EP0873566B1 - Röntgenmikroskop mit zonenplatten - Google Patents
Röntgenmikroskop mit zonenplatten Download PDFInfo
- Publication number
- EP0873566B1 EP0873566B1 EP97919244A EP97919244A EP0873566B1 EP 0873566 B1 EP0873566 B1 EP 0873566B1 EP 97919244 A EP97919244 A EP 97919244A EP 97919244 A EP97919244 A EP 97919244A EP 0873566 B1 EP0873566 B1 EP 0873566B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- zone plate
- zone
- ray
- ray microscope
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Definitions
- the invention relates to zone plates with diffraction structures for X-rays and an X-ray microscope with these zone plates for one Condenser monochromator and for a micro lens.
- Micro zone plates are rotationally symmetrical Transmission circuit grating with lattice constants decreasing towards the outside, typically have a diameter of up to 0.1 mm and several hundred zones.
- the numerical aperture of a zone plate is generally through the Diffraction angle determined under which the outer and therefore finest zones Bend vertically incident X-rays.
- the achievable spatial The resolution of a zone plate is determined by its numerical aperture.
- the numerical aperture of the used X-ray lenses could in the last Years increased significantly, so that their resolution improved. This trend towards higher resolution will continue.
- the numerical aperture of the illuminating condenser of a transmitted light microscope always adapted approximately should be at the numerical aperture of the microscope objective in order to incoherently radiating light sources also include incoherent object lighting and thus an almost linear relationship between object intensity and Get image intensity. If the condenser aperture is smaller than that of the microscope objective, there is a partially coherent image and the linear transformation between object intensity and image intensity goes for that important high determining the resolution of the microscope Spatial frequencies lost.
- a bright condenser must be used.
- too diffractive optics as condensers e.g. Zone plates used because with this allows the X-ray radiation to be monochromatized at the same time.
- Zone plates should have the highest possible diffraction efficiency, to focus as much of the captured radiation on the object as possible.
- Such "condenser zone plates” are usually used in the first Diffraction order used, in which all realized so far Condenser zone plates have their highest diffraction efficiency. there it is difficult to adjust the numerical aperture of the Condenser zone plates to that of the micro zone plate (X-ray lens) to reach. In order to realize the adjustment, the condenser zone plate have the same fine zones on the outside as the microzone plate itself The brightest built microzone plates now have zone widths of only 19 nm (corresponding to 38 nm period of the zone structures), So far, zone plates with such fine zone structures can only be used Methods of electron beam lithography, in which the zones are in succession generated, manufactured.
- condenser zone plates could also be adapted numerical aperture only with methods of electron beam lithography, which is to be described as a serial and thus slow process become.
- condenser zone plates have not yet been manufactured been.
- a condenser monochromator is used for phase contrast X-ray microscopy Arrangement of advantage, as much as possible of the jet pipe available posed X-ray light in an annular hollow cone aperture large Aperture angle to the object.
- the zone plates are used as X-ray lenses use a hollow cone-shaped object lighting. Otherwise it would the radiation from the 0th and 1st Overlay the diffraction order of the condenser zone plate. This is because the vast majority of radiation that is parallel or almost parallel to optical axis falls on the object, this and the following micro zone plate (the x-ray lens) penetrates without diffraction and is a more general diffuser Background in a straight line, i.e. noticeable in the center of the image field makes.
- Such high-resolution microzone plates would have zones with approximately 10 nm Possess structure width. So far, however, it has neither been successful nor clarified whether such exposed zone structures supported by a support film, which in the Usually consist of a metal like germanium or nickel, still with the help of electron beam lithography and have it transferred into metal. Also for "sputtered-sliced" zone plates is for such small structure widths not yet shown that with the sputtering method sufficiently stable and not Zone rings disturbed by material diffusion can be produced finally process into a zone plate using the thinning process let, in particular the zones of material with low scattering capacity should preferably be etched out so that the profile of a Laminar structure arises.
- the contrast of an image is therefore greatly weakened by the radiation of the other, much more effective diffraction orders. In practice, therefore, zone plates in higher diffraction orders could not be used so far.
