EP1192297A1 - Acid bath for galvanic deposition of shining gold and gold alloy layers and brightener therefor - Google Patents
Acid bath for galvanic deposition of shining gold and gold alloy layers and brightener thereforInfo
- Publication number
- EP1192297A1 EP1192297A1 EP00929491A EP00929491A EP1192297A1 EP 1192297 A1 EP1192297 A1 EP 1192297A1 EP 00929491 A EP00929491 A EP 00929491A EP 00929491 A EP00929491 A EP 00929491A EP 1192297 A1 EP1192297 A1 EP 1192297A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- gold
- atoms
- sulfonate
- sulfate
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 34
- 239000010931 gold Substances 0.000 title claims abstract description 34
- 229910052737 gold Inorganic materials 0.000 title claims abstract description 34
- 230000008021 deposition Effects 0.000 title claims abstract description 14
- 229910001020 Au alloy Inorganic materials 0.000 title claims abstract description 10
- 239000002253 acid Substances 0.000 title claims abstract description 10
- 239000003353 gold alloy Substances 0.000 title claims abstract description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims abstract description 18
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 125000003118 aryl group Chemical group 0.000 claims abstract description 7
- 125000006165 cyclic alkyl group Chemical group 0.000 claims abstract description 7
- 125000001072 heteroaryl group Chemical group 0.000 claims abstract description 6
- 239000000654 additive Substances 0.000 claims description 21
- 230000000996 additive effect Effects 0.000 claims description 14
- 238000000151 deposition Methods 0.000 claims description 11
- 150000002894 organic compounds Chemical class 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- -1 compounds pentyl sulfonate Chemical class 0.000 claims description 4
- 238000004070 electrodeposition Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- UZZYXUGECOQHPU-UHFFFAOYSA-N sulfuric acid monooctyl ester Natural products CCCCCCCCOS(O)(=O)=O UZZYXUGECOQHPU-UHFFFAOYSA-N 0.000 claims description 3
- CSMFSDCPJHNZRY-UHFFFAOYSA-M decyl sulfate Chemical compound CCCCCCCCCCOS([O-])(=O)=O CSMFSDCPJHNZRY-UHFFFAOYSA-M 0.000 claims description 2
- UZZYXUGECOQHPU-UHFFFAOYSA-M n-octyl sulfate Chemical compound CCCCCCCCOS([O-])(=O)=O UZZYXUGECOQHPU-UHFFFAOYSA-M 0.000 claims description 2
- KETHQOOVMIVLCH-UHFFFAOYSA-M nonyl sulfate(1-) Chemical compound CCCCCCCCCOS([O-])(=O)=O KETHQOOVMIVLCH-UHFFFAOYSA-M 0.000 claims description 2
- WLGDAKIJYPIYLR-UHFFFAOYSA-N octane-1-sulfonic acid Chemical compound CCCCCCCCS(O)(=O)=O WLGDAKIJYPIYLR-UHFFFAOYSA-N 0.000 claims description 2
- 229940067739 octyl sulfate Drugs 0.000 claims description 2
- CSMFSDCPJHNZRY-UHFFFAOYSA-N sulfuric acid monodecyl ester Natural products CCCCCCCCCCOS(O)(=O)=O CSMFSDCPJHNZRY-UHFFFAOYSA-N 0.000 claims description 2
- FYAQQULBLMNGAH-UHFFFAOYSA-N hexane-1-sulfonic acid Chemical compound CCCCCCS(O)(=O)=O FYAQQULBLMNGAH-UHFFFAOYSA-N 0.000 claims 2
- IDUWTCGPAPTSFB-UHFFFAOYSA-N hexyl hydrogen sulfate Chemical compound CCCCCCOS(O)(=O)=O IDUWTCGPAPTSFB-UHFFFAOYSA-N 0.000 claims 2
- KVGOXGQSTGQXDD-UHFFFAOYSA-N 1-decane-sulfonic-acid Chemical compound CCCCCCCCCCS(O)(=O)=O KVGOXGQSTGQXDD-UHFFFAOYSA-N 0.000 claims 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 claims 1
- ZHGASCUQXLPSDT-UHFFFAOYSA-N cyclohexanesulfonic acid Chemical compound OS(=O)(=O)C1CCCCC1 ZHGASCUQXLPSDT-UHFFFAOYSA-N 0.000 claims 1
- UCZUCGRGTXIWLR-UHFFFAOYSA-N cyclohexyl hydrogen sulfate Chemical compound OS(=O)(=O)OC1CCCCC1 UCZUCGRGTXIWLR-UHFFFAOYSA-N 0.000 claims 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 claims 1
- 229940043264 dodecyl sulfate Drugs 0.000 claims 1
- AKRQHOWXVSDJEF-UHFFFAOYSA-N heptane-1-sulfonic acid Chemical compound CCCCCCCS(O)(=O)=O AKRQHOWXVSDJEF-UHFFFAOYSA-N 0.000 claims 1
- ZGAZPDWSRYNUSZ-UHFFFAOYSA-N nonane-1-sulfonic acid Chemical compound CCCCCCCCCS(O)(=O)=O ZGAZPDWSRYNUSZ-UHFFFAOYSA-N 0.000 claims 1
- ZIRHAFGGEBQZKX-UHFFFAOYSA-N pentyl hydrogen sulfate Chemical compound CCCCCOS(O)(=O)=O ZIRHAFGGEBQZKX-UHFFFAOYSA-N 0.000 claims 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 18
- 238000000926 separation method Methods 0.000 description 18
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 239000003792 electrolyte Substances 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 10
- DVECLMOWYVDJRM-UHFFFAOYSA-N pyridine-3-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CN=C1 DVECLMOWYVDJRM-UHFFFAOYSA-N 0.000 description 7
- OBITVHZFHDIQGH-UHFFFAOYSA-N [Au].[K]C#N Chemical compound [Au].[K]C#N OBITVHZFHDIQGH-UHFFFAOYSA-N 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 5
- SFOSJWNBROHOFJ-UHFFFAOYSA-N cobalt gold Chemical compound [Co].[Au] SFOSJWNBROHOFJ-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 3
- 229940044175 cobalt sulfate Drugs 0.000 description 3
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 3
- 238000003760 magnetic stirring Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- CUYKNJBYIJFRCU-UHFFFAOYSA-N 3-aminopyridine Chemical compound NC1=CC=CN=C1 CUYKNJBYIJFRCU-UHFFFAOYSA-N 0.000 description 2
