EP0430803A1 - Process and installation for air distillation with argon production - Google Patents

Process and installation for air distillation with argon production Download PDF

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Publication number
EP0430803A1
EP0430803A1 EP90403373A EP90403373A EP0430803A1 EP 0430803 A1 EP0430803 A1 EP 0430803A1 EP 90403373 A EP90403373 A EP 90403373A EP 90403373 A EP90403373 A EP 90403373A EP 0430803 A1 EP0430803 A1 EP 0430803A1
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Prior art keywords
column
pressure column
fraction
rich liquid
installation
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EP90403373A
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German (de)
French (fr)
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EP0430803B1 (en
Inventor
Maurice Grenier
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Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
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Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04642—Recovering noble gases from air
    • F25J3/04648—Recovering noble gases from air argon
    • F25J3/04654—Producing crude argon in a crude argon column
    • F25J3/04666—Producing crude argon in a crude argon column as a parallel working rectification column of the low pressure column in a dual pressure main column system
    • F25J3/04672—Producing crude argon in a crude argon column as a parallel working rectification column of the low pressure column in a dual pressure main column system having a top condenser
    • F25J3/04678—Producing crude argon in a crude argon column as a parallel working rectification column of the low pressure column in a dual pressure main column system having a top condenser cooled by oxygen enriched liquid from high pressure column bottoms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04151—Purification and (pre-)cooling of the feed air; recuperative heat-exchange with product streams
    • F25J3/04187—Cooling of the purified feed air by recuperative heat-exchange; Heat-exchange with product streams
    • F25J3/0423—Subcooling of liquid process streams
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04248—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
    • F25J3/04254—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using the cold stored in external cryogenic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/0446—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using the heat generated by mixing two different phases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00—Processes or apparatus using separation by rectification
    • F25J2200/04—Processes or apparatus using separation by rectification in a dual pressure main column system
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00—Processes or apparatus using separation by rectification
    • F25J2200/04—Processes or apparatus using separation by rectification in a dual pressure main column system
    • F25J2200/06—Processes or apparatus using separation by rectification in a dual pressure main column system in a classical double column flow-sheet, i.e. with thermal coupling by a main reboiler-condenser in the bottom of low pressure respectively top of high pressure column
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00—Processes or apparatus using separation by rectification
    • F25J2200/90—Details relating to column internals, e.g. structured packing, gas or liquid distribution
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00—Processes or apparatus using separation by rectification
    • F25J2200/90—Details relating to column internals, e.g. structured packing, gas or liquid distribution
    • F25J2200/94—Details relating to the withdrawal point
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2210/00—Processes characterised by the type or other details of the feed stream
    • F25J2210/42—Nitrogen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2250/00—Details related to the use of reboiler-condensers
    • F25J2250/20—Boiler-condenser with multiple exchanger cores in parallel or with multiple re-boiling or condensing streams
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2250/00—Details related to the use of reboiler-condensers
    • F25J2250/30—External or auxiliary boiler-condenser in general, e.g. without a specified fluid or one fluid is not a primary air component or an intermediate fluid
    • F25J2250/50—One fluid being oxygen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2250/00—Details related to the use of reboiler-condensers
    • F25J2250/30—External or auxiliary boiler-condenser in general, e.g. without a specified fluid or one fluid is not a primary air component or an intermediate fluid
    • F25J2250/52—One fluid being oxygen enriched compared to air, e.g. "crude oxygen"
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S62/00—Refrigeration
    • Y10S62/923—Inert gas
    • Y10S62/924—Argon

