EP0238397B1 - Source d'ions à résonance cyclotronique électronique à injection coaxiale d'ondes électromagnétiques - Google Patents

Source d'ions à résonance cyclotronique électronique à injection coaxiale d'ondes électromagnétiques Download PDF

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Publication number
EP0238397B1
EP0238397B1 EP87400536A EP87400536A EP0238397B1 EP 0238397 B1 EP0238397 B1 EP 0238397B1 EP 87400536 A EP87400536 A EP 87400536A EP 87400536 A EP87400536 A EP 87400536A EP 0238397 B1 EP0238397 B1 EP 0238397B1
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EP
European Patent Office
Prior art keywords
enclosure
ion source
cavity
duct
source according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP87400536A
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German (de)
English (en)
French (fr)
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EP0238397A1 (fr
Inventor
Bernard Jacquot
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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Publication of EP0238397A1 publication Critical patent/EP0238397A1/fr
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the present invention relates to an ion source with electronic cyclotron resonance, with coaxial injection of electromagnetic waves, allowing in particular the production of multicharged ions.
  • An ion source without coaxial injection - but with the features which are included in the first part of claim 1 is known from EP-A 0 142 414, see also Figures 1a and 1b.
  • the ions are obtained by ionization in a closed enclosure such as a microwave cavity, of a gaseous medium consisting of one or more gases or metallic vapors, by means of electrons strongly accelerated by electronic cyclotron resonance.
  • Electronic cyclotron resonance is obtained thanks to the combined action of a high frequency electromagnetic field injected into the enclosure and an axially symmetrical magnetic field created in the enclosure.
  • This axial magnetic field is generally created by solenoids or magnetic coils surrounding the enclosure.
  • the quantity of ions that can be produced results from the competition between two processes, on the one hand the formation of ions by the impact of electrons on neutral atoms constituting the gaseous medium to be ionized and on the other hand the destruction of these same ions by recombination, during a collision of these ions with a neutral atom.
  • This neutral atom can come from atoms of the gaseous medium which is not yet ionized or else be produced by the impact of an ion on the walls of the enclosure.
  • the ions formed are confined in the enclosure, as well as the electrons serving for the ionization of the neutral atoms, the collisions of the ions and the electrons with the walls of the enclosure are thus reduced.
  • a radial magnetic field is created inside this enclosure which is superimposed on the axial magnetic field.
  • the superposition of these magnetic fields defines in the enclosure at least one closed sheet called "equimagnetic", having no contact with the walls of the enclosure. This tablecloth represents the location of the points where the amplitude of the magnetic fields has the same value.
  • the radial magnetic field is in particular generated by magnetized bars arranged symmetrically around the enclosure and each consisting of several elementary magnets placed side by side.
  • FIGS. 1 a and 1 b schematically represent an example of an ion source with known electronic cyclotron resonance.
  • This ion source comprises an enclosure 2 inside which a high vacuum has been produced, this enclosure constitutes a resonant cavity which can be excited by a high frequency electromagnetic field.
  • This electromagnetic field is produced by an electromagnetic wave generator 3 such as a klyston supplied with current by a power source 6.
  • This field is introduced into the enclosure 2 by a wave guide 4 such as a pipe. metallic.
  • This ion source further comprises means 10 shown in dashed lines making it possible to create an axial magnetic field and a radial magnetic field inside the enclosure 2. These magnetic fields make it possible to define a closed equimagnetic sheet. , referenced 11.
  • the vaporization of the solid sample is due to the interaction of the hot plasma on the sample.
  • the necessary hot plasma can be produced by the ionization of a gas introduced into the enclosure 2 through line 8. This gas is injected only to start the vaporization reaction, the hot plasma necessary to maintain the vaporization reaction then coming from the solid sample itself.
  • the ions formed in the enclosure are extracted from it, for example by an electric extraction field generated by a potential difference created between an electrode 16 of revolution and the enclosure 2 , the electrode 16 and the enclosure being connected to a power source 17.
