EP0202277A4 - PROCESS FOR REDUCING THE TOTAL HALIDE CONTENT OF AN EPOXIDE RESIN. - Google Patents

PROCESS FOR REDUCING THE TOTAL HALIDE CONTENT OF AN EPOXIDE RESIN.

Info

Publication number
EP0202277A4
EP0202277A4 EP19850905721 EP85905721A EP0202277A4 EP 0202277 A4 EP0202277 A4 EP 0202277A4 EP 19850905721 EP19850905721 EP 19850905721 EP 85905721 A EP85905721 A EP 85905721A EP 0202277 A4 EP0202277 A4 EP 0202277A4
Authority
EP
European Patent Office
Prior art keywords
weight
epoxy resin
percent
ketone
alkali metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP19850905721
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0202277A1 (en
Inventor
Chun S Wang
Wuu N Chen
Robert L Bowden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Chemical Co
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/773,500 external-priority patent/US4585838A/en
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of EP0202277A1 publication Critical patent/EP0202277A1/en
Publication of EP0202277A4 publication Critical patent/EP0202277A4/en
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule

Definitions

  • the present invention pertains to a process for reducing the hydrolyzable and/or bound (total) halide content of an epoxy resin.
  • Epoxy resins are used in the electronics industry as encapsulants, potting compounds, electrical laminates and the like. This industry has discovered that the halide content of the epoxy resin adversely affects the electrical properties of the resultant end products. The higher the halide content, the greater the detriment.
  • the present invention provides a pro ⁇ cess for reducing the total (hydrolyzable and/or bound) halide content of epoxy resins.
  • the present invention pertains to a process for reducing the total halide content of an epoxy resin containing hydrolyzable and/or bound halide which pro ⁇ cess comprises
  • step (F) washing the product from step (E) with either water, a dilute aqueous solution of a weak inorganic acid, acid salt or a combination thereof; and (G) recovering the resultant epoxy resin having a reduced total halide content from the product of step (F) .
  • Suitable epoxy resins which can be employed herein include any epoxy resin containing an average of more than one vicinal epoxy group per molecule and which contains an undesirable quantity of total, hydro ⁇ lyzable and/or bound halide.
  • Particularly suitable epoxy resins include the polyglycidyl ether of compounds having an average of more than one hydroxyl group per molecule and which contains at least 10 parts per million total halide such as, for example, glycidyl ethers of bisphenols, glycidyl ethers of phenol formaldehyde epoxy resins, cresol formaldehyde epoxy resins, and mixtures thereof.
  • Suitable ketones which can be employed herein include, for example, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and mixtures thereof.
  • Suitable aromatic hydrocarbons which can be employed herein include, for example, benzene, toluene, xylene, and mixtures thereof.
  • Suitable compounds having at least one ali ⁇ phatic hydroxyl group per molecule include, for example, aliphatic alcohols, diols and triols and polyoxyalkylene compounds having from 1 to 3 hydroxyl groups per molecule having an average molecular weight of from 100 to 600, preferably from 200 to 400, and mixtures thereof.
  • polyoxyethylene glycols sometimes referred to as polyethylene glycols, and mixtures thereof.
  • Suitable alkali metal hydroxides include, for example, sodium hydroxide, potassium hydroxide, lithium hydroxide, and mixtures thereof.
  • the alkali metal can be employed in solid form or as an aqueous solution, preferably as an aqueous solution in a concentration of from 10 to 70, preferably from 40 to 60 percent alkali metal hydroxide by weight.
  • the heating can be conducted at atmospheric or superatmospheric pressure.
  • superatmospheric pressure When relatively low boiling solvents are employed, superatmospheric pres ⁇ sure is usually required. It is preferred to employ a temperature of from 50°C up to 200°C, more preferably from 100° to 130°C. It is preferable to not employ a temperature above the boiling point of the solvent system. For low boiling solvent systems, pressure can be employed so that temperatures above the boiling point can be employed.
