EP0570033B1 - Process for electroplating tin or tin alloy on a metal workpiece - Google Patents

Process for electroplating tin or tin alloy on a metal workpiece Download PDF

Info

Publication number
EP0570033B1
EP0570033B1 EP93200646A EP93200646A EP0570033B1 EP 0570033 B1 EP0570033 B1 EP 0570033B1 EP 93200646 A EP93200646 A EP 93200646A EP 93200646 A EP93200646 A EP 93200646A EP 0570033 B1 EP0570033 B1 EP 0570033B1
Authority
EP
European Patent Office
Prior art keywords
process according
tin
metal
electrolysis bath
maintained
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP93200646A
Other languages
German (de)
French (fr)
Other versions
EP0570033A1 (en
Inventor
Bruno Cauwe
Bernard Colinet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal Liege Upstream SA
Original Assignee
Cockerill Sambre SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Sambre SA filed Critical Cockerill Sambre SA
Publication of EP0570033A1 publication Critical patent/EP0570033A1/en
Application granted granted Critical
Publication of EP0570033B1 publication Critical patent/EP0570033B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/60Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin

Definitions

  • the present invention relates to a method of electroplating at high current densities as defined in the preamble of claim 1.
  • the aforementioned support is formed from a steel strip
  • the latter acts as a cathode which is displaced opposite an insoluble anode at a distance of between 0.75 and 1.5 cm while circulating the electrolyte between this cathode and the anode in the form of a substantially turbulent flow.
  • the electrolysis bath is regenerated by bringing it into contact with granules of the metal to be deposited, so as to thus constantly maintain a bath sufficiently rich in metal ions to deposit on the aforementioned support.
  • the method according to the invention consists in carrying out an electrolytic deposition of tin and / or tin alloys, preferably Sn-Pb, Sn-Co or Sn-Ni alloys on a support.
  • tin and / or tin alloys preferably Sn-Pb, Sn-Co or Sn-Ni alloys
  • metallic and in particular on one or two sides of a steel strip which moves in an electrolysis bath, in which the metal halide is formed by bromide, opposite an insoluble anode and which preferably makes cathode office while the electrolyte is circulated between this cathode and the anode at a sufficiently high speed to obtain a substantially turbulent flow.
  • This speed is generally between 1 and 9 m / s and preferably between 3 and 6 m / s, an ideal speed being of the order of 5 m / s.
  • the high current density implies relatively high concentrations of metal cations.
  • an electrolytic bath the metal ion content of which is maintained between 60 and 150 g / l, preferably around 115 to 125 g / l for tinning, and around 135 to 145 g / l for depositing tin alloys.
  • the content of the other metal or metals of this alloy is generally maintained between 10 and 80 g / l.
  • the lead content of the electrolysis bath is advantageously maintained between 20 and 30 g / l, and is preferably of the order of 25 g / l.
  • the cobalt content of the electrolysis bath is advantageously between 45 and 55 g / l and is preferably of the order of 50 g / l.
  • the ratio R 1 Sn 4+ / (Sn 4+ + Sn 2+ ) in the electrolysis bath is advantageously maintained between 0.1 and 0.95.
  • the pH of the electrolysis bath to avoid hydrolysis of the metal ions, the pH is advantageously maintained between -0.2 and 0.3 and is preferably of the order of 0.
  • the temperature of the electrolysis bath is advantageously maintained between 30 and 50 ° C. and is preferably of the order of 40 ° C.
  • bromide is preferably used which makes it possible to avoid the release of harmful gases into the atmosphere.
  • reaction 1 For a halide mixture of molarity advantageously between 3M and 5M and for a current density between 50 and 400 A / dm 2 , the yield of reaction 1 is 100%.
  • the concentration of halide Y - in the bath is preferably of the order of 4M.
  • the ratio R2 Br / (Br + I + Cl) is between 0 and 1.
  • This ratio is preferably of the order of 1 if it is desired to avoid any risk of release of chlorine and precipitation of stannous iodide.
  • the anodic potential of this electrode should preferably be maintained between 1.5 and 2.5 volts relative to the normal hydrogen electrode (ENH) and is preferably of the order of 2 volts.
  • the invention also relates to a particular process for regenerating a tin plating bath and tin alloys, in particular Sn-Pb, Sn-Co and Sn-Ni alloys, rich in stannic ions by the bringing the electrolysis bath in which this electrodeposition takes place into contact with tin, lead, cobalt and nickel granules of moderate specific surfaces.
  • the regeneration reaction is carried out in a regeneration reactor known per se according to the following reaction scheme: Sn4 + + Sn ⁇ 2 Sn2 +
  • the tinning bath is therefore a mixture of Sn4 + and Sn2 + ions, i.e. a mixture of the regeneration reagent Sn4 + and the regeneration product Sn2 +.
  • the main reactions in the tinning cell are: at the anode 2 Sn2 + ⁇ 2 Sn4 + + 4th- at the cathode Z 1 (Sn4 + + 4th ⁇ Sn) Z 2 (2 Sn2 + + 4th ⁇ 2 Sn) Z 1 represents the fraction of the cathodic current used to reduce stannic tin to metallic tin and Z 2 the fraction of cathodic current used to reduce stannous tin to stannic tin.
  • reaction 6 + reaction 7 or reaction 6 + reaction 7 + reaction 8 The overall cathodic reaction (reaction 6 + reaction 7 or reaction 6 + reaction 7 + reaction 8) added to the anodic reaction (reaction 5) perfectly balances the regeneration reaction (reaction 4a or reaction 4a + reaction 4b), which allows the system consisting of the tinning cell and the regeneration reactor to operate without the addition of external reagents other than tin, nickel, cobalt and lead, all in metallic form.
  • the concentration in the electrolyte of metal ions Sn4 + + Sn2 + + X2 + is maintained between 60 and 150 g / l and is preferably of the order of 120 g / l for tinning and 140 g / l for depositing alloys.
  • the electrolyte was prepared by the action of hydrobromic acid at 47% P.A. and hydrogen peroxide at 30% P.A. on granules of pure metallic tin.
  • the Br2 electrogeneration yield at 300 A / dm 2 and 40 ° C was 100% on the Ti / RuO 2 anode.
  • the conductivity of the electrolytic bath was of the order of 0.4 S / cm and the voltage U A / C across the terminals of the cell was of the order of 10 volts.
  • the specific energy consumption was around 9 KWhr / kg.
  • the regeneration rate was of the order of 27.5 A / dm 2 at 40 ° C and 55 A / dm 2 at 60 ° C (respectively 600 and 1200 mg / cm 2 .hr.).
  • the volume of the regeneration reactor was 200 l at 40 ° C and 110 l at 60 ° C for an hourly consumption of tin of the order from 220 kg.
  • the electrolytes were prepared by dissolving metal halides to be deposited in an Sn4 + / Sn2 + electrolyte prepared as in Example 1.
  • the regeneration reaction was carried out by the action of the electrolyte thus prepared on granules of tin, lead, nickel and cobalt.
  • bromide Br-, chloride Cl- and iodide I-ions allow the easy solubilization in acid medium of the cations Sn2 +, Sn4 +, Co2 +, Ni2 + and Pb2 +.
  • amphoterization reaction between stannic tin and metallic tin in the form of granules makes it possible to regenerate the bath at moderate temperature and specific surface of liquid / solid contact.
  • this regeneration scheme makes it possible to couple the electrodeposition unit with a regeneration unit of moderate size.
  • insoluble anodes Ti / RuO 2 or Ti / IrO 2 minimizes the release of oxygen.
  • the process according to the invention relates, on the one hand, to a process for the electrodeposition of tin or a tin alloy on a metal support with high current density by making use of an anode insoluble in an electrolysis bath containing as metal salt essentially bromide of the metal to be deposited and preferably only bromide, and, on the other hand, a process for the regeneration of an electrolysis bath containing a metal halide or metals to be deposited, these halides can be chlorides, bromides, and iodides.
  • bromide-based electrolyte does not necessarily have to be combined with a regeneration step, although the combination of an electroplating with such a step constitutes a preferred embodiment of the invention.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

