EP0828195A3 - Méthode d'amélioration de la qualité de l'image - Google Patents
Méthode d'amélioration de la qualité de l'image Download PDFInfo
- Publication number
- EP0828195A3 EP0828195A3 EP97810623A EP97810623A EP0828195A3 EP 0828195 A3 EP0828195 A3 EP 0828195A3 EP 97810623 A EP97810623 A EP 97810623A EP 97810623 A EP97810623 A EP 97810623A EP 0828195 A3 EP0828195 A3 EP 0828195A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- improving
- quality
- photoimage
- photocurable resin
- photoimages
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000003112 inhibitor Substances 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70702096A | 1996-09-10 | 1996-09-10 | |
US707020 | 1996-09-10 | ||
US08/820,322 US5912106A (en) | 1996-09-10 | 1997-03-12 | Method for improving photoimage quality |
US820322 | 1997-03-12 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0828195A2 EP0828195A2 (fr) | 1998-03-11 |
EP0828195A3 true EP0828195A3 (fr) | 1998-08-19 |
EP0828195B1 EP0828195B1 (fr) | 2003-02-19 |
Family
ID=27107809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97810623A Expired - Lifetime EP0828195B1 (fr) | 1996-09-10 | 1997-09-02 | Méthode d'amélioration de la qualité de l'image |
Country Status (9)
Country | Link |
---|---|
US (1) | US5912106A (fr) |
EP (1) | EP0828195B1 (fr) |
JP (1) | JPH1097059A (fr) |
KR (1) | KR100536922B1 (fr) |
CN (1) | CN1176405A (fr) |
BR (1) | BR9704669A (fr) |
CA (1) | CA2214913A1 (fr) |
DE (1) | DE69719131T2 (fr) |
TW (1) | TW401534B (fr) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5267047A (en) * | 1991-04-30 | 1993-11-30 | International Business Machines Corporation | Apparatus and method of operation for a facsimilie subsystem in an image archiving system |
GB2344103B (en) * | 1998-11-24 | 2003-04-16 | Ciba Sc Holding Ag | Piperazinone derivatives |
US6296984B1 (en) | 1999-03-12 | 2001-10-02 | Agere Systems Guardian Corp. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
US20030073762A1 (en) * | 1999-12-09 | 2003-04-17 | Tunja Jung | Additive compostion for increasing the storage stability of ethylenically unsaturated resins |
US20050192384A1 (en) * | 1999-12-09 | 2005-09-01 | Tunja Jung | Additive composition for increasing the storage stability of ethylenically unsaturated resins |
US20110071232A1 (en) * | 1999-12-09 | 2011-03-24 | Tunja Jung | Additive composition for increasing the storage stability of ethylenically unsaturated resins |
WO2002033026A1 (fr) | 2000-10-16 | 2002-04-25 | Uniroyal Chemical Company, Inc. | Melanges de composes alkide quinone et nitroxyle utilises en tant qu'inhibiteurs de polymerisation |
US6685823B2 (en) * | 2000-10-16 | 2004-02-03 | Uniroyal Chemical Company, Inc. | C-nitrosoaniline compounds and their blends as polymerization inhibitors |
US6863406B2 (en) * | 2002-08-01 | 2005-03-08 | The University Of Chicago | Apparatus and method for fabricating, sorting, and integrating materials with holographic optical traps |
DE10255667B4 (de) * | 2002-11-28 | 2006-05-11 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit |
US6881533B2 (en) | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
US20050056954A1 (en) * | 2003-09-12 | 2005-03-17 | Devlin Brian Gerrard | Method for making contact lenses |
KR101065394B1 (ko) * | 2004-01-09 | 2011-09-16 | 삼성에스디아이 주식회사 | 평판 표시소자의 전자방출원 형성용 조성물 및 그로부터제조되는 전자방출원 |
US6962763B2 (en) * | 2004-02-25 | 2005-11-08 | Eastman Kodak Company | Silver-free black-and-white thermographic materials |