  • this ion current is regulated by a control and regulation device.
  • FIGs 1a and 1b respectively show an example of a control and regulation device.
  • This control and regulation device comprises means shown diagrammatically by using a electric and / or magnetic field to analyze the ions coming from the enclosure 2.
  • This device also includes a motor 20, connected by means of a rod 22 to the support 14 of the solid sample 12, making it possible to slowly move this the latter so that it best intercepts the plasma confined in the sheet 11. The more the solid sample 12 penetrates inside the enclosure 2, the higher its temperature and its vaporization rate.
  • This device also includes a pulse generator 24 connected to the power source 6.
  • This pulse generator allows by adjusting the cycle, that is to say the ratio between the duration of a pulse and the period of pulses, to control the power source 6 supplying the generator 3 of electromagnetic waves. Control of the average power of the electromagnetic field is therefore obtained by pulsating it.
  • Means 28 for total pressure measurement connected to the enclosure 2 such as a pressure gauge make it possible, via an appropriate device, to ensure the operation of a valve 26, connected to the pipe 8 for introducing gas, so that the total pressure prevailing in the enclosure remains constant.
  • This suitable device can be as shown in FIG. 1 a, a comparator 30 or as shown in FIG. 1 b a microprocessor 32.
  • the comparator 30 is connected to the means 28 and to the valve 26, a reference voltage R being applied to this comparator.
  • the microprocessor 32 is connected to means 34 for measuring the intensity of the current of extracted ions, to the means 28, to the valve 26, to the motor 20 and to the pulse generator 24. This microprocessor 32 therefore allows automatic regulation. of the ion current.
  • FIGS. 2a and 2b schematically represent a known device for producing multicharged ions, by a shielded magnetic structure. This shielding makes it possible to magnetize only the volume useful for electronic cyclotronic resonance in an enclosure 1.
  • This device comprises permanent magnets 35 fixed to the internal wall of a cylinder 37 of ferromagnetic material, solenoids 39 disposed on either side of the cylinder 37 and a magnetic shield 41.
  • a material 43 allows to magnetically isolate the cylinder 37 of the shield 41.
  • the permanent magnets 35 distributed along the circular section of the cylinder 37 can be quadrupole, hexapolar, octopolar, etc. (FIG. 2b). These permanent magnets produce a multipolar radial magnetic field 45. Furthermore, the coils 39 provide an axial magnetic field 49. The superposition of these two magnetic fields generates a closed equimagnetic sheet 11.
  • Such a known device makes it possible to produce an opaque, magnetically shielded ion source whose magnetic axis referenced 50 is coincident with that of the solenoids 39 and of the cylinder 37.
  • This magnetic axis 50 which is also the longitudinal axis of the device, passes through the shield 41 by two openings 51, 53 arranged therein to allow on the one hand the extraction of the ions from the enclosure 1, and on the other hand the introduction of the electromagnetic waves and the introduction of the sample in enclosure 1.
  • the electromagnetic waves must pass through a resonance zone where the module of the magnetic field suddenly passes from a zero value to a maximum value.
  • the longitudinal axis 50 of the enclosure 1 is not available due to the introduction of the electromagnetic waves axially. It is therefore not possible to directly associate with this ion source a device in particular for controlling and regulating the current of extracted ions, such as those described in FIGS.
  • the object of the invention is to remedy these drawbacks by producing in particular an ion source with coaxial injection, comprising a transition cavity and a set of pipes making it possible to guide the electromagnetic waves towards the enclosure and to inject them into it. ci along its longitudinal axis while leaving this axis available.
  • the transition cavity according to the invention is of any shape. It can in particular be cubic.
  • the electromagnetic waves penetrate laterally into the cavity, the axial sides of the cavity being connected to the enclosure by the first and second pipes.
  • the first and second openings of the cavity have respectively the dimensions of the sections of the first and second pipes.
  • the window of the cavity is preferably made of BeO, but other materials such as AI 2 0 3 can also be used.
