EP0043485A1 - Method of activating surfaces for electroless plating - Google Patents
Method of activating surfaces for electroless plating Download PDFInfo
- Publication number
- EP0043485A1 EP0043485A1 EP81104782A EP81104782A EP0043485A1 EP 0043485 A1 EP0043485 A1 EP 0043485A1 EP 81104782 A EP81104782 A EP 81104782A EP 81104782 A EP81104782 A EP 81104782A EP 0043485 A1 EP0043485 A1 EP 0043485A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- organic solvent
- organometallic
- nickel
- metallic
- metallized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 30
- 230000003213 activating effect Effects 0.000 title claims abstract description 9
- 238000007772 electroless plating Methods 0.000 title 1
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 19
- 239000003960 organic solvent Substances 0.000 claims abstract description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 55
- 229910052759 nickel Inorganic materials 0.000 claims description 28
- 239000004744 fabric Substances 0.000 claims description 19
- 230000004913 activation Effects 0.000 claims description 14
- -1 polyethylene Polymers 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 239000003638 chemical reducing agent Substances 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 150000001336 alkenes Chemical class 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 6
- 229920000728 polyester Polymers 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229920002647 polyamide Polymers 0.000 claims description 5
- 239000004698 Polyethylene Substances 0.000 claims description 4
- 239000004743 Polypropylene Substances 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 4
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims description 4
- 229920001577 copolymer Polymers 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 150000002825 nitriles Chemical class 0.000 claims description 4
- 229920000515 polycarbonate Polymers 0.000 claims description 4
- 239000004417 polycarbonate Substances 0.000 claims description 4
- 229920000573 polyethylene Polymers 0.000 claims description 4
- 229920001155 polypropylene Polymers 0.000 claims description 4
- 239000010959 steel Substances 0.000 claims description 4
- 229920000742 Cotton Polymers 0.000 claims description 3
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims description 3
- 229910000085 borane Inorganic materials 0.000 claims description 3
- 238000000454 electroless metal deposition Methods 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 239000004753 textile Substances 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000003822 epoxy resin Substances 0.000 claims description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 2
- 125000002524 organometallic group Chemical group 0.000 claims description 2
- 239000000123 paper Substances 0.000 claims description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims description 2
- 229920001281 polyalkylene Polymers 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- 229920001291 polyvinyl halide Polymers 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 210000002268 wool Anatomy 0.000 claims description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims 2
- 150000002429 hydrazines Chemical class 0.000 claims 1
- 238000001465 metallisation Methods 0.000 abstract description 20
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract description 14
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 abstract description 11
- 150000001875 compounds Chemical class 0.000 abstract description 5
- CSIFGMFVGDBOQC-UHFFFAOYSA-N 3-iminobutanenitrile Chemical compound CC(=N)CC#N CSIFGMFVGDBOQC-UHFFFAOYSA-N 0.000 abstract description 4
- WXNOJTUTEXAZLD-UHFFFAOYSA-L benzonitrile;dichloropalladium Chemical compound Cl[Pd]Cl.N#CC1=CC=CC=C1.N#CC1=CC=CC=C1 WXNOJTUTEXAZLD-UHFFFAOYSA-L 0.000 abstract description 3
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 29
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 12
- 238000007747 plating Methods 0.000 description 10
- 239000002904 solvent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004604 Blowing Agent Substances 0.000 description 3
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 229910003771 Gold(I) chloride Inorganic materials 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- OHFBOYYRSYLQRT-UHFFFAOYSA-N O(Cl)Cl.[Sn+4] Chemical compound O(Cl)Cl.[Sn+4] OHFBOYYRSYLQRT-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Chemical class CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver nitrate Substances [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
Definitions
- the invention relates to a method for activating metallic and non-metallic surfaces for the purpose of electroless metal deposition.
- the previously usual method for the currentless production of metal coatings on non-conductive or semiconductive supports consists in cleaning the support surface, successively in a bath containing stannous chloride or another stannous salt, and in a bath of a metal salt catalyzing the deposition of the desired metal, for example S- Silver nitrate or gold chloride, palladium chloride or platinum chloride is immersed so as to form catalytic nucleus centers, the metal ions of the salt being reduced to centers of the catalytic metal by the ion ions absorbed on the support and / or by reducing agents contained in the electroless metal salt bath, and that then the desired metal, for example copper, nickel or cobalt, by treating the catalyzed surface with the solution of the desired metal in the presence of a reduction by means of deposits; (e.g. G. Müller: electroplating of plastics, Eugen G. Leutze Verlag, Saulgau (1966)).