- zone structures if they have an aspect ratio> 1, a particularly high diffraction efficiency only in its first order can accept (up to about 50% for X-ray optically suitable and realistic, i.e. technologically processable materials).
- the prerequisite for this is that the zone structures run along the areas of constant phase that one for an object point on the optical axis and the associated image point can construct. These surfaces run parallel and concentric to optical axis, the zone structures act like the network levels of one Crystal used in Bragg reflection and hence the Bragg condition Fulfills.
- Bragg reflection if the zone structures are like this are inclined to be parallel to the bisector ("Braggwinkel") of incident and diffracted beam direction. The following is therefore for such a case of "zone plates in Bragg reflection" spoken.
- the claim 1 relates to the application of the invention Zone plates in an X-ray microscope. Advantageous configurations and Further developments of the invention result from the subclaims.
- the specified zone plates are in an X-ray microscope Condenser monochromator and used as a micro lens, so one can Achieve a resolution of 10 nm.
- a suitably adjusted line / gap ratio smaller than 1: 1 and achieved by a high aspect ratio Diffraction efficiency of these zone plates is at a maximum in a higher one Diffraction order.
- This provides efficient X-ray optics with the necessary high numerical aperture. They are also with them X-ray microscopes with 10 nm resolution possible without the extremely small and technologically extremely difficult to manufacture zone structures must be used for zone plates with the same resolution would be necessary to use the first diffraction order.
- a zone plate with a high aspect ratio (typical value: greater than 10) a comparable high Diffraction efficiency in one of their high diffraction orders like one in zone plate with the high aspect ratio used in the first diffraction order has if the mentioned line / gap ratio is significantly less than one. Since such a zone plate is used in a high diffraction order, it has one compared to applications in the first diffraction order greatly enlarged aperture. For example, a zone plate with high Aspect ratio (about 20) and small line / gap ratio (about 0.25), if they are in the 6th diffraction order and in Bragg reflection at 2.4 nm Wavelength is used to have up to 45% diffraction efficiency. For this X-ray optically suitable and technologically processable materials used. In general, the parameters of the zone plate, e.g. Materials, aspect ratio and dash / gap ratio are different for each have the desired higher diffraction order optimized.
- the parameters of the zone plate e.g. Materials, aspect ratio and das
- zone plates with a large aspect ratio and a small line gap Ratio - when using a higher diffraction order and the Bragg reflection - is that with the same numerical aperture one in high Diffraction order used zone plate only relatively rough zone structures needed compared to one used in the first diffraction order Zone plate of the same numerical aperture.
- one X-ray microscopes with 10 nm resolution result for the finest Zone structure to be produced has a width of approximately 30 nm with a period of 120 nm if the zone plate is operated in the 6th diffraction order should.
- Such structural widths are nowadays by means of To produce electron beam lithography well. Add to that 6 times less Zones are to be written, which is significantly faster. For one electron-beam written zone plate condenser, this means that drastically reduce writing times.
- a zone plate for Bragg reflection can be made using known evaporation techniques be produced, e.g. according to the known method for producing so-called "sputtered sliced zone plates" by sputter coating a polished wire rotating in vacuum, alternating the materials suitable for X-ray optics are applied. The wire with the applied materials are then embedded in a substrate and cut in slices perpendicular to its wire axis. This creates Zone plates, the inner area of which is absorbent, i.e. X-ray optical What is ineffective for the condenser outlined in the introduction Reasons is desired.
- an optically polished metal or glass ball can be used as an alternative manufacturing method for a zone plate.
- the Sphere becomes - rotating - in vacuum with a multilayer system occupied and then on their circumference except for a spherical zone of a few thinned by width near its equator. If the thinned ball zone is not exactly on the equator of the sphere, so is the remaining layer sequence inclined. If the inclination is half the required beam deflection and coinciding with the angle bisector mentioned above, then the Layer sequence under the Bragg angle. The layer sequence acts like an Multiple mirrors so that the diffraction efficiency reaches a maximum.
- FIG. 1 shows a zone plate according to the invention.
- Fig. 2 shows an X-ray microscope with a condenser and micro zone plate both are operated in Bragg reflection.
