EP1105703A4 - VERFAHREN UND VORRICHTUNG ZUR ÜBERWACHTUNG VON PLASMA-BEARBEITUNGSVORGäNGEN - Google Patents
VERFAHREN UND VORRICHTUNG ZUR ÜBERWACHTUNG VON PLASMA-BEARBEITUNGSVORGäNGENInfo
- Publication number
- EP1105703A4 EP1105703A4 EP99918803A EP99918803A EP1105703A4 EP 1105703 A4 EP1105703 A4 EP 1105703A4 EP 99918803 A EP99918803 A EP 99918803A EP 99918803 A EP99918803 A EP 99918803A EP 1105703 A4 EP1105703 A4 EP 1105703A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma processing
- processing operations
- monitoring plasma
- monitoring
- operations
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title 1
- 238000012544 monitoring process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/443—Emission spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J2003/2866—Markers; Calibrating of scan
Applications Claiming Priority (40)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US64970 | 1993-05-20 | ||
US6497298A | 1998-04-23 | 1998-04-23 | |
US6524598A | 1998-04-23 | 1998-04-23 | |
US65680 | 1998-04-23 | ||
US09/064,957 US6221679B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US65362 | 1998-04-23 | ||
US65195 | 1998-04-23 | ||
US64972 | 1998-04-23 | ||
US09/064,793 US6134005A (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/065,359 US6157447A (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/065,362 US6132577A (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/065,006 US6090302A (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US64965 | 1998-04-23 | ||
US09/064,965 US6254717B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US65203 | 1998-04-23 | ||
US09/064,991 US6246473B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/065,247 US6169933B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US65247 | 1998-04-23 | ||
US09/065,307 US6261470B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/064,966 US6165312A (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US65257 | 1998-04-23 | ||
US09/065,203 US6192826B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US65307 | 1998-04-23 | ||
US09/065,195 US6223755B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/065,257 US6123983A (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US65359 | 1998-04-23 | ||
US09/064,970 US6269278B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/065,274 US6275740B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US64957 | 1998-04-23 | ||
US65274 | 1998-04-23 | ||
US65245 | 1998-04-23 | ||
US64966 | 1998-04-23 | ||
US09/065,358 US6419801B1 (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US65006 | 1998-04-23 | ||
US64991 | 1998-04-23 | ||
US64793 | 1998-04-23 | ||
US09/065,680 US6077386A (en) | 1998-04-23 | 1998-04-23 | Method and apparatus for monitoring plasma processing operations |
US09/290,903 US6383402B1 (en) | 1998-04-23 | 1999-04-12 | Method and apparatus for monitoring plasma processing operations |
PCT/US1999/008894 WO1999054694A1 (en) | 1998-04-23 | 1999-04-23 | Method and apparatus for monitoring plasma processing operations |
US65358 | 2002-10-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1105703A1 EP1105703A1 (de) | 2001-06-13 |
EP1105703A4 true EP1105703A4 (de) | 2005-08-03 |
Family
ID=27586430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99918803A Withdrawn EP1105703A4 (de) | 1998-04-23 | 1999-04-23 | VERFAHREN UND VORRICHTUNG ZUR ÜBERWACHTUNG VON PLASMA-BEARBEITUNGSVORGäNGEN |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1105703A4 (de) |
JP (1) | JP2003524753A (de) |
KR (2) | KR20010042965A (de) |
WO (1) | WO1999054694A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107782447A (zh) * | 2017-09-14 | 2018-03-09 | 中国科学院长春光学精密机械与物理研究所 | 成像光谱仪光谱定标中空间维自动识别方法及系统 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001040535A2 (en) * | 1999-12-03 | 2001-06-07 | The Regents Of The University Of California | System and method relating to vapor deposition |
US7672747B2 (en) | 2000-03-30 | 2010-03-02 | Lam Research Corporation | Recipe-and-component control module and methods thereof |
WO2004032177A2 (en) * | 2002-09-30 | 2004-04-15 | Tokyo Electron Limited | Apparatus and method for use of optical system with plasma proc essing system |
