechloride copolymer, acrylate-styrene copolymer, methacrylate-acrylonitrile copolymer, methacrylate-vinylidenechloride copolymer, methacrylate-styrene copolymer, urethane elastomer, nylon-silicon resins, nitrocellulose-polyamide resin, vinylpolyfluoride, vinylidenechloride-acrylonitrile copolymer, butadiene-acrylonitrile copolymer, polyamide resin, polyviny
- the coating solution preferably has a molecular weight of not more than 200000, and those which have a molecular weight that becomes infinite by applying heat and humidifying them after having been coated and dried, through a reaction such as a condensing addition reaction. Moreover, among these resins, those which are not softened or molten until the resin has been thermally decomposed are preferably used.
- examples thereof include: phenolic resin, phenoxy resin, epoxy resin, polyurethane resin, polyester resin, polyurethane polycarbonate resin, urea resin, melamine resin, alkyd resin, silicone resin, acrylic reactive resins (electron-ray curing resin), epoxy-polyamide resin, nitrocellulose-melamine resin, a mixture of high molecular polyester resin and isocyanate prepolymer, a mixture of methacrylate copolymer and diisocyanate prepolymer, a mixture of polyester polyol and polyisocyanate, urea formaldehyde resin, a mixture of low molecular glycol/high molecular diol/triphenylmethane triisocyanate, polyamine resin, polyimine resin, etc.
- polyisocyanate is preferably used.
- polyisocyanate include: isocyanates such as tolylenediisocyanate, 4,4'-diphenylmethanediisocyanate, hexamethylenediisocyanate, xylylenediisocyanate, naphthylene-1 ,5-diisocyanate, O-toluidinediisocyanate, isophoronediisocyanate, and triphenylmethanetriisocyanate, or reaction products of these isocyanates and polyalcohol, or polyisocyanates of dimer to decamer produced by condensation of isocyanate chains, or products of polyisocyanate and polyurethane having isocyanate as a terminal functional group.
- the molecular weight of these polyisocyanates has a number average molecular weight of 100 to 20000.
- the wiping film of the present invention is prepared as follows: a wiping layer containing plastic particles and a binder is formed on one surface of a backing film and this layer is cured.
- the wiping layer is generally formed by mixing and dispersing plastic particles so as to preliminarily prepare a coating solution, and applying this coating solution to the surface of a backing film so as to be dried thereon.
- the plastic particles and the binder is preferably mixed in a weight ratio
- particles/binder of nonvolatile components (that is, at the state that solvents are excluded, for example, in case of examples, at the state that methyl ethyl ketone, and toluene are excluded) of 70/100 to 350/100, more preferably 100/100 to 200/100.
- the mixture ratio is less than 70/100, most of the surface of the wiping layer of the film covered with the binder, a sufficient irregular structure required for the product is not achieved.
- the mixture ratio is more than 350/100, the plastic particles are easily detached from the wiping layer.
- binders Upon mixing, a plurality of kinds of binders may be combined and used, and, if necessary, conventional additive agents, such as a dispersant, a coupling agent, a lubricant, an antistatic agent, an antioxidant, a moldewproof agent, a colorant and a solvent, may be added thereto.
- additive agents such as a dispersant, a coupling agent, a lubricant, an antistatic agent, an antioxidant, a moldewproof agent, a colorant and a solvent
- the addition order of the respective components, the dispersing temperature (0 to 80°C) , etc. may preferably be controlled.
- the addition order of the additives is, for example, that a coupling agent and a dispersing agent are added at the time when mixing of plastic particles and a binder are started, and a lubricant and an antistatic agent and the like are added coincidentally after uniform dispersion is formed.
- the dispersing temperature is for example determined in consideration of boiling point of a solvent contained in an coating solution.
- dispersing process may be carried out with keeping at 20 to 50°C in the case that methyl ethyl ketone or toluene are mainly employed as a solvent.
- the preparation of the coating solution may be carried out by using a conventional kneading machine.
- the viscosity of the coating solution After the viscosity of the coating solution has been appropriately adjusted, it is applied through the following methods: gravure coater, air doctor coater, blade coater, rod coater, knife coater, squeeze coater, impregnating machine, reverse roll coater, transfer roll coater, kiss roll coater, cast coating, spray coater, slot orifice coater (curtain coater, fountain coater), static powder coater, electrodeposition coating, powder electrodeposition coating, vacuum plating method, extrusion coater, micro replication method, PVD method,
- a base coating layer may be placed, or a corona discharging process, etc. may be applied in order to improve the adhesive strength to the film backing.
