EP0375993B1 - Process and apparatus for recovering the enamel slurry in an electrophoretic-enamelling installation - Google Patents
Process and apparatus for recovering the enamel slurry in an electrophoretic-enamelling installation Download PDFInfo
- Publication number
- EP0375993B1 EP0375993B1 EP89122245A EP89122245A EP0375993B1 EP 0375993 B1 EP0375993 B1 EP 0375993B1 EP 89122245 A EP89122245 A EP 89122245A EP 89122245 A EP89122245 A EP 89122245A EP 0375993 B1 EP0375993 B1 EP 0375993B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- vessel
- eie
- additional
- enamel
- recovering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 210000003298 dental enamel Anatomy 0.000 title claims description 28
- 238000000034 method Methods 0.000 title claims description 19
- 239000002002 slurry Substances 0.000 title claims description 9
- 238000009434 installation Methods 0.000 title claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 238000005507 spraying Methods 0.000 claims description 5
- 238000007654 immersion Methods 0.000 claims 3
- 239000012530 fluid Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000007921 spray Substances 0.000 description 3
- 239000008237 rinsing water Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/22—Servicing or operating apparatus or multistep processes
- C25D13/24—Regeneration of process liquids
Definitions
- the invention relates to a method and a device for reducing the entry of enamel slip into the first sink of electro-dip enamelling systems with a basin for electrophoretic dip enamelling (ETE basin) and with at least one sink arranged subsequently in the process.
- ETE basin electrophoretic dip enamelling
- ETE electrophoretic dip enamelling
- DE-A1-34 33 576 describes a method and a device for recovering the rinsing slip, in which the coated part is transported directly to a subsequent sink after leaving the ETE basin.
- the sink is equipped with an agitator, which puts the rinsing water in a forced flow and in which part of the rinsing water is led over a sedimentation area, from which the deposited enamel is then transported back to the ETE basin.
- DD-A-203076 describes a method in which the electro-enamelled parts are rinsed off over the electrophoresis bath.
- the disadvantage of the known method and the known device is essentially that the slip resulting from the recovered enamel has different properties than the one located in the coating basin.
- the conductivity, the pH value, the density and, among other things, the content of auxiliary substances are different, which means that compensation is required in order to be able to use the rinsing slip again.
- a difficulty then arises in the fact that the ratio of the amount of electrically deposited enamel to the amount of enamel carried into the rinsing bath is not always constant, for example caused by parts with different levels of scooping.
- the invention has for its object to provide a method and an apparatus in which or in which the entry of enamel slip into the first sink is limited from the outset to a minimum.
- the particular advantage is achieved that only very little of the enamel slip detaching from the coated part reaches the first sink (7), so that complex reprocessing measures for the flushing slip can be dispensed with. Furthermore, the slip properties of the slip used are stabilized and the content of interfering ions in the coating system is reduced. This measure also creates the possibility of improving the coating of the so-called Faraday cages as a whole.
- the part (1) to be coated is immersed in the ETE basin (2).
- the cathodes (3) are indicated in the ETE basin (2).
- the ETE pool (2) is connected to an additional pool (5) via an overflow (4).
- Drainage cells (6) also called migration cells, are arranged in the additional basin (5).
- the additional sink (5) is then followed by the first sink (7).
- the additional basin (5) is connected to the ETE basin (2) via a return device for the enamel slip.
- the return device essentially consists of a pump (8) which returns the pumpable enamel slip to the ETE basin (2) via a transport line (9). Via an arranged in the transport route Density measuring device (10) monitors the density of the enamel slip and corrects it accordingly.
- a spraying device (11) is installed above the ETE basin (2) with which demineralized water can be sprayed onto the parts (1) to be coated.
- the part (1) After spraying, the part (1) is transported over the additional basin (5) where, if necessary, another spraying with demineralized water can be carried out.
- the draining time is extended by one full work cycle and thus by more than 100%, so that this measure allows a large part of the enamel loosely adhering to the part (1) to be coated to drip off before the first sink (7).
- the part (1) In the work cycle after the additional sink (5), the part (1) is drained into the sink (7) submerged.