- FIG. 3 shows an X-ray microscope with a condenser and micro zone plate both have inclined zones and are operated in Bragg reflection.
- FIG. 4 shows an X-ray microscope with a focuser with a ring focus and one downstream annular zone plate and a micro zone plate.
- FIG 1 an embodiment of a zone plate 4 according to the invention is shown schematically in cross section.
- the diffractive properties of the zone plate 4 are determined by the line / gap ratio P 1 / P 2 , the aspect ratio H / P and by the inclination of the zones 6, 7 with respect to the optical axis 3.
- the line / gap ratio P 1 / P 2 indicates the ratio of the structure width of the material of the zones 6, which strongly scatters the incident X-ray radiation 1, and the structure width of the weakly scattering material of the zones 7.
- the line / gap ratio P 1 / P 2 is constant over the entire zone plate 4.
- the aspect ratio indicates the ratio of the zone height H and the length P of the zone period and in this embodiment increases from the optical axis 3 to the edge of the zone plate 4.
- a high diffraction efficiency is achieved in a higher diffraction order if the line / gap ratio P 1 / P 2 is less than 1, as is shown, for example, with 0.5 to scale in FIG. 1, and if a large aspect ratio, for example greater than 10 is realized, which is however not shown to scale in FIG. 1.
- a further increase in diffraction efficiency in a higher one Diffraction order can be achieved in certain applications with zones 6.7 be inclined to the optical axis 3.
- the embodiment 1 shows zones 6, 7 which are close to the optical axis 3 parallel to this run. With increasing distance of the zones 6, 7 from the optical axis 3 the inclination of the zones 6, 7 with respect to the optical axis 3 also increases. A further improvement can be achieved if the zone plate 4 with their zones 6,7 is used in Bragg reflection.
- the X-ray radiation 1 incident on the zone plate 4 is included different intensities diffracted into different diffraction orders.
- 1 shows the directions of propagation for the diffraction of the zero order 8, first order 9a, second order 9b and third order 9c.
- the diffraction angle increases with the higher diffraction orders. Therefore can with a high diffraction order when using the zone plate 4 as a condenser and / or as an objective in an X-ray microscope Aperture and thus a high resolution of the X-ray microscope can be achieved.
- easily and in a relatively short time are advantageously sufficient Rough structures to be produced as zones 6, 7 of zone plate 4.
- Figures 2-4 show schematically zone plates 4 in arrangements as Condensers and microzone plates for X-ray microscopes with special high resolution, which are operated with different radiation sources.
- Fig.2 the optics of an X-ray microscope is shown, in which as Radiation source is an isotropically radiating micro-plasma X-ray source 17 is used.
- An annular zone plate 14 with is not suitable as a condenser for this inclined zones 6,7, which is advantageously operated in Bragg reflection.
- the Zone plate 14 focuses the x-ray radiation 1 of the microplasma x-ray source 17 via a hollow radiation cone 10 in focus 13 on the optical axis 3. The object thus illuminated is located there.
- a monochromator pinhole 11 is also arranged, which the unwanted diffraction orders and wavelengths of the X-ray light for hides the further beam path.
- the zone plate 14 thereby acts together with the monochromator pinhole 11 as a condenser monochromator, the general for illuminating objects in X-ray microscope is used.
- a microzone plate 12 with inclined zones 6, 7 serves as the X-ray objective and with Bragg reflection. It creates an image of the object in the image plane 18.
- the zone plate 14 and the micro zone plate 12 have a central one X-ray absorbing zone plate area 19 in order - as in the Introduction already mentioned - the undiffracted X-rays as diffuse To eliminate underground.
- FIG 3 the optics of an X-ray microscope is shown, the optical Elements a condenser zone plate 15 with Bragg reflection and inclined Zones and a micro zone plate 12 with Bragg reflection and inclined zones 6.7 used.
- Zones 6,7 of the application have to be effective in Bragg reflection Condenser zone plate 15 be inclined.
- the central one, the X-rays Absorbent zone plate area 20 consists of a spherical one Carrier.