  • the sample being gaseous it is introduced into the enclosure by the second pipe from the second opening of the cavity.
  • one end of said second pipe close to the second opening of the enclosure is transparent to electromagnetic waves, at least in the part of the second pipe opposite the shielding of the magnetic structure.
  • the transparent part of the second pipe can be produced for example by fitting on a pipe of length less than the second pipe, a transparent pipe for example made of AlzOa.
  • the sample being solid it is introduced into the enclosure in the form of a rod passing through at least the second pipe.
  • Rod means both a threadlike sample and a bar.
  • This rod can be either metallic to create ions of the metal used, or dielectric.
  • dielectric samples such as samples in A1 2 0 3 , in Si0 2 , in CaF 2 , ions of AI, Si and Ca are respectively created.
  • the length of the rod is indefinite, it can constitute an important reserve of sample for long cycles of ionization.
  • this rod is preferably of length greater than the second pipe, on the one hand to penetrate the enclosure and on the other hand to allow its positioning in the enclosure.
  • the ion source comprises a device for controlling and regulating the current of extracted ions.
  • the device for controlling and regulating the current of extracted ions comprises means serving to modify the flow of gas introduced into the second pipe such as a valve associated with the pipes for introducing gas and means to control the means used to modify the gas flow.
  • the device for controlling and regulating the current of extracted ions, when the sample is solid comprises means for positioning the solid sample on the longitudinal axis of the enclosure.
  • the means for controlling the valve comprise for example a comparator or a microprocessor associated with means for measuring the total pressure of the enclosure.
  • the means for positioning the solid sample in the enclosure comprise a motor which can be controlled by the microprocessor. This microprocessor can also be used to control the generator of electromagnetic waves.
  • the ion source comprises a device for adjusting the internal volume of the transition cavity.
  • this device comprises a piston located in a third opening formed in the transition cavity.
  • the position of the piston is adjusted before using the ion source to produce ions.
  • This piston is positioned so that the vacuum volume of the transition cavity maximizes the transmission of electromagnetic waves to the enclosure containing the plasma by means of the first and second pipes. These waves are then guided in a coaxial mode by the internal wall and the external wall respectively of the first and second pipes, to the plasma in the enclosure.
  • the cavity, the first pipe and at least part of the second pipe are made of copper.
  • other non-magnetic conductive materials such as Al alloys or stainless steel may also be suitable, to guide the electromagnetic waves. These electromagnetic waves are generally guided over small distances of the order of dm.
  • the ratio between the internal diameter of the first pipe and the external diameter of the second pipe is between 3 and 5.
  • the first pipe has an inside diameter of 25 mm and an outside diameter of 30 mm and the second pipe has an inside diameter of 4 mm and an outside diameter of 6 mm.
  • the outside diameter of the first pipe is of the same order of magnitude as the thickness of the shielding of the magnetic structure of the ion source. This allows efficient magnetic shielding by a simple magnetic carcass.
  • FIG. 3 we find the enclosure 1 described in FIG. 2b, inside which a radial magnetic field 45 and an axial magnetic field 49 are produced. This enclosure is surrounded by an armored magnetic structure of the same type as that described in FIG. 2b.
  • the ion source shown in FIG. 3 also includes a transition cavity 60 connected to the opening 53 of the enclosure 1 by first and second pipes 63, 65.
  • This cavity 60 is for example, as shown, Figure 3, made in a metal cube.
  • the pipe 63 connects the opening 64 of the cavity 60 to the opening 53 of the enclosure 1. These two openings 64, 53 have the dimensions of the section of the pipe 63.
  • the pipe 65 connects the opening 66 of the cavity at the opening 53 of the enclosure. This pipe 65 crosses the cavity 60 and the pipe 63.
  • the opening 66 of the cavity 60 has the dimensions of the section of the pipe 65.