- WOFVPNPAVMKHCX-UHFFFAOYSA-N N#C[Au](C#N)C#N Chemical class N#C[Au](C#N)C#N WOFVPNPAVMKHCX-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- VUVORVXMOLQFMO-ONEGZZNKSA-N (e)-3-pyridin-3-ylprop-2-enoic acid Chemical compound OC(=O)\C=C\C1=CC=CN=C1 VUVORVXMOLQFMO-ONEGZZNKSA-N 0.000 description 1
- WTZDTUCKEBDJIM-UHFFFAOYSA-N 2,3-dipyridin-2-ylpyrazine Chemical compound N1=CC=CC=C1C1=NC=CN=C1C1=CC=CC=N1 WTZDTUCKEBDJIM-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- QHNFACMTBFJLAT-UHFFFAOYSA-N 3-isoquinolin-1-ylpropane-1-sulfonic acid Chemical compound C1=CC=C2C(CCCS(=O)(=O)O)=NC=CC2=C1 QHNFACMTBFJLAT-UHFFFAOYSA-N 0.000 description 1
- REEBJQTUIJTGAL-UHFFFAOYSA-N 3-pyridin-1-ium-1-ylpropane-1-sulfonate Chemical compound [O-]S(=O)(=O)CCC[N+]1=CC=CC=C1 REEBJQTUIJTGAL-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000000337 buffer salt Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000009189 diving Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- NPEWZDADCAZMNF-UHFFFAOYSA-N gold iron Chemical compound [Fe].[Au] NPEWZDADCAZMNF-UHFFFAOYSA-N 0.000 description 1
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- NPFOYSMITVOQOS-UHFFFAOYSA-K iron(III) citrate Chemical compound [Fe+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NPFOYSMITVOQOS-UHFFFAOYSA-K 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- ZZYXNRREDYWPLN-UHFFFAOYSA-N pyridine-2,3-diamine Chemical compound NC1=CC=CN=C1N ZZYXNRREDYWPLN-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Definitions
- the invention relates to an acid bath for the galvanic deposition of shiny gold and gold alloy layers and a gloss additive therefor.
- Galvanic gold baths usually contain gold and optionally one or more alloy elements in dissolved form.
- Such electrolytes are mainly based on gold cyanide complexes. It is necessary to adjust these electrolytes to a weak to moderately acidic pH using inorganic and / or organic acids and buffer salts.
- shiny gold or gold alloy layers are deposited from such baths, they usually contain certain inorganic or organic compounds as so-called “gloss additives”.
- a typical, very frequently used gloss additive is, as described for example in DE 23 55 581, the compound pyridine-3-sulfonic acid.
- Such additives shift or expand the working range, that is the range of applicable current density, in which a shiny gold plating is deposited, in the direction of high current densities.
- the use of higher current densities in turn allows deposition at a higher speed.
- the working range of such gold baths also depends on the pH of the electrolyte. It applies here that the working range (applicable current density range) is narrowed at a higher pH value, but at the same time the current yield and thus the separation speed is increased.
- the invention thus relates to an acidic bath for the electrodeposition of shiny gold and gold alloy layers, containing gold and optionally one or more alloy elements in dissolved form and at least one organic compound as an additive, characterized in that the bath as at least one compound of the additive general formula R - SO m -H (I)
- the gloss additives according to formula I are selected compounds from the classes of the alkyl sulfonates and the alkyl, aryl or heteroaryl sulfates.
- R means a straight or branched chain or cyclic alkyl group with up to 20 C atoms. If m stands for the number 4, then R can also be an aryl or heteroaryl group with up to 10 C atoms, it being possible for these to be substituted one or more times with straight-chain or branched-chain alkyl groups with 1 to 14 C atoms .
- Preferred gloss additives are compounds of the formula I in which R represents straight-chain or branched-chain or cyclic alkyl groups having 5 to 12 carbon atoms and in particular branched-chain alkyl groups having 6 to 10 carbon atoms.
- Typical gloss additives according to the invention are
- Branched-chain and short-chain connections are particularly suitable due to their lower tendency to foam, especially in processes and systems in which strong foam formation interferes, e.g. in air-moving electrolytes where
- Drum processing in systems for high-speed separation (spraying systems) and in systems for selective separation, e.g. Diving cells.
- the use of the further gloss additive according to the invention in acid baths for the electrodeposition of shiny gold and gold alloy layers is advantageously carried out in a concentration range from 0.01 to 10 g / l.
- Baths according to the invention which contain the gloss additive according to formula I in a concentration of 0.1 to 5 g / l are particularly advantageous.
- the compounds of the formula I according to the invention as a further gloss additive in galvanic gold baths of otherwise customary composition the applicable current density working range is expanded in an unexpected manner and at the same time the current yield and the separation efficiency are drastically increased in part.
- the galvanic gold baths according to the invention typically contain approximately
- alloy metals such as iron, cobalt, nickel, indium, silver, copper, cadmium, tin, zinc, bismuth, arsenic, antimony as salt or complex salt
- a low gold content can be used with the same separation performance.