JP2006011397A (ja) * | 2004-05-21 | 2006-01-12 | Nippon Kayaku Co Ltd | ネガ型着色感光性組成物 |
US8132507B2 (en) * | 2004-10-08 | 2012-03-13 | Flint Group Incorporated | Energy-curable news ink containing soy oil |
US7723398B2 (en) * | 2005-04-21 | 2010-05-25 | Ciba Specialty Chemicals Corporation | In-can stabilizer blend |
JP2007079153A (ja) * | 2005-09-14 | 2007-03-29 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
JP2007079152A (ja) * | 2005-09-14 | 2007-03-29 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
US7700264B2 (en) | 2005-10-31 | 2010-04-20 | Nippon Paint Co., Ltd. | Photosensitive resin composition, image forming material and image forming method using thereof |
EP1783548B1 (fr) * | 2005-11-08 | 2017-03-08 | Rohm and Haas Electronic Materials LLC | Procédé de formation d'une couche à motifs sur un substrat |
US20070160935A1 (en) * | 2006-01-12 | 2007-07-12 | Keiichi Okajima | Lithographic printing plate material for CTP |
JP2007225675A (ja) * | 2006-02-21 | 2007-09-06 | Nippon Paint Co Ltd | Ctp用平版印刷版材、その製法およびそれから得られる平版印刷版 |
US7968001B2 (en) | 2007-12-19 | 2011-06-28 | Air Products And Chemicals, Inc. | Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor |
US8440099B2 (en) * | 2007-12-19 | 2013-05-14 | Air Products And Chemicals, Inc. | Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor |
JP2010181843A (ja) * | 2009-02-09 | 2010-08-19 | Seiko Epson Corp | 印刷版の製造方法および印刷版製造用光硬化性液体 |
CN101833241B (zh) * | 2009-03-09 | 2012-07-04 | 村上精密制版(昆山)有限公司 | 一种感光性树脂组合物 |
WO2014024804A1 (fr) * | 2012-08-06 | 2014-02-13 | 日立化成株式会社 | Composition de résine photosensible pour résine de masque permanent, élément photosensible, procédé de fabrication d'un motif de résine, et procédé de production d'une carte de circuit imprimé |
EP2899034B1 (fr) * | 2012-09-20 | 2019-07-03 | FUJIFILM Corporation | Plaque d'impression planographique originale et procédé de fabrication de plaque |
JP2017191892A (ja) * | 2016-04-14 | 2017-10-19 | イビデン株式会社 | プリント配線基板及びその製造方法 |
EP3922462B1 (fr) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Précurseur de plaque d'impression photopolymère lithographique ayant une meilleure stabilité à la lumière du jour |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2198736A (en) * | 1986-12-19 | 1988-06-22 | Wolfen Filmfab Veb | Photopolymerisable material |
EP0384366A2 (fr) * | 1989-02-24 | 1990-08-29 | BASF Aktiengesellschaft | Elément d'enregistrement photosensible |
US5268257A (en) * | 1990-08-01 | 1993-12-07 | W. R. Grace & Co.-Conn. | Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom |
EP0599075A1 (fr) * | 1992-10-29 | 1994-06-01 | Ajinomoto Co., Inc. | Composition résineuse photosensible ou composition résineuse durcissable à la chaleur, photosensible et composition photosensible pour masque de soudure préparée à partir de ces compositions |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4180403A (en) * | 1973-01-18 | 1979-12-25 | E. I. Du Pont De Nemours And Company | Photohardenable films having high resolution containing nitroso dimers |
AU507014B2 (en) * | 1975-11-05 | 1980-01-31 | Hercules Inc. | Photopolymer compositions |
US4216019A (en) * | 1977-07-21 | 1980-08-05 | Kenneth James Reed | Photographically produced stencils |
CA1100148A (fr) * | 1978-01-04 | 1981-04-28 | Rudolph L. Pohl | Composes photopolymeriques pour cliches d'impression |
US4264705A (en) * | 1979-12-26 | 1981-04-28 | Uniroyal, Inc. | Multilayered elastomeric printing plate |
US4431723A (en) * | 1981-09-21 | 1984-02-14 | E. I. Du Pont De Nemours And Company | Aqueous processible, alcohol resistant flexographic printing plates |
