EP0414189A1 - Procédé pour produire un support en aluminium pour une plaque d'impression - Google Patents

Procédé pour produire un support en aluminium pour une plaque d'impression Download PDF

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Publication number
EP0414189A1
EP0414189A1 EP90115928A EP90115928A EP0414189A1 EP 0414189 A1 EP0414189 A1 EP 0414189A1 EP 90115928 A EP90115928 A EP 90115928A EP 90115928 A EP90115928 A EP 90115928A EP 0414189 A1 EP0414189 A1 EP 0414189A1
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EP
European Patent Office
Prior art keywords
aluminum
range
period
aluminum support
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP90115928A
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German (de)
English (en)
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EP0414189B1 (fr
Inventor
Akio C/O Fuji Photo Film Co. Ltd Uesugi
Tsutomu Fuji Photo Film Co. Ltd. Kakei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
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Fuji Photo Film Co Ltd
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Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of EP0414189A1 publication Critical patent/EP0414189A1/fr
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer

Definitions

  • This invention relates to a method of producing an aluminum support for a printing plate, and more particularly to a method of producing a grained aluminum support for an offset printing plate.
  • an aluminum plate (including aluminum alloy) has been used as a printing plate, such as an offset printing plate.
  • a printing plate such as an offset printing plate.
  • the surface of the aluminum plate should be uniformly and finely grained to meet the aforesaid requirements.
  • This graining process largely affects a printing performance and a durability of the printing plate upon the printing process following manufacture of the plate. Thus, it is important for the manufacture of the plate whether such graining is satisfactory or not.
  • an alternating current electrolytic graining method is used as the method of graining an aluminum support for a printing plate.
  • suitable alternating currents for example a sinewaveform, a squarewaveform, a special alternating waveform and the like.
  • this graining is usually conducted only one time, as the result of which, the depth of pits formed by the graining is small over the whole surface thereof. Also, the durability of the grained printing plate during printing will deteriorate. Therefore, in order to obtain a uniformly and closely grained aluminum plate satisfying the requirement of a printing plate with deep pits as compared with their diameters, a variety of methods have been proposed as follows.
  • One method is a graining method to use a current of particular waveform for an electrolytic source (Japanese Patent Laid-Open No. Sho 53-67507). Another method is to control a ratio between an electricity quantity of a positive period and that of a negative period at the time of alternating electrolytic graining (Japanese Patent Laid-Open No. Sho 54-65607). Still another method is to control the waveform supplied from electrolytic source (Japanese Patent Laid-Open No. Sho 55-25381). Finally, another method is directed to a combination of current density (Japanese Patent Laid-Open No. Sho 56-29699).
  • Japanese Patent Examined Publication No. Sho 61-60797 discloses obtaining a uniform graining surface as a result of supplying an alternating current to the aluminum plate, in which at least one of the positive period and negative period includes a rest period of 0 Volt, so that the electricity quantity of the positive period may be larger than that of the negative period.
  • An object of this invention is to provide a method of producing an aluminum support for a printing plate by using an electrolytic treatment and a current waveform, and in which an aluminum plate is more uniformly grained, resulting in stable quality for printing performance despite the irregular variations of a small amount of ingredients within the aluminum composition.
  • the foregoing object of the invention has been achieved by the provision of a method of producing an aluminum support for a printing plate by electrochemical graining, comprising steps of: soaking the aluminum support in an acid electrolytic liquid; and assuming that t F is the positive period and t R is the negative period, applying, between the aluminum support and the opposite electrode, an alternating current including periods in which the current reaches peak levels in the positive period t F and the negative period t R , respectively, being adjusted in the range of 0.1-20% of either period.
  • An acid electrolytic liquid according to the present invention is a liquid mainly containing nitric acid or hydrochloric acid.
  • a preferable concentration of the nitric acid is in the range of 5-50 g/l and a preferable concentration of aluminum in the electrolytic liquid is in the range of 2-20 g/l.
  • a preferable concentration of the hydrochloric acid is in the range of 5-100 g/l and a suitable concentration of aluminum is in the range of 2-30 g/l.
  • the electrolytic current be supplied by a current density in the range of 10-80 A/dm2 and the temperature of the electrolytic liquid be above 30°C.
  • the concentration of aluminum in the electrolytic liquid is caused by eluting constituents from the aluminum plate by the reaction of the anode, or caused by adjusting the density of nitric aluminum, or the like, as desired.
  • a frequency of electrolytic current for mass-production is in the range of 10-100 Hz.
  • an aluminum support is etched by an alkaline.
  • a preferable alkaline agent includes caustic soda, caustic potash, metasilicate soda, sodium carbonate, aluminate soda, gluconate soda or the like. It is preferable that a concentration of the alkaline agent is in the range of 0.01-20%, a temperature of the etching liquid is in the range of 20-90°C and an etching period is in the range of 5 secs. to 5 mins. Also, a preferable etching amount is in the range of 0.01-5 g/m2, and regarding an aluminum support containing a relatively large amount of impurities of manganese or the like, a preferable etching amount is in the range of 0.01-1 g/m2.
  • a desmut treatment may be performed, if necessary.
  • the aluminum plate is electrochemically grained in an acid electrolytic liquid using an alternating current.
  • An acid electrolytic liquid according to the present invention may include a liquid mainly containing nitric acid or hydrochloric acid.
  • a concentration of the nitric acid is in the range of 3-150 g/l, more preferably 5-50 g/l, and a concentration of aluminum is not larger than 50 g/l, more preferably in the range of 2-20 g/l.