Definitions

  • the present invention relates to the technique of air distillation with production of argon by means of a double column air distillation installation. It relates firstly to a process of the type in which the air to be treated, purified of water and CO2 and cooled near its dew point, is injected at the base of the medium pressure column of the double column ; a first fraction of rich liquid, drawn off from the tank of the medium pressure column, is expanded and sent to a condenser at the top of a column for the production of impure argon connected to the low pressure column of the double column; and a second fraction of rich liquid, drawn off at the bottom of the medium pressure column, is expanded and injected under reflux into the low pressure column.
  • the air installations must be equipped with a turbine in which a fraction is expanded significant flow of incoming air, for example 15 to 17% of this flow, or an equivalent medium pressure nitrogen flow.
  • the object of the invention is to make it possible to maintain a high yield of argon extraction despite this unfavorable factor.
  • the installation shown in FIG. 1 essentially comprises a double distillation column 1, an impure argon production column 2, and a section of mixing column 3.
  • the pressures indicated are approximate absolute pressures.
  • the double column 1 comprises a medium pressure column 4 operating at around 6 ⁇ 105 Pa, surmounted by a low pressure column 5 operating slightly above 1 ⁇ 105 Pa.
  • a vaporizer-condenser 6 puts the vapor at the head of the column 4 (nitrogen) in heat exchange relationship with the bottom liquid of column 5 (approximately pure oxygen).
  • a gas line 7 called argon tapping connects an intermediate point of column 5 to the lower part of column 2, from the bottom of which a liquid return line 8 joins column 5, at approximately the same level.
  • Column 2 includes a head condenser 9.
  • the sub-cooler 11 is cooled by natural circulation of oxygen, taken in liquid form in the tank of the column 5 and returned to the latter after at least partial vaporization.
  • a second rich liquid LR2 is withdrawn from column 4 a few trays above the tank, and more precisely near the level where the argon concentration is maximum.
  • This liquid after sub-cooling in 11, is expanded in an expansion valve 15 and sent under reflux at an intermediate point of the column 5, above the outlet of the pipe 13.
  • "Lower lean liquid”, rich in nitrogen, is taken from an intermediate point in column 4 located above the LR2 liquid, then, after expansion, sent back to reflux at the top of column 5, via a pipe 16.
  • the section of column 3 although having a structure analogous to a distillation column with trays or packed, functions as a mixing column: the liquid which it receives at the head is less rich in nitrogen, and therefore less cold , than that which it produces in tanks, which corresponds to a heat pump operation obtained thanks to the energy recovered by re-mixing, under conditions close to reversibility, of the liquid LR1 and of impure nitrogen.
  • Line 17A thus supplies additional oxygen-poor reflux liquid at the top of column 5, and the vapor produced at the top of section 3 is evacuated from the installation via line 18 as waste gas.
  • the low pressure column 5 is further surmounted by a "minaret” 19 used for the production of pure nitrogen at 1 ⁇ 105 Pa.
  • This "minaret” communicates at its base with the top of the column 5 and is therefore supplied by part of the impure nitrogen produced by it.
  • Its reflux consists of liquid nitrogen arriving via a line 20.
  • the low pressure nitrogen is produced at the top of the "minaret” 19 and evacuated via a line 21.
  • the installation can also produce gaseous oxygen, liquid oxygen, medium pressure nitrogen gas and medium pressure liquid nitrogen, via respective pipes 22 to 25.
  • Part of the nitrogen gas is liquefied by means of an auxiliary liquefaction cycle (not shown), and part of the liquid nitrogen thus produced feeds line 20.
  • part of the second stream of liquid LR1 (liquid LR1 not vaporized in the condenser 9) could be sent directly under reflux, after expansion, in column 5.
  • the impure argon is produced in gaseous form and evacuated from the top of the column 2 via a pipe 26.
  • the installation does not produce low pressure nitrogen, so that the minaret 19 is eliminated.
  • the mixing section 3 is then placed directly above the column 5, in the same shell, and the lines 17, 17A and 21 are eliminated.
  • the pipe 20 is eliminated, and the single pipe 16 for supplying lean liquid to the column 5 opens just below the base of the section 3.
  • a pipe 27d is also shown in FIG. 2 introduction of liquid nitrogen at the top of column 4.
  • the installation shown in FIG. 3 differs from that of FIG. 1 only by the elimination of the mixing section 3: the fraction of the rich liquid LR1 not sent to the condenser 9 is directly sent, after expansion in the expansion valve 14, in column 5, and the waste gas discharged through line 18 consists of at least part of the gas resulting from the total vaporization of rich liquid LR1 carried out in the condenser 9, the rest of this gas being, as previously, sent to column 5 via line 13.
  • a line 17B makes it possible to remove a second waste gas from the installation, consisting of impure nitrogen, from the top of column 5.
  • the liquid expanded at 14 is injected into column 5 above the point of injection of the liquid LR2, because it is less rich in argon than the latter. This promotes the argon extraction yield of the installation.
  • the installation shown in Figure 4 differs from the previous one only in that all of the LR1 liquid is, after expansion in the valve 12, sent to the condenser 9, where it is only partially vaporized.
  • the non-vaporized liquid, enriched in oxygen, is sent to reflux in column 5 via a line 28, and the gas resulting from the vaporization is, as in FIG. 3, partially evacuated from the installation as waste gas via the line 18.
  • this liquid is richer in argon than the liquid LR2, and the pipe 28 consequently leads below the liquid LR2.

Abstract

Upper rich liquid (LR2) drawn off at an intermediate point of the intermediate-pressure column (4) is decompressed and sent as reflux to the low-pressure column (5). The lower rich liquid (LR1) drawn off at the vessel of the intermediate-pressure column (4) and less rich in argon than the preceding one, is employed at least partly to form a residual gas of the plant, for example after remixing in a column section (3) with impure nitrogen drawn off at the head of the low-pressure column. <IMAGE>

Description

La présente invention est relative à la technique de distillation d'air avec production d'argon au moyen d'une installation de distillation d'air à double colonne. Elle concerne en premier lieu un procédé du type dans lequel de l'air à traiter, épuré de l'eau et du CO₂ et refroidi au voisinage de son point de rosée, est injecté à la base de la colonne moyenne pression de la double colonne; une première fraction de liquide riche, soutirée en cuve de la colonne moyenne pression, est détendue et envoyée dans un condenseur de tête d'une colonne de production d'argon impur reliée à la colonne basse pression de la double colonne; et une seconde fraction de liquide riche, soutirée à la partie inférieure de la colonne moyenne pression, est détendue et injectée en reflux dans la colonne basse pression.The present invention relates to the technique of air distillation with production of argon by means of a double column air distillation installation. It relates firstly to a process of the type in which the air to be treated, purified of water and CO₂ and cooled near its dew point, is injected at the base of the medium pressure column of the double column ; a first fraction of rich liquid, drawn off from the tank of the medium pressure column, is expanded and sent to a condenser at the top of a column for the production of impure argon connected to the low pressure column of the double column; and a second fraction of rich liquid, drawn off at the bottom of the medium pressure column, is expanded and injected under reflux into the low pressure column.

