EP1105703A4 - Method and apparatus for monitoring plasma processing operations - Google Patents

Method and apparatus for monitoring plasma processing operations

Info

Publication number
EP1105703A4
EP1105703A4 EP99918803A EP99918803A EP1105703A4 EP 1105703 A4 EP1105703 A4 EP 1105703A4 EP 99918803 A EP99918803 A EP 99918803A EP 99918803 A EP99918803 A EP 99918803A EP 1105703 A4 EP1105703 A4 EP 1105703A4
Authority
EP
European Patent Office
Prior art keywords
plasma processing
processing operations
monitoring plasma
monitoring
operations
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP99918803A
Other languages
German (de)
French (fr)
Other versions
EP1105703A1 (en
Inventor
Michael Lane Smith Jr
Joel O'don Stevenson
Pamela Denise Peardon Ward
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Technology and Engineering Solutions of Sandia LLC
Original Assignee
Sandia Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/065,362 external-priority patent/US6132577A/en
Priority claimed from US09/064,970 external-priority patent/US6269278B1/en
Priority claimed from US09/065,307 external-priority patent/US6261470B1/en
Priority claimed from US09/064,991 external-priority patent/US6246473B1/en
Priority claimed from US09/064,965 external-priority patent/US6254717B1/en
Priority claimed from US09/065,274 external-priority patent/US6275740B1/en
Priority claimed from US09/065,203 external-priority patent/US6192826B1/en
Priority claimed from US09/065,257 external-priority patent/US6123983A/en
Priority claimed from US09/064,793 external-priority patent/US6134005A/en
Priority claimed from US09/064,957 external-priority patent/US6221679B1/en
Priority claimed from US09/065,359 external-priority patent/US6157447A/en
Priority claimed from US09/065,006 external-priority patent/US6090302A/en
Priority claimed from US09/065,680 external-priority patent/US6077386A/en
Priority claimed from US09/064,966 external-priority patent/US6165312A/en
Priority claimed from US09/065,358 external-priority patent/US6419801B1/en
Priority claimed from US09/065,195 external-priority patent/US6223755B1/en
Priority claimed from US09/065,247 external-priority patent/US6169933B1/en
Priority claimed from US09/290,903 external-priority patent/US6383402B1/en
Application filed by Sandia Corp filed Critical Sandia Corp
Publication of EP1105703A1 publication Critical patent/EP1105703A1/en
Publication of EP1105703A4 publication Critical patent/EP1105703A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/443—Emission spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J2003/2866—Markers; Calibrating of scan

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
EP99918803A 1998-04-23 1999-04-23 Method and apparatus for monitoring plasma processing operations Withdrawn EP1105703A4 (en)

Applications Claiming Priority (40)

Application Number Priority Date Filing Date Title
US64972 1979-08-08
US64970 1987-06-19
US64966 1987-06-19
US65307 1987-06-23
US6497298A 1998-04-23 1998-04-23
US6524598A 1998-04-23 1998-04-23
US64965 1998-04-23
US09/064,991 US6246473B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US65195 1998-04-23
US09/064,965 US6254717B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/065,274 US6275740B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US64957 1998-04-23
US09/065,203 US6192826B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US65247 1998-04-23
US65203 1998-04-23
US09/065,257 US6123983A (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/065,680 US6077386A (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US65680 1998-04-23
US09/064,957 US6221679B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/065,362 US6132577A (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US64991 1998-04-23
US65245 1998-04-23
US09/065,307 US6261470B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/064,793 US6134005A (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/064,966 US6165312A (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/065,358 US6419801B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/065,195 US6223755B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US65006 1998-04-23
US64793 1998-04-23
US65362 1998-04-23
US09/064,970 US6269278B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US09/065,247 US6169933B1 (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US65274 1998-04-23
US09/065,006 US6090302A (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US65359 1998-04-23
US09/065,359 US6157447A (en) 1998-04-23 1998-04-23 Method and apparatus for monitoring plasma processing operations
US65257 1998-04-23
US09/290,903 US6383402B1 (en) 1998-04-23 1999-04-12 Method and apparatus for monitoring plasma processing operations
PCT/US1999/008894 WO1999054694A1 (en) 1998-04-23 1999-04-23 Method and apparatus for monitoring plasma processing operations
US65358 2002-10-08

Publications (2)

Publication Number Publication Date
EP1105703A1 EP1105703A1 (en) 2001-06-13
EP1105703A4 true EP1105703A4 (en) 2005-08-03