CN101473211A (zh) * | 2006-07-03 | 2009-07-01 | 和舰科技(苏州)有限公司 | 一种氮氧化硅薄膜的等离子处理程度的光学检测方法 |
US7565220B2 (en) | 2006-09-28 | 2009-07-21 | Lam Research Corporation | Targeted data collection architecture |
US7814046B2 (en) | 2006-09-29 | 2010-10-12 | Lam Research Corporation | Dynamic component-tracking system and methods therefor |
US8125633B2 (en) * | 2007-05-07 | 2012-02-28 | Verity Instruments, Inc. | Calibration of a radiometric optical monitoring system used for fault detection and process monitoring |
CN104266324A (zh) * | 2014-10-15 | 2015-01-07 | 北京雷克利达机电股份有限公司 | 可提醒用户更换新风除霾机hepa过滤器的系统和方法 |
US9640371B2 (en) * | 2014-10-20 | 2017-05-02 | Lam Research Corporation | System and method for detecting a process point in multi-mode pulse processes |
WO2016171845A1 (en) * | 2015-04-23 | 2016-10-27 | Applied Materials, Inc. | In-situ etch rate determination for chamber clean endpoint |
KR102543349B1 (ko) * | 2016-07-11 | 2023-06-30 | 삼성전자주식회사 | 플라즈마 모니터링 장치 |
JP6762927B2 (ja) * | 2017-12-19 | 2020-09-30 | 株式会社日立ハイテク | 信号処理装置及び信号処理方法 |
WO2020219208A1 (en) * | 2019-04-26 | 2020-10-29 | Applied Materials, Inc. | Methods for calibrating an optical emission spectrometer |
CN112458440B (zh) | 2020-11-18 | 2022-11-25 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其反应腔室和膜层沉积方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5014217A (en) * | 1989-02-09 | 1991-05-07 | S C Technology, Inc. | Apparatus and method for automatically identifying chemical species within a plasma reactor environment |
US5347460A (en) * | 1992-08-25 | 1994-09-13 | International Business Machines Corporation | Method and system employing optical emission spectroscopy for monitoring and controlling semiconductor fabrication |
US5626714A (en) * | 1994-12-08 | 1997-05-06 | Sumitomo Metal Industries Limited | Method for detecting etching endpoint and etching apparatus and etching system using the method thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5871658A (en) * | 1997-01-13 | 1999-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Optical emisson spectroscopy (OES) method for monitoring and controlling plasma etch process when forming patterned layers |
-
1999
- 1999-04-23 KR KR1020007011793A patent/KR20010042965A/ko active IP Right Grant
- 1999-04-23 JP JP2000544994A patent/JP2003524753A/ja active Pending
- 1999-04-23 WO PCT/US1999/008894 patent/WO1999054694A1/en active IP Right Grant
- 1999-04-23 EP EP99918803A patent/EP1105703A4/de not_active Withdrawn
- 1999-04-23 KR KR10-2004-7006151A patent/KR20040053203A/ko not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5014217A (en) * | 1989-02-09 | 1991-05-07 | S C Technology, Inc. | Apparatus and method for automatically identifying chemical species within a plasma reactor environment |
US5347460A (en) * | 1992-08-25 | 1994-09-13 | International Business Machines Corporation | Method and system employing optical emission spectroscopy for monitoring and controlling semiconductor fabrication |
US5626714A (en) * | 1994-12-08 | 1997-05-06 | Sumitomo Metal Industries Limited | Method for detecting etching endpoint and etching apparatus and etching system using the method thereof |
Non-Patent Citations (1)
Title |
---|
See also references of WO9954694A1 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107782447A (zh) * | 2017-09-14 | 2018-03-09 | 中国科学院长春光学精密机械与物理研究所 | 成像光谱仪光谱定标中空间维自动识别方法及系统 |
Also Published As
Publication number | Publication date |
---|---|
WO1999054694A9 (en) | 2001-08-09 |
KR20010042965A (ko) | 2001-05-25 |
KR20040053203A (ko) | 2004-06-23 |
WO1999054694A1 (en) | 1999-10-28 |
JP2003524753A (ja) | 2003-08-19 |
EP1105703A1 (de) | 2001-06-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
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17P | Request for examination filed |
Effective date: 20001122 |
|
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20050617 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7H 01L 21/66 B Ipc: 7G 01J 3/443 B Ipc: 7G 01J 3/44 B Ipc: 7G 01J 3/00 A |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20051031 |