EP0537439B1 - Elément de sécurité - Google Patents

Elément de sécurité Download PDF

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Publication number
EP0537439B1
EP0537439B1 EP19920113563 EP92113563A EP0537439B1 EP 0537439 B1 EP0537439 B1 EP 0537439B1 EP 19920113563 EP19920113563 EP 19920113563 EP 92113563 A EP92113563 A EP 92113563A EP 0537439 B1 EP0537439 B1 EP 0537439B1
Authority
EP
European Patent Office
Prior art keywords
carrier material
diffraction elements
embossing
security element
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP19920113563
Other languages
German (de)
English (en)
Other versions
EP0537439B2 (fr
EP0537439A1 (fr
Inventor
Gregor Antes
Walter Trächslin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Electrowatt Technology Innovation AG
Original Assignee
Landis and Gyr Technology Innovation AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Landis and Gyr Technology Innovation AG filed Critical Landis and Gyr Technology Innovation AG
Publication of EP0537439A1 publication Critical patent/EP0537439A1/fr
Application granted granted Critical
Publication of EP0537439B1 publication Critical patent/EP0537439B1/fr
Publication of EP0537439B2 publication Critical patent/EP0537439B2/fr
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/351—Translucent or partly translucent parts, e.g. windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • B42D25/465—Associating two or more layers using chemicals or adhesives
    • B42D25/47—Associating two or more layers using chemicals or adhesives using adhesives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/908—Impression retention layer, e.g. print matrix, sound record
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/916—Fraud or tamper detecting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24364—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] with transparent or protective coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24628—Nonplanar uniform thickness material
    • Y10T428/24736—Ornamental design or indicia
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal
    • Y10T428/31681—Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]

Definitions

  • the invention relates to a security element of the type mentioned in the preamble of claim 1 and to a method for producing such a security element.
  • Such security elements are suitable, for example, for securing a glued-on photograph on an identity card, the security element designed as a brand covering both a partial area of the photograph and a partial area of the ID card.
  • European patent application EP-A 401 466 describes such a security element which has a full-surface reflection layer and shows a pattern composed of surfaces with embossed relief structures and non-embossed surfaces arranged between them. When the security element is viewed visually, the bright reflections on the unembossed surfaces disrupt the full color development of the light diffracted at the relief structures.
  • European patent EP 169 326 describes a device for the production of matrices with which the microscopic relief structures are embossed, for example, in plastic supports aluminized on one side.
  • the improved device from European patent application EP-A 330 738 enables the production of the matrices necessary for embossing the relief structures, which have partial areas with at least one dimension less than 0.3 mm.
  • EP-A 253 089 it is known to interrupt the reflection layer in the area of the relief structures in a predetermined pattern in order to achieve good adhesion between a carrier of the relief structures and a protective layer covering them.
  • European patent application EP-A 439 092 describes the use of the security element with diffraction structures, which are covered with the reflection layer in partial areas in a grid-like manner, for securing identification documents, the features of the security element covered by non-reflecting partial areas despite clouding through the grid ID are recognizable.
  • the invention has for its object to provide a security element with a pattern of diffraction optically effective relief structures and non-embossed neutral areas, in which the visual observation of the pattern is not disturbed by the light reflected from the neutral areas, and to find an inexpensive manufacturing process for it.
  • 1 means a substrate made of paper, plastic, metal and the like, on the surface of which a feature 2 is arranged.
  • a mark 3 made of plastic covers adjacent partial surfaces of the substrate 1 and the feature 2 as a security element, the mark 3 being glued to the feature 2 with one partial area and to the substrate 1 with the other partial area.
  • the substrate 1 can be an identification document, the feature 2 being a photograph of the holder, a signature made before the application of the mark 3 or another identification.
  • the mark 3 has a pattern which is composed of diffraction-optical surfaces with diffraction elements 4 and neutral areas 5.
  • the diffraction elements 4 diffract the incident ambient light in reflection and produce a characteristic color image that changes when the substrate 1 is tilted.
  • the neutral areas 5 do not reflect; for example, they are absorbent or transparent. If the neutral areas 5 are transparent, only a weak reflection on the surface of the mark 3 is noticeable in the areas 5 because of the jump in the refractive index of the media (air-plastic), but neither the color image nor the viewing of the substrate visible at this point 1 or feature 2 interferes with the mark 3.