- the advantages are the lower carry-over due to electrolytes adhering to the goods and the lower capital commitment.
- a maximum current density of 3 A / dm 2 is reached on pre-nickel-plated sheets of size 25 x 40 mm (experimental setup: 1 liter beaker, platinum-coated titanium anode, bath movement 200 rpm using a magnetic stirring bar 60 mm, movement of goods 5 cm / s).
- the cathodic current yield at 3 A / dm 2 is 52% and the deposition rate is 1.0 ⁇ m / min.
- a maximum current density of 5 A / dm 2 is achieved on sheets of size 25 x 40 mm (conditions see example 2).
- the cathodic current yield is 31% and the deposition rate is 1.0 ⁇ m / min.
- the maximum applicable current density is increased to over 6 A / dm 2 .
- the current yield is still 30%; the separation rate increases to 1.16 ⁇ m / min. This corresponds to a speed increase of 16%.
- a working range of up to 5 A / dm 2 is achieved in a Hull cell (test conditions: platinum-plated titanium anode, temperature 50 ° C., duration 2 min, movement 500 rpm by means of a magnetic stirring bar 25 mm) with a cell current of 2 A.
- the current yield at 5 A / dm 2 is 26%; the separation speed is 0.83 ⁇ m / min.
- the maximum applicable current density is increased to over 8 A / dm 2 .
- the current yield is still 19%; the separation rate increases to 1.0 ⁇ m / min.
- the maximum applicable current density is increased to over 5 A / dm 2 by the addition of 1 g / 1 hexyl sulfonate.
- the current yield is 35.1%, the separation efficiency increases to 1.13 ⁇ m / min. This corresponds to a speed increase of 15%.
- the maximum applicable current density is increased to over 7 A / dm 2 by the addition of 1 g / 1 octyl sulfonate.
- the current yield is 26.2%, the separation efficiency increases to 1.18 ⁇ r ⁇ / min. This corresponds to a 20% increase in speed.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
Saures Bad zur galvanischen Abscheidung von glänzenden Gold- und Goldlegierungsschichten und Glanzzusatz hierfür Acidic bath for the galvanic deposition of shiny gold and gold alloy layers and a gloss additive therefor
Beschreibung:Description:
Die Erfindung betrifft ein saures Bad zur galvanischen Ab- Scheidung von glänzenden Gold- und Goldlegierungsschichten und einen Glanzzusatz hierfür.The invention relates to an acid bath for the galvanic deposition of shiny gold and gold alloy layers and a gloss additive therefor.
Galvanische Goldbäder enthalten üblicherweise Gold und gegebenenfalls eines oder mehrere Legierungselemente in gelöster Form.Galvanic gold baths usually contain gold and optionally one or more alloy elements in dissolved form.
Derartige Elektrolyte basieren überwiegend auf Goldcyanid- komplexen. Es ist erforderlich, diese Elektrolyte mit Hilfe von anorganischen und/oder organischen Säuren und Puffersalzen auf einen schwach bis mäßig sauren pH-Wert einzustellen.Such electrolytes are mainly based on gold cyanide complexes. It is necessary to adjust these electrolytes to a weak to moderately acidic pH using inorganic and / or organic acids and buffer salts.
Damit aus solchen Bädern glänzende Gold- bzw. Goldlegierungsschichten abgeschieden werden, enthalten diese üblicherweise bestimmte anorganische oder organische Verbindungen als sogenannte "Glanzzusätze".So that shiny gold or gold alloy layers are deposited from such baths, they usually contain certain inorganic or organic compounds as so-called "gloss additives".
Ein typischer, sehr häufig eingesetzter Glanzzusatz ist, wie beispielsweise in DE 23 55 581 beschrieben, die Verbindung Pyridin-3-sulfonsäure .A typical, very frequently used gloss additive is, as described for example in DE 23 55 581, the compound pyridine-3-sulfonic acid.
Derartige Zusätze verschieben bzw. erweitern den Arbeitsbereich, also den Bereich anwendbarer Stromdichte, in dem ein glänzender Goldüberzug abgeschieden wird, in Richtung hoher Stromdichten. Die Anwendung höherer Stromdichten wiederum erlaubt die Abscheidung mit größerer Geschwindigkeit.Such additives shift or expand the working range, that is the range of applicable current density, in which a shiny gold plating is deposited, in the direction of high current densities. The use of higher current densities in turn allows deposition at a higher speed.
Andererseits ist der Arbeitsbereich derartiger Goldbäder auch vom pH-Wert des Elektrolyten abhängig. Hierbei gilt, daß bei höherem pH-Wert der Arbeitsbereich (anwendbarer Stromdichtebereich) eingeengt, gleichzeitig aber die Strom- ausbeute und damit die Abscheidegeschwindigkeit gesteigert wird.On the other hand, the working range of such gold baths also depends on the pH of the electrolyte. It applies here that the working range (applicable current density range) is narrowed at a higher pH value, but at the same time the current yield and thus the separation speed is increased.
Es war daher Aufgabe der Erfindung, eine Optimierung der Arbeitsbedingungen und der Abscheideleistung derartiger saurer Goldbäder in der Hinsicht vorzunehmen, daß einerseits ein maximaler Stromdichte-Arbeitsbereich bei möglichst geringer negativer Beeinflussung durch pH-Wert- Änderungen und andererseits eine maximale Stromausbeute und Abscheidegeschwindigkeit erzielt wird.It was therefore an object of the invention to optimize the working conditions and the separation performance of such acidic gold baths in such a way that, on the one hand, a maximum current density working range is achieved with the least possible negative influence by pH changes and, on the other hand, a maximum current efficiency and separation speed is achieved.