- FIG. 4 shows an X-ray microscope with a focuser 21 Ring focus and an annular zone plate arranged downstream in the beam path 16 with Bragg reflection and inclined zones 6.7.
- the focuser 21 and the Zone plate 16 together with a monochromator aperture 11 form one Condenser monochromator.
- the focuser 21 with ring focus focuses the incident parallel bundled x-ray radiation 1 from an undulator or one Deflection magnets of an electron storage ring in the form of a ring.
- the Zone plate 16 is arranged close to the ring focus of the focuser 21.
- the Zones 6, 7 of the zone plate 16 are modified so that they are out of the ring focus of the focuser 21 by diffraction a point-like focus 13 on the generate optical axis 3.
- Zone plate 16 does not need to have a large area, since it is close to Ring focus of the focuser 21 can be located. So there are only a few structures to produce on the zone plate 16.
- the light-collecting surface becomes alone determined by the focuser 21. It has only rough zone structures and can therefore be easily produced using methods of electron beam lithography.
- This arrangement can be used particularly advantageously for well-collimated ones X-rays 1, e.g. from an undulator.
- This condenser-monochromator arrangement also serves as X-ray lens a micro zone plate 12 with Bragg reflection and inclined Zones 6.7.
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
Claims (21)
- Röntgenmikroskop mit Zonenplatten für einen Kondensor-Monochromator und für ein Mikroobjektiv, dadurch gekennzeichnet, daß mindestens eine auf der optischen Achse (3) des Röntgenmikroskops angeordnete Zonenplatte (4,12,14,15,16) mit einem hohen Aspektverhältnis (H/P) und einem Strich/Lücke-Verhältnis (P1/P2) kleiner als 1 vorgesehen ist.
- Röntgenmikroskop nach Anspruch 1, dadurch gekennzeichnet, daß das Aspektverhältnis (H/P) zum Rand der Zonenplatte (4,12,14,15,16) hin zunimmt.
- Röntgenmikroskop nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß der zentrale Bereich (19,20) der Zonenplatte (4,12,14,15,16) für die Röntgenstrahlung absorbierend ist.
- Röntgenmikroskop nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß die Zonen (6,7) der Zonenplatte (4,12,14,15,16) parallel oder geneigt zur optischen Achse (3) ausgerichtet sind.
- Röntgenmikroskop nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß die Zonen (6,7) der Zonenplatte (4,12,14,15,16) im Bereich nahe der optischen Achse (3) parallel zu dieser ausgerichtet sind und zum Rand der Zonenplatte (4,12,14,15,16) hin zunehmend geneigt gegen die optische Achse (3) sind.
- Röntgenmikroskop nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß eine in Braggreflexion betriebene Zonenplatte (4,12,14,15,16) vorgesehen ist.
- Röntgenmikroskop nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß für einen Kondensor-Monochromator die Zonenplatte (14,15,16) ringförmig ausgebildet und in ihrem Fokus (13) eine Monochromatorlochblende (11) angeordnet ist.
- Röntgenmikroskop nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß für einen Kondensor-Monochromator ein Fokussator (21) mit Ringfokus und eine im Strahlengang nachgeordnete ringförmig ausgebildete Zonenplatte (16) vorgesehen sind, wobei im Fokus (13) der Zonenplatte (16) eine Monochromatorlochblende (11) angeordnet ist.
- Röntgenmikroskop nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß die Zonenplatte (12) als Mikroobjektiv verwendet wird.
- Röntgenmikroskop nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß Zonenplatten (4,12,14,15,16) vorgesehen sind, deren Zonen (6,7) auf einem Draht oder einer polierten Kugel aufgebracht sind.
- Zonenplatte (4,12,14,15,16) mit Beugungsstrukturen (6,7) für Röntgenstrahlung, dadurch gekennzeichnet, daß die Beugungsstrukturen (6,7) ein hohes Aspektverhältnis (H/P) und ein Strich/Lücke-Verhältnis (P1/P2) kleiner als 1 aufweisen.
- Zonenplatte (4,12,14,15,16) nach Anspruch 11, dadurch gekennzeichnet, daß das Aspektverhältnis (H/P) zum Rand der Zonenplatte (4,12,14,15,16) hin zunimmt.