- part (1) On the electrophoretically deposited, relatively solid enamel layer, part (1) also adheres to an enamel slip layer which is only connected to the surface by adhesive forces. In order to avoid that this loosely adhering enamel slip gets into the sink, the part (1) is rinsed with deionized water after it has been moved out of the ETE basin (2). The loosely adhering enamel runs back into the ETE basin (2) with the spray water. The flow of demineralized water lowers the conductivity in the ETE basin (2), which is desirable, but the density of the enamel slip also decreases, which in turn is not permitted.
- the water extracted via the drainage cells (6) should also generally be discarded so that the conductivity of the slip in the coating basin is as low as possible.
- the battery of the drainage cells (6) can also be arranged in an enlarged ETE basin (2) without the basic process steps and device arrangements changing appreciably. In this way, the additional basin (5) can be dispensed with.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Sampling And Sample Adjustment (AREA)
- Detergent Compositions (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- Cleaning Or Clearing Of The Surface Of Open Water (AREA)
- Devices For Medical Bathing And Washing (AREA)
Description
Die Erfindung bezieht sich auf ein Verfahren und eine Vorrichtung zur Reduzierung des Eintragens von Emailschlicker in das erste Spülbecken von Elektrotauch-Emaillier-Anlagen mit einem Becken für die elektrophoretische Tauchemaillierung (ETE-Becken) und mit mindestens einem im Verfahrensgang nachfolgend angeordneten Spülbecken.The invention relates to a method and a device for reducing the entry of enamel slip into the first sink of electro-dip enamelling systems with a basin for electrophoretic dip enamelling (ETE basin) and with at least one sink arranged subsequently in the process.
Bei der elektrophoretischen Tauchemaillierung, in der Abkürzung als ETE bezeichnet, wird in der Regel etwa ein Drittel des eingesetzten Emailschlickers in das erste Spülbecken, das sich in der Verfahrensfolge dem ETE-Becken anschließt, eingetragen. In erster Linie aus Kostengründen muß dieses abgespülte Email zurückgewonnen und dem Prozeß wieder zugeführt werden. Verfahren für die Rückgewinnung des Emailschlickers sind bekannt aus der DE-A1-34 33 576 und DE-A1 31 21 604. Hierzu ist in der DE-A1-34 33 576 ein Verfahren und eine Vorrichtung zur Rückgewinnung des Spülschlickers beschrieben, bei dem das beschichtete Teil nach Verlassen des ETE-Beckens direkt in ein nachfolgendes Spülbecken transportiert wird. Das Spülbecken ist mit einem Rührwerk versehen, welches das Spülwasser in eine Zwangsströmung versetzt und bei dem ein Teil des Spülwassers über einen strömungsberuhigten Absetzbereich geführt wird, woraus dann das sich absetzende Email in das ETE-Becken zurücktransportiert wird.In electrophoretic dip enamelling, abbreviated as ETE, about a third of the enamel slip used is usually placed in the first sink, which follows the ETE basin in the sequence of procedures. Primarily for cost reasons, this rinsed email must be recovered and returned to the process. Methods for recovering the enamel slip are known from DE-A1-34 33 576 and DE-A1 31 21 604. For this purpose, DE-A1-34 33 576 describes a method and a device for recovering the rinsing slip, in which the coated part is transported directly to a subsequent sink after leaving the ETE basin. The sink is equipped with an agitator, which puts the rinsing water in a forced flow and in which part of the rinsing water is led over a sedimentation area, from which the deposited enamel is then transported back to the ETE basin.
Die DD-A-203076 beschreibt ein Verfahren, bei welchem die elektrotauchemaillierten Teile über dem Elektrophoresebad abgespült werden.DD-A-203076 describes a method in which the electro-enamelled parts are rinsed off over the electrophoresis bath.