Überraschend wurde nun gefunden, daß dies erreicht werden kann, wenn derartigen sauren Bäder zur Abscheidung von glänzenden Goldschichten als weiterer Glanzzusatz mindestens eine Verbindung der allgemeinen Formel ISurprisingly, it has now been found that this can be achieved if such acid baths for the deposition of shiny gold layers as a further additive to the gloss add at least one compound of the general formula I.
R - SOm-H (I)R - SO m -H (I)
zugefügt wird, worinis added in which
m die Zahlen 3 oder 4 undm the numbers 3 or 4 and
R eine gerad- oder verzweigtkettige oder cykli- sche Alkylgruppe mit bis zu 20 C-Atomen und im Falle m = 4 auch eine Aryl- oder Heteroa- rylgruppe mit bis zu 10 C-Atomen, die gegebenenfalls ein- oder mehrfach mit gerad- oder verzweigtkettigen Alkylgruppen mit 1 bis 14 C-Atomen substituiert sein können,R is a straight-chain or branched-chain or cyclic alkyl group with up to 20 C atoms and in the case of m = 4 also an aryl or heteroaryl group with up to 10 C atoms, which may be one or more times with straight or branched-chain alkyl groups with 1 to 14 C atoms can be substituted,
bedeutet .means.
Gegenstand der Erfindung ist somit ein saures Bad zur galvanischen Abscheidung von glänzenden Gold- und Goldlegierungsschichten, enthaltend Gold und gegebenenfalls ein oder mehrere Legierungselemente in gelöster Form sowie mindestens eine organische Verbindung als Glanzzusatz, dadurch gekennzeichnet, daß das Bad als weiteren Glanzzusatz mindestens eine Verbindung der allgemeinen Formel R - SOm-H (I)The invention thus relates to an acidic bath for the electrodeposition of shiny gold and gold alloy layers, containing gold and optionally one or more alloy elements in dissolved form and at least one organic compound as an additive, characterized in that the bath as at least one compound of the additive general formula R - SO m -H (I)
enthält, worincontains what
m die Zahlen 3 oder 4 undm the numbers 3 or 4 and
R eine gerad- oder verzweigtkettige oder cykli- sehe Alkylgruppe mit bis zu 20 C-Atomen und im Falle m = 4 auch eine Aryl- oder Heteroa- rylgruppe mit bis zu 10 C-Atomen, die gegebenenfalls ein- oder mehrfach mit gerad- oder verzweigtkettigen Alkylgruppen mit 1 bis 14 C-Atomen substituiert sein können,R is a straight-chain or branched-chain or cyclic alkyl group with up to 20 C atoms and in the case of m = 4 also an aryl or heteroaryl group with up to 10 C atoms, which may be one or more times with straight or branched-chain alkyl groups with 1 to 14 C atoms can be substituted,
bedeutet .means.
Die Glanzzusätze gemäß Formel I sind ausgewählte Verbindungen aus den Klassen der Alkylsulfonate und der Alkyl-, Aryl- oder Heteroarylsulfate . In Formel I bedeutet, wenn m für die Zahlen 3 oder 4 steht, R eine gerad- oder verzweigtkettige oder cyklische Alkylgruppe mit bis zu 20 C- Atomen. Wenn m für die Zahl 4 steht, dann kann R auch eine Aryl- oder Heteroarylgruppe mit bis zu 10 C-Atomen sein, wobei diese ein- oder mehrfach mit gerad- oder ver- zweigtkettigen Alkylgruppen mit 1 bis 14 C-Atomen substituiert sein können.The gloss additives according to formula I are selected compounds from the classes of the alkyl sulfonates and the alkyl, aryl or heteroaryl sulfates. In formula I, when m stands for the numbers 3 or 4, R means a straight or branched chain or cyclic alkyl group with up to 20 C atoms. If m stands for the number 4, then R can also be an aryl or heteroaryl group with up to 10 C atoms, it being possible for these to be substituted one or more times with straight-chain or branched-chain alkyl groups with 1 to 14 C atoms .
Die Verbindungen der Formel I sind an sich bekannt und sind entweder kommerziell erhältlich oder ohne weiteres nach Standardverfahren herstellbar.The compounds of the formula I are known per se and are either commercially available or can be prepared readily by standard processes.
Diese Verbindungen sind ausreichend wasserlöslich und mit dem Galvanikbad kompatibel. Die Verbindungen haben Tensid- eigenschaften, wobei die entsprechende Wirkung bei einer Gesamtzahl an C-Atomen weniger als 4 verringert ist, und bei einer Gesamtzahl an C-Atomen von mehr als 20 im allge- meinen keine ausreichende Löslichkeit mehr gegeben ist. Bevorzugte Glanzzusätze sind Verbindungen der Formel I in denen R für gerad- oder verzweigtkettige oder cyklische Alkylgruppen mit 5 bis 12 C-Atomen und insbesondere für verzweigtkettige Alkylgruppen mit 6 bis 10 C-Atomen steht.These compounds are sufficiently water soluble and compatible with the electroplating bath. The compounds have surfactant properties, the corresponding action being reduced by less than 4 for a total number of carbon atoms and generally no longer providing adequate solubility if the total number of carbon atoms is more than 20. Preferred gloss additives are compounds of the formula I in which R represents straight-chain or branched-chain or cyclic alkyl groups having 5 to 12 carbon atoms and in particular branched-chain alkyl groups having 6 to 10 carbon atoms.