  • the security element is particularly advantageous when viewed visually when the diffraction elements 4 are, for example, linear and have filigree patterns on the security element ment. These patterns have the advantage that the feature 2 lying under the mark is easily recognizable, in particular if the lines of the diffraction elements 4 are as narrow as possible.
  • the line widths can be less than 0.5 mm, for example 0.1 mm, 0.05 mm or even narrower.
  • a dot grid or a pattern made up of dots is also conceivable, the diameter of the dot-shaped diffraction elements 4 corresponding approximately to the line widths above. Line widths from approximately 25 ⁇ m can be achieved using the means described in EP-A 330 738 entitled "Document" by Antes et al.
  • An individual diffraction element 4 can be generated in each point or line section, which differs in its parameters, spatial frequency and grating profile, from the neighboring points or line sections.
  • the change of the parameters from one diffraction element 4 to the other can be z.
  • graphically designed means to increase security.
  • the security element has the advantage that the diffraction elements 4 stand out very conspicuously due to the reflection of the diffracted light from the faint neutral areas 5, at which no light is reflected, which mixes with the play of colors of the diffracted light and the brilliance of the diffraction elements 4 can decrease. Since the partial images 6 of the feature 2 lying underneath them can be seen through the neutral areas 5 and which must form a complete image of the feature 2 with the partial images 7 not covered by the mark 3, the adhesive label 3 is also suitable as a security element for Authentication of the feature 2, which is not only characterized by the high visibility of the diffraction elements 4 and by the transparency in the neutral areas 5 but also offers a visually verifiable, high security against forgery of the authentication of the feature 2.
  • a brilliant diffraction optical identifier 8 with such a pattern can also be generated as a security element directly in the surface of the substrate 1 without the detour via a glued-on label 3.
  • FIG. 2 shows a cross section through the ID card with the label 3 glued onto the substrate 1 as a security element.
  • a layered composite is shown as an example, which is described in European patent application EP-A 401 466 with the title "Layered composite with diffraction structures" by the same applicant and the text of which expressly belongs to the present description.
  • a carrier 10 made of plastic for the diffraction elements 4 is enclosed between the substrate 1 and a stabilization layer 9 made of polyester.
  • a lacquer layer 11 imparts good adhesion between the stabilization layer 9 and the carrier 10.
  • the diffraction elements 4 are embossed into the carrier 10 as microscopic relief structures 12.
  • a protective layer 13 covers both the relief structures 12 covered with a reflective layer 14 and the non-embossed and non-reflective neutral regions 5 of the carrier 10.
  • An adhesive layer 15 applied to the protective layer 13 firmly connects the mark 3 (FIG. 1) to the substrate 1, the adhesive connection not being able to be released without destroying the security element.
  • the carrier 10 and the protective layer 13 are made of the same material, so that the carrier 10 and the protective layer 13 can be connected particularly intimately in the neutral areas 5, so that no weak point is formed at the joint and the protective layer 13 for molding the Relief structures 12 can be removed without destroying them.
  • the carrier 10 and the protective layer 13 are made of the same clear material, an undisturbed carrier surface 16 present in the unembossed neutral areas 5 is invisible.
  • the carrier surface 16 is therefore shown in dashed lines in the drawing.
  • the neutral areas 5 therefore remain completely clearly transparent and do not interfere with the recognizability of the feature 2 lying under the mark 3 (FIG. 1).
  • the carrier 10 and the protective layer 13 can also be colored differently.
  • a solid film for example made of PVC, can also be used as a carrier material 17.
  • the mark 3 is to be used for gluing onto the substrate 1, transparent or even colorless materials are advantageously used for the protective layer 13, for the adhesive layer 15 and the carrier material 17, so that the feature 2 (FIG. 1) is visible through the neutral areas 5 remains.
  • the carrier 10 itself is stable enough so that the stabilization layer 9 and the lacquer layer 11 are unnecessary.
  • the production of the security feature is characterized by a few characteristic process steps, which can be recognized from the production processes listed as examples. For example, compared to the state of the art nik (EP-A 401 466) to insert only a few additional method steps in the process described below, which, however, are designed differently as described below. Each of these methods has its advantages.