  • a concentration of the hydrochloric acid is in the range of 2-250 g/l, more preferably 5-100 g/l, and a concentration of aluminum is not larger than 50 g/l, more preferably in the range of 2-30 g/l.
  • the electrolytic current it is preferable to supply the electrolytic current at a current density in the range of 5-100 A/dm2, more preferably 10-80 A/dm2.
  • a current density in the range of 5-100 A/dm2, more preferably 10-80 A/dm2.
  • the electric current waveform is selected in an inductance component and the like of an electric source, a busbar and an electrolytic cell.
  • FIG. 1 An alternating waveform shown in Fig. 1 is used as a current waveform.
  • I FP is the peak level in the positive period
  • I RP is the peak level in negative period
  • T1 is the period from a current of zero to peak level I FP
  • T2 is the period from a current of zero to peak level I RP .
  • Periods of the present invention are represented as: t F x 0.001 ⁇ T1 ⁇ t F x 0.2 t R x 0.001 ⁇ T2 ⁇ t R x 0.2
  • periods t F and t R As a result of causing periods t F and t R to meet the above conditions, a dissolving reaction on the anode and a smut producing reaction on the cathode are effectively conducted to produce uniform pits.
  • periods t F and t R though the above method is effective to reduce an inductance component of the electric source and the electrolytic cell as much as possible, in the case where an electric source of a large capacity is required for mass-production, the inductance component is inevitably increased due to enlargement of the electric source apparatus.
  • a method which forces the source voltage to be overworked to reduce periods t F and t R of the current waveform.
  • the preferable liquid may include phosphoric acid or mixture of phosphoric acid and chromic acid, as well as sulfuric acid described in Japanese Patent Examined Publication No. 56-11316.
  • An alkaline liquid such as a caustic soda described in Japanese Patent Examined Publication No. 48-28123 may be used to effect a weak etching treatment for removing the smut from the surface of the grained aluminum.
  • insoluble ingredients remain in the alkaline liquid since the aluminum surface is etched. It is, therefore, necessary to carry out a de-smut treatment in an acid solution, e.g., sulfuric acid, phosphoric acid, chromic acid or the like.
  • an oxidized surface of the anode have an amount of 0.1-10 g/m2, more preferably 0.3-5 g/m2. Also, it is suitable to carry out the alkaline-etching and the de-smut treatment before the oxidizing treatment.
  • the electrolytic liquid be prepared with the conditions of a concentration of 1-80 wt%, a temperature of 5-70°C, a current density of 0.5-60 A/dm2, a voltage of 1-100 V, and an electrolytic period to be within a range of 1 sec. to 5 mins.
  • An aluminum plate having an oxidized surface anode according to the above method has a hydrophilic property. Therefore, it is possible to apply a photosensitive coat directly to the plate, and it is possible to apply a further surface treatment to the plate. For example, it is possible to apply to the plate a silicate coat of alkali metal silicate or an undercoating of hydrophilic polymer compound. A preferable amount of the applied undercoating is in the range of 5-150 mg/m2.
  • a photosensitive coat is applied onto the aluminum support treated according to the above methods, and subsequently thereto, various treatments such as exposing, developing, photoengraving and printing are carried out in series.
  • An aluminum support such as JIS 3103 material was soaked in a solution including 10% caustic soda warmed at 50°C, so that an aluminum was dissolved in the solution with an amount of 3 g/m2 during the etching treatment. Subsequently, treatments such as removing smut from the aluminum support, and washing the aluminum support with water, were performed in series. Furthermore, the treated aluminum support was soaked in a solution at 50°C including nitric acid of 13 g/l and added aluminum ion of 4 g/l.
  • the samples were marked A-F, respectively. Subsequent to electrolytic treating and a removing of the smut from the surface of the aluminum plate, the surface was observed using electrophotography. Subsequently, an oxidized surface of the anode was formed using an amount of 2.5 g/m2 in a solution including 20% sulfuric acid, was washed with water, and was dried. Also, these treated samples were marked [A]-[P], respectively, as base plates.
  • An aluminum support such as JIS 3103 material was soaked in a solution including 10% caustic soda warmed at 50°C, so that an aluminum was dissolved in the solution with an amount of 3 g/m2 during the etching treatment. Subsequently, treatments such as removing smut from the aluminum support, and washing the aluminum support with water, were performed in series. Furthermore, the treated aluminum support was soaked in a solution at 50°C including nitric acid of 13 g/l and added aluminum ion of 4 g/l.
  • the samples were marked Q-U, respectively. Subsequent to the electrolytic treating and a removing of the smut from the surface, the surface of the aluminum plate was observed using electrophotography. Subsequently, an oxidized surface of the anode was formed using an amount of 2.5 g/m2 in a solution including 20% sulfuric acid, was washed with water, and was dried. Also, these treated samples were marked [Q]-[U], respectively, as base plates.
  • the base plates [A]-[U] treated by the above methods were formed, respectively, with photosensitive layers of 2.5 g/m2 dry weight including the following components on the surface.
  • Ester compounds of naphthoquinone-1, 2-diazide-5-sulfonylchloride with pyrogallol or acetone resin (disclosed in example 1 of U.S. Patent 3,635,709) ------ 0.75 g Cresolnovolak resin ----- 2.00 g Oil blue #603 (product of Orient Chemical Co., Ltd.) ----- 0.04 g Etylenedichloride ----- 16 g 2-methoxyethyl acetate ----- 12 g
  • symbol o means an excellent printing performance with strong stain-proof
  • symbol o means excellent printing performance with stain-proof
  • symbol o ⁇ means practical use performance with stain-proof
  • symbol ⁇ means narrow practical use performance
  • symbol ⁇ means non-practical use performance
  • symbol ⁇ means non-practical use and easy staining performance.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
EP19900115928 1989-08-21 1990-08-20 Procédé pour produire un support en aluminium pour une plaque d'impression Expired - Lifetime EP0414189B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP212998/89 1989-08-21
JP1212998A JP2660581B2 (ja) 1989-08-21 1989-08-21 印刷版用アルミニウム支持体の製造方法