Pour assurer certaines productions, par exemple de l'argon sous forme liquide, ainsi que de l'oxygène et de l'azote, également sous forme liquide, les installations d'air doivent être équipées d'une turbine dans laquelle est détendue une fraction importante du débit d'air entrant, par exemple 15 à 17% de ce débit, ou un débit équivalent d'azote moyenne pression.To ensure certain productions, for example argon in liquid form, as well as oxygen and nitrogen, also in liquid form, the air installations must be equipped with a turbine in which a fraction is expanded significant flow of incoming air, for example 15 to 17% of this flow, or an equivalent medium pressure nitrogen flow.

Cependant, ceci conduit à une dégradation des conditions de distillation dans la colonne basse pression, qui se traduit notamment par une baisse du rendement d'extraction en argon. Un soutirage direct d'azote moyenne pression conduit à des conséquences analogues.However, this leads to a degradation of the distillation conditions in the low pressure column, which is reflected in particular by a drop in the argon extraction yield. Direct withdrawal of medium pressure nitrogen leads to similar consequences.

L'invention a pour but de permettre de conserver un rendement élevé d'extraction en argon malgré ce facteur défavorable.The object of the invention is to make it possible to maintain a high yield of argon extraction despite this unfavorable factor.

A cet effet, l'invention a pour objet un procédé du type précité, caractérisé en ce que:

  • (a) la seconde fraction de liquide riche est soutirée en un point intermédiaire de la colonne moyenne pression; et
  • (b) on forme un gaz résiduaire de l'installation à partir d'au moins une partie du liquide riche soutiré en cuve de la colonne moyenne pression.
To this end, the invention relates to a process of the aforementioned type, characterized in that:
  • (a) the second fraction of rich liquid is drawn off at an intermediate point of the medium pressure column; and
  • (b) forming a residual gas from the installation from at least part of the rich liquid drawn off from the bottom of the medium pressure column.

L'invention a également pour objet une installation destinée à la mise en oeuvre d'un tel procédé. Cette installation, du type comprenant une double colonne de distillation comportant une colonne moyenne pression et une colonne basse pression, une colonne de production d'argon impur reliée à la colonne basse pression et comportant un condenseur de tête, des moyens pour envoyer dans le condenseur de tête une première fraction de liquide riche soutirée en cuve de la colonne moyenne pression, et des moyens pour envoyer en reflux dans la colonne basse pression, après détente, une seconde fraction de liquide riche soutirée à la partie inférieure de la colonne moyenne pression, est caractérisée en ce que:

  • (a) la seconde fraction de liquide riche est soutirée en un point intermédiaire de la colonne moyenne pression; et
  • (b) l'installation comprend des moyens auxiliaires pour former un gaz résiduaire de l'installation à partir d'au moins une partie du liquide riche soutiré en cuve de la colonne moyenne pression.
The invention also relates to an installation intended for the implementation of such a method. This installation, of the type comprising a double distillation column comprising a medium pressure column and a low pressure column, a column for producing impure argon connected to the low pressure column and comprising a head condenser, means for sending into the condenser at the head a first fraction of rich liquid withdrawn from the bottom of the medium pressure column, and means for sending reflux into the low pressure column, after expansion, a second fraction of rich liquid withdrawn from the bottom of the medium pressure column, is characterized in that:
  • (a) the second fraction of rich liquid is drawn off at an intermediate point of the medium pressure column; and
  • (b) the installation comprises auxiliary means for forming a residual gas from the installation from at least part of the rich liquid withdrawn from the bottom of the medium pressure column.

Quelques exemples de mise en oeuvre de l'invention vont maintenant être décrits en regard des dessins annexés, sur lesquels:

  • la figure 1 représente schématiquement une installation de distillation d'air conforme à l'invention; et
  • les figures 2 à 4 sont des vues analogues de trois variantes.
Some examples of implementation of the invention will now be described with reference to the accompanying drawings, in which:
  • Figure 1 schematically shows an air distillation installation according to the invention; and
  • Figures 2 to 4 are similar views of three variants.

L'installation représentée à la figure 1 comprend essentiellement une double colonne de distillation 1, une colonne de production d'argon impur 2, et un tronçon de colonne de mélange 3. Dans ce qui suit, les pressions indiquées sont des pressions absolues approximatives.The installation shown in FIG. 1 essentially comprises a double distillation column 1, an impure argon production column 2, and a section of mixing column 3. In the following, the pressures indicated are approximate absolute pressures.

La double colonne 1 comprend une colonne moyenne pression 4 fonctionnant vers 6 × 10⁵ Pa, surmontée d'une colonne basse pression 5 fonctionnant un peu au-dessus de 1 × 10⁵ Pa. Un vaporiseur-condenseur 6 met la vapeur de tête de la colonne 4 (azote) en relation d'échange thermique avec le liquide de cuve de la colonne 5 (oxygène à peu près pur). Une conduite de gaz 7 dite de piquage argon relie un point intermédiaire de la colonne 5 à la partie inférieure de la colonne 2, du fond de laquelle une conduite de retour de liquide 8 rejoint la colonne 5, à peu près au même niveau. La colonne 2 comporte un condenseur de tête 9.The double column 1 comprises a medium pressure column 4 operating at around 6 × 10⁵ Pa, surmounted by a low pressure column 5 operating slightly above 1 × 10⁵ Pa. A vaporizer-condenser 6 puts the vapor at the head of the column 4 (nitrogen) in heat exchange relationship with the bottom liquid of column 5 (approximately pure oxygen). A gas line 7 called argon tapping connects an intermediate point of column 5 to the lower part of column 2, from the bottom of which a liquid return line 8 joins column 5, at approximately the same level. Column 2 includes a head condenser 9.

