EP0450855B1 - Nettoyage à solvent pour articles - Google Patents

Nettoyage à solvent pour articles Download PDF

Info

Publication number
EP0450855B1
EP0450855B1 EP91302698A EP91302698A EP0450855B1 EP 0450855 B1 EP0450855 B1 EP 0450855B1 EP 91302698 A EP91302698 A EP 91302698A EP 91302698 A EP91302698 A EP 91302698A EP 0450855 B1 EP0450855 B1 EP 0450855B1
Authority
EP
European Patent Office
Prior art keywords
process according
ether
azeotrope
methanol
tetrafluoroethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP91302698A
Other languages
German (de)
English (en)
Other versions
EP0450855A2 (fr
EP0450855A3 (en
Inventor
Neil Winterton
David George Mcbeth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10673894&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP0450855(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of EP0450855A2 publication Critical patent/EP0450855A2/fr
Publication of EP0450855A3 publication Critical patent/EP0450855A3/en
Application granted granted Critical
Publication of EP0450855B1 publication Critical patent/EP0450855B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5018Halogenated solvents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5036Azeotropic mixtures containing halogenated solvents
    • C11D7/504Azeotropic mixtures containing halogenated solvents all solvents being halogenated hydrocarbons
    • C11D7/5063Halogenated hydrocarbons containing heteroatoms, e.g. fluoro alcohols
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/032Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/28Organic compounds containing halogen