Typische erfindungsgemäße Glanzzusätze sindTypical gloss additives according to the invention are
Pentylsulfonat Pentylsulfat Hexylsulfonat Hexylsulfat Heptylsulfonat Heptylsulfat Octylsulfonat Octylsulfat Nonylsulfonat Nonylsulfat Decylsulfonat Decylsulfat Dodecylsulfonat Dodecylsulfat Cyclohexylsulfonat Cyclohexylsulfat und deren Isomere.Pentyl sulfonate Pentyl sulfate Hexyl sulfonate Hexyl sulfate Heptyl sulfonate Heptyl sulfate Octyl sulfonate Octyl sulfate Nonyl sulfonate Nonyl sulfate Decyl sulfonate Decyl sulfate Dodecyl sulfonate Dodecyl sulfate Cyclohexyl sulfonate Cyclohexyl sulfate.
Diese Verbindungen können auch in Form ihrer Salze vorliegen.These compounds can also be in the form of their salts.
Verzweigtkettige und kurzkettigere Verbindungen eignen sich aufgrund der geringer ausgeprägten Schaumneigung besonders in Verfahren und Anlagen, bei denen eine starke Schaumbil- düng stört, z.B. in luftbewegten Elektrolyten, bei derBranched-chain and short-chain connections are particularly suitable due to their lower tendency to foam, especially in processes and systems in which strong foam formation interferes, e.g. in air-moving electrolytes where
Trommelbearbeitung, in Anlagen zur Hochgeschwindigkeits- abscheidung (Spritzanlagen) und in Anlagen zur selektiven Abscheidung, wie z.B. Tauchzellen.Drum processing, in systems for high-speed separation (spraying systems) and in systems for selective separation, e.g. Diving cells.
Die Anwendung des erfindungsgemäßen weiteren Glanzzusatzes in sauren Bädern zur galvanischen Abscheidung von glänzenden Gold- und Goldlegierungsschichten erfolgt zweckmäßigerweise in einem Konzentrationsbereich von 0,01 bis 10 g/1. Besonders vorteilhaft sind erfindungsgemäße Bäder, die den Glanzzusatz gemäß Formel I in einer Konzentration von 0,1 bis 5 g/1 enthalten. Durch den erfmdungsgemaßen Einsatz der Verbindungen der Formel I als weiteren Glanzzusatz in galvanischen Goldbadern von ansonsten üblicher Zusammensetzung wird in unerwarteter Weise der anwendbare Stromdichte-Arbeitsbereich erheblich erweitert und gleichzeitig die Stromausbeute und die Abscheideleistung zum Teil drastisch gesteigert.The use of the further gloss additive according to the invention in acid baths for the electrodeposition of shiny gold and gold alloy layers is advantageously carried out in a concentration range from 0.01 to 10 g / l. Baths according to the invention which contain the gloss additive according to formula I in a concentration of 0.1 to 5 g / l are particularly advantageous. Through the use of the compounds of the formula I according to the invention as a further gloss additive in galvanic gold baths of otherwise customary composition, the applicable current density working range is expanded in an unexpected manner and at the same time the current yield and the separation efficiency are drastically increased in part.
Zur Herstellung der erfmdungsgemaßen Goldbader kann von vielen gangigen und handelsüblichen galvanischen, schwach sauren Goldbadern ausgegangen werden, in dem diesen die entsprechende Menge an Verbindung der Formel I zugegeben wird. Die qualitative und quantitative Zusammensetzung derartiger Goldbader ist dem Fachmann aus Literatur und Praxis bestens bekannt und bedarf daher keiner eingehenderer Erläuterung. Diese enthalten in jedem Fall Gold m gelöster Form, ausgehend von Goldsalzen oder Gold-Komplexsalzen, wobei überwiegend Goldcyanidkomplexe eingesetzt werden. Weiterhin können die Bader Legierungselemente in Form gelöster Salze oder Komplexsalze enthalten. Weiterhin enthalten die Bader anorganische und/oder organische Sauren, entsprechen- de Salze sowie gegebenenfalls Puffer- und Leitsalze, um den pH-Wert und die Leitfähigkeit einzustellen. Um glanzende, glatte Goldschichten abzuscheiden sind regelmäßig organische Verbindungen enthalten, die meist Tensideigenschaften haben und als Glanzbildner wirken. Ein typischer und be- wahrter derartiger Glanzbildner ist Pyπdιn-3-sulfonsaure .To produce the gold baths according to the invention, it is possible to start from many common and commercially available galvanic, weakly acidic gold baths by adding the corresponding amount of compound of the formula I to them. The qualitative and quantitative composition of such gold baths is well known to the person skilled in the art from literature and practice and therefore requires no further explanation. In any case, these contain gold in dissolved form, starting from gold salts or gold complex salts, predominantly gold cyanide complexes being used. The Bader can also contain alloying elements in the form of dissolved salts or complex salts. The bathers also contain inorganic and / or organic acids, corresponding salts and, if appropriate, buffer and conductive salts in order to adjust the pH and the conductivity. In order to deposit shiny, smooth gold layers, organic compounds are usually contained, which mostly have surfactant properties and act as brighteners. A typical and well-preserved brightener of this type is pyridine-3-sulfonic acid.