- a metal salt catalyzing the deposition of the desired metal for example S- Silver
- both activation methods have the disadvantage that several process steps (activation, sensitization, rinsing, etc.) are required to carry them out, which make the electroless metallization very cumbersome and therefore expensive.
- both methods are not universally applicable, but primarily limited to substrates whose surfaces can be pretreated by chemical or mechanical processes.
- the invention therefore relates to a method for activating metallic and non-metallic surfaces for the purpose of electroless metal deposition, characterized in that the surface to be metallized is wetted with an organometallic compound distributed in an organic solvent by elements of the 1st and 8th subgroups of the Periodic Table of the Elements , the organic solvent is removed and the organometallic compound adhering to the surface to be metallized is reduced.
- the organometallic compound can, for example, be dissolved or dispersed in the organic solvent, or it can also be a rubbing of the organometallic compounds in the solvent.
- the surface can then be electrolessly metallized in a known manner.
- An organometallic compound of elements of the 1st and 8th subgroups of the periodic table in particular of Cu, Ag, Au, Co, Ni, Pd and Pt, olefins, nitriles or 1,3-dicarbonyl compounds being used as organic constituents, very particularly compounds of the divalent Palladium and platinum with olefins, e.g. Butadiene palladium dichloride, with nitriles, e.g.
- the concentration of organometallic compound should be between 0.01 g and 10 g per liter, but in special cases can also be below or above.
- Particularly suitable organic solvents are polar protic and aprotic solvents such as methylene chloride, chloroform, 1,1,1-trichloroethane, trichlorethylene, perchlorethylene, acetone, methyl ethyl ketone, butanol, ethylene glycol, dioxane and tetrahydrofuran.
- polar protic and aprotic solvents such as methylene chloride, chloroform, 1,1,1-trichloroethane, trichlorethylene, perchlorethylene, acetone, methyl ethyl ketone, butanol, ethylene glycol, dioxane and tetrahydrofuran.
- Suitable substrates for the process according to the invention are: steels, titanium, glass, quartz, ceramic, carbon, paper, polyethylene, polypropylene, ABS plastics, epoxy resins, polyesters, polyamides, polycarbonates and textile fabrics, threads and fibers made of polyamide, polyester, Polyalkylene, polyacrylonitrile, polyvinyl halides, cotton and wool, and their mixtures or copolymers.
- the organic solvent is removed.
- Low boiling solvents are preferred by evaporation, e.g. removed in vacuum.
- other methods such as extraction with a solvent in which the organometallic compounds are insoluble, are appropriate.
- the reductions customary in electroplating can preferably be used agents such as hydrazine hydrate, formaldehyde, hypophosphite or boranes can be used. Of course, other reducing agents are also possible.
- the reduction is preferably carried out in aqueous solution. However, other solvents such as alcohols, ethers, hydrocarbons can also be used. Of course, suspensions or slurries of the reducing agents can also be used.
- the surfaces activated in this way can be used directly for electroless metallization. However, it may also be necessary to rinse the surfaces of the reducing agent residues.
- a very particularly preferred embodiment of the method according to the invention consists in that the reduction in the metallization bath is carried out immediately with the reducing agent of the electroless metallization.
- This version represents a simplification of the electroless metallization that has not been possible until now.
- This very simple embodiment only consists of the three operations. Immersing the substrate in the solution of the organic compound, evaporating the solvent and immersing the surfaces thus impregnated in the metallization bath (reduction and Metallization).
- This embodiment is very particular for nickel baths containing amine borane or copper containing formalins suitable for baths.
- Metallization baths which can be used in the process according to the invention are preferably baths with nickel salts, cobalt salts, iron salts or mixtures thereof with copper salts, gold and silver salts. Such metallization baths are known in the electroless metallization art.
- ABS plastic part with a structured surface is sprayed evenly with a solution of 0.1 g butadiene palladium dichloride per 1 chloroform (blowing agent Frigen).