L'air à séparer, comprimé et épuré en eau et en CO₂, par exemple par adsorption, est injecté à la base de la colonne 4. Un premier "liquide riche" (air enrichi en oxygène) LR1, constitué par le liquide recueilli en cuve de la colonne 4, est soutiré via une conduite 10, sous-refroidi dans un sous-refroidisseur 11, et divisé en deux flux ou fractions:

  • un premier flux est détendu dans une vanne de détente 12 et entièrement vaporisé dans le condenseur 9. Le gaz résultant est envoyé dans la colonne 5 via une conduite 13;
  • le reste est détendu dans une vanne de détente 14 et envoyé au sommet du tronçon de colonne 3.
The air to be separated, compressed and purified in water and CO₂, for example by adsorption, is injected at the base of column 4. A first "rich liquid" (air enriched in oxygen) LR1, consisting of the liquid collected in column 4 tank, is withdrawn via a pipe 10, sub-cooled in a sub-cooler 11, and divided into two streams or fractions:
  • a first flow is expanded in an expansion valve 12 and entirely vaporized in the condenser 9. The resulting gas is sent to the column 5 via a line 13;
  • the rest is expanded in an expansion valve 14 and sent to the top of the column section 3.

Le sous-refroidisseur 11 est refroidi par circulation naturelle d'oxygène, prélevé sous forme liquide en cuve de la colonne 5 et renvoyé dans celle-ci après vaporisation au moins partielle.The sub-cooler 11 is cooled by natural circulation of oxygen, taken in liquid form in the tank of the column 5 and returned to the latter after at least partial vaporization.

Un second liquide riche LR2, dit liquide riche supérieur, est soutiré de la colonne 4 quelques plateaux au-dessus de la cuve, et plus précisément au voisinage du niveau où la concentration en argon est maximale. Ce liquide, après sous-refroidissement en 11, est détendu dans une vanne de détente 15 et envoyé en reflux en un point intermédiaire de la colonne 5, au-dessus du débouché de la conduite 13. Du "liquide pauvre inférieur", riche en azote, est prélevé en un point intermédiaire de la colonne 4 situé au-dessus du liquide LR2, puis, après détente, envoyé en reflux au sommet de la colonne 5, via une conduite 16.A second rich liquid LR2, called upper rich liquid, is withdrawn from column 4 a few trays above the tank, and more precisely near the level where the argon concentration is maximum. This liquid, after sub-cooling in 11, is expanded in an expansion valve 15 and sent under reflux at an intermediate point of the column 5, above the outlet of the pipe 13. "Lower lean liquid", rich in nitrogen, is taken from an intermediate point in column 4 located above the LR2 liquid, then, after expansion, sent back to reflux at the top of column 5, via a pipe 16.

Au sommet de la colonne 5 est produit de l'azote impur, contenant une petite quantité d'oxygène, qui est envoyé à la base du tronçon 3 via une conduite 17; du fond du même tronçon part une conduite de liquide 17A qui débouche au sommet de la colonne 5.At the top of column 5 is produced impure nitrogen, containing a small amount of oxygen, which is sent to the base of section 3 via a pipe 17; from the bottom of the same section leaves a liquid pipe 17A which opens at the top of the column 5.

Ainsi, le tronçon de colonne 3, bien qu'ayant une structure analogue à une colonne de distillation à plateaux ou à garnissage, fonctionne en colonne de mélange: le liquide qu'il reçoit en tête est moins riche en azote, et donc moins froid, que celui qu'il produit en cuve, ce qui correspond à un fonctionnement en pompe à chaleur obtenu grâce à l'énergie récupérée par re-mélange, dans des conditions voisines de la réversibilité, du liquide LR1 et de l'azote impur.Thus, the section of column 3, although having a structure analogous to a distillation column with trays or packed, functions as a mixing column: the liquid which it receives at the head is less rich in nitrogen, and therefore less cold , than that which it produces in tanks, which corresponds to a heat pump operation obtained thanks to the energy recovered by re-mixing, under conditions close to reversibility, of the liquid LR1 and of impure nitrogen.

La conduite 17A fournit ainsi un supplément de liquide de reflux pauvre en oxygène au sommet de la colonne 5, et la vapeur produite au sommet du tronçon 3 est évacuée de l'installation via une conduite 18 en tant que gaz résiduaire.Line 17A thus supplies additional oxygen-poor reflux liquid at the top of column 5, and the vapor produced at the top of section 3 is evacuated from the installation via line 18 as waste gas.