Weiterhin kommen als konventionelle Glanzzusatze auchFurthermore, conventional gloss additives also come
Nicotmsaure,Nicotmic acid,
Nicotmsaureamid,Nicotmsaureamid,
3- (3-Pyπdyl) -acrylsaure3- (3-pyπdyl) acrylic acid
3- (4-Imιdazolyl) -acrylsaure3- (4-Imιdazolyl) acrylic acid
3-Pyπdylhydroxymethansulfonsaure Pyridin3-pyπdylhydroxymethanesulfonic acid Pyridine
PicolinPicolin
Chino1insulfonsaureQuinoinsulfonic acid
3-Aminopyridin3-aminopyridine
2 , 3-Diaminopyridin2,3-diaminopyridine
2, 3-Di- (2-pyridyl) -pyrazin2,3-di- (2-pyridyl) pyrazine
2- (Pyridyl) -4-ethansulfonsaure2- (pyridyl) -4-ethanesulfonic acid
1- (3-Sulfopropyl) -pyridiniumbetain1- (3-sulfopropyl) pyridinium betaine
1- (3-Sulfopropyl) -isochinoliniumbetain1- (3-sulfopropyl) isoquinolinium betaine
und ihre Salze und Derivate in Betracht. Die erfindungsgemäßen galvanischen Goldbäder enthalten typischerweise etwaand their salts and derivatives. The galvanic gold baths according to the invention typically contain approximately
0,1 - 50 g/1 Gold als Goldcyanidkomplex0.1 - 50 g / 1 gold as a gold cyanide complex
0 - 50 g/1 Legierungsmetalle wie Eisen, Kobalt, Nickel, Indium, Silber, Kupfer, Cadmi- um, Zinn, Zink, Wismut, Arsen, Antimon als Salz oder Komplexsalz0 - 50 g / 1 alloy metals such as iron, cobalt, nickel, indium, silver, copper, cadmium, tin, zinc, bismuth, arsenic, antimony as salt or complex salt
10 - 200 g/1 Citronensäure/Citrate als Pufferund/oder Leitsalze10 - 200 g / 1 citric acid / citrate as buffer and / or conductive salts
0,1 - 10 g/1 Pyridin-3-sulfonsäure als Glanzbildner0.1 - 10 g / 1 pyridine-3-sulfonic acid as a brightener
0,1 - 5 g/1 Verbindung der Formel I als erfindungsgemäßen weiteren Glanzzusatz,0.1 - 5 g / 1 compound of the formula I as a further gloss additive according to the invention,
wobei der pH-Wert des Bades auf 3 bis 6 eingestellt wird, vorzugsweise auf 4 bis 5. Der Einsatz des erfindungsgemaßen Glanzusatzes bewirkt eine Reihe praxisrelevanter Vorteile. So kann unter ansonsten unveränderten Bedingungen die Abscheideleistung deutlich gesteigert werden. Aufgrund des breiteren Arbeitsbereiches ist die Feineinstellung der Arbeitsweise weniger kritisch, wobei die Gefahr einer sudigen Abscheidung wesentlich reduziert wird.wherein the pH of the bath is adjusted to 3 to 6, preferably 4 to 5. The use of the gloss additive according to the invention brings about a number of practical advantages. The separation performance can be increased significantly under otherwise unchanged conditions. Due to the wider working area, the fine adjustment of the working method is less critical, whereby the risk of sudy separation is significantly reduced.
Es kann aber auch mit höheren pH-Werten bei unverändertem Arbeitsbereich gearbeitet werden. Damit ist es ebenfalls möglich, die Abscheideleistung zu steigern.However, it is also possible to work with higher pH values with an unchanged working range. This also makes it possible to increase the separation performance.
Alternativ kann aber auch ein geringer Goldgehalt bei gleichbleibender Abscheideleistung verwendet werden. Die Vorteile liegen dabei in der geringeren Verschleppung durch an der Ware anhaftenden Elektrolyten und in der niedrigeren Kapitalbindung.Alternatively, a low gold content can be used with the same separation performance. The advantages are the lower carry-over due to electrolytes adhering to the goods and the lower capital commitment.
Beispiel 1:Example 1:
In einem Gold-Kobalt-Elektrolyten mitIn a gold-cobalt electrolyte with
10 g/1 Gold in Form von Kaliumgold (I) -cyanid 0,5 g Kobalt als Kobaltsulfat 100 g/1 Citronensäure10 g / 1 gold in the form of potassium gold (I) cyanide 0.5 g cobalt as cobalt sulfate 100 g / 1 citric acid
3 g/1 Pyridin-3-sulfonsaure mit Kaliumhydroxid auf pH 4,2 eingestellt3 g / 1 pyridine-3-sulfonic acid adjusted to pH 4.2 with potassium hydroxide
wird in einer Hullzelle (Versuchsbedingungen: platinierte Titananode, Temperatur 50 °C, Dauer 2 min, Bewegung 500is in a Hull cell (test conditions: platinized titanium anode, temperature 50 ° C, duration 2 min, movement 500
U/min durch Magnetrührstab 25 mm) bei einem Zellenstrom von 2 A ein Arbeitsbereich bis 3 A/dm2 erzielt. Die Stromausbeute bei 3 A/dm2 beträgt 48 %; die Abscheidegeschwindigkeit beträgt 0,98 μm/min.U / min by magnetic stirring bar 25 mm) with a cell current of 2 A a working range up to 3 A / dm 2 achieved. The current yield at 3 A / dm 2 is 48%; the deposition speed is 0.98 μm / min.
Durch den Zusatz von 1 g/1 Nonylsulfat wird die maximal anwendbare Stromdichte auf über 5 A/dm2 gesteigert. Dies ent- spricht einer Verbreiterung des Arbeitsbereichs um über 66By adding 1 g / 1 nonyl sulfate, the maximum applicable current density is increased to over 5 A / dm 2 . This speaks of widening the work area by over 66
Bei einem dann auf 4,4 erhöhten pH-Wert wird ein Arbeitsberreeiicchh bbiiss 44 .A/dm2 erzielt; die Abscheideleistung beträgt 1,05 μm/min.When the pH is then raised to 4.4, a working range of up to 44 .A / dm 2 is achieved; the separation rate is 1.05 μm / min.