- a 13 x 13 cm square of a polyester / cotton fabric (plain weave) is immersed in a solution of 0.3 g of dicyclopentadiene-gold (I) chloride in 1 l of chloroform for 30 seconds, dried at room temperature and then in one alkaline nickel plating bath nickel-plated according to Example 1.
- a shiny metallic piece of fabric with a metal coating of 12% by weight of nickel is obtained.
- the electrical resistance is 1.7 ohms in the warp direction and 3.5 ohms in the weft direction.
- a 13 x 13 cm square of a polyacrylonitrile fabric (copolymer on 93.6% acrylonitrile, 5.7% methyl acrylate and 0.7% sodium methalylsulfonate;) plain weave is immersed in a solution of 0.01 g diacetronitrile palladium dichloride in 100 ml methylene chloride for 30 seconds, dried at room temperature and then nickel-plated for 10 minutes in an alkaline nickel plating bath according to Example 1. This gives a shiny metallic piece of fabric with a metal coating of 10% by weight of nickel, the resistance of which is 2.8 ohms in the warp direction and 6.7 ohms in the weft direction.
- a 13 x 13 cm square made of a polyacrylonitrile fabric (copolymer as in Example 3) is immersed in a solution of 0.1 g of acetylacetonatoplatinum (II) chloride in 100 ml of methylene chloride for 20 seconds, dried and then 1 minute in a 1% -reduced aqueous sodium borohydride solution.
- the piece of fabric is then metallized for 10 minutes in an alkaline nickel plating bath which contains 25 g / 1 nickel sulfate, 20 g / 1 citric acid and 24 g / 1 sodium hyphosphite and the pH of which has been adjusted to 8.8 with ammonia.
- a piece of shiny metallic fabric with a nickel coating of 12% by weight is obtained.
- a knitted fabric made from a fiber yarn (Nm 40) made from a polyester polymer (100% polyethylene terephthalate) is immersed in an activation solution according to Example 3 at room temperature for 30 seconds. The solvent is allowed to evaporate at room temperature and then the knitted fabric is immersed for 1 minute in a solution containing 0.5 g / 1 sodium borohydride. The goods are then rinsed with water. The product is then introduced into an aqueous solution of 0.2 mol / 1 nickel (II) chloride, 0.15 mol / 1 citric acid, 0.2 mol / 1 sodium hypophosphite, which is brought to pH 9 at 25 ° C. with ammonia. 0 is set. After approx. 15 seconds the surface of the textile fabric begins to discolor. After only 30 seconds, the goods are covered with a fine layer of nickel metal and discolored darkly.
- the nickel layer After about 10 minutes the nickel layer has a thickness of 0.2 ⁇ m.
- the goods are removed from the bath, rinsed with water and dried.
- the weight gain was 23% based on the raw weight of the knitted fabric.
- the surface resistance of a 10 x 10 cm square cut out of the material was 3.6 ohms in the direction of the rods and 4.2 ohms across.
- a fabric made of a polyacrylonitrile multifilament yarn (100% polyacrylonitrile) is immersed in an activation solution according to Example 1 for 1 minute.
- the sample is then dried at 40 ° C. and placed in an alkaline copper bath composed of 10 g / 1 copper sulfate, 15 g / 1 Seignette salt and 20 ml / 1 35% by weight formaldehyde solution, which is brought to pH 12-13 with sodium hydroxide solution was discontinued.
- the surface of the fabric begins to turn dark, after about 2 minutes metallic copper luster develops. After about 20 minutes, the sample was removed from the metallization bath, rinsed thoroughly and air-dried. The layer thickness of the copper was approx. 0.2 ⁇ m.
- the surface resistance was 0.6 ohms, measured as the resistance of a square of 10 ⁇ 10 cm in the warp direction.
- a 10 x 10 cm square of carbon fiber fabric is immersed in a solution of 0.05 g of butadiene palladium dichloride per 1 methylene chloride for 30 seconds, dried at room temperature and then in an alkaline nickel plating for 20 minutes Bad nickel plated according to Example 1. This gives a shiny metallic piece of material with a metal coating of 16.9 wt .-%, the resistance 0.3. Is ohms.
- a glass plate of 30 ⁇ 30 cm is sprayed uniformly with an activation solution according to Example 1, dried and then immersed in an alkaline nickel plating bath according to Example 1 for 7 minutes. After 80 seconds the surface turns dark and after 5 minutes a shiny metallic layer is observed. The glass pane washed and dried after metallization is covered with a reflective metal layer.