Definitions

  • This invention relates to solvent cleaning applications in which contaminated articles such as, for example, metals, textiles, glass, plastics, electronic components and printed circuit boards are cleaned using a solvent or solvent vapour and more particularly to the use of low molecular weight ethers as solvents in solvent cleaning applications.
  • Solvent cleaning applications wherein contaminated articles are immersed in or washed with halogenated hydrocarbon solvents and/or the vapours thereof are well known and are in common use. Applications involving several stages of immersion, rinsing and drying are common and it is well known to use the solvent at ambient temperature (often accompanied by ultrasonic agitation) or at an elevated temperature up to the boiling point of the solvent. Examples of solvents used in these cleaning processes are 1,1,2-trichloro-1,2,2-trifluoroethane, 1,1,1-trichloroethane, trichloroethylene, perchloroethylene and methylene chloride.
  • solvents are used alone or in mixtures with cosolvents such as aliphatic alcohols or other low molecular weight, polar additives and depending to some extent upon the articles to be cleaned are often stabilised against degradation induced by light, heat and the presence of metals.
  • the use of the common cleaning solvents has been regarded as safe practice in that the solvents are stable, of low toxicity, non-flammable materials believed to be environmentally benign.
  • some at least of the common solvents may have a long-term deleterious effect on the stratosphere, the so-called ozone layer, so that a replacement solvent is seen to be desirable.
  • solvent cleaning applications of solvents comprising low molecular weight fluorine-containing ethers of boiling point in the range of 20°C to 120°C and containing at least 3 carbon atoms and further containing one or more hydrogen atoms.
  • the ether has a boiling point in the range 20°C to 120°C, preferably from 25°C to 85°C, such that it may be used in conventional and existing cleaning equipment.
  • an ether may be selected having a boiling point close to that of the solvent the ether is replacing.
  • the ethers can be obtained by reaction of a halogenated aliphatic olefin with an optionally halogenated aliphatic alcohol in known manner and thus contain at least three carbon atoms in the molecule.
  • the ether will contain not more than five carbon atoms although it may contain six or more carbon atoms providing its boiling point is below 120°C.
  • the ether contains at least one and will usually contain two or more fluorine atoms but will not be perfluorinated. In addition to fluorine atoms, the ether may contain chlorine atoms, bromine atoms and hydrogen atoms. Ethers containing chlorine and/or hydrogen may contain one or two chlorine atoms and/or one or two hydrogen atoms.
  • Examples of alcohols which may be used to produce the ethers are methanol, ethanol, propanol and butanol and halogenated derivatives thereof.
  • Alkenes which may be used include tetrafluoroethylene, hexafluoropropene, chlorotrifluoroethylene and the chlorofluoropropenes and hydrogen-containing analogues of these compounds for example trifluoroethylene and chlorodifluoroethylene.
  • ethers which may be used, and their boiling points, include the following:- Boiling Point (°C) 1,1-difluoroethyl methyl ether 47 1,1,2,2-tetrafluoroethyl methyl ether 36.5 1-chloro-1,2,2-trifluoroethyl methyl ether 70.6 1-1-dichloro-2,2-difluoroethyl methyl ether 104.8 1-chloro-2,2-difluoroethyl methyl ether 27.5 1,1,1,2,3,3-hexafluoropropyl methyl ether 54.5 1,1-difluoroethyl ethyl ether 65 1,1,2,2-tetrafluoroethyl ethyl ether 56 1-chloro-1,2,2-trifluoroethyl ethyl ether 82 1,1,1,2,3,3-hexafluoropropyl ethyl ether 64.5 1,1,2,2-tetra
  • ethers including azeotropic mixtures
  • ethers may be used if desired as may mixtures of an ether with one or more cosolvents.
  • cosolvents may be used as are used with the principal solvents in known cleaning applications and in particular polar compounds such as alcohols are preferred cosolvents.
  • Cleaning compositions comprising the ether and a cosolvent, notably a lower alkanol cosolvent, are used according to another embodiment of the invention.