Der Nachteil des bekannten Verfahrens und der bekannten Vorrichtung besteht im wesentlichen darin, daß der aus dem zurückgewonnenen Email resultierende Schlicker andere Eigenschaften aufweist als der im Beschichtungsbecken befindliche. Unterschiedlich sind insbesondere die Leitfähigkeit, der PH-Wert, die Dichte und unter anderem der Gehalt an Hilfsstoffen, was zur Folge hat, daß eine Kompensation erforderlich ist, um den Spülschlicker wieder verwenden zu können. Dabei liegt dann eine Schwierigkeit darin, daß das Verhältnis der elektrisch abgeschiedenen Emailmenge zu der ins Spülbad getragenen Emailmenge nicht immer konstant ist, z.B. bewirkt durch unterschiedlich stark schöpfende Teile.The disadvantage of the known method and the known device is essentially that the slip resulting from the recovered enamel has different properties than the one located in the coating basin. In particular, the conductivity, the pH value, the density and, among other things, the content of auxiliary substances are different, which means that compensation is required in order to be able to use the rinsing slip again. A difficulty then arises in the fact that the ratio of the amount of electrically deposited enamel to the amount of enamel carried into the rinsing bath is not always constant, for example caused by parts with different levels of scooping.
Der Erfindung liegt die Aufgabe zugrunde, ein Verfahren und eine Vorrichtung zu schaffen, bei dem bzw. bei der das Eintragen von Emailschlicker in das erste Spülbecken von vornherein auf ein Minimum begrenzt wird.The invention has for its object to provide a method and an apparatus in which or in which the entry of enamel slip into the first sink is limited from the outset to a minimum.
Die Lösung dieser Aufgabe wird durch ein Verfahren gemäß Anspruch 1 und durch eine erfindungsgemäß ausgestaltete Vorrichtung gemäß Anspruch 2 erzielt. Zweckmäßige Weiterbildungen und Ausgestaltungen der Erfindung ergeben sich aus den Unteransprüchen.This object is achieved by a method according to
Mit der erfindungsgemäßen Lehre wird der besondere Vorteil erzielt, daß von dem sich von dem beschichteten Teil ablösenden Emailschlicker nur noch sehr wenig in das erste Spülbecken (7) gelangt, so daß aufwendige Wiederaufbereitungsmaßnahmen für den Spülschlicker entfallen können. Weiterhin kommt es zu einer Stabilisierung der Schlickereigenschaften des eingesetzten Schlickers und es wird der Gehalt an störenden Ionen im Beschichtungssystem reduziert. Durch diese Maßnahme wird außerdem die Möglichkeit geschaffen, die Beschichtung der sogenannten Faradayschen Käfige insgesamt zu verbessern.With the teaching according to the invention, the particular advantage is achieved that only very little of the enamel slip detaching from the coated part reaches the first sink (7), so that complex reprocessing measures for the flushing slip can be dispensed with. Furthermore, the slip properties of the slip used are stabilized and the content of interfering ions in the coating system is reduced. This measure also creates the possibility of improving the coating of the so-called Faraday cages as a whole.
Anhand eines in der Zeichnung dargestellten Ausführungsbeispiels wird das erfindungsgemäße Verfahren und eine erfindungsgemäße Vorrichtung nachstehend näher erläutert. Die Zeichnung zeigt in rein schematischer Form den Teilbereich einer elektrophoretischen Tauchemaillieranlage mit einem nachfolgenden Spülbecken.The method according to the invention and a device according to the invention are explained in more detail below using an exemplary embodiment shown in the drawing. The drawing shows in a purely schematic form the partial area of an electrophoretic dip enamelling system with a subsequent sink.
Bei der elektrophoretischen Emaillierung wird das zu beschichtende Teil (1) in das ETE-Becken (2) eingetaucht. In dem ETE-Becken (2) sind die Kathoden (3) angedeutet.In the case of electrophoretic enamelling, the part (1) to be coated is immersed in the ETE basin (2). The cathodes (3) are indicated in the ETE basin (2).
Das ETE-Becken (2) ist über einen Überlauf (4) mit einem Zusatzbecken (5) verbunden. In dem Zusatzbecken (5) sind Drainierzellen (6), auch Migrationszellen genannt, angeordnet. Dem Zusatzbecken (5) ist dann das erste Spülbecken (7) nachgeschaltet.The ETE pool (2) is connected to an additional pool (5) via an overflow (4). Drainage cells (6), also called migration cells, are arranged in the additional basin (5). The additional sink (5) is then followed by the first sink (7).