- the coating solution After the coating solution has been applied to the film backing, this is dried and the binder is cured so that a wiping film is obtained.
- the curing process of the binder is generally carried out by heating.
- the wiping layer has a thickness of from 1 to 200 ⁇ m, more preferably 2 to 20 ⁇ m.
- the thickness of the wiping layer of less than 1 ⁇ m tends to cause an interlayer separation in the wiping layer formed on the backing.
- the thickness exceeding 200 ⁇ m causes a great amount of consumption of the materials such as the plastic particles and binder, in comparison with the resulting functions of the wiping layer, resulting in high costs of the film for this purpose.
- a surface of the wiping layer has a center line average surface roughness
- PET polyethylene terephthalate
- Teijin K.K. having the following properties was employed: serial No.: G2-24, average thickness: 23.3 ⁇ m, breaking strength: longitudinal direction 28 kg/mm 2 - lateral direction 29 kg/mm , breaking extension: longitudinal direction 125 %-lateral direction 110 %, surface roughness (Ra): 0.023 ⁇ m, thermal contraction rate (150°C x 30 minutes): longitudinal direction 1.8 %-lateral direction 0.3%), haze: 3.0 %>, friction coefficient: stationary 0. 35 - moving 0.33.
- PTT polyethylene terephthalate
- the coating solution was applied to the surface of this film backing by using a direct gravure coating method.
- the application was set to an amount so as to form a thickness of the wiping layer of 6 ⁇ m after the curing process.
- this was put in an atmosphere of 40 to 130°C for 5 to 300 seconds so that the coated solution was dried, and the wiping layer was then cured.
- the surface roughness (Ra) of the wiping layer was measured, and the resulting value was 0.203 ⁇ m.
- the resulting wiping film was set to a texturing polishing machine made by Hitachi Electronics Engineering K.K. Then, the surface of a 3.5 inch NI-P plated aluminum board was subjected to a wiping process under conditions shown in Table 3. The surface roughness of the board was measured before and after the process. Table 3 shows the results of the measurements. Table 3
- Example 2 The same processes as Example 1 were carried out except that a conventional lapping film (abrasive grains: aluminum oxide having an average particle size of 0.3 ⁇ m, Ra of abrasive layer surface: 0.045 ⁇ m) was used, so as to polish the surface of a 3.5-inch NI-P plated Al board.
- a conventional lapping film abrasive grains: aluminum oxide having an average particle size of 0.3 ⁇ m, Ra of abrasive layer surface: 0.045 ⁇ m
- Example 2 The same processes as Example 1 were carried out except that a conventional lapping film (abrasive grains: aluminum oxide having an average particle size of 1 ⁇ m, Ra of abrasive layer surface: 0.162 ⁇ m) was used, so as to polish the surface of a 3.5-inch NI- P plated Al board.
- a conventional lapping film abrasive grains: aluminum oxide having an average particle size of 1 ⁇ m, Ra of abrasive layer surface: 0.162 ⁇ m
- Example 2 The same processes as Example 1 were carried out except that a conventional lapping film (abrasive grains: aluminum oxide having an average particle size of 2 ⁇ m, Ra of abrasive layer surface: 1.56 ⁇ m) was used, so as to polish the surface of a 3.5-inch NI-P plated Al board.
- a conventional lapping film abrasive grains: aluminum oxide having an average particle size of 2 ⁇ m, Ra of abrasive layer surface: 1.56 ⁇ m
- the wiping film of the present invention does not contain inorganic particles nor fiber materials so that it generates neither scratches nor fiber dusts on the treatment surface. Moreover, it has an uneven irregular structure on the surface so that it is possible to remove foreign matters and loose lubricant from the treatment surface.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
A wiping film having a flexible film backing, and a wiping layer formed on one surface of the backing, wherein the wiping layer is composed of a binder and plastic particles dispersed therein. The wiping film is useful for removing foreign matter and loose lubricant from the treatment surface of a magnetic disk without generating any scratches or fiber particles thereon.