  • washing the epoxy resin to remove the salt formed and any unreacted alkali metal hydroxide it is preferred to employ a plurality of washing steps employing as the first wash a dilute solution of an inorganic acid or a dilute solution of an inorganic acid salt, preferably acids or acid salts having a pKa value of from 2 to 10, preferably from 2 to 7.
  • Suitable acids and acid salts include, for example, phosphoric acid, mono-sodium phosphate, di-sodiu phosphate, carbonic acid, boric acid, and mixtures thereof.
  • the epoxy resin is ultimately recovered by subjecting the organic phase from the washing procedure to distillation to remove the solvents from the epoxy resin.
  • 75 G of a cresol-formaldehyde epoxy novolac resin having an average epoxide equivalent weight (EEW) of about 220 and an average epoxy functionality of about 6 containing 3536 ppm hydrolyzable chloride by weight was dissolved in 75 g of a 75/25 by weight mixture of methyl ethyl ketone ( EK) and toluene.
  • 0.38 G (0.5 weight percent based on epoxy resin) of poly ⁇ ethylene glycol having an average molecular weight of about 400 was added to the solution and the solution was heated to 80°C with stirring.
  • 1.05 G of 50 percent aqueous potassium hydroxide (1.25 eq. KOH to 1 eq. of hydrolyzable chloride) was added all at once and the reaction mixture was maintained at 80° for 2 hours (7200 s) with good agitation.
  • reaction mixture was diluted to 20 per ⁇ cent resin concentration with MEK/toluene solvent mix, neutralized with dilute H 3 P0 and then washed with water 3 to 4 times to remove NaCl.
  • Example 1 The procedure of Example 1 was followed employing the following components and conditions.
  • COSOLVENT HYDROLYZABLE CHLORIDE __£___ glycerine 181 methanol 95 isopropyl alcohol 84 monomethyl ether of propylene glycol 83 tetraethylene glycol 54 polyethylene glycol (200 MW) 60 polyethylene glycol (300 MW) 55 polyethylene glycol (400 MW) 54 polypropylene glycol (425 MW) 159
  • Example 1 The procedure of Example 1 was followed employing the following components and conditions.
  • the tem ⁇ perature was raised to 65°C and the pressure was reduced to 180 mm Hg (24 kPa) absolute.
  • To the resultant solution was continuously added 75.2 g (0.94 equivalent) of 50 percent aqueous sodium hydroxide solution at a constant rate over a period of 4 hours (14400 s).
  • the sodium hydrox ⁇ ide the water was removed by codistilling with epi- chlorohydrin and solvent. The distillate was condensed thereby forming two distinct phases, an aqueous phase (top) and an organic epichlorohydrin-solvent phase (bottom) .
  • the organic phase was continuously returned to the reactor.
  • the reaction mixture was maintained at a temperature of 65° and a pressure of about 180 mm Hg (24 kPa) absolute for an additional 30 minutes (1800 s).
  • the resulting cresol-formaldehyde epoxy novolac resin was then distilled under full vacuum and temperature up to 170°C .to remove all epichlorohydrin and l-methoxy-2- -hydroxy propane.
  • reaction mixture was diluted to 20 per ⁇ cent resin concentration with MEK/toluene (75/25) solvent mixture, neutralized with C0 2 and then washed with water 4 to 5 times to remove NaCl.
  • reaction mixture was diluted to 20 per- cent solid concentration with MEK/toluene solvent ixture, neutralized with dilute H 3 P0 4 and then washed with water several times to remove NaCl.
  • aqueous potassium hydroxide 2 eq. caustic to 1 eq. chlorine
  • reaction mixture was diluted to 20 per ⁇ cent solid concentration with MEK/toluene solvent mixture, neutralized with C0 2 and then washed with water several times to remove NaCl.
  • reaction mixture was diluted to 20 per ⁇ cent solid concentration with MEK/toluene solvent mixture, neutralized with C0 2 and then washed with water several times to remove NaCl.
EP19850905721 1984-11-19 1985-11-12 PROCESS FOR REDUCING THE TOTAL HALIDE CONTENT OF AN EPOXIDE RESIN. Ceased EP0202277A4 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US67277584A 1984-11-19 1984-11-19
US672775 1984-11-19
US76297185A 1985-08-06 1985-08-06
US773500 1985-09-09
US06/773,500 US4585838A (en) 1985-08-06 1985-09-09 Process for preparing epoxy resins containing low levels of total halide
US762971 1991-09-20

Publications (2)

Publication Number Publication Date
EP0202277A1 EP0202277A1 (en) 1986-11-26
EP0202277A4 true EP0202277A4 (en) 1987-12-07

Family

ID=27418256

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19850905721 Ceased EP0202277A4 (en) 1984-11-19 1985-11-12 PROCESS FOR REDUCING THE TOTAL HALIDE CONTENT OF AN EPOXIDE RESIN.