  • FIGS. 3a to 3d, 4a to 4c and 5a to 5d show examples of the step-by-step production of a primary material in tape form for marks 3 (FIG. 1) with the security element.
  • FIGS. 3a to 3d, 4a to 4c and 5a to 5d show examples of the step-by-step production of a primary material in tape form for marks 3 (FIG. 1) with the security element.
  • FIGS. 3a to 3d, 4a to 4c and 5a to 5d show examples of the step-by-step production of a primary material in tape form for marks 3 (FIG. 1) with the security element.
  • FIGS. 3a to 3d, 4a to 4c and 5a to 5d show examples of the step-by-step production of a primary material in tape form for marks 3 (FIG. 1) with the security element.
  • FIGS. 3a to 3d, 4a to 4c and 5a to 5d show examples of the step-by-step production of a primary material in tape form for marks 3 (
  • the band-shaped carrier material 17 has, for example, the stabilization layer 9 and the carrier 10, which are connected to the lacquer layer 11 (FIG. 2).
  • the backing material 17 is completely covered on the side facing away from the stabilization layer 9, the embossed side, with a reflective layer 14.
  • a reflective layer 14 z. B. evaporated aluminum layers are known, the thickness of which is only a fraction of a micrometer.
  • the carrier material 17 is drawn off as a tape from a supply roll (not shown here) and successively reaches the various processing zones in which the marks 3 (FIG. 1) with the security feature are completed step by step.
  • the microscopic relief structure 12 is embossed in the pattern of the security element into an embossed side 18 of the carrier material 17 characterized by the reflective layer 14.
  • One of the unembossed neutral areas 5 is enclosed between two diffraction elements 4 and 4 '.
  • a protective lacquer 19 is applied to the embossed diffraction elements 4 by means of a printing process, which precisely covers the reflective layer 14 on the surfaces of the diffraction elements 4 and Leave layer 14 free and uncovered on the neutral areas 5.
  • the protective lacquer 19 is, for example, clearly transparent or colored and only transparent to light from a predetermined range of the spectrum.
  • the tape of the carrier material 17 is then drawn through a chemical bath. In the bathroom, the exposed reflective layer 14 on the neutral areas 5 is removed. If the reflective layer 14 consists of aluminum, dilute sodium hydroxide solution is suitable as a chemical bath, for example.
  • the carrier material 17 After washing and drying, the carrier material 17 has the structure shown in FIG. 3c.
  • the reflective layer 14 applied to the embossed relief structures 12 is only present in the region of the diffraction elements 4, 4 ′ and is covered with the protective lacquer 19.
  • the non-embossed neutral regions 5 lying between the diffraction elements 4, 4 ' are no longer coated with the reflective layer 14, the unembossed carrier surface 16 of the carrier material 17 being exposed.
  • the primary material for brands shown in FIG. 3d is produced, whereby the protective layer 13 is first applied over the entire surface to the carrier material 17 on the embossing side 18 (FIG. 3a) and the adhesive layer 15 is finally applied.
  • the adhesive layer 15 can also be omitted if the adhesive is applied to one of the two adhesive partners 1, 3 immediately before the mark 3 (FIG. 1) is attached to the substrate 1 (FIG. 1) or the protective layer 13 is designed as an adhesive layer 15.
  • This method has the advantage that the embossing dies used to produce diffraction-optical patterns according to the prior art can also be used to generate the new security elements, so that no new embossing dies need to be produced.
  • the carrier material 17 embossed in FIG. 4a through the reflective layer 14 has been embossed with raised embossed structures by means of an embossing die described below.
  • the relief structures 12 embossed into the carrier 10 are a predetermined distance A into the carrier material 17, i. H. lowered under the carrier surface 16, with depressions 21 being formed.
  • the distance A is measured between the surface of the carrier material 17 and the tips 20 of the relief structure 12 closest to it.
  • this distance A is approximately 1 .mu.m to 5 .mu.m, while the relief structure 12 has height differences B of 1 .mu.m or less.
  • the relief structures 12 are embossed on the base of the depressions 21 and can therefore also have height differences B of more than 1 ⁇ m.
  • the carrier material 17 in FIG. 4a has a mesa structure, the unembossed areas 5 representing the plateau and the depressions 21 with the relief structures 12 representing the valleys.