Bei pH 4,6 reicht der Arbeitsbereich bis 3 A/dm2 und es wird eine Abscheidegeschwindigkeit von 1,15 μm/min erzieltAt pH 4.6 the working range extends up to 3 A / dm 2 and a deposition speed of 1.15 μm / min is achieved
Beispiel 2:Example 2:
In einem Gold-Nickel-Elektrolyten mitIn a gold-nickel electrolyte with
10 g/1 Gold in Form von Kaliumgold (I) -cyanid 0,7 g Nickel in Form von Nickelsulfat 100 g/1 Citronensäure10 g / 1 gold in the form of potassium gold (I) cyanide 0.7 g nickel in the form of nickel sulfate 100 g / 1 citric acid
3 g/1 Pyridin-3-sulfonsäure mit Kaliumhydroxid auf pH 4,2 eingestellt3 g / 1 pyridine-3-sulfonic acid adjusted to pH 4.2 with potassium hydroxide
wird auf vorvernickelten Blechen der Größe 25 x 40 mm (Versuchsaufbau: 1 Liter Becherglas, platinierte Titananode, Badbewegung 200 U/min durch Magnetrührstab 60 mm, Warenbewegung 5 cm/s) eine maximale Stromdichte von 3 A/dm2 er- reicht. Die kathodische Stromausbeute bei 3 A/dm2 beträgt 52 % und die Abscheidegeschwindigkeit 1,0 μm/min.a maximum current density of 3 A / dm 2 is reached on pre-nickel-plated sheets of size 25 x 40 mm (experimental setup: 1 liter beaker, platinum-coated titanium anode, bath movement 200 rpm using a magnetic stirring bar 60 mm, movement of goods 5 cm / s). The cathodic current yield at 3 A / dm 2 is 52% and the deposition rate is 1.0 μm / min.
Durch den Zusatz von 0,5 g/1 Decylsulfat wird die maximal anwendbare Stromdichte auf über 7 A/dm2 gesteigert. Bei 7 A/dm2 beträgt die Stromausbeute noch 26 %, die Abscheide- leistung steigt auf 1,18 μm/min. Dies entspricht einem Geschwindigkeitszuwachs um 18 %. Beispiel 3 :The addition of 0.5 g / 1 decyl sulfate increases the maximum applicable current density to over 7 A / dm 2 . At 7 A / dm 2 , the current yield is still 26%, the separation efficiency increases to 1.18 μm / min. This corresponds to a speed increase of 18%. Example 3:
In einem Gold-Eisen-Elektrolyten mitIn a gold-iron electrolyte with
10 g/1 Gold in Form von Kaliumgold (I ) -cyanid 0,05 g Eisen als Eisen ( III) citrat 100 g/1 Citronensäure10 g / 1 gold in the form of potassium gold (I) cyanide 0.05 g iron as iron (III) citrate 100 g / 1 citric acid
3 g/1 Pyridin-3-sulfonsaure mit Kaliumhydroxid auf pH 4,2 eingestellt3 g / 1 pyridine-3-sulfonic acid adjusted to pH 4.2 with potassium hydroxide
wird auf Blechen der Größe 25 x 40 mm (Bedingungen siehe Beispiel 2) eine maximale Stromdichte von 5 A/dm2 erreicht. Die kathodische Stromausbeute beträgt dabei 31 % und die Abscheidegeschwindigkeit 1,0 μm/min.a maximum current density of 5 A / dm 2 is achieved on sheets of size 25 x 40 mm (conditions see example 2). The cathodic current yield is 31% and the deposition rate is 1.0 μm / min.
Durch den Zusatz von 4 g/1 Hexylsulfat wird die maximal anwendbare Stromdichte auf über 6 A/dm2 gesteigert. Bei 6 A/dm2 beträgt die Stromausbeute noch 30 %; die Abscheide- leistung steigt auf 1,16 μm/min. Dies entspricht einem Geschwindigkeitszuwachs um 16 %.By adding 4 g / 1 hexyl sulfate, the maximum applicable current density is increased to over 6 A / dm 2 . At 6 A / dm 2 , the current yield is still 30%; the separation rate increases to 1.16 μm / min. This corresponds to a speed increase of 16%.
Beispiel 4:Example 4:
In einem Gold-Kobalt-Elektrolyten mitIn a gold-cobalt electrolyte with
10 g/1 Gold in Form von Kaliumgold (I ) -cyanid 0,5 g Kobalt als Kobaltsulfat 100 g/1 Citronensäure10 g / 1 gold in the form of potassium gold (I) cyanide 0.5 g cobalt as cobalt sulfate 100 g / 1 citric acid
1 g/1 3- (3-Pyridyl) -acrylsaure mit Kaliumhydroxid auf pH 4,2 eingestellt1 g / 1 of 3- (3-pyridyl) acrylic acid adjusted to pH 4.2 with potassium hydroxide
wird in einer Hullzelle (Versuchsbedingungen: platinierte Titananode, Temperatur 50°C, Dauer 2 min, Bewegung 500 U/min durch Magnetrührstab 25 mm) bei einem Zellenstrom von 2 A ein Arbeitsbereich bis 5 A/dm2 erzielt. Die Stromausbeute bei 5 A/dm2 beträgt 26 % ; die Abscheidegeschwindig- keit beträgt 0,83 μm/min. Durch den Zusatz von 1,5 g/1 Octylsulfat wird die maximal anwendbare Stromdichte auf über 8 A/dm2 gesteigert. Bei 8 A/dm2 betragt die Stromausbeute noch 19 %; die Abscheide- leistung steigt auf 1,0 μm/min.a working range of up to 5 A / dm 2 is achieved in a Hull cell (test conditions: platinum-plated titanium anode, temperature 50 ° C., duration 2 min, movement 500 rpm by means of a magnetic stirring bar 25 mm) with a cell current of 2 A. The current yield at 5 A / dm 2 is 26%; the separation speed is 0.83 μm / min. By adding 1.5 g / 1 octyl sulfate, the maximum applicable current density is increased to over 8 A / dm 2 . At 8 A / dm 2, the current yield is still 19%; the separation rate increases to 1.0 μm / min.