Description
WIPING FILM
The present invention relates to a material used for finishing the surface of a magnetic recording medium, and more particularly concerns a wiping film that is used for a cleaning process and a burnishing process carried out on the surface of a magnetic disk.
Background of Invention
In recent years, along with the development of the information processing technology such as computers, magnetic recording media such as magnetic disks have been widely used as the external memory devices thereof.
In general, magnetic disks are formed as follows: a non-magnetic backing such as an aluminum alloy backing and glass backing is subjected to a sequence of surface treatments such as a lapping treatment, a polishing treatment and a texture treatment so that the surface becomes rough, and on the non-magnetic backing having the roughened surface is formed a magnetic recording layer, and on this magnetic recording layer is further formed a protective film made from carbon, SiO2, etc.
After forming the protective film, a film cleaning process is carried out to remove protrusions formed on the surface of the protective film and foreign matters on the surface of the magnetic disk. This film cleaning process is generally carried out using an abrasive tape.
Following the cleaning process, a lubricant of fluorocarbon type is applied to to the protective film to form a lubricating film, and burnishing is carried out thereon to remove adhered matter such as dust on the surface of the magnetic recording medium. In general, this burnishing is also carried out by using an abrasive film. Thereafter, these are subjected to predetermined tests so as to produce magnetic recording medium in conformity with the standard.
Conventionally, with respect to films used for film cleaning and burnishing, a lapping film is used comprising abrasive grains such as alumina particles and SiC particles carried on a film made of a material, such as polyethylene terephthalate and polyamide.
For example, Japanese Patent Laid-Open Publication No. 85628/1997, 71572/1998 and 114837/1999 have disclosed a lapping film having such a construction.
In recent years, in order to increase the memory capacity of a magnetic disk, the formation technique of protective films has been improved, and a shift has been made from the sputtering method to the chemical vapor deposition (CVD) method. Accordingly, it has become possible to provide a high precision and high quality film with high density and very thin film thickness. Moreover, the surface of the magnetic disk after the film formation becomes more uniform and more clean, thereby making it possible to provide a high quality disk (with less abnormally grown protrusions and reduced number of dust particles generated during the film formation).
Along with the development of the high quality formation film, the lapping film used for film cleaning and burnishing has been improved to meet the change so that the average particle size of abrasive grains used therein, which used to be the level of several μm, has now become more finer grains of not more than 0.3 μm.
However, the lapping film contains hard inorganic particles as an abrasive material, and in the case when irregular protrusions exist on the surface of a lapping film or when grain detachment, etc. occurs therein, the resulting defect is that scratches occur on the surface of the magnetic disk. Moreover, if detached grains remain on the surface of the disk, these grains might cause a serious defect in which they are embedded in the disk in the succeeding process.
Therefore, in recent years when the formation technique of the protective film has been improved, with respect to a film for surface-treating the protective film of a magnetic disk, a function for removing foreign matters by wiping them without causing scratches rather than for polishing the surface of the protective film has come to be required. Moreover, in the case when burnishing is carried out after formation of a lubricating film, the film needs to have an oil-absorbing characteristic in order to remove loose lubricant and render the lubricating film more uniform across the surface of the magnetic disk.
In other words, the quality required for a surface finishing material for the surface of a magnetic disk has come to change in response to the improvement of the film quality and changes in the processes in which it is used, and those materials which cause no scratches and can remove foreign matters and loose lubricant have come to be demanded. That is, although emphasis was put on the polishing function conventionally, emphasis now has been put on the removal of foreign-matter (wiping function).
Japanese Patent Laid-Open Publication No. 66179/1993 discloses a cleaning film for surface-treating a protective film of a magnetic recording medium. This cleaning film is made of a woven cloth with very thin fibers, and this is used for removing dust after the abrasive process using a lapping film. Therefore, it contains no abrasive grains, and causes no scratches on the surface of the magnetic disk. However, the very thin fibers tend to be cut due to tension and friction, and once they are cut, fiber particles come off from the woven cloth. Therefore, the application of this cleaning film instead of the lapping film causes a problem in which the treatment surface is contaminated by fiber. For this reason, cleaning films composed of woven cloth with very thin fibers have not been put into practical use yet as a material for treating a protective film surface of a magnetic recording medium.
The present invention provides a wiping film for removing foreign matter and loose lubricant, without scratching and without depositing fibrous debris on the treatment surface. The wiping film may be used in the treatment of magnetic disks and the like.