- a 30 x 30 cm polyethylene film is degreased with methylene chloride and then sprayed on one side with an activation solution according to Example 1. After drying, the films are metallized in a nickel plating bath according to Example 1 for 20 minutes. A film nickel-plated on one side with a nickel content of 10.8 g / m 2 is obtained .
- the fabric web is then drawn through a metallization bath containing 25 g / 1 nickel sulfate, 3 g / 1 dimethylamine borane and 14 g / 1 citric acid at a speed of 25 m / h.
- the bath time is 10 minutes.
- the pH value, nickel concentration and reducing agent concentration are kept constant by continuous addition.
- the goods are then washed and dried.
- a uniformly nickel-plated fabric web with a nickel coating of 30.5 g / m 2 is obtained .
- a stamp pad is wetted with 1 gram of dibenzonitrile palladium dichloride in 20 ml of ethylene glycol. Letters are then stamped onto a polyethylene film using a stamp. The film is immersed in a water bath for 30 seconds and then nickel-plated in a metallization bath as in Example 1. After 5 minutes the letters were clearly recognizable as shiny metallic surfaces.
- a 30 x 26 cm steel plate is degreased with 1,1,1-trichloroethane, then sprayed on one side with an activation solution according to Example 1 and dried. The plate is then immersed in a metallization bath according to Example 1 for 20 minutes.
- a steel plate evenly coated with a nickel layer of approximately 2 gm is obtained.
- a 14 cm x 14 cm polypropylene part is sprayed uniformly from one side with a solution of 0.1 g of butadiene palladium dichloride per liter of methylene chloride (blowing agent Frigen), dried at room temperature and then nickel-plated in an alkaline nickel bath according to Example 1 for 15 minutes.
- a shiny metallic, well adhering nickel layer is obtained on the polypropylene part, which has an electrical resistance of 7 cm ohms.
- An 8 cm x 11 cm polypropylene network is sprayed uniformly with a solution of 0.1 g of butadiene palladium dichloride per liter of methylene chloride (blowing agent Frigen), dried at room temperature and then nickel-plated in an alkaline nickel bath as in Example 1 for 15 minutes. A glossy, well-nickel-plated polypropylene network with an electrical resistance of 3 ohms is obtained.
- a 4 cm x 6 cm polyamide sheet is sprayed with an activation solution according to Example 1. After drying, the plate is immersed in a nickel plating bath according to Example 1 for 10 minutes. A plate nickel-plated on one side with a nickel content of 4.2 g / m 2 and a resistance of 5 ohms is obtained.
- a 15 cm x 15 cm polycarbonate sheet is sprayed with an activation solution according to Example 1. After drying, the plate is immersed in a nickel plating bath according to Example 1 for 15 minutes. After washing and drying, the polycarbonate plate is coated with a reflective metal layer that has a resistance of 4 ohms.
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Abstract
Description
Die Erfindung betrifft ein Verfahren zur Aktivierung von metallischen und nicht-metallischen Oberflächen zum Zweck der stromlosen Metallabscheidung.The invention relates to a method for activating metallic and non-metallic surfaces for the purpose of electroless metal deposition.
Die bisher übliche Methode zur stromlosen Erzeugung von Metallüberzügen auf nichtleitenden oder halbleitenden Trägern besteht darin, daß man die Trägeroberfläche reinigt, nacheinander in ein Stannochlorid oder ein anderes Stannosalz enthaltendes Bad, und in ein Bad eines die Abscheidung des gewünschten Metalls katalysierenden Metallsalzes, z.B. S-ilbernitrat oder Goldchlorid, Palladiumchlorid oder Platinchlorid, eintaucht, um so katalytische Keimzentren zu bilden, wobei die Metallionen des Salzes zu Zentren des katalytischen Metalls durch die auf dem Träger absorbierten Stannoionen und/oder durch in dem stromlosen Metallsalzbad enthaltene Reduktionsmittel reduziert werden, und daß man dann das gewünschte Metall, z.B. Kupfer, Nickel.oder Kobalt, durch Behandlung der katalysierten Oberfläche mit der Lösung des gewünschten Metalls in Gegenwart eines Reduktionsmittels abscheidet; (z.B. G. Müller: Galvanisieren von Kunststoffen, Eugen G. Leutze Verlag, Saulgau (1966)).The previously usual method for the currentless production of metal coatings on non-conductive or semiconductive supports consists in cleaning the support surface, successively in a bath containing stannous chloride or another stannous salt, and in a bath of a metal salt catalyzing the deposition of the desired metal, for example S- Silver nitrate or gold chloride, palladium chloride or platinum chloride is immersed so as to form catalytic nucleus centers, the metal ions of the salt being reduced to centers of the catalytic metal by the ion ions absorbed on the support and / or by reducing agents contained in the electroless metal salt bath, and that then the desired metal, for example copper, nickel or cobalt, by treating the catalyzed surface with the solution of the desired metal in the presence of a reduction by means of deposits; (e.g. G. Müller: electroplating of plastics, Eugen G. Leutze Verlag, Saulgau (1966)).