  • the application of the protective lacquer 19 shown in FIG. 4b takes place during the passage of the carrier material 17 through an application unit 22, 23 known in the printing industry for gravure printing.
  • the carrier material 17 moves in a transport direction 24 from the roller mill 22 to the doctor blade 23 from e.g. B. plastic or rubber.
  • the stripping knife 23 is arranged above the carrier material 17, the cutting edge of the stripping knife 23 being able to slide slightly resiliently on the reflecting layer 14 over the entire width of the carrier material 17 for stripping off the unnecessary protective lacquer 19.
  • the protective lacquer 19 is evenly distributed on the reflective layer 14 during the passage of the carrier material 17.
  • the protective lacquer 19 in particular also fills the depressions 21 and covers the relief structures 12.
  • the stripping knife 23 strips the protective lacquer 19 present on the non-embossed neutral areas 5 from the reflective layer 14, so that only in the recesses 21 the protective lacquer 19 remains, which reflects the reflective layer 14 of the diffraction elements 4 before the action of the chemical bath for removing the reflective layer 14 protects.
  • FIG. 4c shows the pre-finished material as an example, in which the reflective layer 14 has remained only on the diffraction elements 4. Only the full-surface protective layer 13 is present on the carrier material 17.
  • This method has the advantage that no register-accurate work is required when applying the protective lacquer 19, since this results automatically and with great precision. It is even possible to emboss and apply the protective layer 13 and the protective lacquer 19 at different production sites without the accuracy of the delimitation of the reflective layers 14 on the diffraction elements 4 being affected.
  • the arrangement of the relief structures 12 on the base of the depressions 21 in the carrier material 17 is advantageous since the greatest possible protection of the relief structures 12 (FIG. 4b) is achieved when the diffraction elements 4 are covered with the protective lacquer 19.
  • the protective lacquer 19 can also be applied to the carrier material 17 with the mesa structure according to method 1.
  • the security elements can also be produced with a starting material as carrier material 17 which, as in FIG. 5a, has no reflective layer 14 (FIG. 3a) on the embossing side 18.
  • carrier material 17 which, as in FIG. 5a, has no reflective layer 14 (FIG. 3a) on the embossing side 18.
  • the diffraction elements 4 and the depressions 21 are produced in the carrier material 17 by means of the embossing die with raised embossing structures.
  • a washable material is applied as a separating layer 25 according to EP-A 253 089 by means of a printing unit known from high pressure, which is shown here only with its application roller 26, on the surfaces of the unembossed neutral areas 5 of FIG. 5b.
  • the application roller 26 rolls on the embossed side 18 of the carrier material 17 and covers the raised neutral areas 5 with the separating layer 25.
  • the viscosity and the application thickness of the washable material is selected such that the washable material does not fill the depressions 21 and the relief structures 12 ( Figure 2) dirty.
  • the separating layer 25 therefore only covers the neutral areas 5 and the relief structures 12 embossed in the depressions 21 remain free.
  • the carrier material 17, which is partially covered with the separating layer 25, is then coated with the reflective layer 14 both on the relief structures 12 in the depressions 21 and on the separating layer 25.
  • the primary material After a washing process, which removes the washable material of the separating layer 25 together with the reflective layer 14 applied directly to it, in FIG. 5d the primary material only has the reflective layer 14 in the diffraction elements 4, while in the neutral regions 5 the carrier material 17 exposed. Finally, the carrier material 17 is coated over its entire area with the protective layer 13, the depressions 21 being filled with the material of the protective layer 13.
  • the advantage of this process is a shorter throughput time in the production of the primary material, since the process step for applying the protective lacquer 19 (FIG. 4c) is omitted.
  • the protective lacquer 19 can be applied by means of the printing process as in FIG. 3b or with the process shown in FIG. 4b.
  • the carrier material 17 and the protective lacquer 19 advantageously differ in their refractive index in FIG. 4c.
  • the carrier ma material 17 has a value less than 1.5 in the refractive index, while the protective lacquer 19 over the diffraction elements 4 has a refractive index over 1.55.
  • the jump in the refractive index at the boundary layer between the carrier material 17 and the protective lacquer 19 causes a strong reflection of the light falling through the carrier material 17 onto the diffraction elements 4, so that this boundary layer forms the reflective layer 14 and has the same effect.