La colonne basse pression 5 est de plus surmontée d'un "minaret" 19 servant à la production d'azote pur sous 1 × 10⁵ Pa. Ce "minaret" communique à sa base avec le sommet de la colonne 5 et est donc alimenté par une partie de l'azote impur produit par celle-ci. Son reflux est constitué par de l'azote liquide arrivant via une conduite 20. L'azote basse pression est produit au sommet du "minaret" 19 et évacué via une conduite 21.The low pressure column 5 is further surmounted by a "minaret" 19 used for the production of pure nitrogen at 1 × 10⁵ Pa. This "minaret" communicates at its base with the top of the column 5 and is therefore supplied by part of the impure nitrogen produced by it. Its reflux consists of liquid nitrogen arriving via a line 20. The low pressure nitrogen is produced at the top of the "minaret" 19 and evacuated via a line 21.

L'installation peut produire par ailleurs de l'oxygène gazeux, de l'oxygène liquide, de l'azote gazeux moyenne pression et de l'azote liquide moyenne pression, via des conduites respectives 22 à 25. Une partie de l'azote gazeux est liquéfiée au moyen d'un cycle de liquéfaction auxiliaire (non représenté), et une partie de l'azote liquide ainsi produit alimente la conduite 20.The installation can also produce gaseous oxygen, liquid oxygen, medium pressure nitrogen gas and medium pressure liquid nitrogen, via respective pipes 22 to 25. Part of the nitrogen gas is liquefied by means of an auxiliary liquefaction cycle (not shown), and part of the liquid nitrogen thus produced feeds line 20.

En variante, une partie du second flux de liquide LR1 (liquide LR1 non vaporisé dans le condenseur 9) pourrait être envoyée directement en reflux, après détente, dans la colonne 5.As a variant, part of the second stream of liquid LR1 (liquid LR1 not vaporized in the condenser 9) could be sent directly under reflux, after expansion, in column 5.

L'argon impur est produit sous forme gazeuse et évacué du sommet de la colonne 2 via une conduite 26.The impure argon is produced in gaseous form and evacuated from the top of the column 2 via a pipe 26.

On retrouve sur la figure 2 l'essentiel des éléments décrits ci-dessus en regard de la figure 1. Les différences sont les suivantes:We find in Figure 2 most of the elements described above with reference to Figure 1. The differences are as follows:

D'une part, l'installation ne produit pas d'azote basse pression, de sorte que le minaret 19 est supprimé. Pour simplifier la construction, le tronçon de mélange 3 est alors disposé directement au-dessus de la colonne 5, dans la même virole, et les conduites 17, 17A et 21 sont supprimées. De plus, la conduite 20 est supprimée, et l'unique conduite 16 d'alimentation en liquide pauvre de la colonne 5 débouche juste au-dessous de la base du tronçon 3. On a par ailleurs représenté à la figure 2 une conduite 27 d'introduction d'azote liquide au sommet de la colonne 4.On the one hand, the installation does not produce low pressure nitrogen, so that the minaret 19 is eliminated. To simplify construction, the mixing section 3 is then placed directly above the column 5, in the same shell, and the lines 17, 17A and 21 are eliminated. In addition, the pipe 20 is eliminated, and the single pipe 16 for supplying lean liquid to the column 5 opens just below the base of the section 3. A pipe 27d is also shown in FIG. 2 introduction of liquid nitrogen at the top of column 4.

D'autre part, la totalité du liquide riche LR1 est envoyée, après détente dans la vanne 12, dans le condenseur 9. Dans celui-ci, seule une partie du liquide est vaporisée, le gaz résultant étant envoyé comme précédemment dans la colonne 5 via la conduite 13. Le liquide non vaporisé, enrichi en oxygène, est envoyé, comme précédemment, au sommet du tronçon 3. Comme précédemment, une partie du liquide non vaporisé pourrait être envoyée directement en reflux dans la colonne 5.On the other hand, all of the rich liquid LR1 is sent, after expansion in the valve 12, in the condenser 9. In this, only part of the liquid is vaporized, the resulting gas being sent as previously to column 5 via line 13. The non-vaporized liquid, enriched in oxygen, is sent, as before, to the top of the section 3. As before, part of the non-vaporized liquid could be sent directly to reflux in column 5.

L'installation représentée à la figure 3 ne diffère de celle de la figure 1 que par la suppression du tronçon de mélange 3: la fraction du liquide riche LR1 non envoyée au condenseur 9 est directement envoyée, après détente dans la vanne de détente 14, dans la colonne 5, et le gaz résiduaire évacué par la conduite 18 est constitué par au moins une partie du gaz résultant de la vaporisation totale de liquide riche LR1 effectuée dans le condenseur 9, le reste de ce gaz étant, comme précédemment, envoyé dans la colonne 5 via la conduite 13. Une conduite 17B permet d'évacuer un second gaz résiduaire de l'installation, constitué d'azote impur, à partir du sommet de la colonne 5.The installation shown in FIG. 3 differs from that of FIG. 1 only by the elimination of the mixing section 3: the fraction of the rich liquid LR1 not sent to the condenser 9 is directly sent, after expansion in the expansion valve 14, in column 5, and the waste gas discharged through line 18 consists of at least part of the gas resulting from the total vaporization of rich liquid LR1 carried out in the condenser 9, the rest of this gas being, as previously, sent to column 5 via line 13. A line 17B makes it possible to remove a second waste gas from the installation, consisting of impure nitrogen, from the top of column 5.