Das Zusatzbecken (5) ist mit dem ETE-Becken (2) über eine Rückführeinrichtung für den Emailschlicker verbunden. Die Rückführeinrichtung besteht dabei im wesentlichen aus einer Pumpe (8), die über eine Transportleitung (9) den pumpfähigen Emailschlicker ins ETE-Becken (2) zurückführt. Über ein im Transportweg angeordnetes Dichtemeßgerät (10) wird die Dichte des Emailschlickers überwacht und entsprechend korrigiert.The additional basin (5) is connected to the ETE basin (2) via a return device for the enamel slip. The return device essentially consists of a pump (8) which returns the pumpable enamel slip to the ETE basin (2) via a transport line (9). Via an arranged in the transport route Density measuring device (10) monitors the density of the enamel slip and corrects it accordingly.
Über dem ETE-Becken (2) ist eine Absprüheinrichtung (11) installiert, mit der entsalztes Wasser auf die zu beschichtenden Teile (1) gesprüht werden kann.A spraying device (11) is installed above the ETE basin (2) with which demineralized water can be sprayed onto the parts (1) to be coated.
Nach dem Absprühen wird das Teil (1) über das Zusatzbecken (5) transportiert, wo gegebenfalls nochmals ein weiteres Absprühen mit entsalztem Wasser erfolgen kann.Durch die Zwischenschaltung des Zusatzbeckens (5) verlängert sich die Abtropfzeit um einen vollen Arbeitstakt und damit um mehr als 100%, so daß bereits durch diese Maßnahme ein großer Teil des lose am zu beschichtenden Teil (1) anhaftenden Email vor dem ersten Spülbecken (7) abtropfen kann.Im Arbeitstakt nach dem Zusatzbecken (5) wird das Teil (1) in das Spülbecken (7) getaucht.After spraying, the part (1) is transported over the additional basin (5) where, if necessary, another spraying with demineralized water can be carried out. By interposing the additional basin (5), the draining time is extended by one full work cycle and thus by more than 100%, so that this measure allows a large part of the enamel loosely adhering to the part (1) to be coated to drip off before the first sink (7). In the work cycle after the additional sink (5), the part (1) is drained into the sink (7) submerged.
Die Funktionsweise der gezeigten Anordnung ist wie folgt: Auf der elektrophoretisch abgeschiedenen relativ festen Emailschicht haftet auf dem Teil (1) außerdem noch eine Emailschlicker-Schicht, die nur durch Adhäsionskräfte mit der Oberfläche verbunden ist. Um zu vermeiden, daß dieser lose anhaftende Emailschlicker ins Spülbecken gelangt, wird das Teil (1) nach dem Herausfahren aus dem ETE-Becken (2) mit entsalztem Wasser abgespült. Das lose anhaftende Email läuft mit dem Spritzwasser ins ETE-Becken (2) zurück. Durch den Zufluß von entsalztem Wasser wird die Leitfähigkeit im ETE-Becken (2) gesenkt, was wünschenswert ist, jedoch nimmt auch die Dichte des Emailschlickers ab, was wiederum nicht zulässig ist.The functioning of the arrangement shown is as follows: On the electrophoretically deposited, relatively solid enamel layer, part (1) also adheres to an enamel slip layer which is only connected to the surface by adhesive forces. In order to avoid that this loosely adhering enamel slip gets into the sink, the part (1) is rinsed with deionized water after it has been moved out of the ETE basin (2). The loosely adhering enamel runs back into the ETE basin (2) with the spray water. The flow of demineralized water lowers the conductivity in the ETE basin (2), which is desirable, but the density of the enamel slip also decreases, which in turn is not permitted.
