EP1138793A2 - Aluminiumlegierung zum Herstellen von Präzionsteilen durch spanabhebende Formgebung und zum Erzeugen von extrem - Google Patents
Aluminiumlegierung zum Herstellen von Präzionsteilen durch spanabhebende Formgebung und zum Erzeugen von extrem Download PDFInfo
- Publication number
- EP1138793A2 EP1138793A2 EP01106442A EP01106442A EP1138793A2 EP 1138793 A2 EP1138793 A2 EP 1138793A2 EP 01106442 A EP01106442 A EP 01106442A EP 01106442 A EP01106442 A EP 01106442A EP 1138793 A2 EP1138793 A2 EP 1138793A2
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- EP
- European Patent Office
- Prior art keywords
- aluminum alloy
- aluminum
- anodizing
- alloy according
- ppm
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/06—Alloys based on aluminium with magnesium as the next major constituent
Definitions
- the aim of the stain is that remove oxide from any aluminum surface and at Aluminum alloys near-surface phases, the accompanying elements included to remove as completely as possible.
- Pickling depends crucially on the quality of anodization. Are on the Surface still oxide residues and poorly anodizable foreign phases existing, the layer structure is disturbed locally. Then there can be none form a closed layer.
- the component is immersed in an acid bath, which in addition to dissolved aluminum can also contain other additives to a lesser extent.
- a voltage between 10 and 120 volts is applied between the workpiece and the counter electrodes.
- the current density is 0.5 to 3 amperes per dm 2 .
- the bath temperatures are around 0 ° C to 25 ° C.
- the anodizing layer builds up during the coating (often called anodized layer) not evenly.
- the Layer build-up is relatively high after the voltage is applied, it always drops the thicker the layer becomes.
- the acidity at the same time removes the surface of the anodizing layer at a constant rate after a certain time no further layer build-up. This Phenomenon is called redemption.
- To generate a High-quality anodization is not too much for this borderline case approach. High layer thicknesses with anodizing are then achieved if you increase the voltage and the current density, the bath cools and in large scale bath additives suppressing the redissolution, e.g. Oxalic acid, used. After the actual anodization, the component is thoroughly cleaned rinsed.
- the final stage of anodization is the so-called compression of the Layer, which is considered a swelling of the layer under irreversible Has to introduce water absorption.
- the oxides in the Anodizing water on. The compression takes place in a bath with hot Water (deionized) or in a chamber with wet steam.
- the Compression can be influenced by various process parameters (e.g. pH value, temperature, time).
- an anodizing layer is not a homogeneous layer. Anodizing are always made up of two clearly separate areas.
- a very first one forms directly on the base material thin, dense, homogeneous layer, the thickness of which is 0.1% to a maximum of 2% Total layer thickness.
- This so-called barrier layer is in the essential for the electrical insulation properties of the Shift system responsible.
- the so-called porous layer on top which is by far the largest Thickness portion of the layer system consists of more or less amorphous aluminum oxide, oxide hydroxide and hydroxide and mixed oxide phases as well as salts from the anodizing bath. Like the name of the layer for Expresses, this layer always has a more or less large one porous portion. It consists of very small, ideally hexagonal cells (Typically 0.02 to 0.06 ⁇ m in diameter) perpendicular to the Top of the barrier layer are grown. So you can Macroscopically also considered as stalked (length to diameter can up to 1000: 1). Run inside these stems Pores from the surface of the layer almost to the barrier layer. The The number of these cells per unit area is determined by the parameters of Coating determined.
- a layer system described above can only in this way on a chemically and physically homogeneous metal surface separate.
- alloy elements which intermetallic phases, e.g. Iron and silicon, which can also form with aluminum, can be reduced to reduce imperfections in anodizing.
- JP Patent No. P 60-40528, DE 3606218 A1 for an aluminum material for Watch case, suggested the iron content and silicon content in the Aluminum material with 0.5 - 3.0% magnesium as an alloying element lower than 100 ppm to make it crystal clear and after one To get gold colored anodizing layers.
- Similar so-called Glossy alloys for decorative purposes are currently available on the market and are therefore state of the art.
- the present invention relates to a machining suitable high purity aluminum alloy for producing extremely corrosion-resistant anodizing layers.
- the sum of the elements in the Aluminum alloy according to this invention, except magnesium and Aluminum should not be more than 300 ppm (total concentration).
