EP0941496A1 - Lame de phase annulaire pour la realisation d'un contraste de phase positif - Google Patents

Lame de phase annulaire pour la realisation d'un contraste de phase positif

Info

Publication number
EP0941496A1
EP0941496A1 EP98948715A EP98948715A EP0941496A1 EP 0941496 A1 EP0941496 A1 EP 0941496A1 EP 98948715 A EP98948715 A EP 98948715A EP 98948715 A EP98948715 A EP 98948715A EP 0941496 A1 EP0941496 A1 EP 0941496A1
Authority
EP
European Patent Office
Prior art keywords
phase
layer
substrate
putty
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP98948715A
Other languages
German (de)
English (en)
Inventor
Sabine Alt-Nedvidek
Claus Gunkel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leica Microsystems CMS GmbH
Original Assignee
Leica Microsystems Wetzlar GmbH
Leica Microsystems CMS GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leica Microsystems Wetzlar GmbH, Leica Microsystems CMS GmbH filed Critical Leica Microsystems Wetzlar GmbH
Publication of EP0941496A1 publication Critical patent/EP0941496A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/14—Condensers affording illumination for phase-contrast observation

Definitions

  • the invention relates to a phase ring for realizing a positive phase contrast.
  • the microscopic phase contrast method has been known since Zernike.
  • so-called phase rings are produced by vapor deposition of one or more thin layers on a substrate base, for example made of optical glass.
  • a clever choice of the layer thickness succeeds in delaying the phase of the direct light - i.e. the light beam that passes through the vapor-deposited phase ring - compared to the phase of the diffracted light - i.e. the light beam not penetrating the phase ring - for example by ⁇ / 2 or to accelerate ⁇ / 2.
  • the latter case is a so-called "positive" phase contrast.
  • FIG. 1 b a reduced top view of that shown in FIG. 1 a;
  • 5b shows a graphical representation of the transmission of an uncemented phase ring as a function of the wavelength ⁇ , specifically for an Ag layer thickness of 34.5 nm;
  • 6b a graphical representation of the course of the transmission as a function of the wavelength ⁇ for a thin-layer system according to FIG. 6a; 7a: a graphical representation of a phase shift as a function of the wavelength ⁇ for a putty for which the following applies: n putty ⁇ n ⁇
  • FIG. 1a The layer sequence of a cemented phase ring according to the invention is shown schematically in FIG. 1a.
  • a ring made of silver (Ag) is vapor-deposited on a substrate - for example on a glass plate or a glass lens - and a dielectric layer with a refractive index n H is placed on it .
  • n H a refractive index
  • FIG. 1b shows a plan view - in a reduced form - of what is shown in FIG. 1a, the two areas (direct
  • FIG. 2 shows a non-cemented embodiment.
  • An optical glass or another transparent medium - for example crystals, plastics - is used as the substrate material.
  • Layer system is a layer sequence of silver and a dielectric material, e.g. B. a titanium-oxygen compound.
  • a dielectric material e.g. B. a titanium-oxygen compound.
  • Layer system it is also possible that Layer system to be additionally provided with a reflection-reducing layer.
  • the application of these structures is known for example from DE-PS 2 261 780. A so-called Menzel three-slit is used to measure the specific phase shift.
  • Fig. 3 is another embodiment of a cemented
  • 4a shows the phase shift of a cemented phase ring as a function of the wavelength ⁇ in a graphic representation. It can be seen that the four measured values in the range between 425 nm and 600 nm are between 50 ° and 55 °.
  • the transmission values determined for this example (the thickness of the
  • the transmission of the overall system is first determined via the thickness of the silver layer. This is associated with a phase shift.
  • the layer with the thickness n 2 primarily protects the silver; it consists z. B. from an oxide (Al 2 O 3 ) of suitable thickness, for. B. 5 nm.
  • the setting of the desired phase shift ⁇ takes place primarily with the n layer. The relationship applies to this:
  • ⁇ s (n Kltt - n 1 ) - d 1 .
  • FIG. 5a graphically illustrates how, in the case of an uncondensed phase ring according to FIG. 2, the phase shift as a function of the
  • FIG. 6a shows a graphical representation of the phase shift as a function of the wavelength ⁇ for a putty with the refractive index n Kltt > n.
  • the phase shift is 59% at a ⁇ of 437 nm and at a ⁇ of 482 nm at 71%, at a ⁇ of 546 nm at 64% and at a ⁇ of 585 nm at 72%.
  • the course of the transmission T is shown as a function of the wavelength ⁇ in FIG. 6b, with a transmission of 28% at a ⁇ value of 425 nm and a transmission T of approximately 12 at a ⁇ of approximately 600 nm % is achieved.
  • the present invention it is therefore possible to achieve a positive phase contrast with a largely constant phase shift of 50 ° to 55 ° in the wavelength range between 425 nm and 600 nm with a transmission characteristic of T (at 425 nm) of approx. 35% to T (at 600 nm) between 15-20%.
  • T at 425 nm
  • the present invention enables any positive phase shift to be set between 40 ° and 60 °.