Summary of the Invention
The invention provides a wiping film having a flexible film backing, and a wiping layer formed on one surface of the backing, the wiping layer composed of a binder and plastic particles dispersed therein.
Brief Description of the Drawings
In describing aspect of the preferred embodiment, reference is made to the Figure wherein:
FIG. 1 is a cross-sectional view of an embodiment of a wiping film in accordance with the present invention.
Detailed Description of the Preferred Embodiment
Fig. 1 is a cross-sectional view of a wiping film according to the present invention. Plastic particles 2 are bonded to a surface of a film-shape backing 1 by a hardened binder resin 3 to provide a wiping layer 4. This wiping film is used for removing foreign matter and loose lubricant from the surface of a magnetic recording medium, that is, mainly from
the surface of the magnetic disk so as to provide a uniform lubricating film formed on the surface of the magnetic disk. Film backing
The film backing is properly selected from polymer films that have sufficient strength resistant to tape cleaning and burnishing processes as well as strength and heat resistance to coating and drying processes during manufacturing processes, are less susceptible to dimensional change, and have flexibility. Polymer films conventionally used as lapping film backings are preferably used.
Examples of such polymer films, oriented or unoriented films, include, polyester resins such as polyethylene terephthalate, polybutylene terephthalate and polyethylene naphthalate; polyolefin resins such as high-density polyethylene and polypropylene; polystyrene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, ethylene- vinylalcohol copolymer, polyacrylonitrile, polyamide, acrylic resins mainly composed of materials such as esters of acrylic acid, or esters of methacrylic acid; polyacetal, cellulose derivatives such as cellulose triacetate and cellulose diacetate; and polycarbonate. In particular, biaxial oriented films of polyethylene terephthalate and nylon and polyimide film are superior in the coating property of wiping film, post-processing property and handling in the actual machine, and are preferably used.
The film backing preferably have appropriate flexibility. For example this film backing has a bend elastic modulus of from 500 to 2000 kg/mm2 measured according to
JIS K 6911 by using a test piece having a thickness of 1 mm.
The film backing generally has a thickness of from 5 to 125 μm and more preferably, 14 to 75 μm. Plastic particles In lapping films conventionally used for tape cleaning and burnishing processes on the surface of a magnetic recording medium, inorganic materials such as alumina have been used as components in the abrasive layer. However, in order to prevent scratches on the treatment surface, in the wiping film of the present invention, plastic particles, which are softer than the inorganic particles, are used. The combination of such plastic particles and a binder allows the surface of the wiping layer to have an uneven irregular structure, thereby providing functions for taking in fine foreign matters and particles and for absorbing loose lubricant, without causing scratches on the polishing treatment subject.
The plastic particles preferably have a hardness of Ml 0 to Ml 30 in the Rockwell hardness, more preferably, M85 to Ml 05. When the Rockwell hardness of the plastic particles is less than M10, the plastic particles become flattened at the time of the application of the wiping film, making it impossible to maintain the irregular structure on the surface. In this case, it is not possible to obtain the wiping effect. Moreover, the
Rockwell hardness exceeding Ml 30 tends to cause scratches on the treatment surface.
Although not particularly limited, the plastic particles preferably have spherical shape. This shape prevents scratches from occurring on the treatment surface. With respect to the particle size, the average particle size is preferably in the range of 0.01 to 100 μm, more preferably, 0.1 μm to 10 μm. The average particle size less than 0.01 μm fails to form the irregularity corresponding to the surface roughness required in designing the surface of the wiping layer of the film. The average particle size exceeding 100 μm makes the surface roughness of the wiping layer of the film too high, resulting in degradation in the wiping function required for the product. In particular, it becomes difficult to take in fine particles in the orders of nm.
The material of the plastic particles is preferably selected from resins having a proper hardness. Examples of the material include: esters of polymethacrylic acid, polystyrene, polyolefin, phenolic resin, epoxy resin, acrylonitrile-butadiene-styrene resin, high-density polyethylene resin, urea resin, polyester resin, polyvinylchloride, polyamide and polycarbonate. Moreover, those materials obtained by subjecting these fine particles to a surface modifying treatment, etc., for example, those materials obtained by metal- coating these fine particles or introducing a functional group to these fine particles, may be used. Furthermore, inorganic particles, such as spherical glass or spherical ceramics, may be mixed into the above-mentioned plastic particles so as to allow the plastic particles to deposit certainly on the backing.