- the concentration of the elements except aluminum and Magnesium for each individual element should not be more than 40 ppm.
- This high purity of the aluminum alloy according to the invention is due to the fusion of ultra-pure aluminum and magnesium reached (purity of the aluminum used for melting and Magnesium each better than 99.995%).
- the aluminum alloy according to the invention is first degassed.
- the hydrogen content is below 0.25 ppm lowered. This will cause gas bubbles to form in the following Hot working and / or cold working of the cast material no longer close, avoided.
- melt is filtered using ceramic filters remove any existing oxides and oxide inclusions in the To prevent castings.
- rollers can only be used for initial thicknesses cast slab up to approx. 600 mm can be used. Therefore, for current time for components of large dimensions (thickness, width, Height) due to hot rolling only low degrees of deformation (quotient from the Thickness of material before deformation / Thickness of material after Deformation) can be achieved.
- the raw dimension is before the mechanical one Processing for a vacuum chamber for use as a round plasma reactor 400 mm x 350 mm x 250 mm, i.e. with hot forming by rolling can currently only have a degree of deformation of around 2.4 can be achieved.
- the aluminum alloy according to this invention is used for components large size by forging a cast body with and without Drop formed. Another way to achieve high Degree of deformation is the extrusion of the cast body.
- the forming temperature is preferably as low as possible chosen to avoid excessive grain growth, because in the alloy according to the invention which hinders grain growth The grain boundaries are missing.
- the grain size (average grain diameter) the crystallite of the aluminum alloy should be after the forming and the optionally subsequent heat treatment not more than 500 microns be.
- the blasting treatment has become (Sandblasting, shot peening) to compact the anodized Surfaces proven to be successful.
- spherical grit e.g. made of ceramics or metallic alloys, such as more corrosion-resistant Steel, thrown at high pressure onto the surface to be compacted (e.g. ball diameter 0.5 - 3 mm, 3 - 10 bar jet pressure).
- Sharp-edged blasting material may not be used here, because hereby possibly lying below the surface of the workpiece Defects, such as pores, can be opened easily and then closed Lead to defects in the anodization.
- a further improvement in the corrosion resistance of the anodization can be done by mechanical polishing and lapping with fine polishing and Lapping agents, e.g. made of diamond or pure corundum (0.1 to 5 ⁇ m Grain diameter) can be achieved. This will cause the roughness peaks of the anodizing, which favor the corrosion attack.
- the surfaces to be coated can also be coated Electrochemical polishing can be edited to determine the density of the Increase anodization.
- the alloy according to this invention does not contain any elements Limit grain growth during solidification or heat treatment. As mentioned above, this results in a relatively coarse grain structure. This does not bother from a technical point of view, because there are practically none There are precipitates at the grain boundaries that the anodizing layer could affect. However, with a high-quality component from such a high-quality alloy to problems in appearance come when the component is visually "spotty" due to the coarse grains looks.
- the blasted component down to a layer thickness of approx. 15 ⁇ m Anodizing can be pre-coated, and then the layer preferably with a mixture of 120 grams of phosphoric acid, 80 grams of chromic acid per liter of solution can be stripped at 60 to 80 ° C. After this pretreatment, anodized components from the in this Written alloy again show the glassy appearance of the Anodized layer without the above-mentioned grain structure with the naked eye is visible.
- Pure aluminum alloys with a content of> 99.5% aluminum are suitable from economic and technical Reasons only very limited for a mechanically complex Machining through machining manufacturing processes, such as turning, Milling, drilling.
- the only alloy component is the aluminum alloy according to the invention between 1.4 to 2.9% magnesium added.
- the invention is based on a comparative embodiment are explained in more detail.
- vacuum chambers and others Process parts (components that are located inside the plasma reactor) often made of aluminum alloy with the international material number: 6061 T 6, which often after machining be anodized. Therefore, this material was used for a comparative Corrosion test with the aluminum alloy according to this invention selected.
- Table 1 shows that using the emission spectroscopy method determined compositions of the alloys used.
- the dimensions of the mechanical samples produced by milling were 80 mm x 80 mm x 5 mm.
- the degree of deformation of the for the production of the Samples of the material used were approx. 50.