  • Azeotropic mixtures of ethers and alcohols represent preferred solvent compositions used in the process of the invention.
  • Lower aliphatic alcohols containing 1 to 4 carbon atoms are useful in such mixtures.
  • the ethers used according to the invention tend to be more stable than the commonly-used solvents and generally will not require stabilisation against degradation.
  • stabilisers may be added if desired or if required for particularly onerous cleaning applications and the stabilisers used in the common solvents may be employed, notably nitroalkanes and epoxides.
  • the ethers may be used as replacements for the solvent(s) used in any of the known cleaning applications and have the advantage of being generally more stable towards aluminium than the solvents they replace.
  • the ethers may be used to replace part of the solvent(s) used in known cleaning applications.
  • This Example illustrates the use of 2-chloro-1,1,2-trifluoroethyl methyl ether in cleaning flux residues from copper-coated boards.
  • solder cream A known weight of solder cream was applied to test boards (5 cm x 7 cm) cut from copper-coated FR4 (epoxy/glass fibre laminate) board and the cream was reflowed in a MICROTM VPS soldering unit.
  • the solder cream used was a 62% tin/38% lead solder available as MulticoreTM PRAB 3.
  • Residual ionic contamination of the test board expressed as mg sodium chloride per square centimetre was determined using a Protonique Contaminometer. The ionic contamination of an unwashed test board was determined and the % removal of ionic contamination was calculated. 61% of the ionic flux residues were removed from the test boards.
  • the ether was heated to 190°C and the vapour pressures above the ether were determined over the range 50 - 190°C. A slight increase in vapour pressure was observed at approximately 120°C but there was no visible evidence of solvent breakdown at this temperature.
  • Example 2 a mixture of 2-chloro-1,1,2-trifluoroethyl methyl ether and methanol was boiled until a constant boiling mixture was obtained. This azeotrope contained 18.5% by weight of methanol and boiled at 56.8°C at normal pressure.
  • the azeotropic mixture was used to remove ionic residues from the test boards as described in Example 1. 66.9% of the ionic resudes were removed.
  • Example 3 the procedure of Example 2 was repeated except that a mixture of the ether (95% by weight) and methanol (5% by weight) was used instead of the azeotropic mixture. 65.1% of the ionic residues were removed.
  • the ether was refluxed in contact with aluminium for 48 hours.
  • the aluminium test piece was partly immersed in the liquid and partly in the vapour above the liquid.
  • This Example illustrates the use of tetrafluoroethyl methyl ether in cleaning flux residues from copper-coated boards.
  • Tetrafluoroethyl methyl ether forms an azeotrope with methanol containing 4% by weight methanol and boiling at 34.5°C.
  • the ether forms an azeotrope with 1,1,2-trichloro-1,2,2 -trifluoroethane containing 39.5% by weight of the haloethane and boiling at 34.9°C.
  • the ether forms a ternary azeotrope with 1,1,2-trichloro- 1,2,2-trifluoroethane and methanol containing 41% by weight of the haloethane and 3% by weight of methanol and boiling at 34.5°C.
  • This Example illustrates the use of a ternary azeotropic mixture in the process according to the present invention.
  • Example 8 The ternary azeotropic mixture of tetrafluoroethyl methyl ether, 1,1,2-trichloro-1,2,2-trifluoroethane and methanol prepared in Example 8 was used to remove solder flux residues from circuit boards by the procedure described in Example 1. 48.2% of the ionic flux residues were removed.
  • Tetrafluoroethyl ethyl ether boiling point 56°C and density 1.21 g/ml, forms an azeotrope with methanol containing 10.6% by weight of methanol and boiling at 48.6°C.
  • the ether forms an azeotrope with ethanol containing 38.5% by weight of 1,1,2-trichloro-1,2,2-trifluoroethane and boiling at 46.3°C.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Detergent Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Claims (14)

