EP0620582A1 - Source de ions à métal liquide pour la production des rayons de ions de cobalt - Google Patents

Source de ions à métal liquide pour la production des rayons de ions de cobalt Download PDF

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Publication number
EP0620582A1
EP0620582A1 EP94105227A EP94105227A EP0620582A1 EP 0620582 A1 EP0620582 A1 EP 0620582A1 EP 94105227 A EP94105227 A EP 94105227A EP 94105227 A EP94105227 A EP 94105227A EP 0620582 A1 EP0620582 A1 EP 0620582A1
Authority
EP
European Patent Office
Prior art keywords
cobalt
liquid metal
source material
alloy
metal ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP94105227A
Other languages
German (de)
English (en)
Other versions
EP0620582B1 (fr
Inventor
Jochen Dr. Teichert
Evelyn Hesse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Dresden Rossendorf eV
Original Assignee
Forschungszentrum Dresden Rossendorf eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungszentrum Dresden Rossendorf eV filed Critical Forschungszentrum Dresden Rossendorf eV
Publication of EP0620582A1 publication Critical patent/EP0620582A1/fr
Application granted granted Critical
Publication of EP0620582B1 publication Critical patent/EP0620582B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/22—Metal ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0805—Liquid metal sources

Definitions

  • the invention relates to a liquid metal ion source for generating cobalt ion beams, in particular the source material of such an ion source wetting the emitter.
  • Liquid metal ion sources are special ion sources which have a very high directional beam value compared to other types of ion sources and which are used in ion micro-beam systems on account of this property. These systems make it possible to focus ion beams to a diameter of less than one micrometer, and they are becoming increasingly important for ion beam exposure, ion beam milling, microdoping and surface analysis in the submicron range.
  • Liquid metal ion sources are in / PD Prewett and GLR Mair, Focused Ion Beams from Liquid Metal Ion Sources, Research Studies Press Ltd. 1991 / described in detail.
  • a fine tip made of tungsten, tantalum, carbon or other suitable material serves as an emitter, which is wetted with the source material.
  • the source material In order to be able to wet the emitter and during the operation of the ion source, the source material must be liquid. An electrical resistance heater or an electron beam heater is used for this. An electrical voltage is applied between a counter electrode and the emitter tip. The high electric field strength at the emitter tip means that an even finer tip is formed from the liquid source material and ions are emitted from it.
  • the source material must be have special physical and chemical properties. Of particular importance is that the source material behaves metallic, has a low melting point, its vapor pressure is high, the emitter is well wetted and it is chemically compatible with the emitter material. Therefore, only a few elements, such as indium, gallium and gold, are suitable as source material.
  • An effective method to overcome this difficulty and to generate ions of other elements is to use suitable alloys as the source material. An ion current then arises from all elements contained in the alloy. The desired ion type can be separated by means of a subsequent mass separation.
  • the object of the invention is to create a liquid metal ion source which, by being equipped with a new cobalt source material, in particular an alloy with a sufficiently high proportion of the element cobalt, ensures overall long-term stable operation with a sufficiently high emission of the element cobalt.
  • the object is achieved with liquid metal ion sources whose emitter is wetted with the alloys defined in the claims as source material.
  • liquid metal ion sources equipped in this way it is possible to obtain a stable ion current over the long term, which consists sufficiently of cobalt ions.
  • the components of the alloy in combination with the low melting point mean that no chemical reactions occur with the emitter and heater material.
  • the use of rare earth elements in the alloy is advantageous because the alloy has a low vapor pressure in the temperature range of the melting point. This means that only a small proportion of the source material is evaporated. Both of these facts guarantee a long service life of the liquid metal ion source.
  • Another advantage of the solution according to the invention is the favorable physical properties of the alloy in the liquid phase.
  • the alloy wets the emitter needle lightly and completely, there is a sufficient inflow of source material from the reservoir to the emitter tip, and a drop of the alloy, which can serve as a reservoir, adheres well and stably to the heater and emitter.
  • the alloy of cobalt and the respectively selected rare earth element to be used as the source material is produced by electron beam melting of the metallic cobalt and the elementary rare earth metal in the specified ratios.
  • the emitter is then wetted with the source material in a vacuum, for example by melting the source material in a directly heated tantalum crucible by immersing the held, preheated emitter in the melt.
  • a vacuum for example by melting the source material in a directly heated tantalum crucible by immersing the held, preheated emitter in the melt.
  • an alloy of 36 atomic percent cobalt and 64 atomic percent neodymium is used, which has a melting point of 566 ° C.
  • the melting point for elemental cobalt is 1495 ° C.
  • the proportion of 36 atomic percent cobalt in the alloy corresponds to the eutectic point.
  • a reduction or increase in the cobalt content therefore leads to an increase in the melting temperature, which is disadvantageous for the operation of the liquid metal ion source.
  • the source is operated at a temperature of about 600 ° C, the emission of a stable ion beam in the current range from 2 to 20 ⁇ A can be achieved with a current stability of 1 to 5%.
  • the alloy of 31 atomic percent cobalt and 69 atomic percent lanthanum listed as a second example has a melting point of 500 ° C.
  • the exemplary alloy of 34 atomic percent cobalt and 66 atomic percent praseodymium has a melting point of 541 ° C.
  • the comments on the alloy Co36Ne64 also apply fully to these examples.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
EP94105227A 1993-04-13 1994-04-02 Source de ions à métal liquide pour la production des rayons de ions de cobalt Expired - Lifetime EP0620582B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4312028 1993-04-13
DE4312028A DE4312028A1 (de) 1993-04-13 1993-04-13 Flüssigmetall-Ionenquelle zur Erzeugung von Kobalt-Ionenstrahlen