US4427759A (en) * | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
US4517279A (en) * | 1982-08-31 | 1985-05-14 | Uniroyal, Inc. | Photosensitive elastomeric polymer composition for flexographic printing plates - processable in semi-aqueous basic solution or solvent systems |
US4666821A (en) * | 1984-02-23 | 1987-05-19 | W. R. Grace & Co. | Photopolymer for use as a solder mask |
ZA851456B (en) * | 1984-03-06 | 1985-10-30 | Uniroyal Inc | Tapered di-block copolymer photopolymerizable composition |
JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
JPH0666030B2 (ja) * | 1984-07-04 | 1994-08-24 | 工業技術院長 | スクリ−ン製版用感光性樹脂組成物 |
US4540649A (en) * | 1984-09-12 | 1985-09-10 | Napp Systems (Usa) Inc. | Water developable photopolymerizable composition and printing plate element containing same |
GB8525027D0 (en) * | 1985-10-10 | 1985-11-13 | Autotype Int Ltd | Water soluble photoinitiators |
PT85756A (pt) * | 1986-09-22 | 1988-10-14 | Napp Systems Inc | Processo para a preparacao de chapas fotossensiveis e revelaveis com agua |
EP0295944A3 (fr) * | 1987-06-18 | 1989-09-06 | Napp Systems (Usa) Inc. | Composition résineuse photosensible et plaque d'impression préparée avec cette composition |
JP2653458B2 (ja) * | 1988-03-26 | 1997-09-17 | 旭化成工業株式会社 | 凸版印刷版用感光性樹脂組成物 |
DE59108989D1 (de) * | 1990-12-18 | 1998-06-25 | Ciba Geigy Ag | Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel |
WO1995012148A1 (fr) * | 1993-10-26 | 1995-05-04 | The Chromaline Corporation | Composition pour pochoir de serigraphie presentant une resistance a l'eau amelioree |
-
1997
- 1997-03-12 US US08/820,322 patent/US5912106A/en not_active Expired - Fee Related
- 1997-09-02 DE DE69719131T patent/DE69719131T2/de not_active Expired - Fee Related
- 1997-09-02 EP EP97810623A patent/EP0828195B1/fr not_active Expired - Lifetime
- 1997-09-08 CA CA002214913A patent/CA2214913A1/fr not_active Abandoned
- 1997-09-08 TW TW086112970A patent/TW401534B/zh not_active IP Right Cessation
- 1997-09-09 CN CN97118239A patent/CN1176405A/zh active Pending
- 1997-09-09 BR BR9704669A patent/BR9704669A/pt not_active Application Discontinuation
- 1997-09-10 JP JP9262848A patent/JPH1097059A/ja not_active Withdrawn
- 1997-09-10 KR KR1019970046487A patent/KR100536922B1/ko not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2198736A (en) * | 1986-12-19 | 1988-06-22 | Wolfen Filmfab Veb | Photopolymerisable material |
EP0384366A2 (fr) * | 1989-02-24 | 1990-08-29 | BASF Aktiengesellschaft | Elément d'enregistrement photosensible |
US5268257A (en) * | 1990-08-01 | 1993-12-07 | W. R. Grace & Co.-Conn. | Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom |
EP0599075A1 (fr) * | 1992-10-29 | 1994-06-01 | Ajinomoto Co., Inc. | Composition résineuse photosensible ou composition résineuse durcissable à la chaleur, photosensible et composition photosensible pour masque de soudure préparée à partir de ces compositions |
Also Published As
Publication number | Publication date |
---|---|
KR19980024485A (ko) | 1998-07-06 |
MX9706886A (es) | 1998-03-31 |
DE69719131T2 (de) | 2003-07-31 |
BR9704669A (pt) | 1999-07-27 |
JPH1097059A (ja) | 1998-04-14 |
KR100536922B1 (ko) | 2006-04-14 |
EP0828195B1 (fr) | 2003-02-19 |
DE69719131D1 (de) | 2003-03-27 |
US5912106A (en) | 1999-06-15 |
EP0828195A2 (fr) | 1998-03-11 |
TW401534B (en) | 2000-08-11 |
CN1176405A (zh) | 1998-03-18 |
CA2214913A1 (fr) | 1998-03-10 |
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