JPS57207200A - Rinsing method for electrodeposited substrate - Google Patents
Rinsing method for electrodeposited substrateInfo
- Publication number
- JPS57207200A JPS57207200A JP8948881A JP8948881A JPS57207200A JP S57207200 A JPS57207200 A JP S57207200A JP 8948881 A JP8948881 A JP 8948881A JP 8948881 A JP8948881 A JP 8948881A JP S57207200 A JPS57207200 A JP S57207200A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- bath
- washing
- substrate
- ultrafiltrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
PURPOSE: To prevent the generation of pitting corrosion in an electrodeposited films by washing the substrate which is electrodeposited in a cationic electrodeposition bath in the ultrafiltrate of the electrodeposition bath, in the water tank and further spray-washing with the fresh water.
CONSTITUTION: A substrate 14 applied with cationic electrodeposition is pulled up from a paint bath 3 and is drained of liquid on an overflow tank 16, after which it is washed by the ultrafiltrate sprayed from a riser 18 in the 1st filtrate washing section 17. The solids of the paint bath 3 stuck on the electrodeposited film are washed away by this washing. Here, the electrodeposition bath 19 in the tank 16 is ultrafiltered with an ultrafiltering device 22, and the concd. cationic electrodeposition bath is fed to an electrodeposition tank 2, and the ultrafiltrate to a storage tank 25. The substrate 14 is put in a rising tank 44, where it is rinsed with the rinsing water 45 in the tank and the cationic electrodeposition bath left thereon is rinsed away. Finally it is rinsed with the fresh water sprayed from a nozzle 50a, and is thereby cleaned.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8948881A JPS57207200A (en) | 1981-06-12 | 1981-06-12 | Rinsing method for electrodeposited substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8948881A JPS57207200A (en) | 1981-06-12 | 1981-06-12 | Rinsing method for electrodeposited substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57207200A true JPS57207200A (en) | 1982-12-18 |
Family
ID=13972126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8948881A Pending JPS57207200A (en) | 1981-06-12 | 1981-06-12 | Rinsing method for electrodeposited substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57207200A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5080723A (en) * | 1988-12-24 | 1992-01-14 | Miele & Cie Gmbh & Co. | Process and device for recovering the enamel slimes in electro-immersion enameling plants |
-
1981
- 1981-06-12 JP JP8948881A patent/JPS57207200A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5080723A (en) * | 1988-12-24 | 1992-01-14 | Miele & Cie Gmbh & Co. | Process and device for recovering the enamel slimes in electro-immersion enameling plants |
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