Process for electroplating, with high current densities of between 100 and 400 A/dm<2>, preferably between 200 and 300 A/dm<2>, in an electrolysis bath, of tin and/or tin alloys especially of Sn-Pb, Sn-Co and Sn-Ni alloys, on a metal substrate such as a steel strip, according to which an electrolysis bath is employed containing at least one halide, such as chloride, bromide or iodide, of the metal to be deposited on the metal substrate, and stannous and stannic ions, employing an electrolysis bath in which the content of metal ions is maintained between 60 and 150 g/l and is preferably of the order of 115 to 125 g/l in the case of tin plating and of the order of 135 to 145 g/l for the deposition of tin alloys, and in that the electrolyte is circulated at a velocity, relative to the metal substrate, of between 2 and 9 m/s and preferably between 3 and 6 m/s.

Description

La présente invention est relative à un procédé d'électrodéposition à de hautes densités de courant tel que défini dans le préambule de la revendication 1.The present invention relates to a method of electroplating at high current densities as defined in the preamble of claim 1.

Le document EP-A-0357839 décrit un tel procédé d'étamage dans un bain d'électrolyse à base de chlorure stannique et de chlorure stanneux. Ce procédé présente l'inconvénient de dégager des gaz nocifs dans l'atmosphère.Document EP-A-0357839 describes such a tinning process in an electrolysis bath based on stannic chloride and stannous chloride. This process has the drawback of releasing harmful gases into the atmosphere.

Dans l'extrait de "Chemical Abstracts" Vol. 88, n° 2, du 9 janvier 1972, Columbus Ohio U.S. Abstract n° 13625z, SHINDO, "rapid dissolution of tin in a tin electroplating bath" p. 423 et JP, A, 7789536 (Nippon Steel) 27/7/1977, il est fait mention d'un tel procédé, ne pouvant toutefois être appliqué qu'à base de densité de courant.In the extract from "Chemical Abstracts" Vol. 88, No. 2, January 9, 1972, Columbus Ohio U.S. Abstract No. 13625z, SHINDO, "rapid dissolution of tin in a tin electroplating bath" p. 423 and JP, A, 7789536 (Nippon Steel) 27/7/1977, mention is made of such a process, which can however only be applied on the basis of current density.

Le procédé suivant l'invention est caractérisé par le fait que l'on utilise un bain d'électrolyse contenant un bromure du métal dans un rapport R 2 = Br B r + I + Cl

Figure imgb0001
compris entre 0 et 1.The process according to the invention is characterized in that an electrolysis bath is used containing a metal bromide in a ratio R 2 = Br B r + I + Cl
Figure imgb0001
between 0 and 1.

Plus particulièrement, dans le cas où le support précité est formé d'une bande d'acier, cette dernière fait office de cathode que l'on déplace en regard d'une anode insoluble à une distance comprise entre 0,75 et 1,5 cm pendant que l'on fait circuler l'électrolyte entre cette cathode et l'anode sous forme d'un écoulement sensiblement turbulent.More particularly, in the case where the aforementioned support is formed from a steel strip, the latter acts as a cathode which is displaced opposite an insoluble anode at a distance of between 0.75 and 1.5 cm while circulating the electrolyte between this cathode and the anode in the form of a substantially turbulent flow.

Suivant une forme de réalisation préférentielle de l'invention, l'on régénère le bain d'électrolyse par la mise en contact de ce dernier avec des granules du métal à déposer, de manière à maintenir ainsi constamment un bain suffisamment riche en ions métalliques à déposer sur le support précité.According to a preferred embodiment of the invention, the electrolysis bath is regenerated by bringing it into contact with granules of the metal to be deposited, so as to thus constantly maintain a bath sufficiently rich in metal ions to deposit on the aforementioned support.

D'autres détails et particularités de l'invention ressortiront de la description donnée ci-après à titre d'exemple non limitatif de quelques formes de réalisation particulières de l'invention.Other details and particularities of the invention will emerge from the description given below by way of nonlimiting example of some particular embodiments of the invention.

D'une façon générale, le procédé suivant l'invention consiste à effectuer un dépôt électrolytique d'étain et/ou d'alliages d'étain, de préférence d'alliages Sn-Pb, Sn-Co ou Sn-Ni sur un support métallique et notamment sur une ou deux faces d'une bande d'acier qui se déplace dans un bain d'électrolyse, dans lequel l'halogénure du métal est formé par du bromure, en regard d'une anode insoluble et qui fait de préférence office de cathode pendant que l'on fait circuler l'électrolyte entre cette cathode et l'anode à une vitesse suffisamment importante pour obtenir un écoulement sensiblement turbulent.In general, the method according to the invention consists in carrying out an electrolytic deposition of tin and / or tin alloys, preferably Sn-Pb, Sn-Co or Sn-Ni alloys on a support. metallic and in particular on one or two sides of a steel strip which moves in an electrolysis bath, in which the metal halide is formed by bromide, opposite an insoluble anode and which preferably makes cathode office while the electrolyte is circulated between this cathode and the anode at a sufficiently high speed to obtain a substantially turbulent flow.