Publications (2)

Publication Number Publication Date
EP0414189A1 true EP0414189A1 (fr) 1991-02-27
EP0414189B1 EP0414189B1 (fr) 1995-03-01

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EP19900115928 Expired - Lifetime EP0414189B1 (fr) 1989-08-21 1990-08-20 Procédé pour produire un support en aluminium pour une plaque d'impression

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EP (1) EP0414189B1 (fr)
JP (1) JP2660581B2 (fr)
DE (1) DE69017306T2 (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502507A1 (fr) * 1991-03-07 1992-09-09 Fuji Photo Film Co., Ltd. Procédé et appareil pour traitement électrolytique
EP0504811A1 (fr) * 1991-03-18 1992-09-23 Aluminum Company Of America Plaque lithographique, grainée à l'arc, et procédé en deux étapes pour la fabrication de celle-ci
US5213666A (en) * 1991-01-23 1993-05-25 Fuji Photo Film Co., Ltd. Method of preparing support for printing plate
EP0645260A1 (fr) * 1993-08-31 1995-03-29 Fuji Photo Film Co., Ltd. Procédé pour la production d'un support pour plaques d'impression planographique
EP0730979A3 (fr) * 1995-03-06 1997-08-20 Fuji Photo Film Co Ltd Support pour plaques lithographiques, procédé de fabrication de ces plaques et appareil pour le grainage électrochimique
EP0841190A1 (fr) * 1996-11-08 1998-05-13 Fuji Photo Film Co., Ltd. Plaque d'impression lithographique
EP0887203A1 (fr) * 1997-06-23 1998-12-30 Konica Corporation Procédé de fabrication d'un support pour plaque lithographique, et plaque lithographique présensibilisée