Um den Wassergehalt des Emailschlickers im ETE-Becken (2) im Gleichgewicht zu halten, befindet sich weiterer Emailschlicker in einem Zusatzbecken (5), das über die Rohrleitung (9), die Pumpe (8) und den Überlauf (4) derart mit dem ETE-Becken (2) verbunden ist, daß ein guter Austausch des Emailschlickers gewährleistet ist. In dem Zusatzbecken (5) befinden sich die Drainierzellen (6), die es ermöglichen, daß dem Emailschlicker soviel Wasser entzogen wird, wie ihm beim Abspülen zufließt. Wählt man die Drainierzellen (6) so groß, daß die entzogene Wassermenge größer ist als die über dem ETE-Becken (2) zugeführte, so regelt ein in dem Pumpenkreis eingebautes Dichtemeßgerät (10) zusammen mit der Ablaufeinrichtung (12), die Dichte im ETE-Becken (2) sowie im Zusatzbecken (5).In order to keep the water content of the enamel slurry in the ETE basin (2) in balance, there is another enamel slurry in an additional basin (5), which via the pipeline (9), the pump (8) and the overflow (4) with the ETE basin (2) is connected that a good exchange of the enamel slip is guaranteed. In the additional basin (5) there are the drainage cells (6) which allow as much water to be extracted from the enamel slip as it flows into when rinsing off. If you choose the drainage cells (6) so large that the amount of water withdrawn is greater than that supplied via the ETE basin (2), a density meter (10) installed in the pump circuit, together with the drain device (12), regulates the density in ETE pool (2) and in the additional pool (5).
Bei der Elektrotauchemaillierung muß das Wasser, das zur Zeit des Stromflußes in die Beschichtungskathoden gelangt, wegen der hohen Leitfähigkeit (16000 µS/cm und darüber) unbedingt verworfen werden, weil sonst der Prozeß instabil wird. Dieses Wasser kann also für die Sprühdüsen der Absprüheinrichtung (11) nicht verwendet werden.With electro-dip enamelling, the water that enters the coating cathodes at the time of the current flow must be discarded because of the high conductivity (16000 µS / cm and above), otherwise the process will become unstable. This water can therefore not be used for the spray nozzles of the spray device (11).
Das über die Drainierzellen (6) entzogene Wasser (Leitfähigkeit etwas höher als die des Schlickers) sollte ebenfalls in der Regel verworfen werden, damit die Leitfähigkeit des Schlickers im Beschichtungsbecken möglichst tief liegt. Je tiefer die Leitfähigkeit im ETE-Becken (2), desto unproblematischer ist die Beschichtung.The water extracted via the drainage cells (6) (conductivity slightly higher than that of the slip) should also generally be discarded so that the conductivity of the slip in the coating basin is as low as possible. The deeper the conductivity in the ETE basin (2), the less problematic is the coating.
In einer weiteren Ausführung kann anstelle eines besonderen Zusatzbeckens (5) die Batterie der Drainierzellen (6) auch in einem vergrößerten ETE-Becken (2) angeordnet sein, ohne daß sich hier die grundsätzlichen Verfahrensschritte und Vorrichtungsanordnungen nennenswert ändern. Auf diese Weise kann eventuell auf das Zusatzbecken (5) verzichtet werden.In a further embodiment, instead of a special additional basin (5), the battery of the drainage cells (6) can also be arranged in an enlarged ETE basin (2) without the basic process steps and device arrangements changing appreciably. In this way, the additional basin (5) can be dispensed with.
Claims (4)
- Method of reducing the entry of enamel slurry into the first rinsing vessel in electric immersion enamelling installations, which are provided with a vessel for the electrophoretic immersion enamelling process (EIE vessel) and at least one rinsing vessel which follows the latter vessel in the method procedure, wherein the electric immersion enamelled component parts (1) are sprayed wholly or partially with desalinated water above the EIE vessel (2) and/or an additional vessel (5), which is disposed downstream of the EIE vessel (2) in the treatment operation and is connected to said EIE vessel via an overflow (4) and a return arrangement for recovering the enamel slurry, and wherein the water content of the enamel slurry in the EIE vessel (2) is kept constant by means of drainage cells (6), which are incorporated in the EIE vessel (2) or are disposed in the additional vessel (5).