Cette vitesse est généralement comprise entre 1 et 9 m/s et de préférence entre 3 et 6 m/s, une vitesse idéale étant de l'ordre de 5 m/s.This speed is generally between 1 and 9 m / s and preferably between 3 and 6 m / s, an ideal speed being of the order of 5 m / s.

Il s'agit de plus d'une électrolyse à haute densité de courant, cette densité étant avantageusement comprise entre 100 et 400 A/dm2 et de préférence entre 200 et 300 A/dm2.It is also a high current density electrolysis, this density advantageously being between 100 and 400 A / dm 2 and preferably between 200 and 300 A / dm 2 .

De plus, une préférence est donnée à l'utilisation d'une cellule d'électrolyse dans laquelle la répartition du courant cathodique sur la partie de la bande d'acier se déplaçant dans la zone d'électrolyse a lieu d'une manière aussi uniforme que possible afin de créer ainsi une densité de courant limite de diffusion élevée et sensiblement égale à chaque endroit de cette partie de la bande.In addition, preference is given to the use of an electrolysis cell in which the distribution of cathodic current over the part of the steel strip moving in the electrolysis zone takes place in such a uniform manner as possible in order to thus creating a high diffusion limit current density which is substantially equal at each location in this part of the strip.

Par ailleurs, une préférence est également donnée à un bain d'électrolyse dans lequel l'halogénure du métal est formé par du bromure.Furthermore, preference is also given to an electrolysis bath in which the metal halide is formed by bromide.

La haute densité de courant implique des concentrations relativement élevées en cations métalliques. Ainsi, des résultats satisfaisants ont été obtenus en utilisant, suivant l'invention, un bain électrolytique dont la teneur en ions métalliques est maintenue entre 60 et 150 g/l, de préférence de l'ordre de 115 à 125 g/l pour l'étamage, et de l'ordre de 135 à 145 g/l pour le dépôt d'alliages d'étain.The high current density implies relatively high concentrations of metal cations. Thus, satisfactory results have been obtained by using, according to the invention, an electrolytic bath, the metal ion content of which is maintained between 60 and 150 g / l, preferably around 115 to 125 g / l for tinning, and around 135 to 145 g / l for depositing tin alloys.

Dans le cas du dépôt d'alliage d'étain, on maintient généralement la teneur du ou des autres métaux de cet alliage entre 10 et 80 g/l.In the case of the deposit of tin alloy, the content of the other metal or metals of this alloy is generally maintained between 10 and 80 g / l.

Particulièrement pour un alliage Sn-Pb, la teneur en plomb du bain d'électrolyse est avantageusement maintenue entre 20 et 30 g/l, et est de préférence de l'ordre de 25 g/l.Particularly for an Sn-Pb alloy, the lead content of the electrolysis bath is advantageously maintained between 20 and 30 g / l, and is preferably of the order of 25 g / l.

Pour un alliage Sn-Co la teneur en cobalt du bain d'électrolyse est avantageusement comprise entre 45 et 55 g/l et est de préférence de l'ordre de 50 g/l.For an Sn-Co alloy, the cobalt content of the electrolysis bath is advantageously between 45 and 55 g / l and is preferably of the order of 50 g / l.

Il a, en effet, été constaté que si la teneur totale en ions métalliques est inférieure à 60 g/l, le rendement cathodique risque de diminuer trop fortement et les dépôts obtenus pourraient être pulvérulents aux densités de courant élevées.It has, in fact, been observed that if the total content of metal ions is less than 60 g / l, the cathodic yield risks decreasing too strongly and the deposits obtained could be pulverulent at high current densities.

Si, au contraire, on maintient une concentration en ions métalliques supérieure à 150 g/l les pertes dues à l'entraînement de l'électrolyte par la bande d'acier à couvrir risquent d'être trop importantes.If, on the contrary, a metal ion concentration greater than 150 g / l is maintained, the losses due to the entrainment of the electrolyte by the steel strip to be covered may be too great.

Il a été constaté que d'excellents résultats sont obtenus, notamment en ce qui concerne les rendements cathodiques et la structure des dépôts à des densités de courant de 100 à 400 A/dm2 et plus particulièrement entre 200 et 300 A/dm2, si on combine soit des hautes teneurs en cations métalliques dissouts dans le bain et les faibles vitesses de circulation de l'électrolyte, soit les faibles teneurs en cations métalliques dissouts dans le bain et les hautes vitesses de circulation de l'électrolyte. Il faut donc combiner, entre les limites données ci-dessus, les valeurs supérieures des teneurs en cations métalliques avec les valeurs inférieures des vitesses relatives de circulation de l'électrolyte, et inversement.It has been found that excellent results are obtained, in particular as regards the cathodic yields and the structure of the deposits at current densities of 100 to 400 A / dm 2 and more particularly between 200 and 300 A / dm 2 , if one combines either high contents of dissolved metal cations in the bath and low speeds of circulation of the electrolyte, or low contents of dissolved metal cations in the bath and high speeds of circulation of the electrolyte. It is therefore necessary to combine, between the limits given above, the upper values of the contents of metal cations with the lower values of the relative speeds of circulation of the electrolyte, and vice versa.

Ces diverses combinaisons possibles sont définies par la valeur du produit C.v,0,8 , avec C la concentration en ions métalliques dissouts dans le bain (en g/L) et v la vitesse relative entre l'électrolyte et le support métallique (en m/s). Pour des densités de courant comprises entre 200 et 300 A/dm2, la valeur de ce produit est, de préférence, égal à 350.These various possible combinations are defined by the value of the product Cv, 0.8 , with C the concentration of dissolved metal ions in the bath (in g / L) and v the relative speed between the electrolyte and the metal support (in m / s). For current densities between 200 and 300 A / dm 2 , the value of this product is preferably equal to 350.

Le rapport R1 = Sn4+/(Sn4+ + Sn2+) dans le bain d'électrolyse est avantageusement maintenu entre 0,1 et 0,95. La valeur exacte de ce rapport est choisie suivant la nature du critère que l'on veut optimaliser. Ainsi la consommation spécifique d'énergie est minimale pour R = 0,1.The ratio R 1 = Sn 4+ / (Sn 4+ + Sn 2+ ) in the electrolysis bath is advantageously maintained between 0.1 and 0.95. The exact value of this ratio is chosen according to the nature of the criterion that we want to optimize. Thus the specific energy consumption is minimal for R = 0.1.