  1. Procédé pour le nettoyage d'articles contaminés comprenant la mise en contact des articles contaminés avec une composition de solvant comprenant un éther de faible poids moléculaire contenant du fluor présentant un point d'ébullition dans l'intervalle de 20°C à 120°C et contenant au moins 3 atomes de carbone et contenant en outre un ou plusieurs atomes d'hydrogène, ou la vapeur de celui-ci ou les deux.
  2. Procédé suivant la revendication 1, dans lequel ledit éther de faible poids moléculaire contenant du fluor ne contient pas plus de 5 atomes de carbone.
  3. Procédé suivant l'une quelconque des revendications 1 ou 2, dans lequel ladite composition de solvant contient en outre un cosolvant.
  4. Procédé suivant la revendication 3, dans lequel ledit cosolvant est un composé polaire.
  5. Procédé suivant la revendication 4, dans lequel ledit cosolvant est un alcool.
  6. Procédé suivant la revendication 5, dans lequel ledit cosolvant est un alcanol aliphatique inférieur contenant de 1 à 4 atomes de carbone.
  7. Procédé suivant la revendication 1, dans lequel ladite composition de solvant se présente sous la forme d'un azéotrope, ledit azéotrope étant sélectionné dans le groupe constitué d'un azéotrope binaire de tétrafluoroéthylméthyléther et de méthanol, d'un azéotrope binaire de tétrafluoroéthylméthyléther et de 1,1,2-trichloro-1,2,2-trifluoroéthane, d'un azéotrope ternaire de tétrafluoroéthylméthyléther, de méthanol et de 1,1,2-trichloro-1,2,2-trifluoroéthane, d'un azéotrope binaire de tétrafluoroéthyléthyléther et de méthanol et d'un azéotrope binaire de tétrafluoroéthyléthyléther et de 1,1,2-trichloro-1,2,2-trichloroéthane.
  8. Procédé suivant la revendication 1, dans lequel ladite composition de solvant comprend un mélange dudit éther de faible poids moléculaire contenant du fluor.
  9. Procédé suivant la revendication 1, dans lequel lesdits articles contaminés sont des cartes à circuit imprimé contaminées par un résidu de flux.
  10. Procédé suivant l'une quelconque des revendications précédentes, dans lequel ladite composition de solvant inclut en outre un stabilisant.
  11. Procédé suivant la revendication 10, dans lequel ledit stabilisant est un époxyde ou un nitroalcane.
  12. Procédé suivant la revendication 1, dans lequel ledit éther de faible poids moléculaire contenant du fluor peut être obtenu à partir de la réaction d'une oléfine aliphatique halogénée avec un alcool aliphatique facultativement halogéné.
  13. Procédé suivant la revendication 12, dans lequel ledit alcool aliphatique facultativement halogéné est sélectionné dans le groupe constitué de méthanol, d'éthanol, de propanol, de butanol et de dérivés halogénés de ces composés.
  14. Procédé suivant la revendication 12 ou 13, dans lequel ladite oléfine aliphatique halogénée est sélectionnée dans le groupe constitué de tétrafluoroéthylène, d'hexafluoropropène, de chlorotrifluoroéthylène, de chlorofluoropropènes et d'analogues de ces composés contenant de l'hydrogène.
EP91302698A 1990-04-04 1991-03-27 Nettoyage à solvent pour articles Expired - Lifetime EP0450855B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB909007645A GB9007645D0 (en) 1990-04-04 1990-04-04 Solvent cleaning of articles
GB9007645 1990-04-04

