EP0702775A4 - Thermische behandlungsvorrichtung für dünne film-halbleiterblättchen - Google Patents
Thermische behandlungsvorrichtung für dünne film-halbleiterblättchenInfo
- Publication number
- EP0702775A4 EP0702775A4 EP95911781A EP95911781A EP0702775A4 EP 0702775 A4 EP0702775 A4 EP 0702775A4 EP 95911781 A EP95911781 A EP 95911781A EP 95911781 A EP95911781 A EP 95911781A EP 0702775 A4 EP0702775 A4 EP 0702775A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- thin film
- thermal treatment
- film wafer
- wafer
- thermal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/14—Substrate holders or susceptors
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/005—Transport systems
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Furnace Charging Or Discharging (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR9402820 | 1994-02-17 | ||
KR1019940002820A KR950025850A (ko) | 1994-02-17 | 1994-02-17 | 박막의 열처리 장치 |
PCT/US1995/002008 WO1995023427A2 (en) | 1994-02-17 | 1995-02-15 | Apparatus for thermal treatment of thin film wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0702775A1 EP0702775A1 (de) | 1996-03-27 |
EP0702775A4 true EP0702775A4 (de) | 1996-07-31 |
Family
ID=19377325
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP95911781A Withdrawn EP0702775A4 (de) | 1994-02-17 | 1995-02-15 | Thermische behandlungsvorrichtung für dünne film-halbleiterblättchen |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0702775A4 (de) |
KR (1) | KR950025850A (de) |
WO (1) | WO1995023427A2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5791895A (en) * | 1994-02-17 | 1998-08-11 | Novellus Systems, Inc. | Apparatus for thermal treatment of thin film wafer |
JP5080043B2 (ja) | 2006-08-31 | 2012-11-21 | 新電元工業株式会社 | 半導体装置の製造方法、半導体装置の製造用治具、および半導体装置の製造装置 |
CN110993550B (zh) * | 2019-12-25 | 2022-12-09 | 北京北方华创微电子装备有限公司 | 半导体热处理设备 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0350752A2 (de) * | 1988-07-15 | 1990-01-17 | Balzers Aktiengesellschaft | Haltevorrichtung für eine Scheibe sowie Anwendung derselben |
EP0452779A2 (de) * | 1990-04-20 | 1991-10-23 | Applied Materials, Inc. | Klemmechanismus für physikalische Dampfniederschlagvorrichtung |
WO1994024840A2 (en) * | 1993-04-26 | 1994-11-10 | Varian Associates, Inc. | Thin film heat treatment apparatus |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60169148A (ja) * | 1984-02-13 | 1985-09-02 | Dainippon Screen Mfg Co Ltd | 基板の搬送方法及びその装置 |
US5228501A (en) * | 1986-12-19 | 1993-07-20 | Applied Materials, Inc. | Physical vapor deposition clamping mechanism and heater/cooler |
EP0423327B1 (de) * | 1989-05-08 | 1994-03-30 | Koninklijke Philips Electronics N.V. | Vorrichtung und verfahren zur behandlung eines flachen, scheibenförmigen substrates unter niedrigem druck |
US5222310A (en) * | 1990-05-18 | 1993-06-29 | Semitool, Inc. | Single wafer processor with a frame |
JPH0651777U (ja) * | 1991-12-26 | 1994-07-15 | 日空工業株式会社 | 真空乾燥装置 |
-
1994
- 1994-02-17 KR KR1019940002820A patent/KR950025850A/ko active IP Right Grant
-
1995
- 1995-02-15 WO PCT/US1995/002008 patent/WO1995023427A2/en not_active Application Discontinuation
- 1995-02-15 EP EP95911781A patent/EP0702775A4/de not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0350752A2 (de) * | 1988-07-15 | 1990-01-17 | Balzers Aktiengesellschaft | Haltevorrichtung für eine Scheibe sowie Anwendung derselben |
EP0452779A2 (de) * | 1990-04-20 | 1991-10-23 | Applied Materials, Inc. | Klemmechanismus für physikalische Dampfniederschlagvorrichtung |
WO1994024840A2 (en) * | 1993-04-26 | 1994-11-10 | Varian Associates, Inc. | Thin film heat treatment apparatus |
Non-Patent Citations (1)
Title |
---|
See also references of WO9523427A3 * |
Also Published As
Publication number | Publication date |
---|---|
EP0702775A1 (de) | 1996-03-27 |
KR950025850A (ko) | 1995-09-18 |
WO1995023427A2 (en) | 1995-08-31 |
WO1995023427A3 (en) | 1995-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19951228 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): CH DE GB LI NL |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 19960611 |
|
AK | Designated contracting states |
Kind code of ref document: A4 Designated state(s): CH DE GB LI NL |
|
17Q | First examination report despatched |
Effective date: 19970205 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19990901 |