Publications (2)

Publication Number Publication Date
EP0620582A1 true EP0620582A1 (fr) 1994-10-19
EP0620582B1 EP0620582B1 (fr) 1996-08-28

Family

ID=6485363

Family Applications (1)

Application Number Title Priority Date Filing Date
EP94105227A Expired - Lifetime EP0620582B1 (fr) 1993-04-13 1994-04-02 Source de ions à métal liquide pour la production des rayons de ions de cobalt

Country Status (2)

Country Link
EP (1) EP0620582B1 (fr)
DE (2) DE4312028A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1622182A1 (fr) * 2004-07-28 2006-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emetteur pour source de ions et procédé pour sa production

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006059274A1 (de) * 2006-12-13 2008-06-26 Stein, Ralf Verfahren zur Herstellung eines Bauteils für das Werk einer mechanischen Uhr
DE102007027097B4 (de) 2007-06-12 2010-12-30 Forschungszentrum Dresden - Rossendorf E.V. Flüssigmetall-Ionenquelle zur Erzeugung von Lithium-Ionenstrahlen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3443405A1 (de) * 1983-11-28 1985-06-05 Hitachi, Ltd., Tokio/Tokyo Fluessigmetall-ionenquelle
WO1987003739A1 (fr) * 1985-12-13 1987-06-18 Hitachi, Ltd. Source d'ions en metal liquide

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3443405A1 (de) * 1983-11-28 1985-06-05 Hitachi, Ltd., Tokio/Tokyo Fluessigmetall-ionenquelle
WO1987003739A1 (fr) * 1985-12-13 1987-06-18 Hitachi, Ltd. Source d'ions en metal liquide

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1622182A1 (fr) * 2004-07-28 2006-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emetteur pour source de ions et procédé pour sa production
US7335896B2 (en) 2004-07-28 2008-02-26 Ict, Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Emitter for an ion source

Also Published As

Publication number Publication date
DE4312028A1 (de) 1994-10-20
EP0620582B1 (fr) 1996-08-28
DE59400534D1 (de) 1996-10-02

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