Publications (3)

Publication Number Publication Date
EP0450855A2 EP0450855A2 (fr) 1991-10-09
EP0450855A3 EP0450855A3 (en) 1992-01-15
EP0450855B1 true EP0450855B1 (fr) 1999-10-27

Family

ID=10673894

Family Applications (1)

Application Number Title Priority Date Filing Date
EP91302698A Expired - Lifetime EP0450855B1 (fr) 1990-04-04 1991-03-27 Nettoyage à solvent pour articles

Country Status (11)

Country Link
EP (1) EP0450855B1 (fr)
JP (1) JP2961924B2 (fr)
KR (1) KR100205296B1 (fr)
AT (1) ATE186071T1 (fr)
AU (1) AU640760B2 (fr)
CA (1) CA2039828C (fr)
DE (1) DE69131737T2 (fr)
ES (1) ES2140382T3 (fr)
GB (1) GB9007645D0 (fr)
IE (1) IE911028A1 (fr)
NZ (1) NZ237628A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101528909B (zh) * 2006-11-01 2011-04-13 中央硝子株式会社 包含1,1,2,2-四氟-1-甲氧基乙烷的共沸或类共沸组合物

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1005181A3 (fr) * 1991-08-19 1993-05-18 Solvay Compositions comprenant un ether fluore et utilisation de ces compositions.
US5273592A (en) * 1991-11-01 1993-12-28 Alliesignal Inc. Method of cleaning using partially fluorinated ethers having a tertiary structure
US6355113B1 (en) 1991-12-02 2002-03-12 3M Innovative Properties Company Multiple solvent cleaning system
CA2125143A1 (fr) * 1991-12-03 1993-06-10 Cynthia L. Gage Compositions de frigorigenes et procedes pour leur utilisation
US5888418A (en) * 1992-03-20 1999-03-30 The United States Of America As Represented By The Secretary Of Commerce Azeotropic refrigerant comprising bis-(difluoromethyl)ether and 1,1,2-trifluoroethane
US5278342A (en) * 1992-03-25 1994-01-11 Hampshire Chemical Corp. Vapor phase chlorination of difluoromethyl methyl ether
US5605882A (en) 1992-05-28 1997-02-25 E. I. Du Pont De Nemours And Company Azeotrope(like) compositions of pentafluorodimethyl ether and difluoromethane
BE1006433A3 (fr) * 1992-12-03 1994-08-23 Solvay Compositions contenant un ether fluore et utilisation de ces compositions.
US5484546A (en) * 1993-05-19 1996-01-16 E. I. Du Pont De Nemours And Company Refrigerant compositions including an acylic fluoroether
US5658962A (en) 1994-05-20 1997-08-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
US5562854A (en) * 1994-09-29 1996-10-08 E. I. Du Pont De Nemours And Company Octafluorobutane compositions
US5718293A (en) * 1995-01-20 1998-02-17 Minnesota Mining And Manufacturing Company Fire extinguishing process and composition
US6548471B2 (en) 1995-01-20 2003-04-15 3M Innovative Properties Company Alkoxy-substituted perfluorocompounds
US6506459B2 (en) 1995-01-20 2003-01-14 3M Innovative Properties Company Coating compositions containing alkoxy substituted perfluoro compounds
US5925611A (en) 1995-01-20 1999-07-20 Minnesota Mining And Manufacturing Company Cleaning process and composition
JP2870577B2 (ja) * 1995-03-28 1999-03-17 工業技術院長 溶剤組成物
DE69637691D1 (de) * 1995-05-16 2008-11-06 Minnesota Mining & Mfg Azeotropähnliche zusammensetzungen und ihre verwendung
CN1192088C (zh) * 1995-05-16 2005-03-09 美国3M公司 共沸物状组合物及其应用
US6008179A (en) 1995-05-16 1999-12-28 3M Innovative Properties Company Azeotrope-like compositions and their use
US5543055A (en) * 1995-06-06 1996-08-06 Hampshire Chemical Corp. Purifications of flourinated dimethyl ethers
DE69620642T2 (de) 1995-12-15 2002-11-28 Minnesota Mining & Mfg Reiningungsverfahren und-zusammensetzung
US6030934A (en) * 1997-02-19 2000-02-29 3M Innovative Properties Company Azeotropic compositions of methoxy-perfluoropropane and their use
US6552090B1 (en) 1997-09-15 2003-04-22 3M Innovative Properties Company Perfluoroalkyl haloalkyl ethers and compositions and applications thereof
US6022842A (en) * 1998-02-11 2000-02-08 3M Innovative Properties Company Azeotrope-like compositions including perfluorobutyl methyl ether, 1- bromopropane and alcohol
US6127430A (en) * 1998-12-16 2000-10-03 3M Innovative Properties Company Microemulsions containing water and hydrofluroethers
US6159917A (en) * 1998-12-16 2000-12-12 3M Innovative Properties Company Dry cleaning compositions containing hydrofluoroether
GB0203315D0 (en) * 2002-02-13 2002-03-27 Henly Stephen R Method of sterilising an article
CN100412184C (zh) 2003-06-27 2008-08-20 旭硝子株式会社 清洗漂洗方法
JP6274363B2 (ja) * 2015-07-27 2018-02-07 旭硝子株式会社 溶剤組成物、洗浄方法、塗膜の形成方法、熱移動媒体および熱サイクルシステム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3957672A (en) * 1973-11-23 1976-05-18 The United States Of America As Represented By The Secretary Of The Navy Displacement of organic liquid films from solid surfaces by non aqueous systems
IT1213537B (it) * 1986-11-21 1989-12-20 Ausimont Spa Procedimento per la preparazione di perfluoroeteri mediannte fluorurazione con fluoro elementare.
US4948526A (en) * 1989-09-26 1990-08-14 Allied-Signal Inc. Azeotrope-like compositions of pentafluorodimethyl ether and monochlorodifluoromethane

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"Beilsteins Handbuch der organischen Chemie IIIE, 4, pp 425 & H, 4, pp 336", SPRINGER VERLAG, BERLIN-GÖTTINGEN-HEIDELBERG (DE) *
GMEHLING, ONKEN, RAREY: "Vapor-Liquid Equilibrium Data Collection ",DECHEMA,FRANKFURT (DE) *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101528909B (zh) * 2006-11-01 2011-04-13 中央硝子株式会社 包含1,1,2,2-四氟-1-甲氧基乙烷的共沸或类共沸组合物

Also Published As

Publication number Publication date
EP0450855A2 (fr) 1991-10-09
CA2039828A1 (fr) 1991-10-05
GB9007645D0 (en) 1990-05-30
AU640760B2 (en) 1993-09-02
DE69131737T2 (de) 2000-06-08
DE69131737D1 (de) 1999-12-02
KR910018532A (ko) 1991-11-30
ATE186071T1 (de) 1999-11-15
JP2961924B2 (ja) 1999-10-12
KR100205296B1 (ko) 1999-07-01
AU7391391A (en) 1991-10-10
CA2039828C (fr) 2001-01-23
NZ237628A (en) 1994-07-26
EP0450855A3 (en) 1992-01-15
IE911028A1 (en) 1991-10-09
JPH05271692A (ja) 1993-10-19
ES2140382T3 (es) 2000-03-01