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)

Abstract

L'invention concerne une lame de phase annulaire constituée d'un système de déphasage à couches minces qui présente, dans le cas d'un système collé, une structure: (premier) substrat - Ag - nH - colle - (deuxième) substrat ou (premier) substrat - n1 - Ag - n2 - colle - (deuxième) substrat, et, dans le cas d'un système non collé, une structure: substrat - Ag - nH - air. nH, n1 et n2 représentent respectivement l'indice de réfraction d'une couche diélectrique. On peut définir le déphasage du contraste de phase positif de manière ciblée.
EP98948715A 1997-09-29 1998-08-03 Lame de phase annulaire pour la realisation d'un contraste de phase positif Withdrawn EP0941496A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19743027 1997-09-29
DE19743027A DE19743027A1 (de) 1997-09-29 1997-09-29 Phasenring zur Realisierung eines positiven Phasenkontrastes
PCT/DE1998/002228 WO1999017145A1 (fr) 1997-09-29 1998-08-03 Lame de phase annulaire pour la realisation d'un contraste de phase positif

Publications (1)

Publication Number Publication Date
EP0941496A1 true EP0941496A1 (fr) 1999-09-15

Family

ID=7844023

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98948715A Withdrawn EP0941496A1 (fr) 1997-09-29 1998-08-03 Lame de phase annulaire pour la realisation d'un contraste de phase positif

Country Status (6)

Country Link
US (1) US6212009B1 (fr)
EP (1) EP0941496A1 (fr)
JP (1) JP4199833B2 (fr)
CN (2) CN1267761C (fr)
DE (1) DE19743027A1 (fr)
WO (1) WO1999017145A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5285306B2 (ja) * 2008-03-06 2013-09-11 豊 末永 光学部品及び光学部品を用いた位相差顕微鏡
DE102011006018A1 (de) 2011-03-24 2012-09-27 Hilti Aktiengesellschaft Befestigungssystem
JP7031740B2 (ja) * 2018-06-05 2022-03-08 株式会社ニコン 位相板、対物レンズ、及び観察装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE45855C (de) * TH. OTTO in Schkeuditz Selbstthätiger Kuppelungsapparat mit Daumen für Seilbahnen
US2427689A (en) * 1942-08-28 1947-09-23 American Optical Corp Microscope with special light modifiers
US2616334A (en) 1947-11-25 1952-11-04 Zernike Frits Phase microscopy
AT180745B (de) * 1953-06-17 1955-01-10 Optische Werke C Reichert Ag Kontrastmikroskop
AT187704B (de) * 1953-09-23 1956-11-26 Optische Werke C Reichert Ag Phasenkontrastmikroskop
DE2261780C2 (de) * 1972-12-16 1979-09-20 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren zur Herstellung von unmittelbar nebeneinander liegenden Strukturen
DE3412958A1 (de) * 1984-04-06 1985-10-17 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Phasengitter
US5144362A (en) * 1990-11-14 1992-09-01 Mitsubishi Denki Kabushiki Kaisha Projection aligner
JP3413238B2 (ja) 1993-03-31 2003-06-03 オリンパス光学工業株式会社 位相制御膜構造体

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO9917145A1 *

Also Published As

Publication number Publication date
WO1999017145A1 (fr) 1999-04-08
DE19743027A1 (de) 1999-05-12
CN1267761C (zh) 2006-08-02
JP4199833B2 (ja) 2008-12-24
CN1534324A (zh) 2004-10-06
CN1179226C (zh) 2004-12-08
JP2001508557A (ja) 2001-06-26
CN1244264A (zh) 2000-02-09
US6212009B1 (en) 2001-04-03

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