En ce qui concerne le pH du bain d'électrolyse, pour éviter l'hydrolyse des ions métalliques, le pH est avantageusement maintenu entre -0,2 et 0,3 et est de préférence de l'ordre de 0.With regard to the pH of the electrolysis bath, to avoid hydrolysis of the metal ions, the pH is advantageously maintained between -0.2 and 0.3 and is preferably of the order of 0.

A des valeurs de pH trop proches de - 0,2 les risques de voir les rendements cathodiques de déposition chuter ne sont pas négligeables. Par contre, à des valeurs de pH trop proches de 0,3 et pour des teneurs en étain approchant les 120 g/l, les risques de précipitation ne sont pas négligeables.At pH values too close to -0.2 the risks of seeing the cathodic deposition yields drop are not negligible. On the other hand, at pH values too close to 0.3 and for tin contents approaching 120 g / l, the risks of precipitation are not negligible.

La température du bain d'électrolyse est avantageusement maintenue entre 30 et 50°C et est de préférence de l'ordre de 40°C.The temperature of the electrolysis bath is advantageously maintained between 30 and 50 ° C. and is preferably of the order of 40 ° C.

A des températures supérieures à 50°C, l'activité de l'étain stannique sur l'étain métallique électrodéposé est telle que les rendements d'électrodéposition diminuent. Cet effet peut être compensé à condition de placer des protections cathodiques, connues en soi, à la sortie de la cellule.At temperatures above 50 ° C, the activity of stannic tin on electrodeposited metallic tin is such that the electrodeposition yields decrease. This effect can be compensated for provided that cathodic protections, known per se, are placed at the exit of the cell.

A des températures inférieures à 30°C, la conductivité de l'électrolyte pourrait devenir trop faible, ce qui augmenterait la tension entre l'anode et la cathode et donc la consommation spécifique d'énergie.At temperatures below 30 ° C, the conductivity of the electrolyte could become too low, which would increase the voltage between the anode and the cathode and therefore the specific energy consumption.

Le contre-ion accompagnant les cations dans le bain d'électrolyse doit répondre à deux critères indépendants, à savoir :

  • les sels métalliques doivent être fortement solubles
  • la réaction d'oxydation de l'étain stanneux à l'anode de la cellule d'étamage se produit avec un mauvais rendement (de l'ordre de 5 %). Pour pallier cet inconvénient, le contre-ion choisi dit pouvoir s'oxyder aisément à l'anode et son produit d'oxydation doit pouvoir oxyder très rapidement l'étain stanneux en étain stannique.
The counterion accompanying the cations in the electrolysis bath must meet two independent criteria, namely:
  • metal salts must be highly soluble
  • the oxidation reaction of stannous tin at the anode of the tinning cell occurs with poor efficiency (of the order of 5%). To overcome this drawback, the chosen counterion is said to be able to oxidize easily at the anode and its oxidation product must be able to oxidize stannous tin to stannic tin very quickly.

Les ions bromure, chlorure et iodure répondent à ce double critère.The bromide, chloride and iodide ions meet this double criterion.

Le schéma réactionnel devient :

Figure imgb0002
avec Y = Br et/ou Cl et/ou I.The reaction scheme becomes:
Figure imgb0002
with Y = Br and / or Cl and / or I.

Comme déjà signalé ci-dessus, suivant l'invention, on utilise de préférence le bromure qui permet d'éviter le dégagement de gaz nocifs dans l'atmosphère.As already indicated above, according to the invention, bromide is preferably used which makes it possible to avoid the release of harmful gases into the atmosphere.

Pour un mélange d'halogénure de molarité avantageusement comprise entre 3M et 5M et pour une densité de courant comprise entre 50 et 400 A/dm2, le rendement de la réaction 1 est de 100 %.For a halide mixture of molarity advantageously between 3M and 5M and for a current density between 50 and 400 A / dm 2 , the yield of reaction 1 is 100%.

La concentration en halogénure Y- dans le bain est de préférence de l'ordre de 4M.The concentration of halide Y - in the bath is preferably of the order of 4M.

Le rapport R2 = Br/(Br + I + Cl) est compris entre 0 et 1.The ratio R2 = Br / (Br + I + Cl) is between 0 and 1.

Ce rapport est de préférence de l'ordre de 1 si l'on désire éviter tout risque de dégagement de chlore et de précipitation d'iodure stanneux.This ratio is preferably of the order of 1 if it is desired to avoid any risk of release of chlorine and precipitation of stannous iodide.

Il est de préférence de l'ordre de 0 si l'on désire éviter tout risque de corrosion et de destruction des anodes qui sont de préférence réalisées en Ti/RuO2 ou Ti/IrO2.It is preferably of the order of 0 if it is desired to avoid any risk of corrosion and destruction of the anodes which are preferably made of Ti / RuO2 or Ti / IrO 2 .

Le fait d'utiliser une telle anode permet de générer le brome Br2 à haute densité de courant avec des rendements de l'ordre de 100 %.The fact of using such an anode makes it possible to generate the bromine Br2 at high current density with yields of the order of 100%.

Le potentiel anodique de cette électrode, lors de sa polarisation dans la cellule d'étamage, doit de préférence être maintenu entre 1,5 et 2,5 volts rapporté à l'électrode normale à hydrogène (ENH) et est de préférence de l'ordre de 2 volts.The anodic potential of this electrode, during its polarization in the tinning cell, should preferably be maintained between 1.5 and 2.5 volts relative to the normal hydrogen electrode (ENH) and is preferably of the order of 2 volts.

Il a été constaté que si le potentiel anodique est inférieur à 1,5 volts rapporté à l'électrode normale à hydrogène susdite on n'atteint généralement pas les densités de courant importantes qui sont requises pour le procédé d'étamage suivant l'invention à haute densité de courant.It has been observed that if the anode potential is less than 1.5 volts relative to the above-mentioned normal hydrogen electrode, the large current densities which are generally not attained. required for the tinning process according to the invention at high current density.

Si le potentiel anodique est supérieur à 2 volts rapporté à cette électrode normale à hydrogène, le titane de l'anode risque de se corroder au bout de quelques minutes dans le cas où Y- = Br-.If the anode potential is greater than 2 volts compared to this normal hydrogen electrode, the titanium of the anode may corrode after a few minutes in the case where Y - = Br - .