  • the absence of the metallic reflective layer 14 also causes a strong, non-detachable connection between the layers in the diffraction elements 4.
  • a radiation-curable protective lacquer 19 has the advantage that when the protective lacquer 19 hardens in the recesses 21 (FIG. 5a), a very robust and heat-stable base is formed, which has the precisely shaped relief structures 12 (FIG. 2) in the diffraction elements 4.
  • the marks 3 (FIG. 1) made from such a raw material withstand the heat required when the marks 3 are hot-glued or overlaminated even without a stabilizing layer 9 (FIG. 2).
  • the carrier material 17 is transparent and at least the protective lacquer 19 (FIG. 3b) or the protective layer 13 is colored dark or even black, since the viewer can recognize the identification mark 8 as a strikingly brilliant filigree pattern, e.g. B. as fine lines against a dark background. If the reflective layer 14 is not applied in register, besides the linear diffraction structures 4, reflective, non-diffractive surfaces can be easily recognized by the unarmed eye.
  • the security element can be used for authenticity detection of documents, banknotes and other objects.
  • the pattern of the security element and the features 2 lying under the mark 3, such as image or writing elements printed on the substrate 1 or a watermark in the substrate 1, can also be recognized by the layperson with the unarmed eye, if the protective layer except for the reflective layer 14 13 and the carrier material 17 are transparent.
  • Such a quasi-transparent security element shows the fine filigree patterns from the diffraction elements 4 and, depending on the incidence of light and the viewing direction, can show a brilliant play of colors without the recognizability of the image or writing elements suffering through the clear neutral areas 5.
  • the quasi-transparent security element can advantageously be used to partially or completely cover the substrate 1 to be secured against forgery and its features 2.
  • substrates 1 include personal identification cards with imprint and photo of the holder.
  • the graphic pattern of the mark 3 covers the features 2 with the fine lines or line elements whose relief structure 12 act as diffraction elements 4. Because of the high light diffraction efficiency of the diffraction elements 4, a small area fraction of the diffraction elements 4 is sufficient so that recognition of the information on the substrate 1 through the neutral regions 5 is not impaired.
  • the line-shaped diffraction elements 4 advantageously have predetermined spatial frequencies and profile shapes that change along the lines, so that the visual impression changes predetermined along the lines when the viewing conditions are changed, for example by rotating or tilting the substrate 1.
  • An attempt to replace the features 2 located under the security element destroys the security element.
  • falsifying the ID card, e.g. B. by assembling pieces of several real ID cards is easily recognizable, since the fine lines of the diffraction elements shifted at seams or continue broken in the line.
  • By tilting the substrate with the help of the obvious diffraction effects even laypersons can easily check whether the fine diffraction elements 4 covering the information are intact, e.g. B. by checking whether the diffraction effects of the diffraction elements 4 along the fine lines change abruptly or not.
  • the ID cards in credit card format can be punched directly from the primary material.
  • the pattern of the security element forms the identifier 8 ( Figure 1) and serves z. B. as an optical eye-catcher. It is advantageous to use transparent or even colorless materials for the protective layer 13, the carrier material 17 and any protective lacquer 19, since the identifier 8 (FIG. 1) is visible from both sides of the identification card.
  • the strip-like primary material can be processed, for example, into a branded roll 27 in a separate operation.
  • the marks 3 are made very thin (about 15 .mu.m to 40 .mu.m) for technical reasons.
  • the patterns of the security elements regularly arranged on the primary material can be punched out as marks 3, and the stabilization layer 9 can be glued to a carrier film 28 made of paper or plastic with a cold adhesive.
  • the mark 3 is pulled off the carrier film 28 and glued onto the substrate 1 (FIG. 1) and the feature 2 (FIG. 1).
  • the embossing matrices with raised embossing structures for producing the depressions 21 (FIG. 4a) and the relief structures 12 embossed at the base of the depressions (FIG. 4a) can be produced with the aid of the numerically controlled device described in EP-A 330 738, a first in Master structure 29 of the embossing die shown in FIG. 7a is produced.
  • the master structure 29 is fastened on a structure carrier 30. As soon as the master structure 29 is imprinted on one side with the microscopic relief structures 12 of the pattern, it is removed together with the structure carrier 30 from the device for coating with a photoresist 31.