Commercially available plastic particles may be used. For example "CHEMISNOW (trade name)" made by Soken Chemical & Engineering Co., Ltd. is listed. Binder
With respect to the binder, conventionally known thermoplastic resin, thermocuring resin, reactive-type resin, electronic-ray-curing resin, ultraviolet-curing resin, visible-light-curing resin, and a mixture of these may be used. Those materials that have been used as the binder of lapping films may be preferably used.
With respect to these binders, in the case of thermocuring type, those which can provide a hardness of 15 to 90, more preferably, 50 to 85, in the Shore D hardness after having been set at room temperature are preferably used.
In the case when thermoplastic resins are used as the binder, those having a softening temperature of not more than 150°C, an average molecular weight of 10000 to
300000, and a polymerization degree of at least 50 to 200, in particular, 200 to 700, may be preferably used.
More specifically, examples thereof include; vinylchloride-vinylacetate copolymer, vinylchloride copolymer, vinylchloride-vinylacetate-vinylalcohol copolymer, vinylchloride-vinylalcohol copolymer, vinylchloride-vinylidenechloride copolymer, vinylchloride-acrylonitrile copolymer, acrylate-acrylonitrile copolymer, acrylate- vinylidenechloride copolymer, acrylate-styrene copolymer, methacrylate-acrylonitrile copolymer, methacrylate-vinylidenechloride copolymer, methacrylate-styrene copolymer, urethane elastomer, nylon-silicon resins, nitrocellulose-polyamide resin, vinylpolyfluoride, vinylidenechloride-acrylonitrile copolymer, butadiene-acrylonitrile copolymer, polyamide resin, polyvinylbutyral, cellulose derivatives (cellulose acetate butyrate, cellulose diacetate, cellulose triacetate, cellulose propionate, nitrocellulose, ethyl cellulose, methyl cellulose, propyl cellulose, methylethyl cellulose, carboxymethyl cellulose, acetyl cellulose, etc.), styrene-butadiene copolymer, polyester resin, polycarbonate resin, chlorovinylether-acrylate copolymer, amino acid resin, various synthetic rubbers, thermoplastic resins, and mixtures thereof may be used.
In the case when thermocuring resins or reactive-type resins are used as the binder, the coating solution preferably has a molecular weight of not more than 200000, and those which have a molecular weight that becomes infinite by applying heat and humidifying them after having been coated and dried, through a reaction such as a condensing addition reaction. Moreover, among these resins, those which are not softened or molten until the resin has been thermally decomposed are preferably used.
More specifically, examples thereof include: phenolic resin, phenoxy resin, epoxy resin, polyurethane resin, polyester resin, polyurethane polycarbonate resin, urea resin, melamine resin, alkyd resin, silicone resin, acrylic reactive resins (electron-ray curing resin), epoxy-polyamide resin, nitrocellulose-melamine resin, a mixture of high molecular polyester resin and isocyanate prepolymer, a mixture of methacrylate copolymer and
diisocyanate prepolymer, a mixture of polyester polyol and polyisocyanate, urea formaldehyde resin, a mixture of low molecular glycol/high molecular diol/triphenylmethane triisocyanate, polyamine resin, polyimine resin, etc. and a mixture of these. With respect to a curing agent for the thermocuring resin, polyisocyanate is preferably used. Specific examples of polyisocyanate include: isocyanates such as tolylenediisocyanate, 4,4'-diphenylmethanediisocyanate, hexamethylenediisocyanate, xylylenediisocyanate, naphthylene-1 ,5-diisocyanate, O-toluidinediisocyanate, isophoronediisocyanate, and triphenylmethanetriisocyanate, or reaction products of these isocyanates and polyalcohol, or polyisocyanates of dimer to decamer produced by condensation of isocyanate chains, or products of polyisocyanate and polyurethane having isocyanate as a terminal functional group. The molecular weight of these polyisocyanates has a number average molecular weight of 100 to 20000. Preparation of wiping film The wiping film of the present invention is prepared as follows: a wiping layer containing plastic particles and a binder is formed on one surface of a backing film and this layer is cured. The wiping layer is generally formed by mixing and dispersing plastic particles so as to preliminarily prepare a coating solution, and applying this coating solution to the surface of a backing film so as to be dried thereon. The plastic particles and the binder is preferably mixed in a weight ratio
(particles/binder) of nonvolatile components (that is, at the state that solvents are excluded, for example, in case of examples, at the state that methyl ethyl ketone, and toluene are excluded) of 70/100 to 350/100, more preferably 100/100 to 200/100. When the mixture ratio is less than 70/100, most of the surface of the wiping layer of the film covered with the binder, a sufficient irregular structure required for the product is not achieved. When the mixture ratio is more than 350/100, the plastic particles are easily detached from the wiping layer.