- test specimens were mechanically produced, they were each anodized in a sulfuric acid bath and subsequently in one Hot water bath at 98 ° C, 180 minutes, compressed.
- the layer thickness which was determined using the eddy current method, was approx. 30 ⁇ m.
- the color of the anodized samples from material 6061 T 6 appeared yellowish, whereas the anodization on the aluminum alloy, according to of this invention, colorless (glassy) until silver gray appeared.
- Figure 1 shows the comparative result of the Corrosion test. It can be seen that the material 6061 T 6 after a period of around 3 hours the specified limit of 10 mg of free aluminum (penetration of the anodizing layer) by reaction the hydrochloric acid solution with the base body is exceeded. On the other hand the anodization fails with the aluminum alloy according to the invention only after twice the time of around 6 hours.
- Figure 1 shows the comparative results of the corrosion test carried out on the anodized test specimens.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
Claims (9)
- Eine Aluminiumlegierung zum Erzeugen von extrem korrosionsbeständigen Anodisierungsschichten für Prozeßbauteile insbesondere für den Einsatz in chemischen Reaktoren und / oder Plasmareaktoren, für das Herstellen und Bearbeiten von Halbleitersubstraten (Wafern).
- Eine Aluminiumlegierung nach Anspruch 1, bei der neben Aluminium nur Magnesium als Legierungselement in der Konzentration von 1,4% bis 2,9 % verwendet wird und die Summe aller weiteren Elemente in der Legierung nicht mehr als 300 ppm beträgt und die Konzentration der einzelnen Elemente mit Ausnahme des Aluminiums und des Magnesiums 40 ppm nicht übersteigt.
- Eine Aluminiumlegierung nach Anspruch 1 und 2, bei der der Gasgehalt in der Schmelze kleiner als 0,25 ppm ist.
- Eine Aluminiumlegierung nach Anspruch 1 bis 3, bei der diese vor der mechanischen Bearbeitung durch Warm- und / oder Kaltverformung hoch verdichtet wird und dabei einen Verformungsgrad größer 10 aufweist.
- Eine Aluminiumlegierung nach Anspruch 1 bis 4, bei der die Schmelze bei der schmelzmetallurgischen Herstellung gefiltert wird, um die Oxidanteile im Gußkörper zu verringern.
- Eine Aluminiumlegierung nach Anspruch 1 bis 5, bei der zum zusätzlichen Verdichten der Oberfläche des umgeformten Grundkörpers nach der mechanischen Vorbearbeitung und / oder nach dem Endbearbeiten vor dem Anodisieren eine Oberflächenbehandlung durch Strahlen mit kugeligem Strahlgut aus Keramik oder / und Metallen und / oder Metalllegierungen erfolgt.
- Eine Aluminiumlegierung nach Anspruch 1 bis 6, bei der die Anodisierschichten der hieraus hergestellten Bauteile eine Dicke von 5 - 300 µm, vorzugsweise zwischen 25 µm und 90 µm, aufweisen.
- Eine Aluminiumlegierung nach Anspruch 1 bis 7, bei der die Anodisierschicht zum Erzeugen von glatten und dichten Oberflächen zusätzlich mechanisch poliert und / oder geläppt wird.