- Apparatus for accomplishing the method according to claim 1, characterised in that an additional vessel (5), having drainage cells (6), is disposed between the EIE vessel (2) and the first rinsing vessel (7) in the treatment operation, in that a spraying arrangement for spraying with desalinated water is installed above the EIE vessel (2) and/or the additional vessel (5), and in that the additional vessel (5) is connected to the EIE vessel (2) via an overflow (4) and a return arrangement for recovering the enamel slurry.
- Apparatus according to claim 2, characterised in that the drainage cells (6) are provided with a discharge arrangement (12) for excess fluid.
- Apparatus according to claim 2 or claim 3, characterised in that a density measuring device (10) is disposed in the return arrangement for recovering the enamel slurry, and in that the density of the slurry is adjusted.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3843953A DE3843953A1 (en) | 1988-12-24 | 1988-12-24 | METHOD AND DEVICE FOR RECOVERY OF THE ENAMEL SLIP IN ELECTRO-DIP-ENAMELING PLANTS |
| DE3843953 | 1988-12-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0375993A1 EP0375993A1 (en) | 1990-07-04 |
| EP0375993B1 true EP0375993B1 (en) | 1993-08-25 |
Family
ID=6370305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP89122245A Expired - Lifetime EP0375993B1 (en) | 1988-12-24 | 1989-12-02 | Process and apparatus for recovering the enamel slurry in an electrophoretic-enamelling installation |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5080723A (en) |
| EP (1) | EP0375993B1 (en) |
| JP (1) | JPH03138397A (en) |
| DD (1) | DD290669A5 (en) |
| DE (2) | DE3843953A1 (en) |
| ES (1) | ES2044029T3 (en) |
| YU (1) | YU233989A (en) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2935231A (en) * | 1958-02-17 | 1960-05-03 | Wheeling Stamping Co | Collapsible tube and insert therefor |
| GB1360970A (en) * | 1970-07-22 | 1974-07-24 | Ici Ltd | Electrodecantation of electrolytic baths |
| US3663403A (en) * | 1970-11-27 | 1972-05-16 | Ppg Industries Inc | Double ion exchange of an ultrafiltrate derived from an electrodeposition bath |
| DE2313751A1 (en) * | 1973-03-20 | 1974-10-03 | Basf Farben & Fasern | Electrophoretic dip coating process of workpieces - using anion exchanger treated ultra filtrate for flushing, giving improved coating |
| GB1373579A (en) * | 1973-05-16 | 1974-11-13 | Pressed Steel Fisher Ltd | Process and apparatus for the electrophoretic deposition of coating medium on workpieces |
| HU172790B (en) * | 1976-09-23 | 1978-12-28 | Hajtomuevek Es Festoberendeze | Dip dying plant |
| JPS57207200A (en) * | 1981-06-12 | 1982-12-18 | Nissan Motor Co Ltd | Rinsing method for electrodeposited substrate |
-
1988
- 1988-12-24 DE DE3843953A patent/DE3843953A1/en not_active Withdrawn
-
1989
- 1989-12-02 EP EP89122245A patent/EP0375993B1/en not_active Expired - Lifetime
- 1989-12-02 DE DE89122245T patent/DE58905390D1/en not_active Expired - Fee Related
- 1989-12-02 ES ES89122245T patent/ES2044029T3/en not_active Expired - Lifetime
- 1989-12-11 YU YU02339/89A patent/YU233989A/en unknown
- 1989-12-21 US US07/454,519 patent/US5080723A/en not_active Expired - Fee Related
- 1989-12-22 DD DD89336241A patent/DD290669A5/en not_active IP Right Cessation
- 1989-12-25 JP JP1333016A patent/JPH03138397A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US5080723A (en) | 1992-01-14 |
| JPH03138397A (en) | 1991-06-12 |
| DD290669A5 (en) | 1991-06-06 |
| YU233989A (en) | 1991-04-30 |
| DE58905390D1 (en) | 1993-09-30 |
| EP0375993A1 (en) | 1990-07-04 |
| ES2044029T3 (en) | 1994-01-01 |
| DE3843953A1 (en) | 1990-06-28 |
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