L'invention concerne également un procédé particulier de régénération d'un bain d'électrodéposition d'étain et d'alliages d'étain, notamment d'alliages Sn-Pb, Sn-Co et Sn-Ni, riches en ions stanniques par la mise en contact du bain d'électrolyse dans lequel a lieu cette électrodéposition, avec des granules d'étain, de plomb, de cobalt et de nickel de surfaces spécifiques modérées.The invention also relates to a particular process for regenerating a tin plating bath and tin alloys, in particular Sn-Pb, Sn-Co and Sn-Ni alloys, rich in stannic ions by the bringing the electrolysis bath in which this electrodeposition takes place into contact with tin, lead, cobalt and nickel granules of moderate specific surfaces.

A cet égard il a été constaté que des résultats économiquement et industriellement valables ont été obtenus avec des granules ayant une surface spécifique comprise entre 5 et 0,25 m2/kg de métal. Les ions stanniques consommés lors de la dissolution des granules précitées sont régénérés en continu à l'anode de la cellule d'électrodéposition et permettent ainsi de maintenir la concentration de ces ions dans le bain d'électrolyse, lors de l'électrodéposition, sensiblement au niveau tel que défini ci-dessus.In this regard, it has been found that economically and industrially valid results have been obtained with granules having a specific surface of between 5 and 0.25 m 2 / kg of metal. The stannic ions consumed during the dissolution of the above granules are continuously regenerated at the anode of the electrodeposition cell and thus make it possible to maintain the concentration of these ions in the electrolysis bath, during electrodeposition, substantially at level as defined above.

La réaction de régénération s'effectue dans un réacteur de régénération connu en soi selon le schéma réactionnel suivant : Sn4+ + Sn → 2 Sn2+

Figure imgb0003
The regeneration reaction is carried out in a regeneration reactor known per se according to the following reaction scheme: Sn4 + + Sn → 2 Sn2 +
Figure imgb0003

Le bain d'étamage est, par conséquent, un mélange d'ions Sn4+ et Sn2+, c'est-à-dire un mélange du réactif de régénération Sn4+ et du produit de la régénération Sn2+.The tinning bath is therefore a mixture of Sn4 + and Sn2 + ions, i.e. a mixture of the regeneration reagent Sn4 + and the regeneration product Sn2 +.

Dans le cas du dépôt d'alliage, des granules de Pb et/ou Ni et/ou Co sont ajoutés dans le réacteur de régénération.In the case of alloy deposition, granules of Pb and / or Ni and / or Co are added to the regeneration reactor.

La dissolution de ces éléments s'effectue suivant le schéma réactionnel : Sn4+ + X→Sn2+ + X2+

Figure imgb0004
avec X = Co, Ni, Pb.The dissolution of these elements is carried out according to the reaction scheme: Sn4 + + X → Sn2 + + X2 +
Figure imgb0004
with X = Co, Ni, Pb.

Les réactions principales dans la cellule d'étamage sont : à l'anode 2 Sn2+ →2 Sn4+ + 4e-

Figure imgb0005
à la cathode Z 1 (Sn4+ + 4e → Sn)
Figure imgb0006
Z 2 (2 Sn2+ + 4e → 2 Sn)
Figure imgb0007
Z1 représente la fraction du courant cathodique servant à réduire l'étain stannique en étain métallique et Z2 la fraction de courant cathodique servant à réduire l'étain stanneux en étain stannique.The main reactions in the tinning cell are: at the anode 2 Sn2 + → 2 Sn4 + + 4th-
Figure imgb0005
at the cathode Z 1 (Sn4 + + 4th → Sn)
Figure imgb0006
Z 2 (2 Sn2 + + 4th → 2 Sn)
Figure imgb0007
Z 1 represents the fraction of the cathodic current used to reduce stannic tin to metallic tin and Z 2 the fraction of cathodic current used to reduce stannous tin to stannic tin.

Dans le cas du dépôt d'alliage, les réactions cathodiques sont : Z 1 (Sn4+ + 4e → Sn)

Figure imgb0008
Z 2 (2 Sn2+ + 4e → 2 Sn)
Figure imgb0009
Z 3 (2 x2+ + 4e →2 X)
Figure imgb0010
avec Z1 + Z2 + Z3 = 1.In the case of alloy deposition, the cathodic reactions are: Z 1 (Sn4 + + 4th → Sn)
Figure imgb0008
Z 2 (2 Sn2 + + 4th → 2 Sn)
Figure imgb0009
Z 3 (2 x2 + + 4th → 2 X)
Figure imgb0010
with Z 1 + Z 2 + Z 3 = 1.

La réaction cathodique globale (réaction 6 + réaction 7 ou réaction 6 + réaction 7 + réaction 8) ajoutée à la réaction anodique (réaction 5) équilibre parfaitement la réaction de régénération (réaction 4a ou réaction 4a + réaction 4b), ce qui permet au système constitué de la cellule d'étamage et du réacteur de régénération de fonctionner sans apport de réactifs extérieurs autres que l'étain, le nickel, le cobalt et le plomb, tous sous forme métallique.The overall cathodic reaction (reaction 6 + reaction 7 or reaction 6 + reaction 7 + reaction 8) added to the anodic reaction (reaction 5) perfectly balances the regeneration reaction (reaction 4a or reaction 4a + reaction 4b), which allows the system consisting of the tinning cell and the regeneration reactor to operate without the addition of external reagents other than tin, nickel, cobalt and lead, all in metallic form.

Comme déjà signalé ci-dessus la concentration dans l'électrolyte en ions métalliques Sn4+ + Sn2+ + X2+ est maintenue entre 60 et 150 g/l et est de préférence de l'ordre de 120 g/l pour l'étamage et de 140 g/l pour le dépôt d'alliages.As already indicated above, the concentration in the electrolyte of metal ions Sn4 + + Sn2 + + X2 + is maintained between 60 and 150 g / l and is preferably of the order of 120 g / l for tinning and 140 g / l for depositing alloys.

Pour ce qui concerne le rapport R1 = Sn4+/(Sn4+ + Sn2+), la vitesse de régénération est maximale pour R1 = 0,95.Regarding the ratio R 1 = Sn4 + / (Sn4 + + Sn2 +), the regeneration speed is maximum for R 1 = 0.95.