- Zonenplatte (4,12,14,15,16) nach Anspruch 11 oder 12, dadurch gekennzeichnet, daß der zentrale Bereich (19,20) der Zonenplatte (4,12,14,15,16) für die Röntgenstrahlung absorbierend ist.
- Zonenplatte (4,12,14,15,16) nach einem der Ansprüche 11-13, dadurch gekennzeichnet, daß sie in Braggreflexion betrieben wird.
- Zonenplatte (4,12,14,15,16) nach einem der Ansprüche 11-14, dadurch gekennzeichnet, daß ihre Beugungsstrukturen (6,7) auf einem Draht oder einer polierten Kugel aufgebracht sind.
- Zonenplatte (4,12,14,15,16) nach einem der Ansprüche 11-15, dadurch gekennzeichnet, daß sie in einem Röntgenmikroskop verwendet wird.
- Zonenplatte (4,12,14,15,16) nach Anspruch 16, dadurch gekennzeichnet, daß ihre Beugungsstrukturen (6,7) parallel oder geneigt zur optischen Achse (3) des Röntgenmikroskops ausgerichtet sind.
- Zonenplatte (4,12,14,15,16) nach Anspruch 16, dadurch gekennzeichnet, daß ihre Beugungsstrukturen (6,7) im Bereich nahe der optischen Achse (3) des Röntgenmikroskops parallel zu dieser ausgerichtet sind und zum Rand der Platte (4,12,14,15,16) hin zunehmend geneigt gegen die optische Achse (3) sind.
- Zonenplatte (4,12,14,15,16) nach einem der Ansprüche 16-18, dadurch gekennzeichnet, daß sie für einen Kondensor-Monochromator ringförmig ausgebildet und in ihrem Fokus (13) eine Monochromatorlochblende (11) angeordnet ist.
- Zonenplatte (4,12,14,15,16) nach einem der Ansprüche 16-18, dadurch gekennzeichnet, daß sie für einen Kondensor-Monochromator ringförmig ausgebildet und einem Fokussator (21) mit Ringfokus im Strahlengang nachgeordnet ist, wobei im Fokus (13) der Zonenplatte (16) eine Monochromatorlochblende (11) angeordnet ist.
- Zonenplatte (4,12,14,15,16) nach einem der Ansprüche 16-18, dadurch gekennzeichnet, daß sie als Mikroobjektiv (12) in dem Röntgenmikroskop verwendet wird.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19600895 | 1996-01-12 | ||
DE19600895 | 1996-01-12 | ||
PCT/DE1997/000045 WO1997025723A2 (de) | 1996-01-12 | 1997-01-13 | Röntgenmikroskop mit zonenplatten |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0873566A2 EP0873566A2 (de) | 1998-10-28 |
EP0873566B1 true EP0873566B1 (de) | 2001-03-14 |
Family
ID=7782588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97919244A Expired - Lifetime EP0873566B1 (de) | 1996-01-12 | 1997-01-13 | Röntgenmikroskop mit zonenplatten |
Country Status (4)
Country | Link |
---|---|
US (1) | US6167112A (de) |
EP (1) | EP0873566B1 (de) |
DE (2) | DE59703140D1 (de) |
WO (1) | WO1997025723A2 (de) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3741411B2 (ja) * | 1999-10-01 | 2006-02-01 | 株式会社リガク | X線集光装置及びx線装置 |
US20050041779A1 (en) * | 1999-11-24 | 2005-02-24 | Btg International Limited | X-ray zoom lens |
US6762880B2 (en) * | 2001-02-21 | 2004-07-13 | Ibsen Photonics A/S | Grating structures and methods of making the grating structures |
US7365909B2 (en) * | 2002-10-17 | 2008-04-29 | Xradia, Inc. | Fabrication methods for micro compounds optics |
US7072442B1 (en) * | 2002-11-20 | 2006-07-04 | Kla-Tencor Technologies Corporation | X-ray metrology using a transmissive x-ray optical element |
US7119953B2 (en) * | 2002-12-27 | 2006-10-10 | Xradia, Inc. | Phase contrast microscope for short wavelength radiation and imaging method |