- Eine Aluminiumlegierung nach Anspruch 1 - 8, bei der der Grundkörper nach der mechanischen Bearbeitung örtlich und / oder vollständig elektrochemisch poliert wird.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2000114356 DE10014356A1 (de) | 2000-03-24 | 2000-03-24 | Aluminiumlegierung zum Herstellen von Präzisionsteilen durch spanabhebende Formgebung und zum Erzeugen von extrem korrosionsbeständigen Anodisierschichten |
DE10014356 | 2000-03-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1138793A2 true EP1138793A2 (de) | 2001-10-04 |
EP1138793A3 EP1138793A3 (de) | 2001-10-17 |
Family
ID=7635997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01106442A Ceased EP1138793A3 (de) | 2000-03-24 | 2001-03-23 | Aluminiumlegierung zum Herstellen von Präzionsteilen durch spanabhebende Formgebung und zum Erzeugen von extrem |
Country Status (2)
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EP (1) | EP1138793A3 (de) |
DE (1) | DE10014356A1 (de) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1221492A2 (de) * | 2000-12-29 | 2002-07-10 | Alcan Technology & Management AG | Behälter aus einer Leichtmetalllegierung und Verfahren zu seiner Herstellung |
WO2003066920A1 (en) * | 2002-02-08 | 2003-08-14 | Applied Materials, Inc. | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus |
WO2003073478A2 (en) * | 2002-02-26 | 2003-09-04 | Applied Materials, Inc. | Plasma-resistant, welded aluminum structures for use in semiconductor processing apparatus |
US7033447B2 (en) | 2002-02-08 | 2006-04-25 | Applied Materials, Inc. | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus |
CN100370045C (zh) * | 2002-05-28 | 2008-02-20 | 应用材料公司 | 用于半导体加工设备的洁净铝合金 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3187428A (en) * | 1960-10-19 | 1965-06-08 | Reynolds Metals Co | Method of treating aluminum and aluminum alloys preparatory to bright finishing |
US3312536A (en) * | 1963-06-19 | 1967-04-04 | Olin Mathieson | Composite aluminum alloy |
US3347714A (en) * | 1963-12-27 | 1967-10-17 | Olin Mathieson | Method of producing aluminum-magnesium sheet |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61201798A (ja) * | 1985-03-01 | 1986-09-06 | Citizen Watch Co Ltd | 腕時計用外装部品 |
-
2000
- 2000-03-24 DE DE2000114356 patent/DE10014356A1/de not_active Ceased
-
2001
- 2001-03-23 EP EP01106442A patent/EP1138793A3/de not_active Ceased
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3187428A (en) * | 1960-10-19 | 1965-06-08 | Reynolds Metals Co | Method of treating aluminum and aluminum alloys preparatory to bright finishing |
US3312536A (en) * | 1963-06-19 | 1967-04-04 | Olin Mathieson | Composite aluminum alloy |
US3347714A (en) * | 1963-12-27 | 1967-10-17 | Olin Mathieson | Method of producing aluminum-magnesium sheet |
Non-Patent Citations (1)
Title |
---|
J.R. DAVIS (EDITOR): "ASM Specialty Handbook. Aluminum and Aluminum Alloys" 1993 , ASM , USA XP002170523 * Seite 451 - Seite 466 * * Seite 672 - Seite 679 * * |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1221492A2 (de) * | 2000-12-29 | 2002-07-10 | Alcan Technology & Management AG | Behälter aus einer Leichtmetalllegierung und Verfahren zu seiner Herstellung |
EP1221492A3 (de) * | 2000-12-29 | 2002-08-28 | Alcan Technology & Management AG | Behälter aus einer Leichtmetalllegierung und Verfahren zu seiner Herstellung |
WO2003066920A1 (en) * | 2002-02-08 | 2003-08-14 | Applied Materials, Inc. | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus |
US7033447B2 (en) | 2002-02-08 | 2006-04-25 | Applied Materials, Inc. | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus |
US7048814B2 (en) | 2002-02-08 | 2006-05-23 | Applied Materials, Inc. | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus |
CN1321207C (zh) * | 2002-02-08 | 2007-06-13 | 应用材料有限公司 | 用于半导体处理设备中的抗卤素的阳极氧化铝 |
WO2003073478A2 (en) * | 2002-02-26 | 2003-09-04 | Applied Materials, Inc. | Plasma-resistant, welded aluminum structures for use in semiconductor processing apparatus |
WO2003073478A3 (en) * | 2002-02-26 | 2003-12-04 | Applied Materials Inc | Plasma-resistant, welded aluminum structures for use in semiconductor processing apparatus |
US7055732B2 (en) | 2002-02-26 | 2006-06-06 | Applied Materials, Inc. | Semiconductor processing apparatus including plasma-resistant, welded aluminum structures |
CN1330452C (zh) * | 2002-02-26 | 2007-08-08 | 应用材料有限公司 | 用于半导体处理设备中的抗等离子体的焊接铝结构 |
CN101064243B (zh) * | 2002-02-26 | 2010-04-21 | 应用材料有限公司 | 包含复杂形状的摩擦焊接铝部件的半导体处理设备 |
CN100370045C (zh) * | 2002-05-28 | 2008-02-20 | 应用材料公司 | 用于半导体加工设备的洁净铝合金 |
Also Published As
Publication number | Publication date |
---|---|
EP1138793A3 (de) | 2001-10-17 |
DE10014356A1 (de) | 2001-10-04 |
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