  • One of the lateral openings 68 of the cube is connected by a waveguide 5 such as a metal pipe to the generator 3 of high frequency electromagnetic waves described above; a window 72 transparent to high frequency vacuum tight electromagnetic waves is interposed between the cavity and the waveguide, the latter being at atmospheric pressure.
  • This generator 3 is supplied by the power source 6.
  • Another lateral opening 67 of the cavity is connected to a device 75 comprising for example a piston, for adjusting the internal volume of the cavity and the third lateral opening 69 of the cavity is connected to means 77 for creating the vacuum, such as '' a turbomolecular pump, for example of 50 Us.
  • These different openings 64, 66, 67, 68, 69 are produced, for example by drilling a metal mass along three orthogonal axes.
  • the adjustment between the dimensions of the openings made during drilling and the dimensions of the necessary openings is carried out for example by metal plates 79 fixed in leaktight manner on the pierced faces of this mass.
  • the openings 64, 66 of the cavity are therefore adjusted by the plates 79 in order to obtain openings suitable for these pipes.
  • the ratio of the diameters of these two pipes makes it possible to consider the latter as a coaxial line of characteristic impedance of the order of 85 Q.
  • the space between these two pipes allows sufficient pumping by the means 77, of this space.
  • a reflected wave is a wave that returns to the generator of electromagnetic waves.
  • the gas is introduced into the line 65 for example by a line 85 connected to the opening 66 of the cavity and by the pipe 8 laterally connected to the pipe 85.
  • the end of the pipe 85 opposite the opening 66 of the cavity is closed to leave the axis 50 available.
  • the longitudinal axis 50 of the ion source according to the invention is free in the vicinity of the opening 66 for introducing the sample, it can be associated with a device for controlling and regulating the current d 'ions extracted of the type described in Figures 1a and 1b.
  • FIG. 3 is shown the embodiment of the control and regulation device described in FIG. 1b comprising a microprocessor 32 connected to means 34 for measuring the intensity of the current of ions extracted from means 28 for measuring total pressure of the enclosure, to a valve 26 connected to the pipe 8 for introducing gas, to a motor 20 connected to the end 82 of the rod 80 and to a pulse generator 24 connected to the source of supply 6 of the generator 3 of electromagnetic waves.
  • a pipe 85 is connected to the opening 66 of the cavity, the end 82 of the rod passes right through this pipe 85 along its axis to be connected in particular to the motor 20.
  • FIG. 4 represents an alternative embodiment of an ion source in accordance with the invention making it possible to produce ions from a gas. Furthermore, this figure represents the other embodiment of a device for controlling and regulating the current of extracted ions described in FIG. 1a, associated with the ion source according to the invention.
  • the rod 80 and the motor 20 for positioning the rod in the enclosure have not been shown.
  • the second pipe 65a, 65b differs from that of the ion source shown in FIG. 3, by an end 65a transparent to electromagnetic waves in the vicinity of the opening 53 of the enclosure, opposite the shielding 41 of the magnetic structure.
  • This material transparent to high frequency electromagnetic waves is for example A1 2 0 3 .
  • This end 65a is generally in the form of a transparent tube fitted on a pipe 65b of the same type as the pipe 65 shown in Figure 3, but shorter.
  • Pre-ionization of the gas introduced into the second pipe takes place in the interior volume of the transparent end 65a of this pipe. Indeed, in this volume reigns an axial magnetic field from the solenoids, an electromagnetic field and a high gas pressure.
  • the electromagnetic field comes from electromagnetic waves guided between the first pipe 63 and the non-transparent part 65b of the second pipe and transmitted by the end 65a of the second pipe. Therefore, an electronic cyclotron resonance takes place inside the end 65a of the second pipe, in a volume where there is a high gas pressure.
  • the denser the plasma produced by electronic cyclotron resonance inside the end 65a the better the coaxial guidance of the electromagnetic waves, this dense plasma cord itself becoming conductive.
  • this plasma cord has the same outside diameter as the part 65b of the second pipe. The characteristic impedance of the coaxial line is therefore not modified, which makes it possible to avoid the reflection of electromagnetic waves.