Upon mixing, a plurality of kinds of binders may be combined and used, and, if necessary, conventional additive agents, such as a dispersant, a coupling agent, a lubricant, an antistatic agent, an antioxidant, a moldewproof agent, a colorant and a solvent, may be added thereto. The addition order of the respective components, the dispersing temperature (0 to 80°C) , etc. may preferably be controlled.
The addition order of the additives is, for example, that a coupling agent and a dispersing agent are added at the time when mixing of plastic particles and a binder are started, and a lubricant and an antistatic agent and the like are added coincidentally after uniform dispersion is formed. The dispersing temperature is for example determined in consideration of boiling point of a solvent contained in an coating solution. For example, dispersing process may be carried out with keeping at 20 to 50°C in the case that methyl ethyl ketone or toluene are mainly employed as a solvent. The preparation of the coating solution may be carried out by using a conventional kneading machine.
With respect to the method for coating the backing film with the coating solution, after the viscosity of the coating solution has been appropriately adjusted, it is applied through the following methods: gravure coater, air doctor coater, blade coater, rod coater, knife coater, squeeze coater, impregnating machine, reverse roll coater, transfer roll coater, kiss roll coater, cast coating, spray coater, slot orifice coater (curtain coater, fountain coater), static powder coater, electrodeposition coating, powder electrodeposition coating, vacuum plating method, extrusion coater, micro replication method, PVD method,
CVD method, and various vapor deposition methods.
Specific explanations of these methods are given in "Coating Systems" published by Maki Book Store (published on October 30, 1979) and "New Trend of Thin-Film Techniques" published by Industrial Research Association (published on July 15, 1997) on pages 65 to 135. Examples of a preferred viscosity of a coating liquid for application by using the various kinds of coating apparatus are as follows.
Table 1
The order of application of these coating solutions may be desirably selected, and prior to a coating by a desired solution, a base coating layer may be placed, or a corona discharging process, etc. may be applied in order to improve the adhesive strength to the film backing.
After the coating solution has been applied to the film backing, this is dried and the binder is cured so that a wiping film is obtained. The curing process of the binder is generally carried out by heating.
In the resulting wiping film, the wiping layer has a thickness of from 1 to 200 μm, more preferably 2 to 20 μm. The thickness of the wiping layer of less than 1 μm tends to cause an interlayer separation in the wiping layer formed on the backing. The thickness exceeding 200 μm causes a great amount of consumption of the materials such as the
plastic particles and binder, in comparison with the resulting functions of the wiping layer, resulting in high costs of the film for this purpose.
Moreover, a surface of the wiping layer has a center line average surface roughness
(Ra) of not more than 50 μm, more preferably 0.01 to 5 μm (cut off value: 80 μm). The value exceeding 50 μm causes the surface of the wiping layer of the film too rough. Here, in the wiping treatment subject such as a magnetic disk, it is demanded that the surface roughness is reduced to the nano level and further to the angstrom level, and in response to this demand, it is of course necessary for the surface roughness of the wiping layer of the film to be adjusted with high precision. The features of the preferred embodiment are further illustrated in the following non-limiting examples.
Examples
A detailed explanation will be given of the present invention by means of the following examples; however, the present invention is not intended to be limited by these. Here, in the examples, "part" and "%" refer to "parts by weight" and "% by weight" unless otherwise defined.
Example 1
Materials A to D, shown in Table 2, were put into a tank, and this was dispersed and kneaded for 60 minutes at 1800 rpm by using a high-speed mixer, and it was confirmed that the plastic particles had been uniformly dispersed. Thereafter, material E was added thereto, and further stirred for 15 minutes. Then, this was filtered, and a coating solution having a solid concentration of 35.0 % was obtained.