Diese und ähnliche Methoden werden im allgemeinen als ionische Aktivierung bezeichnet.These and similar methods are commonly referred to as ionic activation.
Eine andere Möglichkeit zum Aktivieren von Polymeroberflächen bei deren Galvanisierung ist in DE-AS 1 197 720 beschrieben. Dieser Methode liegt die Vereinigung der Arbeitsgänge Sensibilisieren und Aktivieren durch Einbringen von Zin(II)-chlorid in eine Salzsäure-Palladiumchlorid-Lösung zugunde.Another possibility for activating polymer surfaces during their galvanization is described in DE-AS 1 197 720. This method is based on the combination of the steps of sensitizing and activating by introducing zin (II) chloride into a hydrochloric acid-palladium chloride solution.
Es ist anzunehmen, daß dabei eine Kolloidallösung aus metallischem Palladium entsteht, die durch Zinnsäure und Zinn(IV)-oxychlorid stabilisiert wird. Daher wird diese Methode im allgemeinen auch als kolloidale Aktivierung bezeichnet. Bei dem nachfolgenden Arbeitsgang - Beschleunigung in Säuren, Laugen oder Salzen von geeigneter Konzentration - wird das Schutzkolloid beseitigt und die Palladiumteilchen können katalytisch im Elektrolyt für chemische Vernickelung einwirken.It can be assumed that a colloidal solution of metallic palladium is formed which is stabilized by tin acid and tin (IV) oxychloride. For this reason, this method is generally referred to as colloidal activation. In the subsequent work step - acceleration in acids, bases or salts of a suitable concentration - the protective colloid is removed and the palladium particles can act catalytically in the electrolyte for chemical nickel plating.
Beide Aktivierungsmethoden haben den Nachteil, daß zu ihrer Durchführung mehrer Verfahrensschritte (Aktivieren, Sensibilisieren, Spülen, usw.) erforderlich sind, die die stromlose Metallisierung sehr umständlich und damit teuer machen. Außerdem sind beide Verfahren nicht universell anwendbar, sondern vornehmlich auf Substrate beschränkt, deren Oberflächen sich durch chemische oder mechanische Verfahren vorbehandeln lassen.Both activation methods have the disadvantage that several process steps (activation, sensitization, rinsing, etc.) are required to carry them out, which make the electroless metallization very cumbersome and therefore expensive. In addition, both methods are not universally applicable, but primarily limited to substrates whose surfaces can be pretreated by chemical or mechanical processes.
Es wurde nun überraschenderweise eine neue, schondende und verfahrenstechnisch einfache Methode zur Aktivierung von metallischen und nicht metallischen Oberflächen mit der außerdem auch schwer zu metallisierende Oberflächen ohne Vorbehandlung mit einem gut haftenden Metallüberzug versehen werden können, gefunden.Surprisingly, a new, gentle and process-technically simple method for activating metallic and non-metallic surfaces has now been found, with which even surfaces that are difficult to metallize can be provided with a well-adhering metal coating without pretreatment.