Il est à noter que, bien qu'il soit plus riche en oxygène que le liquide LR2, le liquide détendu en 14 est injecté dans la colonne 5 au-dessus du point d'injection du liquide LR2, car il est moins riche en argon que ce dernier. Ceci favorise le rendement d'extraction en argon de l'installation.It should be noted that, although it is richer in oxygen than the liquid LR2, the liquid expanded at 14 is injected into column 5 above the point of injection of the liquid LR2, because it is less rich in argon than the latter. This promotes the argon extraction yield of the installation.

L'installation représentée à la figure 4 ne diffère de la précédente que par le fait que la totalité du liquide LR1 est, après détente dans la vanne 12, envoyé dans le condenseur 9, où il n'est vaporisé que partiellement. Le liquide non vaporisé, enrichi en oxygène, est envoyé en reflux dans la colonne 5 via une conduite 28, et le gaz résultant de la vaporisation est, comme à la figure 3, partiellement évacué de l'installation en tant que gaz résiduaire via la conduite 18. Pour la même raison qu'à la figure 3, c'est la teneur en argon du liquide véhiculé par la conduite 28 qui gouverne le niveau d'injection de ce liquide dans la colonne 5.The installation shown in Figure 4 differs from the previous one only in that all of the LR1 liquid is, after expansion in the valve 12, sent to the condenser 9, where it is only partially vaporized. The non-vaporized liquid, enriched in oxygen, is sent to reflux in column 5 via a line 28, and the gas resulting from the vaporization is, as in FIG. 3, partially evacuated from the installation as waste gas via the line 18. For the same reason as in FIG. 3, it is the argon content of the liquid conveyed through line 28 which governs the level of injection of this liquid into column 5.

Dans l'exemple représenté, ce liquide est plus riche en argon que le liquide LR2, et la conduite 28 aboutit par conséquent au-dessous du liquide LR2.In the example shown, this liquid is richer in argon than the liquid LR2, and the pipe 28 consequently leads below the liquid LR2.

Claims (15)