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1712368B1 (fr) 2005-04-13 2008-05-14 FUJIFILM Corporation Procédé de fabrication d'un substrat pour plaque lithographique
JP2009208140A (ja) 2008-03-06 2009-09-17 Fujifilm Corp 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体
JP2011205051A (ja) 2009-06-26 2011-10-13 Fujifilm Corp 光反射基板およびその製造方法
EP2481603A4 (fr) 2009-09-24 2015-11-18 Fujifilm Corp Plaque originale d'impression lithographique
JP2012033853A (ja) 2010-04-28 2012-02-16 Fujifilm Corp 絶縁性光反射基板
CN103085523B (zh) 2011-10-28 2016-12-21 富士胶片株式会社 用于平版印刷版的载体的制备方法和制备装置
WO2018235659A1 (fr) 2017-06-21 2018-12-27 富士フイルム株式会社 Matériau composite en aluminium

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1169234A (en) * 1951-01-28 1969-10-29 Hans-Werner Paehr Process for the Extension of the Effective Surface of Aluminium Electrodes or Foils for Electrolytic Capacitors
US4561944A (en) * 1983-06-09 1985-12-31 Fuji Photo Film Co., Ltd. Method for producing supports for lithographic printing plates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6398116A (ja) * 1986-10-14 1988-04-28 長井電子工業協同組合 電解コンデンサ用アルミニウム箔のエツチング方法
JPH01154797A (ja) * 1987-12-11 1989-06-16 Fuji Photo Film Co Ltd 平版印刷版用アルミニウム支持体の電解粗面化処理方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1169234A (en) * 1951-01-28 1969-10-29 Hans-Werner Paehr Process for the Extension of the Effective Surface of Aluminium Electrodes or Foils for Electrolytic Capacitors
US4561944A (en) * 1983-06-09 1985-12-31 Fuji Photo Film Co., Ltd. Method for producing supports for lithographic printing plates

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5213666A (en) * 1991-01-23 1993-05-25 Fuji Photo Film Co., Ltd. Method of preparing support for printing plate
EP0502507A1 (fr) * 1991-03-07 1992-09-09 Fuji Photo Film Co., Ltd. Procédé et appareil pour traitement électrolytique
US5221442A (en) * 1991-03-07 1993-06-22 Fuji Photo Film Co., Ltd. Method and apparatus for electrolytic treatment
EP0504811A1 (fr) * 1991-03-18 1992-09-23 Aluminum Company Of America Plaque lithographique, grainée à l'arc, et procédé en deux étapes pour la fabrication de celle-ci
EP0645260A1 (fr) * 1993-08-31 1995-03-29 Fuji Photo Film Co., Ltd. Procédé pour la production d'un support pour plaques d'impression planographique
US5518589A (en) * 1993-08-31 1996-05-21 Fuji Photo Film Co., Ltd. Method of producing support for planographic printing plate
EP0730979A3 (fr) * 1995-03-06 1997-08-20 Fuji Photo Film Co Ltd Support pour plaques lithographiques, procédé de fabrication de ces plaques et appareil pour le grainage électrochimique
US5837345A (en) * 1995-03-06 1998-11-17 Fuji Photo Film Co., Ltd. Support for lithographic printing plate, process for the preparation thereof and electrochemical roughening apparatus
EP0841190A1 (fr) * 1996-11-08 1998-05-13 Fuji Photo Film Co., Ltd. Plaque d'impression lithographique
US6140014A (en) * 1996-11-08 2000-10-31 Fuji Photo Film Co., Ltd. Lithographic printing plate
EP0887203A1 (fr) * 1997-06-23 1998-12-30 Konica Corporation Procédé de fabrication d'un support pour plaque lithographique, et plaque lithographique présensibilisée
US6045681A (en) * 1997-06-23 2000-04-04 Konica Corporation Manufacturing method of planographic printing plate support and presensitized planographic printing plate

Also Published As

Publication number Publication date
EP0414189B1 (fr) 1995-03-01
DE69017306D1 (de) 1995-04-06
JPH0379799A (ja) 1991-04-04
DE69017306T2 (de) 1995-06-29
JP2660581B2 (ja) 1997-10-08

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