Country Status (12)

Country Link
EP (1) EP0202277A4 (fi)
KR (1) KR900001943B1 (fi)
CN (1) CN1004356B (fi)
AU (1) AU560379B2 (fi)
BR (1) BR8507064A (fi)
CA (1) CA1257446A (fi)
ES (1) ES8701206A1 (fi)
FI (1) FI862961A (fi)
IL (1) IL77036A (fi)
MY (1) MY101828A (fi)
NO (1) NO165078C (fi)
WO (1) WO1986003210A1 (fi)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4785061A (en) * 1987-08-13 1988-11-15 The Dow Chemical Company Method for reducing the aliphatic halide content of epoxy resins using a solvent mixture including a polar aprotic solvent
US7955498B2 (en) * 2008-12-16 2011-06-07 Chevron, U.S.A. Inc. Reduction of organic halide contamination in hydrocarbon products

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3928288A (en) * 1973-04-11 1975-12-23 Dow Chemical Co Epoxy novolac resins having a narrow molecular weight distribution and process therefor
US4485221A (en) * 1983-11-03 1984-11-27 Ciba-Geigy Corporation Process for making epoxy novolac resins with low hydrolyzable chlorine and low ionic chloride content

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE503550A (fi) * 1950-05-27
BE546441A (fi) * 1955-03-28
US2943095A (en) * 1955-06-28 1960-06-28 Union Carbide Corp Process for preparing glycidyl polyethers of polyhydric phenols
NL270270A (fi) * 1960-10-17
JPS5824578A (ja) * 1981-08-05 1983-02-14 Mitsui Petrochem Ind Ltd グリシジルエ−テルの製造方法
US4447598A (en) * 1983-04-07 1984-05-08 The Dow Chemical Company Method of preparing epoxy resins having low hydrolyzable chloride contents

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3928288A (en) * 1973-04-11 1975-12-23 Dow Chemical Co Epoxy novolac resins having a narrow molecular weight distribution and process therefor
US4485221A (en) * 1983-11-03 1984-11-27 Ciba-Geigy Corporation Process for making epoxy novolac resins with low hydrolyzable chlorine and low ionic chloride content

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN, vol. 7, no. 100 (C-164)[1245], 28th April 1983; & JP-A-58 24 578 (MITSUI SEKIYU KAGAKU KOGYO K.K.) 14-02-1983 *
See also references of WO8603210A1 *

Also Published As

Publication number Publication date
ES548999A0 (es) 1986-11-16
NO165078C (no) 1990-12-19
EP0202277A1 (en) 1986-11-26
CN1004356B (zh) 1989-05-31
NO165078B (no) 1990-09-10
AU5091585A (en) 1986-06-18
IL77036A (en) 1989-07-31
AU560379B2 (en) 1987-04-02
FI862961A0 (fi) 1986-07-16
IL77036A0 (en) 1986-04-29
WO1986003210A1 (en) 1986-06-05
FI862961A (fi) 1986-07-16
ES8701206A1 (es) 1986-11-16
NO862909L (no) 1986-07-18
KR900001943B1 (ko) 1990-03-26
CA1257446A (en) 1989-07-11
NO862909D0 (no) 1986-07-18
KR870700658A (ko) 1987-12-30
MY101828A (en) 1992-01-31
BR8507064A (pt) 1987-05-05
CN85108970A (zh) 1986-07-09

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Inventor name: BOWDEN, ROBERT, L.

Inventor name: CHEN, WUU, N.

Inventor name: WANG, CHUN, S.