EP0425441A3 - Photoempfindliches Gemisch - Google Patents

Photoempfindliches Gemisch Download PDF

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Publication number
EP0425441A3
EP0425441A3 EP19900810803 EP90810803A EP0425441A3 EP 0425441 A3 EP0425441 A3 EP 0425441A3 EP 19900810803 EP19900810803 EP 19900810803 EP 90810803 A EP90810803 A EP 90810803A EP 0425441 A3 EP0425441 A3 EP 0425441A3
Authority
EP
European Patent Office
Prior art keywords
meth
weight
gew
von
eines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP19900810803
Other languages
English (en)
French (fr)
Other versions
EP0425441A2 (de
EP0425441B1 (de
Inventor
Max Dr. Hunziker
Manfred Dr. Hofmann
Adrian Dr. Schulthess
Paul Dr. Bernhard
Bernd Dr. Klingert
Rolf Dr. Wiesendanger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of EP0425441A2 publication Critical patent/EP0425441A2/de
Publication of EP0425441A3 publication Critical patent/EP0425441A3/de
Application granted granted Critical
Publication of EP0425441B1 publication Critical patent/EP0425441B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Flüssige Gemische, enthaltend
  • a) 5-25 Gew.-% eines monomeren aliphatischen oder cycloaliphatischen Di(meth)acrylats mit einem Molekulargewicht (MG) von höchstens 800,
  • b) 0-15 Gew.-% eines monomeren Poly(meth)acrylats mit einer Funktionalität von mindestens 3 und einem MG von höchstens 600,
  • c) 0-20 Gew.-% eines Mono(meth)acrylats oder einer Mono-N-vinylverbindung mit einem MG von höchstens 500,
  • d) 20-60 Gew.-% eines Urethan(meth)acrylats mit einer Funktionalität von 2 bis 4 und einem MG von 500 bis 10000,
  • e) 10-50 Gew.-% eines monomeren oder oligomeren Di(meth)acrylats auf Basis von Bisphenol A oder Bisphenol F,
  • f) 0,1-10 Gew.-% eines Photoinitiators und
  • g) 0-5 Gew.-% üblicher Additive, wobei der Anteil der Komponenten a) bis g) zusammen 100 Gew.-% beträgt, stellen photoempfindliche Gemische dar, die mittels aktinischer Bestrahlung polymerisiert werden können und sich vorzugsweise zur Herstellung von dreidimensionalen Gegenständen mittels des stereolithographischen Verfahrens eignen.
    • EP90810803A 1989-10-27 1990-10-19 Photoempfindliches Gemisch Expired - Lifetime EP0425441B1 (de)

    Applications Claiming Priority (4)

    Application Number Priority Date Filing Date Title
    CH390289 1989-10-27
    CH3902/89 1989-10-27
    CH966/90 1990-03-23
    CH96690 1990-03-23

    Publications (3)

    Publication Number Publication Date
    EP0425441A2 EP0425441A2 (de) 1991-05-02
    EP0425441A3 true EP0425441A3 (de) 1991-06-26
    EP0425441B1 EP0425441B1 (de) 1995-12-27

    Family

    ID=25686242

    Family Applications (1)

    Application Number Title Priority Date Filing Date
    EP90810803A Expired - Lifetime EP0425441B1 (de) 1989-10-27 1990-10-19 Photoempfindliches Gemisch

    Country Status (5)

    Country Link
    EP (1) EP0425441B1 (de)
    JP (1) JP3243565B2 (de)
    KR (1) KR0163588B1 (de)
    CA (1) CA2028541C (de)
    DE (1) DE59010008D1 (de)

    Families Citing this family (21)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    EP0506616B1 (de) * 1991-03-27 1998-01-21 Ciba SC Holding AG Photoempfindliches Gemisch auf Basis von Acrylaten
    EP0525578A1 (de) * 1991-08-02 1993-02-03 E.I. Du Pont De Nemours And Company Photopolymerzusammensetzung zur Herstellung von dreidimensionalen Objekten
    TW311923B (de) * 1992-01-27 1997-08-01 Ciba Sc Holding Ag
    TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
    ATE175034T1 (de) * 1993-08-26 1999-01-15 Ciba Geigy Ag Flüssige strahlungshärtbare zusammensetzung, insbesondere für die stereolithographie
    GB9504996D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
    GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
    GB9522656D0 (en) * 1995-11-04 1996-01-03 Zeneca Ltd Mould
    JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
    JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
    JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
    JP4839525B2 (ja) 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
    DE10328302A1 (de) * 2003-06-23 2005-01-27 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken
    DE102004050868A1 (de) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken
    KR100810998B1 (ko) * 2005-03-30 2008-03-11 주식회사 코오롱 프리즘 필름 및 그 제조방법
    US20110144271A1 (en) 2005-06-16 2011-06-16 Jsr Corporation Radioactive ray-curable liquid resin composition for use in optical stereolithography, and optically shaped article produced by curing the composition
    JP2008201913A (ja) 2007-02-20 2008-09-04 Fujifilm Corp 光重合性組成物
    SG11201906757PA (en) * 2017-02-10 2019-08-27 Basf Se Acrylate-based monomers for use as reactive diluents in printing formulations
    EP3580286B1 (de) 2017-02-10 2021-01-20 Basf Se Acrylatbasierte monomere zur verwendung als reaktive verdünner in druckformulierungen
    US11491709B2 (en) 2018-06-25 2022-11-08 Kj Chemicals Corporation Photo-curable resin composition for three-dimensional molding, method for three-dimensional molding using the same, and three-dimensional molded product
    KR20220095230A (ko) 2019-11-07 2022-07-06 바스프 에스이 3d 프린팅에 사용하기 위한 수-세척성 조성물

    Citations (2)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    EP0171069A2 (de) * 1984-08-08 1986-02-12 3D SYSTEMS, INC. (a California corporation) Stereolithographische Vorrichtung und Verfahren zur Herstellung von dreidimensionalen Gegenständen
    US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates

    Patent Citations (2)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    EP0171069A2 (de) * 1984-08-08 1986-02-12 3D SYSTEMS, INC. (a California corporation) Stereolithographische Vorrichtung und Verfahren zur Herstellung von dreidimensionalen Gegenständen
    US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates

    Also Published As

    Publication number Publication date
    DE59010008D1 (de) 1996-02-08
    EP0425441A2 (de) 1991-05-02
    KR0163588B1 (ko) 1998-12-15
    JP3243565B2 (ja) 2002-01-07
    EP0425441B1 (de) 1995-12-27
    KR910008491A (ko) 1991-05-31
    CA2028541C (en) 2000-05-16
    JPH03160013A (ja) 1991-07-10
    CA2028541A1 (en) 1991-04-28

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