  • the positive-working photoresist 31 is applied over the entire area in a layer thickness between 1 to 10 ⁇ m over the relief structures 12 of the diffraction elements 4, 4 ′ and over the neutral regions 5 of the exposed master structure 29 without destroying the embossed relief structures 12.
  • the layer thickness of the photoresist 31 determines the height of the later embossed structures and corresponds at least to the distance A (FIG. 4a).
  • the device exposes the photoresist 31 with a write beam 32 through the structure support 30 of the master structure 29, the write beam 32 being controlled via the surfaces of the diffraction elements 4, 4 ′ using the same control program and exposing the photoresist 31.
  • the method has the advantage that the photoresist 31 is exposed with great registration accuracy within limits 33 above the diffraction elements 4, 4 ', since the structure carrier 30 can be repositioned precisely in the device by means of pins.
  • a master mold 34 from the master structure 29 remains in FIG. 7b, which only has the photoresist 31 on the unembossed surfaces located between the surfaces of the diffraction elements 4, 4 '.
  • a metal layer 35 is deposited on the surface of the master mold 34 using a galvanic process.
  • the metal layer 35 consists, for. B. made of nickel and is an exact negative of the master form 34th
  • the embossing die can also be produced with a negative-working photoresist 31 if the photoresist 31 is exposed in the unembossed regions 5.
  • the metal layer 35 forms an embossing die 36 with raised embossed structures 37 shown in FIG. 8, which can be used for embossing the carrier material 17.
  • the embossing dies 36 have the advantage that the relief structures 12 (FIG. 4a) are produced in the depressions 21 (FIG. 4a) during the embossing. This enables the use of the inexpensive methods 2 and 3 described above, which can be used in particular for the filigree patterns.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Credit Cards Or The Like (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Bidet-Like Cleaning Device And Other Flush Toilet Accessories (AREA)
  • Burglar Alarm Systems (AREA)
  • Orthopedics, Nursing, And Contraception (AREA)
  • Amplifiers (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)

Claims (12)

1. Elément de sécurité avec un motif observable visuellement d'éléments à diffraction (4, 4') optiques avec des structures de relief (12) microscopiques, creuses, réalisées dans la matière synthétique, sur une face, dans un matériau-support (17) et avec une couche réfléchissante (14) recouvrant en partie le côté creusé (18) du matériau-support (17), caractérisé en ce que la couche réfléchissante (14) ne recouvre que les structures de relief (12) creusées et que les zones (5) neutres non-creusées se trouvant entre les éléments à diffraction (4, 4') ne sont pas réfléchissantes.
2. Elément de sécurité selon la revendication 1, caractérisé en ce que, pour assurer la protection des éléments à diffraction (4, 4'), la face creusée (18) est recouverte sur sa totalité d'une couche de protection (13) transparente qui recouvre la couche réfléchissante (13) sur les structures de relief (12) et les zones neutres (5) et en ce qu'un support (10) des structures de relief (12) et la couche de protection (13) sont constitués du même matériau.
3. Elément de sécurité selon la revendication 1 ou 2, caractérisé en ce que le matériau support (17) est transparent afin de pouvoir observer à travers lui, à travers le matériau-support (17), un motif constitué des éléments à diffraction (4, 4') et des zones neutres (5).
4. Elément de sécurité selon la revendication 3, caractérisé en ce que le matériau-support (17) est réalisé pour être collé sur un substrat (1), et en ce qu'une couche adhésive (15), appliquée sur la totalité de la surface de la face creusée (18), est transparente, afin que des caractéristiques (2) se trouvant sur le substrat (1) restent visibles en observant à travers les zones neutres (5).
5. Elément de sécurité selon l'une des revendications 1 à 4, caractérisé en ce que la somme des aires des zones neutres (5) situées entre les éléments à diffraction (4, 4') est supérieure à la somme des aires des éléments à diffraction (4, 4').
6. Elément de sécurité selon la revendication 5, caractérisé en ce que les éléments à diffraction (4, 4') ont une dimension inférieure à 0,5 mm et constituent un motif du genre filigrane fin.