US7170969B1 (en) * | 2003-11-07 | 2007-01-30 | Xradia, Inc. | X-ray microscope capillary condenser system |
WO2005094318A2 (en) * | 2004-03-29 | 2005-10-13 | Jmar Research, Inc. | Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma |
US7302043B2 (en) * | 2004-07-27 | 2007-11-27 | Gatan, Inc. | Rotating shutter for laser-produced plasma debris mitigation |
US7452820B2 (en) * | 2004-08-05 | 2008-11-18 | Gatan, Inc. | Radiation-resistant zone plates and method of manufacturing thereof |
US7466796B2 (en) * | 2004-08-05 | 2008-12-16 | Gatan, Inc. | Condenser zone plate illumination for point X-ray sources |
US20080240347A1 (en) * | 2005-07-22 | 2008-10-02 | Jmar Research, Inc. | Method, apparatus, and system for extending depth of field (dof) in a short-wavelength microscope using wavefront encoding |
US7331714B2 (en) * | 2005-09-29 | 2008-02-19 | Uchicago Argonne, Llc | Optomechanical structure for a multifunctional hard x-ray nanoprobe instrument |
US7492989B2 (en) | 2006-05-23 | 2009-02-17 | Massachusetts Institute Of Technology | Hybrid transmission-reflection grating |
US8040601B1 (en) * | 2007-06-22 | 2011-10-18 | Allview Research Llc | Projection screen using a bragg selective holographic element |
US8541758B1 (en) * | 2011-06-17 | 2013-09-24 | Aqua Treatment Services, Inc. | Ultraviolet reactor |
US8481966B1 (en) * | 2012-02-28 | 2013-07-09 | Tiza Lab, L.L.C. | Microplasma ion source for focused ion beam applications |
US8674321B2 (en) * | 2012-02-28 | 2014-03-18 | Tiza Lab, L.L.C. | Microplasma ion source for focused ion beam applications |
US9887459B2 (en) * | 2013-09-27 | 2018-02-06 | Raytheon Bbn Technologies Corp. | Reconfigurable aperture for microwave transmission and detection |
US20160086681A1 (en) * | 2014-09-24 | 2016-03-24 | Carl Zeiss X-ray Microscopy, Inc. | Zone Plate and Method for Fabricating Same Using Conformal Coating |
CN108646330B (zh) * | 2018-04-25 | 2020-12-25 | 深圳大学 | 一种全透波带片 |
JP2022069273A (ja) * | 2020-10-23 | 2022-05-11 | 株式会社リガク | 結像型x線顕微鏡 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD129370A1 (de) * | 1976-06-25 | 1978-01-11 | Lutz Wolf | Anordnung zur pruefung und messung von zu einer ebene symmetrisch gekruemmten flaechen |
US4831261A (en) * | 1986-06-20 | 1989-05-16 | Digital Scintigraphics, Inc. | Compound collimator and tomography camera using same |
US5199057A (en) * | 1989-08-09 | 1993-03-30 | Nikon Corporation | Image formation-type soft X-ray microscopic apparatus |
DE4027285A1 (de) * | 1990-08-29 | 1992-03-05 | Zeiss Carl Fa | Roentgenmikroskop |
-
1997
- 1997-01-13 DE DE59703140T patent/DE59703140D1/de not_active Expired - Fee Related
- 1997-01-13 DE DE19700880A patent/DE19700880A1/de not_active Withdrawn
- 1997-01-13 EP EP97919244A patent/EP0873566B1/de not_active Expired - Lifetime
- 1997-01-13 WO PCT/DE1997/000045 patent/WO1997025723A2/de active IP Right Grant
- 1997-01-13 US US09/101,552 patent/US6167112A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6167112A (en) | 2000-12-26 |
DE59703140D1 (de) | 2001-04-19 |
WO1997025723A2 (de) | 1997-07-17 |
DE19700880A1 (de) | 1997-07-17 |
EP0873566A2 (de) | 1998-10-28 |
WO1997025723A3 (de) | 1997-10-02 |
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