Beispiel 5:Example 5:
Im Gold-Kobalt-Elektrolyten aus Beispiel 1 wird durch den Zusatz von 1 g/1 Hexylsulfonat die maximal anwendbare Stromdichte auf über 5 A/dm2 gesteigert. Bei 5 A/dm2 be- tragt die Stromausbeute 35,1 %, die Abscheideleistung steigt auf 1,13 μm/min. Dies entspricht einem Geschwindigkeitszuwachs um 15 %.In the gold-cobalt electrolyte from Example 1, the maximum applicable current density is increased to over 5 A / dm 2 by the addition of 1 g / 1 hexyl sulfonate. At 5 A / dm 2 the current yield is 35.1%, the separation efficiency increases to 1.13 μm / min. This corresponds to a speed increase of 15%.
Beispiel 6:Example 6:
Im Gold-Kobalt-Elektrolyten aus Beispiel 1 wird durch den Zusatz von 1 g/1 Octylsulfonat die maximal anwendbare Stromdichte auf über 7 A/dm2 gesteigert. Bei 7 A/dm2 betragt die Stromausbeute 26,2 %, die Abscheideleistung steigt auf 1,18 μrα/min. Dies entspricht einem Geschwmdig- keitszuwachs um 20 %.In the gold-cobalt electrolyte from Example 1, the maximum applicable current density is increased to over 7 A / dm 2 by the addition of 1 g / 1 octyl sulfonate. At 7 A / dm 2 the current yield is 26.2%, the separation efficiency increases to 1.18 μrα / min. This corresponds to a 20% increase in speed.
Beispiel 7: VergleichsbeispielExample 7: Comparative example
In einem Gold-Kobalt-Elektrolyten (siehe Beispiel l)ausIn a gold-cobalt electrolyte (see example 1)
10 g/1 Gold m Form von Kaliumgold (I) -cyanid 0,5 g Kobalt als Kobaltsulfat 100 g/1 Citronensäure mit Kaliumhydroxid auf pH 4,2 eingestellt10 g / 1 gold in the form of potassium gold (I) cyanide 0.5 g cobalt as cobalt sulfate 100 g / 1 citric acid adjusted to pH 4.2 with potassium hydroxide
wird unter den Versuchsbedingungen von Beispiel 1 der Einfluß auf Arbeitsbereich und Abscheidegeschwindigkeit durch Zugabe von Octylsulfat alleine, Pyridin-3-sulfonsaure alleine und beide Substanzen gemeinsam als Glanzzusätze ermittelt. Tabelle 1 zeigt das Ergebnis.under the test conditions of Example 1, the influence on the working range and deposition rate Addition of octyl sulfate alone, pyridine-3-sulfonic acid alone and both substances determined together as gloss additives. Table 1 shows the result.
Die Kombination aus beiden Substanzen erweitert den-Ar- beitsbereich drastisch und bewirkt eine erhebliche Steigerung der Abscheidegeschwindigkeit.The combination of both substances drastically extends the work area and causes a significant increase in the separation speed.
Tabelle 1:Table 1:
Claims
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DE10007325A DE10007325A1 (en) | 1999-06-17 | 2000-02-17 | Acid bath for galvanically depositing glossy gold and gold alloy layers contains gold and optionally one or more alloying elements in dissolved form as well as an organic compound as brightening agent |
PCT/EP2000/003993 WO2000079031A1 (en) | 1999-06-17 | 2000-05-04 | Acid bath for galvanic deposition of shining gold and gold alloy layers and brightener therefor |
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US4402802A (en) | 1981-01-03 | 1983-09-06 | Dequssa Aktiengesellschaft | Electrolytic bath for the deposition of rhodium coatings |
CH680370A5 (en) * | 1989-12-19 | 1992-08-14 | H E Finishing Sa | |
JPH1150295A (en) | 1997-07-28 | 1999-02-23 | Daiwa Kasei Kenkyusho:Kk | Plating bath |
-
2000
- 2000-05-04 JP JP2001505372A patent/JP3933930B2/en not_active Expired - Fee Related
- 2000-05-04 CN CNB00808582XA patent/CN1205360C/en not_active Expired - Fee Related
- 2000-05-04 DE DE50013952T patent/DE50013952D1/en not_active Expired - Lifetime
- 2000-05-04 WO PCT/EP2000/003993 patent/WO2000079031A1/en active IP Right Grant
- 2000-05-04 US US10/009,467 patent/US6814850B1/en not_active Expired - Fee Related
- 2000-05-04 EP EP00929491A patent/EP1192297B1/en not_active Expired - Lifetime
- 2000-06-12 TW TW089111445A patent/TWI234591B/en not_active IP Right Cessation
-
2002
- 2002-12-31 HK HK02109454.8A patent/HK1047773B/en not_active IP Right Cessation
Non-Patent Citations (1)
Title |
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See references of WO0079031A1 * |
Also Published As
Publication number | Publication date |
---|---|
HK1047773A1 (en) | 2003-03-07 |
JP2003502513A (en) | 2003-01-21 |
HK1047773B (en) | 2006-01-27 |
WO2000079031A1 (en) | 2000-12-28 |
JP3933930B2 (en) | 2007-06-20 |
EP1192297B1 (en) | 2007-01-10 |
TWI234591B (en) | 2005-06-21 |
DE50013952D1 (en) | 2007-02-22 |
CN1357060A (en) | 2002-07-03 |
US6814850B1 (en) | 2004-11-09 |
CN1205360C (en) | 2005-06-08 |
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