Plus particulièrement, dans le cadre d'une optimalisation de la vitesse de régénération de l'étain, il a été constaté que la valeur idéale de R est de l'ordre de 0,92.More particularly, in the context of optimizing the regeneration speed of the tin, it has been found that the ideal value of R is of the order of 0.92.

Par ailleurs, il a également été constaté que si la température du bain d'électrolyse se situe en-dessous de 30°C la vitesse de régénération devient en général faible.Furthermore, it has also been found that if the temperature of the electrolysis bath is below 30 ° C. the speed of regeneration generally becomes low.

Ci-après sont maintenant donnés des exemples de réalisations concrètes du procédé suivant l'invention.Below are now given examples of concrete embodiments of the method according to the invention.

Exemple 1Example 1

Il s'agit d'un exemple d'étamage dans lequel le bain d'électrolyse était constitué d'une solution de 0,9 M en bromure stannique et 0,1 M en bromure stanneux.This is an example of tinning in which the electrolysis bath consisted of a solution of 0.9 M in stannic bromide and 0.1 M in stannous bromide.

L'électrolyte a été préparé par l'action d'acide bromhydrique à 47 % P.A. et d'eau oxygénée à 30 % P.A. sur des granules d'étain métallique pur.The electrolyte was prepared by the action of hydrobromic acid at 47% P.A. and hydrogen peroxide at 30% P.A. on granules of pure metallic tin.

Lors de l'étamage, le rendement d'électrogénération de Br2 à 300 A/dm2 et 40°C était de 100 % sur l'anode Ti/RuO2.During tinning, the Br2 electrogeneration yield at 300 A / dm 2 and 40 ° C was 100% on the Ti / RuO 2 anode.

La conductivité du bain électrolytique était de l'ordre de 0,4 S/cm et la tension U A/C aux bornes de la cellule était de l'ordre de 10 volts.The conductivity of the electrolytic bath was of the order of 0.4 S / cm and the voltage U A / C across the terminals of the cell was of the order of 10 volts.

La consommation spécifique d'énergie était de l'ordre de 9 KWhr/kg.The specific energy consumption was around 9 KWhr / kg.

La vitesse de régénération était de l'ordre de 27,5 A/dm2 à 40°C et 55 A/dm2 à 60°C (respectivement 600 et 1200 mg/cm2.hr.).The regeneration rate was of the order of 27.5 A / dm 2 at 40 ° C and 55 A / dm 2 at 60 ° C (respectively 600 and 1200 mg / cm 2 .hr.).

Pour des granules sphériques d'étain métallique d'un diamètre d = 25 mm, le volume du réacteur de régénération était de 200 l à 40°C et de 110 l à 60°C pour une consommation horaire d'étain de l'ordre de 220 kg.For spherical metallic tin granules with a diameter d = 25 mm, the volume of the regeneration reactor was 200 l at 40 ° C and 110 l at 60 ° C for an hourly consumption of tin of the order from 220 kg.

Exemple 2Example 2

Dans cet exemple, les électrolytes ont été préparés par dissolution d'halogénures des métaux à déposer dans un électrolyte Sn4+/Sn2+ préparé comme dans l'exemple 1.In this example, the electrolytes were prepared by dissolving metal halides to be deposited in an Sn4 + / Sn2 + electrolyte prepared as in Example 1.

La réaction de régénération s'est effectuée par action de l'électrolyte ainsi préparé sur des granules d'étain, de plomb, de nickel et de cobalt.The regeneration reaction was carried out by the action of the electrolyte thus prepared on granules of tin, lead, nickel and cobalt.

Enfin, ci-après est donné un tableau dans lequel sont groupés les conditions idéales de déposition et de régénération suivant l'invention. Tableau Paramètre Domaine "Idéal" étamage "Idéal" alliage Sn/Pb "Idéal" alliage Sn/Ni "Idéal" alliage Sn/Co Vitesse d'écoulement par rapport à la bande (m/s) 1 - 9 5 5 5 5 Température (°C) 30 - 50 40 40 40 40 Sn4+ (g/L) 10 - 140 110 60 40 60 Sn2+ (g/L) 10 - 140 10 55 50 55 X2+ (g/L) [*] 0 - 80 0 25 50 25 Sn2+ + Sn4+ + X2+ (g/L) [*] 60 - 150 120 140 140 140 Sn4+/(Sn4+ + Sn2+) 0,1-0,95 0,92 0,52 0,44 0,52 pH -0,2 - 0,3 0 0 0 0 Halogénure Y- (mole/L) [**] 3 - 5 4 4 4 4 Br/(Br + Cl + I) 0 - 1 1 1 1 1 Densité de courant (A/dm2) 50 - 400 200 - 300 200 - 300 200 - 300 200 - 300 Sn déposé (%) 40 - 100 100 60 65 70 Vitesse de régénération à 40°C (mg/hr.cm2) 100 - 1200 600 120 740 800 [*] X = Pb, Ni, Co [**] Y = Br, Cl, I. Finally, below is given a table in which are grouped the ideal conditions of deposition and regeneration according to the invention. Board Setting Field "Ideal" tinning "Ideal" Sn / Pb alloy "Ideal" Sn / Ni alloy "Ideal" Sn / Co alloy Flow velocity relative to the web (m / s) 1 - 9 5 5 5 5 Temperature (° C) 30 - 50 40 40 40 40 Sn4 + (g / L) 10 - 140 110 60 40 60 Sn2 + (g / L) 10 - 140 10 55 50 55 X2 + (g / L) [*] 0 - 80 0 25 50 25 Sn2 + + Sn4 + + X2 + (g / L) [*] 60 - 150 120 140 140 140 Sn4 + / (Sn4 + + Sn2 +) 0.1-0.95 0.92 0.52 0.44 0.52 pH -0.2 - 0.3 0 0 0 0 Halide Y- (mole / L) [**] 3 - 5 4 4 4 4 Br / (Br + Cl + I) 0 - 1 1 1 1 1 Current density (A / dm 2 ) 50 - 400 200 - 300 200 - 300 200 - 300 200 - 300 Sn deposited (%) 40 - 100 100 60 65 70 Regeneration rate at 40 ° C (mg / hr.cm 2 ) 100 - 1200 600 120 740 800 [*] X = Pb, Ni, Co [**] Y = Br, Cl, I.