7. Elément de sécurité selon l'une des revendications 1 à 6, caractérisé en ce que les éléments à diffraction (4, 4') sont disposés au moins un micromètre au-dessous d'une surface de support (16) déterminée par les faces des zones neutres (5) non-creusées, dans des cavités (21) du matériau-support (17). 8. Elément de sécurité selon la revendication 7, caractérisé en ce que les cavités (21) sont remplies d'un vernis de protection (17) durci au moyen d'un rayonnement.
9. Matrice de gaufrage, pour produire par gaufrage des éléments de sécurité selon la revendication 6 ou 7, caractérisée en ce que, pour produire les cavités (21) dans le matériau-support (17), les structures de relief (12) microscopiques destinées aux éléments à diffraction (4, 4') font saillie, à titre de structure de gaufrage (37), au-dessus d'un plan déterminé par les zones neutres (5).
10. Procédé de fabrication d'un élément de sécurité sur un matériau-support (17) en matière synthétique, avec des éléments à diffraction (4, 4') creusés dans une couche réfléchissante (14) et constitués de structures de relief microscopiques et avec des zones neutres (5) situées entre les éléments à diffraction (4, 4'), caractérisé en ce qu'après le gaufrage du matériau-support (17) seules les surfaces des éléments à diffraction (4, 4') creusés sur la face à gaufrer (18) sont recouvertes d'un vernis de protection (19) et les zones neutres (5) restant sensiblement libres, de manière que la couche réfléchissante (14) soit enlevée dans les zones neutres (5) et en ce que, sur la face creusée (18), au moins une couche de protection (13) soit appliquée sur toute la totalité de la surface du matériau-support (17).
11. Procédé selon la revendication 10, caractérisé en ce que, lors du gaufrage sont produites des cavités (21) avec les structures de relief (12), dans la surface du matériau-support (17), de manière que la couche de protection (17) soit enlevée de la totalité de la surface de la face creusée (18) et que, pour libérer la couche réfléchissante (14) dans les zones neutres (5), le vernis de protection (19) est enlevé au moyen d'une lame de raclage (23) et les cavités (21) étant comblées.
12. Procédé de fabrication d'un élément de sécurité sur un matériau-support (17) en matière synthétique, avec des éléments à diffraction (4, 4') formés par creusement, en structures de relief (12) microscopiques et avec des zones neutres (5) situées entre les éléments à diffraction (4, 4'), caractérisé en ce que, pour façonner par gaufrage le matériau-support (17), est utilisée une matrice de gaufrage (36) avec des structures de gaufrage (37) en relief, en ce que les zones neutres (5) non-gaufrées sont revêtues d'une couche de séparation (25) constituée d'un matériau pouvant être enlevé par lavage, en ce que les structures de relief (12) et les surfaces de la couche de séparation (25) sont recouvertes d'une couche réfléchissante (14), en ce que la couche de séparation (25), conjointement avec la couche réfléchissante (14), sont enlevées sur les zones neutres (5), et en ce qu'une couche de protection est appliquée sur la totalité de la surface du matériau-support (17).
EP19920113563 1991-10-14 1992-08-08 Elément de sécurité Expired - Lifetime EP0537439B2 (fr)

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JP (1) JP3618766B2 (fr)
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GB201400910D0 (en) 2014-01-20 2014-03-05 Rue De Int Ltd Security elements and methods of their manufacture
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EP2711195A2 (fr) 2005-02-10 2014-03-26 OVD Kinegram AG Corps multicouches ayant une structure en relief à diffraction
EP2711196A2 (fr) 2005-02-10 2014-03-26 OVD Kinegram AG Procédé de fabrication d'un corps multicouches ayant une structure en relief à diffraction
US8685488B2 (en) 2007-12-21 2014-04-01 Giesecke & Devrient Gmbh Method for producing a microstructure

Also Published As

Publication number Publication date
EP0537439B2 (fr) 2003-07-09
JPH05224606A (ja) 1993-09-03
FI924621A0 (fi) 1992-10-13
US5714213A (en) 1998-02-03
AU664202B2 (en) 1995-11-09
CA2077165C (fr) 2004-11-09
JP3618766B2 (ja) 2005-02-09
DE59204591D1 (de) 1996-01-18
CA2077165A1 (fr) 1993-04-15
FI924621A (fi) 1993-04-15
AU2620392A (en) 1993-04-22
EP0537439A1 (fr) 1993-04-21
ATE131115T1 (de) 1995-12-15

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