Similar Documents

Publication Publication Date Title
EP0450855B1 (fr) Nettoyage à solvent pour articles
US5824634A (en) Cleaning compositions with decafluoropentane and acetone
US5507878A (en) Azeotropes of octamethyltrisiloxane and aliphatic or alicyclic alcohols
US5087383A (en) Novel azeotropic or azeotrope-like mixture of 2,2,2-trifluoroethyl 1,1,2,2-tetrafluoroethyl ether and ethanol, and its use
GB2188059A (en) Solvent mixtures
US5456856A (en) Azeotrope and azeotrope-like compositions of octamethyltrisiloxane
US6355113B1 (en) Multiple solvent cleaning system
US5035828A (en) Solvents containing dichlorotetrafluoropropane
US5135676A (en) Cleaning compositions formed of hydrogen-containing fluorochlorohydrocarbons and partially fluorinated alkanols
US5114609A (en) Cleaning compositions
EP0742292B1 (fr) Compositions azéotropiques contenant de l'octaméthylcyclotétrasiloxane
AU7047094A (en) Multiple solvent cleaning system
EP0444598A1 (fr) Compositions de solvants azéotropes
JPH10324652A (ja) 含フッ素エーテルと塩素系有機溶剤からなる共沸及び共沸様組成物
JPH01304194A (ja) 共沸組成物
EP0450854A2 (fr) Nettoyage au solvant d'articles
US5965511A (en) Cleaning or drying compositions based on 1,1,1,2,3,4,4,5,5,5-decafluoropentane
EP0450856A2 (fr) Nettoyage d'articles au solvant
US5246618A (en) Cleaning compositions (containing fluorochlorocarbon, C1 to C4 alkanol and ethyl or methyl proprionate)
Kenyon New, long term alternative fluorosolvents for electronics cleaning & drying applications
WO1999002615A1 (fr) Compositions azeotropes, et du type azeotrope, de 1-bromopropane et de dichloropentafluoropropanes
JPH02286797A (ja) 共沸組成物

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE CH DE DK ES FR GB IT LI NL SE

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT BE CH DE DK ES FR GB IT LI NL SE

17P Request for examination filed

Effective date: 19920505

17Q First examination report despatched

Effective date: 19950316

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: MINNESOTA MINING AND MANUFACTURING COMPANY

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH DE DK ES FR GB IT LI NL SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY

Effective date: 19991027

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19991027

REF Corresponds to:

Ref document number: 186071

Country of ref document: AT

Date of ref document: 19991115

Kind code of ref document: T

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REF Corresponds to:

Ref document number: 69131737

Country of ref document: DE

Date of ref document: 19991202

ITF It: translation for a ep patent filed

Owner name: JACOBACCI & PERANI S.P.A.

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20000127

ET Fr: translation filed
REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2140382

Country of ref document: ES

Kind code of ref document: T3

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20040511

Year of fee payment: 14

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050331

BERE Be: lapsed

Owner name: *MINNESOTA MINING AND MFG CY

Effective date: 20050331

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20060228

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: ES

Payment date: 20070326

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 20070328

Year of fee payment: 17

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee

Effective date: 20071001

BERE Be: lapsed

Owner name: *MINNESOTA MINING AND MFG CY

Effective date: 20050331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20071001

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20080327

Year of fee payment: 18

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20080430

Year of fee payment: 18

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20080329

Year of fee payment: 18

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080331

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080331

REG Reference to a national code

Ref country code: ES

Ref legal event code: FD2A

Effective date: 20080328

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080328

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20090317

Year of fee payment: 19

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20090327

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20091001

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20090327

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20101130

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20090327