De ce qui précède, il résulte que le procédé suivant l'invention permet d'utiliser un bain électrolytique acide très riche en ions stanneux et stanniques exempt de tout inhibiteur organique.From the above, it follows that the process according to the invention makes it possible to use an acid electrolytic bath very rich in stannous and stannic ions free of any organic inhibitor.

Dans le cas du dépôt d'alliages d'étain, une fraction de l'étain total est remplacée dans le bain d'électrolyse par des ions Co2+ et/ou Ni2+ et/ou Pb2+.In the case of the deposit of tin alloys, a fraction of the total tin is replaced in the electrolysis bath by Co2 + and / or Ni2 + and / or Pb2 + ions.

Les ions bromure Br-, chlorure Cl- et iodure I-permettent la solubilisation aisée en milieu acide des cations Sn2+, Sn4+, Co2+, Ni2+ et Pb2+.The bromide Br-, chloride Cl- and iodide I-ions allow the easy solubilization in acid medium of the cations Sn2 +, Sn4 +, Co2 +, Ni2 + and Pb2 +.

L'utilisation des ions Br-, Cl- et I- dans le cadre du procédé suivant l'invention en anode insoluble rend aisée la régénération du bain d'électrolyse.The use of the Br-, Cl- and I- ions in the context of the process according to the invention as an insoluble anode makes regeneration of the electrolysis bath easy.

La réaction d'amphotérisation entre l'étain stannique et l'étain métallique sous forme de granules rend possible la régénération du bain à température et surface spécifique de contact liquide/solide modérée.The amphoterization reaction between stannic tin and metallic tin in the form of granules makes it possible to regenerate the bath at moderate temperature and specific surface of liquid / solid contact.

La réaction d'oxydation du cobalt, du plomb et du nickel par l'étain stannique permet de recharger le bain en ions Co2+, Pb2+ et Ni2+ avec les mêmes avantages.The oxidation reaction of cobalt, lead and nickel with stannic tin allows the bath to be recharged with Co2 +, Pb2 + and Ni2 + ions with the same advantages.

Avantageusement, ce schéma de régénération permet de coupler l'unité d'électrodéposition avec une unité de régénération de taille modérée.Advantageously, this regeneration scheme makes it possible to couple the electrodeposition unit with a regeneration unit of moderate size.

Par ailleurs, l'utilisation d'anodes insolubles Ti/RuO2 ou Ti/IrO2 minimise le dégagement d'oxygène.Moreover, the use of insoluble anodes Ti / RuO 2 or Ti / IrO 2 minimizes the release of oxygen.

Il est bien entendu que l'invention n'est pas limitée aux formes de réalisation particulières, décrites ci-dessus, du procédé suivant l'invention (plus particulièrement les exemples donnés ci-dessus) mais que d'autres variantes peuvent être envisagées sans sortir du cadre de la présente invention.It is understood that the invention is not limited to the particular embodiments, described above, of the method according to the invention (more particularly the examples given above) but that other variants can be envisaged without depart from the scope of the present invention.

C'est ainsi que le procédé suivant l'invention concerne, d'une part, un procédé d'électrodéposition d'étain ou d'un alliage d'étain sur un support métallique à haute densité de courant en faisant usage d'une anode insoluble dans un bain d'électrolyse contenant comme sel métallique essentiellement du bromure du métal à déposer et de préférence uniquement du bromure, et, d'autre part, un procédé de la régénération d'un bain d'électrolyse contenant un halogénure du métal ou des métaux à déposer, ces halogénures pouvent être des chlorures, bromures, et iodures.Thus, the process according to the invention relates, on the one hand, to a process for the electrodeposition of tin or a tin alloy on a metal support with high current density by making use of an anode insoluble in an electrolysis bath containing as metal salt essentially bromide of the metal to be deposited and preferably only bromide, and, on the other hand, a process for the regeneration of an electrolysis bath containing a metal halide or metals to be deposited, these halides can be chlorides, bromides, and iodides.

Dans certains cas, ces deux procédés peuvent être combinés ou utilisés séparément. Ainsi, l'utilisation de l'électrolyte à base de bromure ne doit pas nécessairement être combinée avec une étape de régénération, quoique la combinaison d'une électrodéposition avec une telle étape constitue une forme de réalisation préférentielle de l'invention.In some cases, these two methods can be combined or used separately. Thus, the use of the bromide-based electrolyte does not necessarily have to be combined with a regeneration step, although the combination of an electroplating with such a step constitutes a preferred embodiment of the invention.

Claims (14)

  1. Process for electroplating tin and/or tin alloys, in particular Sn-Pb, Sn-Co, Sn-Ni alloys, on a metal substrate, such as a steel strip, at high current densities of between 100 and 400 A/dm2, preferably between 200 and 300 A/dm2, in an electrolysis bath, according to which an electrolysis bath containing at least one halide of the metal to be deposited on the metal substrate, stannous ions and stannic ions is used, the metal-ion content of which bath is maintained between 60 and 150 g/l and is preferably about 115 to 125 g/l for tin plating and about 135 to 145 g/l for depositing tin alloys, this electrolyte being made to flow at a speed relative to the metal substrate of between 2 and 9 m/s and preferably between 3 and 6 m/s, characterized in that an electrolysis bath containing a bromide of the metal in a ratio R 2 = BR Br + I + Cl
    Figure imgb0014
    of between 0 and 1 is used.
  2. Process according to Claim 1, characterized in that, if the aforementioned substrate is formed by a steel strip, the latter acts as the cathode which is moved past an insoluble anode lying at a distance of between 0.75 cm and 1.5 cm away and in that the electrolyte is made to flow between the cathode and the anode in the form of a substantially turbulent flow.
  3. Process according to Claim 1 or 2, characterized in that, in the case of tin-alloy deposition, the content of the other metal or metals of this alloy is maintained between 10 and 80 g/l.
  4. Process according to Claim 3, characterized in that, in respect of an Sn-Pb alloy, the lead content of the electrolysis bath is maintained between 20 and 30 g/l and is preferably about 25 g/l.
  5. Process according to Claim 3, characterized in that, in respect of an Sn-Co alloy, the cobalt content of the electrolysis bath is between 45 and 55 g/l, and is preferably about 50 g/l.
  6. Process according to any one of Claims 1 to 5, characterized in that the ratio R 1 = Sn4 + Sn 4+ + Sn 2+
    Figure imgb0015
    is maintained between 0.1 and 0.95.
  7. Process according to any one of Claims 1 to 6, characterized in that the pH of the electrolyte is maintained between -0.2 and 0.3, and is preferably about 0.
  8. Process according to any one of Claims 1 to 7, characterized in that the temperature of the electrolyte is maintained between 30 and 50°C.
  9. Process according to any one of Claims 1 to 8, characterized in that a halide mixture having a molarity of between 3 M and 5 M is used.
  10. Process according to Claim 9, characterized in that a ratio R 2 = BR Br + I + Cl
    Figure imgb0016
    of between 0 and 1 is maintained in the electrolysis bath.
  11. Process according to any one of Claims 1 to 10, characterized in that an insoluble anode preferably of the Ti/RuO2 or Ti/IrO2 type is used.
  12. Process according to any one of Claims 1 to 11, characterized in that the potential of the anode immersed in the electrolysis bath is maintained between 1.5 and 2.5 volts relative to the standard hydrogen electrode (SHE), and preferably about 2 volts.
  13. Process according to any one of Claims 1 to 12, characterized in that the electrolysis bath is regenerated by bringing the latter into contact with metallic granules of the metal to be deposited.
  14. Process according to Claim 13, characterized in that granules with a moderate specific surface area preferably of between 0.25 and 5 m2/kg are used.
EP93200646A 1992-04-15 1993-03-08 Process for electroplating tin or tin alloy on a metal workpiece Expired - Lifetime EP0570033B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE9200346 1992-04-15
BE9200346A BE1005730A4 (en) 1992-04-15 1992-04-15 Tin electroplating process and / or alloys tin on a metal support.