Table 2
With respect to the film backing, a polyethylene terephthalate (PET) film, made by Teijin K.K., having the following properties was employed: serial No.: G2-24, average thickness: 23.3 μm, breaking strength: longitudinal direction 28 kg/mm2 - lateral direction 29 kg/mm , breaking extension: longitudinal direction 125 %-lateral direction 110 %, surface roughness (Ra): 0.023 μm, thermal contraction rate (150°C x 30 minutes): longitudinal direction 1.8 %-lateral direction 0.3%), haze: 3.0 %>, friction coefficient: stationary 0. 35 - moving 0.33.
The coating solution was applied to the surface of this film backing by using a direct gravure coating method. The application was set to an amount so as to form a thickness of the wiping layer of 6 μm after the curing process. Next, this was put in an atmosphere of 40 to 130°C for 5 to 300 seconds so that the coated solution was dried, and the wiping layer was then cured. After the curing process, the surface roughness (Ra) of the wiping layer was measured, and the resulting value was 0.203 μm.
The resulting wiping film was set to a texturing polishing machine made by Hitachi Electronics Engineering K.K. Then, the surface of a 3.5 inch NI-P plated aluminum board was subjected to a wiping process under conditions shown in Table 3. The surface roughness of the board was measured before and after the process. Table 3 shows the results of the measurements. Table 3
Comparative Example 1
The same processes as Example 1 were carried out except that a conventional lapping film (abrasive grains: aluminum oxide having an average particle size of 0.3 μm, Ra of abrasive layer surface: 0.045 μm) was used, so as to polish the surface of a 3.5-inch NI-P plated Al board.
The surface roughness of the board was measured before and after the process. Table 4 shows the results of the measurements.
Comparative Example 2
The same processes as Example 1 were carried out except that a conventional lapping film (abrasive grains: aluminum oxide having an average particle size of 1 μm, Ra of abrasive layer surface: 0.162 μm) was used, so as to polish the surface of a 3.5-inch NI- P plated Al board.
The surface roughness of the board was measured before and after the process. Table 4 shows the results of the measurements. Comparative Example 3
The same processes as Example 1 were carried out except that a conventional lapping film (abrasive grains: aluminum oxide having an average particle size of 2 μm, Ra of abrasive layer surface: 1.56 μm) was used, so as to polish the surface of a 3.5-inch NI-P plated Al board.
The surface roughness of the board was measured before and after the process. Table 4 shows the results of the measurements. Table 4
In the case of the surface treatment carried out by the wiping film of the example, the surface roughness of the board was not changed before and after the treatment, and it was confirmed that the treatment surface was free from damages such as scratches. The wiping film of the present invention does not contain inorganic particles nor fiber materials so that it generates neither scratches nor fiber dusts on the treatment surface. Moreover, it has an uneven irregular structure on the surface so that it is possible to remove foreign matters and loose lubricant from the treatment surface.
Claims
1. A wiping film comprising a flexible film backing, and a wiping layer formed on a surface of the backing, the wiping layer comprising a binder with plastic particles dispersed therein.
2. The wiping film according to claim 1 , wherein the plastic particles have an average particle size of from 0.01 to 100 μm, and a Rockwell hardness of from M10 to M130.
3. The wiping film according to claim 1 or 2, wherein the plastic particles and the binder are contained in a weight ratio of from 70/100 to 350/100.