Family

ID=27586430

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99918803A Withdrawn EP1105703A4 (en) 1998-04-23 1999-04-23 Method and apparatus for monitoring plasma processing operations

Country Status (4)

Country Link
EP (1) EP1105703A4 (en)
JP (1) JP2003524753A (en)
KR (2) KR20040053203A (en)
WO (1) WO1999054694A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107782447A (en) * 2017-09-14 2018-03-09 中国科学院长春光学精密机械与物理研究所 Space dimension automatic identifying method and system in imaging spectrometer spectral calibration

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4138901A (en) * 1999-12-03 2001-06-12 Regents Of The University Of California, The System and method relating to vapor deposition
US7672747B2 (en) 2000-03-30 2010-03-02 Lam Research Corporation Recipe-and-component control module and methods thereof
JP2006501620A (en) * 2002-09-30 2006-01-12 東京エレクトロン株式会社 Apparatus and method for using an optical system with a plasma processing system
CN101473211A (en) * 2006-07-03 2009-07-01 和舰科技(苏州)有限公司 Optical detection method for plasma treatment degree of silicon oxynitride film
US7565220B2 (en) 2006-09-28 2009-07-21 Lam Research Corporation Targeted data collection architecture
US7814046B2 (en) 2006-09-29 2010-10-12 Lam Research Corporation Dynamic component-tracking system and methods therefor
KR101279911B1 (en) * 2007-05-07 2013-06-28 베러티 인스트루먼트, 인코퍼레이티드 Calibration of a radiometric optical monitoring system used for fault detection and process monitoring
CN104266324A (en) * 2014-10-15 2015-01-07 北京雷克利达机电股份有限公司 System and method capable of reminding user to replace fresh air haze removal machine HEPA (High Efficiency Particulate Air) filter
US9640371B2 (en) * 2014-10-20 2017-05-02 Lam Research Corporation System and method for detecting a process point in multi-mode pulse processes
KR102507814B1 (en) * 2015-04-23 2023-03-07 어플라이드 머티어리얼스, 인코포레이티드 In-Situ Etch Rate Determination for Chamber Clean Endpoint
KR102543349B1 (en) * 2016-07-11 2023-06-30 삼성전자주식회사 Plasma monitoring apparatus
JP6762927B2 (en) * 2017-12-19 2020-09-30 株式会社日立ハイテク Signal processing device and signal processing method
US11927482B2 (en) 2019-04-26 2024-03-12 Applied Materials, Inc. Methods for calibrating an optical emission spectrometer
CN112458440B (en) * 2020-11-18 2022-11-25 北京北方华创微电子装备有限公司 Semiconductor process equipment, reaction chamber thereof and film deposition method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5014217A (en) * 1989-02-09 1991-05-07 S C Technology, Inc. Apparatus and method for automatically identifying chemical species within a plasma reactor environment
US5347460A (en) * 1992-08-25 1994-09-13 International Business Machines Corporation Method and system employing optical emission spectroscopy for monitoring and controlling semiconductor fabrication
US5626714A (en) * 1994-12-08 1997-05-06 Sumitomo Metal Industries Limited Method for detecting etching endpoint and etching apparatus and etching system using the method thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5871658A (en) * 1997-01-13 1999-02-16 Taiwan Semiconductor Manufacturing Company, Ltd. Optical emisson spectroscopy (OES) method for monitoring and controlling plasma etch process when forming patterned layers

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5014217A (en) * 1989-02-09 1991-05-07 S C Technology, Inc. Apparatus and method for automatically identifying chemical species within a plasma reactor environment
US5347460A (en) * 1992-08-25 1994-09-13 International Business Machines Corporation Method and system employing optical emission spectroscopy for monitoring and controlling semiconductor fabrication
US5626714A (en) * 1994-12-08 1997-05-06 Sumitomo Metal Industries Limited Method for detecting etching endpoint and etching apparatus and etching system using the method thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO9954694A1 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107782447A (en) * 2017-09-14 2018-03-09 中国科学院长春光学精密机械与物理研究所 Space dimension automatic identifying method and system in imaging spectrometer spectral calibration

Also Published As

Publication number Publication date
WO1999054694A9 (en) 2001-08-09
JP2003524753A (en) 2003-08-19
EP1105703A1 (en) 2001-06-13
KR20040053203A (en) 2004-06-23
WO1999054694A1 (en) 1999-10-28
KR20010042965A (en) 2001-05-25

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