Procédé de distillation d'air avec production d'argon au moyen d'une installation de distillation d'air à double colonne (1), du type dans lequel de l'air à traiter, épuré de l'eau et du CO₂ et refroidi au voisinage de son point de rosée, est injecté à la base de la colonne moyenne pression (4) de la double colonne; une première fraction de liquide riche (LR₁), soutirée en cuve de la colonne moyenne pression, est détendue et envoyée dans un condenseur de tête (9) d'une colonne de production d'argon impur (2) reliée à la colonne basse pression (5) de la double colonne; et une seconde fraction de liquide riche (LR₂), soutirée à la partie inférieure de la colonne moyenne pression, est détendue et injectée en reflux dans la colonne basse pression, caractérisé en ce que: (a) la seconde fraction de liquide riche (LR₂) est soutirée en un point intermédiaire de la colonne moyenne pression (4); et (b) on forme un gaz résiduaire de l'installation à partir d'au moins une partie du liquide riche (LR₁) soutiré en cuve de la colonne moyenne pression. Air distillation process with production of argon by means of a double column air distillation installation (1), of the type in which the air to be treated, purified from water and CO₂ and cooled near its dew point, is injected at the base of the medium pressure column (4) of the double column; a first fraction of rich liquid (LR₁), drawn off in the tank of the medium pressure column, is expanded and sent to a top condenser (9) of an impure argon production column (2) connected to the low pressure column (5) of the double column; and a second fraction of rich liquid (LR₂), drawn off at the bottom of the medium pressure column, is expanded and injected under reflux into the low pressure column, characterized in that: (a) the second fraction of rich liquid (LR₂) is drawn off at an intermediate point in the medium pressure column (4); and (b) forming a residual gas from the installation from at least part of the rich liquid (LR₁) withdrawn from the bottom of the medium pressure column. Procédé suivant la revendication 1, caractérisé en ce que le point intermédiaire est voisin de celui où la teneur en argon dans la colonne moyenne pression est maximale.Process according to Claim 1, characterized in that the intermediate point is close to that where the argon content in the medium pressure column is maximum. Procédé suivant l'une des revendications 1 et 2, caractérisé en ce qu'on envoie une troisième fraction de liquide riche (LR₁), soutirée en cuve de la colonne moyenne pression (4), en tête d'un tronçon de colonne de mélange (3) alimenté en cuve par de l'azote impur soutiré en tête de la colonne basse pression (5), le liquide produit en cuve de ce tronçon étant envoyé en reflux dans la colonne basse pression et la vapeur de tête de ce tronçon étant évacuée de l'installation et constituant le gaz résiduaire.Method according to one of claims 1 and 2, characterized in that a third fraction of rich liquid (LR₁) is sent, drawn off in the tank of the medium pressure column (4), at the head of a section of mixing column (3) fed into the tank by impure nitrogen drawn off at the head of the low pressure column (5), the liquid produced in the tank of this section being sent into reflux in the low pressure column and the head vapor of this section being evacuated from the installation and constituting the waste gas. Procédé suivant la revendication 3, caractérisé en ce qu'on vaporise totalement la première fraction de liquide riche (LR₁) dans le condenseur de tête (9), le gaz résultant étant envoyé dans la colonne basse pression (5), la troisième fraction de liquide riche étant constituée par au moins une partie du reste du liquide riche (LR₁) soutiré en cuve de la colonne moyenne pression (4) (figure 1).Method according to claim 3, characterized in that the first fraction of rich liquid (LR₁) is completely vaporized in the overhead condenser (9), the resulting gas being sent to the low pressure column (5), the third fraction of rich liquid consisting of at least part of the rest of the rich liquid (LR₁) drawn off from the tank of the medium pressure column (4) (Figure 1). Procédé suivant l'une des revendications 1 et 2, caractérisé en ce qu'on vaporise partiellement la première fraction de liquide riche (LR₁) dans le condenseur de tête (9), et on envoie au moins une partie du liquide résultant de cette vaporisation partielle en tête d'un tronçon de colonne de mélange (3) alimenté en cuve par de l'azote impur soutiré en tête de la colonne basse pression (5), le liquide produit en cuve de ce tronçon étant envoyé en reflux dans la colonne basse pression et la vapeur de tête de ce tronçon étant évacuée de l'installation et constituant le gaz résiduaire (figure 2).Method according to either of Claims 1 and 2, characterized in that the first fraction of rich liquid (LR₁) is partially vaporized in the head condenser (9), and at least part of the liquid resulting from this vaporization is sent. partial at the head of a section of mixing column (3) supplied to the tank by impure nitrogen drawn off at the top of the low pressure column (5), the liquid produced in the tank of this section being sent back into the column low pressure and the top vapor of this section being evacuated from the installation and constituting the waste gas (Figure 2). Procédé suivant la revendication 5, caractérisé en ce que la première fraction de liquide riche (LR₁) est constituée par la totalité du liquide riche produit en cuve de la colonne moyenne pression (4).Method according to claim 5, characterized in that the first fraction of rich liquid (LR₁) consists of all of the rich liquid produced in the bottom of the medium pressure column (4). Procédé suivant l'une des revendications 1 et 2, caractérisé en ce qu'on vaporise totalement la première fraction de liquide riche (LR₁) dans le condenseur de tête (9), et on évacue de l'installation une partie au moins du gaz ainsi formé pour constituer le gaz résiduaire (figure 3).Process according to either of Claims 1 and 2, characterized in that the first fraction of rich liquid (LR₁) is completely vaporized in the overhead condenser, and at least part of the gas is removed from the installation thus formed to constitute the waste gas (Figure 3). Procédé suivant la revendication 7, caractérisé en ce que la première fraction de liquide riche (LR₁) ne constitue qu'une partie du liquide riche produit en cuve de la colonne moyenne pression (4), le reste de ce liquide riche étant directement envoyé, après détente, à un niveau de la colonne basse pression (5) supérieur au point d'injection de la seconde fraction de liquide riche (LR₂).Process according to claim 7, characterized in that the first fraction of rich liquid (LR₁) constitutes only part of the rich liquid produced in the bottom of the medium pressure column (4), the rest of this rich liquid being sent directly, after expansion, at a level of the low pressure column (5) greater than the point of injection of the second fraction of rich liquid (LR₂). Procédé suivant l'une des revendications 1 et 2, caractérisé en ce qu'on vaporise partiellement la première fraction (LR₁) dans le condenseur de tête (9), et on évacue de l'installation une partie au moins du gaz ainsi formé pour constituer le gaz résiduaire (figure 4).Process according to either of Claims 1 and 2, characterized in that the first fraction (LR₁) is partially vaporized in the head condenser (9) and at least part of the gas thus formed is removed from the installation. constitute the waste gas (Figure 4). Installation de distillation d'air, du type comprenant une double colonne de distillation (1) comprenant une colonne moyenne pression (4) et une colonne basse pression (5), une colonne de production d'argon impur (2) reliée à la colonne basse pression (5) et comportant un condenseur de tête (9), des moyens (10) pour envoyer dans le condenseur de tête (9) une première fraction de liquide riche (LR₁) soutirée en cuve de la colonne moyenne pression (4), et des moyens pour envoyer en reflux dans la colonne basse pression (5), après détente (en 15), une seconde fraction de liquide riche (LR₂) soutirée à la partie inférieure de la colonne moyenne pression, caractérisée en ce que: (a) la seconde fraction de liquide riche (LR₂) est soutirée en un point intermédiaire de la colonne moyenne pression (4); et (b) l'installation comprend des moyens auxiliaires (3, 9, 18) pour former un gaz résiduaire de l'installation à partir d'au moins une partie du liquide riche (LR₁) soutiré en cuve de la colonne moyenne pression. Air distillation installation, of the type comprising a double distillation column (1) comprising a medium pressure column (4) and a low pressure column (5), an impure argon production column (2) connected to the column low pressure (5) and comprising a head condenser (9), means (10) for sending into the head condenser (9) a first fraction of rich liquid (LR₁) withdrawn from the bottom of the medium pressure column (4) , and means for sending back into the low pressure column (5), after expansion (in 15), a second fraction of rich liquid (LR₂) drawn off at the bottom of the medium pressure column, characterized in that: (a) the second fraction of rich liquid (LR₂) is drawn off at an intermediate point of the medium pressure column (4); and (b) the installation comprises auxiliary means (3, 9, 18) for forming a residual gas from the installation from at least part of the rich liquid (LR₁) withdrawn from the bottom of the medium pressure column. Installation suivant la revendication 10, caractérisée en ce que le point intermédiaire est voisin de celui où la teneur en argon dans la colonne moyenne pression (4) est maximale.Installation according to claim 10, characterized in that the intermediate point is close to that where the argon content in the medium pressure column (4) is maximum. Installaton suivant l'une des revendications 10 et 11, caractérisée en ce que le condenseur de tête (9) est adapté pour vaporiser totalement la première fraction de liquide (LR₁), et en ce que les moyens auxiliaires comprennent un tronçon de colonne de mélange (3), des moyens pour envoyer en tête de ce tronçon une troisième fraction de liquide riche (LR₁) soutirée en cuve de la colonne moyenne pression (4) et pour envoyer en cuve du même tronçon de l'azote impur soutiré en tête de la colonne basse pression (5), des moyens (17A) pour envoyer en reflux dans la colonne basse pression du liquide produit en cuve du tronçon (3), et des moyens (18) pour évacuer de l'installation la vapeur de tête de ce tronçon, laquelle constitue le gaz résiduaire (figure 1).Installation according to one of claims 10 and 11, characterized in that the head condenser (9) is adapted to completely vaporize the first fraction of liquid (LR₁), and in that the auxiliary means comprise a section of mixing column (3), means for sending at the head of this section a third fraction of rich liquid (LR₁) withdrawn from the bottom of the medium pressure column (4) and for sending to the tank of the same section of impure nitrogen withdrawn at the top of the low pressure column (5), means (17A) for sending back into the low pressure column of the liquid produced in the tank of the section (3), and means (18) for evacuating the head vapor from the installation this section, which constitutes the waste gas (Figure 1). Installation suivant l'une des revendications 10 et 11, caractérisée en ce que le condenseur de tête (9) est adapté pour vaporiser partiellement la première fraction de liquide riche (LR₁), et en ce que les moyens auxiliaires comprennent un tronçon de colonne de mélange (3), des moyens pour envoyer en tête de ce tronçon au moins une partie du liquide résultant de cette vaporisation partielle et pour envoyer en cuve du même tronçon de l'azote impur soutiré en tête de la colonne basse pression (5), des moyens (17A) pour envoyer en reflux dans la colonne basse pression du liquide produit en cuve du tronçon, et des moyens (18) pour évacuer de l'installation la vapeur de tête de ce tronçon, laquelle constitue le gaz résiduaire (figure 2).Installation according to one of claims 10 and 11, characterized in that the head condenser (9) is adapted to partially vaporize the first fraction of rich liquid (LR₁), and in that the auxiliary means comprise a column section of mixture (3), means for sending at the head of this section at least part of the liquid resulting from this partial vaporization and for sending to the tank of the same section of impure nitrogen drawn off at the head of the low pressure column (5), means (17A) for sending reflux into the low pressure column of the liquid produced in the tank of the section, and means (18) for removing from the installation the overhead vapor of this section, which constitutes the waste gas (FIG. 2 ). Installation suivant l'une des revendications 10 et 11, caractérisé en ce que le condenseur de tête (9) est adapté pour vaporiser totalement la première fraction de liquide riche (LR₁), les moyens auxiliaires comprenant des moyens (18) pour évacuer de l'installation une partie au moins du gaz résiduaire ainsi formé (figure 3).Installation according to one of claims 10 and 11, characterized in that the head condenser (9) is adapted to completely vaporize the first fraction of rich liquid (LR₁), the auxiliary means comprising means (18) for discharging l 'installation at least part of the waste gas thus formed (Figure 3). Installation suivant l'une des revendications 10 et 11, caractérisée en ce que le condenseur de tête (9) est adapté pour vaporiser partiellement la première fraction de liquide riche (LR₁), les moyens auxiliaires comprenant des moyens (18) pour évacuer de l'installation une partie au moins du gaz résiduaire ainsi formé (figure 4).Installation according to one of claims 10 and 11, characterized in that the head condenser (9) is adapted to partially vaporize the first fraction of rich liquid (LR₁), the auxiliary means comprising means (18) for evacuating l 'installation at least part of the waste gas thus formed (Figure 4).
EP90403373A 1989-11-28 1990-11-28 Process and installation for air distillation with argon production Expired - Lifetime EP0430803B1 (en)

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EP0573176A2 (en) * 1992-05-19 1993-12-08 Air Products And Chemicals, Inc. Inter-column heat integration for multi-column distillation system
EP0573176A3 (en) * 1992-05-19 1995-02-15 Air Prod & Chem Inter-column heat integration for multi-column distillation system.
FR2801963A1 (en) * 1999-12-02 2001-06-08 Air Liquide PROCESS AND INSTALLATION FOR AIR SEPARATION BY CRYOGENIC DISTILLATION
EP1106945A1 (en) * 1999-12-02 2001-06-13 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process and system for air separation by cryogenic distillation
US6385996B2 (en) 1999-12-02 2002-05-14 L'air Liquide, Societe Anonyme Aodirectoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Process and installation for separation of air by cryogenic distillation

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DE69007032T2 (en) 1994-06-01
DE69007032D1 (en) 1994-04-07
EP0430803B1 (en) 1994-03-02
CA2030771A1 (en) 1991-05-29
JPH03181776A (en) 1991-08-07
US5079923A (en) 1992-01-14
FR2655137B1 (en) 1992-10-16
ES2049953T3 (en) 1994-05-01
FR2655137A1 (en) 1991-05-31

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