  • This transparent end to the electromagnetic waves therefore constitutes a self-regulated pre-ionization stage, where the excess incident power of the electromagnetic waves is transmitted without reflection to the electronic cyclotron resonance zone located in the equimagnetic sheet 11.
  • the device for controlling and regulating the extracted ion current shown in this figure comprises a comparator 30 connected on the one hand to means 28 for measuring the total pressure of the enclosure, and on the other hand to a valve 26 connected to the gas introduction pipe 8, a reference voltage R being also applied to this comparator.
  • the device further comprises, also a pulse generator 24, connected to the power source 6 of the generator 3 of electromagnetic waves.
  • the devices for controlling and regulating the current of extracted ions represented in FIGS. 3 and 4 can be associated indifferently with the two embodiments of the ion sources according to the invention.
  • control and regulation device shown in FIG. 4 is associated with a source of ions produced from a solid sample 80, a motor 20 (manually adjusted) is connected to this sample.
  • the cavity 60, the metal plates 79 and the pipes 63, 65, 65b are preferably made of copper, but other conductive materials can of course be used.
  • the window 72 is made of a vacuum-tight material transparent to high frequency electromagnetic waves; this material is in BeO or AI 2 0s.
  • the ion source according to the invention has a number of specific advantages which will be mentioned below.
  • a transition cavity to inject the electromagnetic waves makes it possible to free the end of the second pipe 65, 65b for introducing the sample. Therefore, a device for controlling and regulating the current of extracted ions can be associated with the ion source according to the invention.
  • the use of a pipe 63 of small diameter, of the same order of magnitude as the thickness of the magnetic shield 41 which it passes through, makes it possible to keep a simple magnetic shield.
  • the simplicity of this shielding facilitates high voltage isolation of the ion source and allows easy disassembly of the latter and in particular of the enclosure, (enclosure 1 generally being integral with the pipe 63). Therefore, cleaning the ion source is easy, allowing the development of high intensity metal ions in continuous regime for long periods (such ions generally fouling the ion source).
  • any solid sample can be introduced into the enclosure 1 by the second pipe 65 without disturbing or modifying the adjustment of the piston, due to the crossing of the cavity by this metal pipe.
  • Another advantage of the ion source according to the invention is the position of the window 72 outside any magnetic field and therefore plasma. By this, pollution of the window 72 is avoided for example by metallic elements coming from the plasma.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
EP87400536A 1986-03-13 1987-03-11 Source d'ions à résonance cyclotronique électronique à injection coaxiale d'ondes électromagnétiques Expired - Lifetime EP0238397B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8603583 1986-03-13
FR8603583A FR2595868B1 (fr) 1986-03-13 1986-03-13 Source d'ions a resonance cyclotronique electronique a injection coaxiale d'ondes electromagnetiques

Publications (2)

Publication Number Publication Date
EP0238397A1 EP0238397A1 (fr) 1987-09-23
EP0238397B1 true EP0238397B1 (fr) 1990-05-23

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EP87400536A Expired - Lifetime EP0238397B1 (fr) 1986-03-13 1987-03-11 Source d'ions à résonance cyclotronique électronique à injection coaxiale d'ondes électromagnétiques

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US (1) US4780642A (ja)
EP (1) EP0238397B1 (ja)
JP (1) JP2637094B2 (ja)
DE (1) DE3762936D1 (ja)
FR (1) FR2595868B1 (ja)

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FR2639756B1 (fr) * 1988-11-30 1994-05-13 Centre Nal Recherc Scientifique Source de vapeurs et d'ions
FR2640411B1 (fr) * 1988-12-08 1994-04-29 Commissariat Energie Atomique Procede et dispositif utilisant une source rce pour la production d'ions lourds fortement charges
EP0426110B1 (en) * 1989-10-31 1996-04-03 Nec Corporation Ion thruster for interplanetary space mission
GB9025695D0 (en) * 1990-11-27 1991-01-09 Welding Inst Gas plasma generating system
FR2676593B1 (fr) * 1991-05-14 1997-01-03 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique.