Publications (2)

Publication Number Publication Date
EP0570033A1 EP0570033A1 (en) 1993-11-18
EP0570033B1 true EP0570033B1 (en) 1997-11-05

Family

ID=3886229

Family Applications (1)

Application Number Title Priority Date Filing Date
EP93200646A Expired - Lifetime EP0570033B1 (en) 1992-04-15 1993-03-08 Process for electroplating tin or tin alloy on a metal workpiece

Country Status (4)

Country Link
EP (1) EP0570033B1 (en)
AT (1) ATE159991T1 (en)
BE (1) BE1005730A4 (en)
DE (1) DE69314990T2 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2171842A (en) * 1936-07-13 1939-09-05 Du Pont Electroplating
JPS5289536A (en) * 1976-01-23 1977-07-27 Nippon Steel Corp Method of melting at high speed tin to be poured in tin plating bath
ZA842098B (en) * 1983-04-15 1984-10-31 Bethlehem Steel Corp Method for electrotinning a ferrous substrate
ATE90116T1 (en) * 1988-09-05 1993-06-15 Cockerill Sambre Sa METHOD OF ELECTRIC PLATING ZON TIN.

Also Published As

Publication number Publication date
DE69314990D1 (en) 1997-12-11
EP0570033A1 (en) 1993-11-18
ATE159991T1 (en) 1997-11-15
BE1005730A4 (en) 1993-12-28
DE69314990T2 (en) 1998-12-10

Similar Documents

Publication Publication Date Title
KR100803931B1 (en) Conductive diamond electrode and process for producing the same
EP0178958B1 (en) Process for electrolytic oxidation, and electrolytic apparatus therefor
SU1416060A3 (en) Method of producing metals
WO2010010252A2 (en) Method for obtaining formic acid by co&lt;sb&gt;2&lt;/sb&gt; electro-reduction in an aprotic medium
CA1247047A (en) Electrolytic production of hydrogen on a cathode
CN101103141A (en) Process for electrolytic production of aluminum
US5411645A (en) Hydrogen assisted reduced oxide soldering system
EP0570033B1 (en) Process for electroplating tin or tin alloy on a metal workpiece
US4285784A (en) Process of electroplating a platinum-rhodium alloy coating
CA1229573A (en) Process for manufacturing an electrochemical process electrode; cathode for the production of electrolytic hydrogen
Burke et al. Auto-inhibition of hydrogen gas evolution on gold in aqueous acid solution
EP0357839B1 (en) Process for electroplating tin
CA2030978A1 (en) Preparation of alkali metal chlorate or perchlorate
FI79863C (en) FOERFARANDE FOER AVLAEGSNANDE AV HALOGEN UR KLOR- OCH BROMAETTIKSYROR.
US4142947A (en) Electrodeposition of polycrystalline silicon from a molten fluoride bath and product
FR2479856A1 (en) Regeneration of metal plating soln. - using cell contg. anodic membrane and soluble metal anode
FR2680523A1 (en) ELECTRODEPOSITION PROCESS.
FR2512431A1 (en) PROCESS FOR THE ELECTROCHEMICAL DECOMPOSITION OF NITRIC ACID
EP0197867B1 (en) Process for improving the purity of transition metals obtained by electrolysis of their halides in molten salts baths
EP0221790A1 (en) Process for the production of glyoxylic acid by the electrochemical reduction of oxalic acid
CA1062195A (en) Method and apparatus for electrolytic production of persulfates
FR2739872A1 (en) Electrolytically depositing zinc or zinc alloys on steel
JP3316606B2 (en) Tin plating apparatus and tin plating method
Dimitrov The electrolytic deposition of carbon from molten Li 2 CO 3
Nakagawa et al. Electrochemical study of a soluble niobium anode in molten salts

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU NL PT SE

17P Request for examination filed

Effective date: 19931206

17Q First examination report despatched

Effective date: 19950710

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU NL PT SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 19971105

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19971105

Ref country code: ES

Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY

Effective date: 19971105

Ref country code: DK

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19971105

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19971105

REF Corresponds to:

Ref document number: 159991

Country of ref document: AT

Date of ref document: 19971115

Kind code of ref document: T

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REF Corresponds to:

Ref document number: 69314990

Country of ref document: DE

Date of ref document: 19971211

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 19971201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19980205

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19980205

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19980308

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: 77245

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19980331

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19980331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19980714

REG Reference to a national code

Ref country code: IE

Ref legal event code: FD4D

Ref document number: 77245

Country of ref document: IE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20040122

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20040127

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20040205

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20040303

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20040305

Year of fee payment: 12

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050308

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050331

BERE Be: lapsed

Owner name: RECHERCHE ET DEVELOPPEMENT GROUPE *COCKERILL SAMBR

Effective date: 20050331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20051001

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20050308

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20051130

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee

Effective date: 20051001

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20051130

BERE Be: lapsed

Owner name: RECHERCHE ET DEVELOPPEMENT GROUPE *COCKERILL SAMBR

Effective date: 20050331