4. The wiping film according to any one of claims 1 to 3, wherein a surface of the wiping layer has a center line average surface roughness (Ra) of not more than 50 μm.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001002496 | 2001-01-10 | ||
| JP2001002496A JP4885364B2 (en) | 2001-01-10 | 2001-01-10 | Wiping film |
| PCT/US2001/050827 WO2002055266A1 (en) | 2001-01-10 | 2001-12-28 | Wiping film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1360038A1 true EP1360038A1 (en) | 2003-11-12 |
Family
ID=18870991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP01986212A Withdrawn EP1360038A1 (en) | 2001-01-10 | 2001-12-28 | Wiping film |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1360038A1 (en) |
| JP (1) | JP4885364B2 (en) |
| KR (1) | KR100881482B1 (en) |
| CN (1) | CN100406202C (en) |
| MY (1) | MY138087A (en) |
| TW (1) | TW592897B (en) |
| WO (1) | WO2002055266A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012043494A (en) | 2010-08-17 | 2012-03-01 | Fuji Electric Co Ltd | Method for manufacturing magnetic recording medium, and magnetic recording medium |
| CN104511850A (en) * | 2013-11-19 | 2015-04-15 | 东莞金太阳研磨股份有限公司 | Preparation method for thin-film abrasive paper special for optical communication |
| CN104209879B (en) * | 2014-09-11 | 2017-04-12 | 衢州学院 | Method for manufacturing soluble fixed soft abrasive-polishing film |
| CN104552039B (en) * | 2014-12-17 | 2017-12-29 | 衢州学院 | A kind of soluble self-training polishing film and its polishing method |
| CN105062718A (en) * | 2015-08-14 | 2015-11-18 | 芜湖真空科技有限公司 | Surface impurity removing material composition and preparation method thereof |
| JP6360586B1 (en) * | 2017-04-13 | 2018-07-18 | 三菱電線工業株式会社 | Elastic film for wafer holding of CMP apparatus |
| JP7757646B2 (en) * | 2021-07-01 | 2025-10-22 | 三菱ケミカル株式会社 | Laminate and decorative film including laminate |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1250711A (en) * | 1959-12-19 | 1961-01-13 | Ici Ltd | Improvements to coated organic films, in particular polyethylene terephthalate coated with organic thermoplastics |
| DE3111032A1 (en) * | 1980-03-21 | 1982-01-14 | Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa | CLEANING BELT |
| JPH01316176A (en) * | 1988-06-16 | 1989-12-21 | Mitsubishi Plastics Ind Ltd | cleaning sheet |
| JPH03268223A (en) * | 1990-03-16 | 1991-11-28 | Fujitsu Ltd | Production of magnetic disk medium |
| JP3211007B2 (en) * | 1991-05-15 | 2001-09-25 | 日立マクセル株式会社 | Manufacturing method of polishing tape |
| JP3158292B2 (en) * | 1991-07-19 | 2001-04-23 | ソニー株式会社 | Cleaning tape |
| US5213588A (en) * | 1992-02-04 | 1993-05-25 | The Procter & Gamble Company | Abrasive wiping articles and a process for preparing such articles |
| JPH06150306A (en) * | 1992-10-30 | 1994-05-31 | Sony Corp | Device for treating surface of magnetic recording medium |
| US5536627A (en) * | 1995-03-21 | 1996-07-16 | Eastman Kodak Company | Photographic elements with improved cinch scratch resistance |
| JP3521560B2 (en) * | 1995-06-23 | 2004-04-19 | Jsr株式会社 | Abrasive |
| JPH10157024A (en) * | 1996-11-29 | 1998-06-16 | Teijin Ltd | Laminated film |
| JPH11276398A (en) * | 1998-03-27 | 1999-10-12 | Toray Ind Inc | Wiping tape |
| JP2000300507A (en) * | 1999-04-22 | 2000-10-31 | Three M Innovative Properties Co | Cleaning sheet |
-
2001
- 2001-01-10 JP JP2001002496A patent/JP4885364B2/en not_active Expired - Fee Related
- 2001-12-28 CN CNB018218466A patent/CN100406202C/en not_active Expired - Fee Related
- 2001-12-28 KR KR1020037009032A patent/KR100881482B1/en not_active Expired - Fee Related
- 2001-12-28 WO PCT/US2001/050827 patent/WO2002055266A1/en not_active Ceased
- 2001-12-28 EP EP01986212A patent/EP1360038A1/en not_active Withdrawn
-
2002
- 2002-01-04 MY MYPI20020023A patent/MY138087A/en unknown
- 2002-01-09 TW TW091100184A patent/TW592897B/en not_active IP Right Cessation
Non-Patent Citations (2)
| Title |
|---|
| None * |
| See also references of WO02055266A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1486234A (en) | 2004-03-31 |
| CN100406202C (en) | 2008-07-30 |
| JP4885364B2 (en) | 2012-02-29 |
| WO2002055266A1 (en) | 2002-07-18 |
| MY138087A (en) | 2009-04-30 |
| JP2002224966A (en) | 2002-08-13 |
| KR100881482B1 (en) | 2009-02-05 |
| KR20030070911A (en) | 2003-09-02 |
| TW592897B (en) | 2004-06-21 |
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