US5189446A (en) * 1991-05-17 1993-02-23 International Business Machines Corporation Plasma wafer processing tool having closed electron cyclotron resonance
FR2679066B1 (fr) * 1991-07-08 1993-09-24 Commissariat Energie Atomique Procede de production d'ions multicharges.
FR2680275B1 (fr) * 1991-08-05 1997-07-18 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique de type guide d'ondes.
FR2681186B1 (fr) * 1991-09-11 1993-10-29 Commissariat A Energie Atomique Source d'ions a resonance cyclotronique electronique et a injection coaxiale d'ondes electromagnetiques.
US5256938A (en) * 1992-02-28 1993-10-26 The United States Of America As Represented By The Department Of Energy ECR ion source with electron gun
US5523652A (en) * 1994-09-26 1996-06-04 Eaton Corporation Microwave energized ion source for ion implantation
DE19757852C2 (de) * 1997-12-24 2001-06-28 Karlsruhe Forschzent Vorrichtung und Verfahren zur Dotierung von Gefäßstützen mit radiaktiven und nicht radioaktiven Atomen
DE19933762C2 (de) * 1999-07-19 2002-10-17 Juergen Andrae Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen
US6414329B1 (en) 2000-07-25 2002-07-02 Axcelis Technologies, Inc. Method and system for microwave excitation of plasma in an ion beam guide
US6703628B2 (en) 2000-07-25 2004-03-09 Axceliss Technologies, Inc Method and system for ion beam containment in an ion beam guide
DE10208668A1 (de) * 2002-02-28 2003-09-18 Forschungszentrum Juelich Gmbh Durchflusszelle sowie Verfahren zur Abtrennung von trägerfreien Radionukliden und deren radiochemische Umsetzung
FR2838020B1 (fr) * 2002-03-28 2004-07-02 Centre Nat Rech Scient Dispositif de confinement de plasma
US6891174B2 (en) * 2003-07-31 2005-05-10 Axcelis Technologies, Inc. Method and system for ion beam containment using photoelectrons in an ion beam guide
JP4868330B2 (ja) * 2004-10-08 2012-02-01 独立行政法人科学技術振興機構 多価イオン発生源およびこの発生源を用いた荷電粒子ビーム装置
FR2933532B1 (fr) * 2008-07-02 2010-09-03 Commissariat Energie Atomique Dispositif generateur d'ions a resonance cyclotronique electronique
EP2430637A1 (en) 2009-05-15 2012-03-21 Alpha Source LLC Ecr particle beam source apparatus, system and method
US10163609B2 (en) * 2016-12-15 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Plasma generation for ion implanter
ES2696227B2 (es) * 2018-07-10 2019-06-12 Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat Fuente de iones interna para ciclotrones de baja erosion

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JPS598959B2 (ja) * 1975-06-02 1984-02-28 株式会社日立製作所 多重同軸型マイクロ波イオン源
FR2533397A2 (fr) * 1982-09-16 1984-03-23 Anvar Perfectionnements aux torches a plasma
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FR2553574B1 (fr) * 1983-10-17 1985-12-27 Commissariat Energie Atomique Dispositif de regulation d'un courant d'ions notamment metalliques fortement charges
FR2556498B1 (fr) * 1983-12-07 1986-09-05 Commissariat Energie Atomique Source d'ions multicharges a plusieurs zones de resonance cyclotronique electronique

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Publication number Publication date
US4780642A (en) 1988-10-25
JP2637094B2 (ja) 1997-08-06
JPS62229641A (ja) 1987-10-08
FR2595868B1 (fr) 1988-05-13
DE3762936D1 (de) 1990-06-28
FR2595868A1 (fr) 1987-09-18
EP0238397A1 (fr) 1987-09-23

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