Die Erfindung betrifft daher ein Verfahren zum Aktivieren von metallischen und nichtmetallischen Oberflächen zum Zwecke der stromlosen Metallabscheidung, dadurch gekennzeichnet, daß die zu metallisierende Oberfläche mit einer in einem organischen Lösungsmittel verteilten organometallischen Verbindungen von Elementen der 1. und 8. Nebengruppe des Periodensystems der Elemente benetzt, das organische Lösungsmittel entfernt und die an der zu metallisierenden Oberfläche haftende organometallische Verbindung reduziert wird.The invention therefore relates to a method for activating metallic and non-metallic surfaces for the purpose of electroless metal deposition, characterized in that the surface to be metallized is wetted with an organometallic compound distributed in an organic solvent by elements of the 1st and 8th subgroups of the Periodic Table of the Elements , the organic solvent is removed and the organometallic compound adhering to the surface to be metallized is reduced.
Die organometallische Verbindung kann in dem organischen Lösungsmittel beispielsweise gelöst oder dispergiert sein, es kann sich auch um eine Anreibung der organometallischen Verbindungen in dem Lösungsmittel handeln.The organometallic compound can, for example, be dissolved or dispersed in the organic solvent, or it can also be a rubbing of the organometallic compounds in the solvent.
Anschließend kann dann die Oberfläche in bekannter Weise stromlos metallisiert werden.The surface can then be electrolessly metallized in a known manner.
Es kommen grundsätzliche alle organometallischen Verbindungen in Frage, mit denen zum Zwecke der stromlosen Metallisierung die Substrate hinreichend aktiviert werden können. Ohne den Umfang der Erfindung einzuschränken, empfiehlt sich jedoch bei der Durchführung des Verfahrens im technischen Maßstab, folgende Bedingungen einzuhalten:
- 1. die verwendeten metallorganischen Verbindungen sollten an der Luft und gegenüber Feuchtigkeit stabil sein. Sie sollten in organischen Lösungsmittel gut löslich, in Wasser aber schwer löslich sein. Sie sollten außerdem mit gebräuchlichen Reduktionsmitteln zu einer bei der stromlosen Metallisierung katalytisch wirksamen Verbindung reduzierbar sein.
- 2. Die Lösungen der metallorganischen Verbindungen in organischen Lösungsmitteln sollten an der Luft und gegenüber Feuchtigkeit stabil sein.
- 3. Das organische Lösungsmittel sollte leicht entfernbar sein.
- 4. Bei der Reduktion der organometallischen Verbindung dürfen keine Liganden frei werden, die die Metallisierungsbäder vergiften.
- 5. Die reduzierten aktiven Keime sollten in wässriger Lösung fest an der Oberfläche haften, um eine Zersetzung der Bäder durch eingeschleppte Metalle zu verhindern.
- 1. The organometallic compounds used should be stable to air and moisture. They should be readily soluble in organic solvents, but poorly soluble in water. They should also be reducible with customary reducing agents to a compound which is catalytically active in the electroless metallization.
- 2. The solutions of the organometallic compounds in organic solvents should be stable to air and moisture.
- 3. The organic solvent should be easily removable.
- 4. When reducing the organometallic compound, no ligands that poison the metallization baths must be released.
- 5. The reduced active germs should adhere firmly to the surface in aqueous solution to prevent decomposition of the baths by imported metals.
Das erfindungsgemäß neue Verfahren wird im allgemeinen folgenderweise durchgeführt:The process according to the invention is generally carried out as follows:
Eine metallorganische Verbindung von Elementen der 1. und 8. Nebengruppe des Periodensystems, insbesondere von Cu, Ag, Au, Co, Ni, Pd und Pt, wobei als organischer Bestandteil Olefine, Nitrile oder 1.3-Dicarbonylverbindungen Verwendung finden, ganz besonders Verbindungen des zweiwertigen Palladiums und Platins mit Olefinen, z.B. Butadienpalladiumdichlorid, mit Nitrilen, z.B. Diacetonitrilpalladiumdichlorid, Diacetonitrilplatindichlorid oder Dibenzonitrilpalladiumdichlorid, ferner Acetylacetonate des zweiwertigen Palladiums und Platins sowie Olefinkomplexe-des einwertigen Golds, z.B. Dicyclopentadien-Gold(I)-chlorid, werden in einem organischen Lösungemittel gelöst. Selbstverständlich können auch Mischungen der oben genannten Verbindungen eingesetzt werden. Die Konzentration an metallorganischer Verbindung soll zwischen 0,01 g und 10 g pro Liter betragen, kann aber in besonderen Fällen auch darunter oder darüber liegen.An organometallic compound of elements of the 1st and 8th subgroups of the periodic table, in particular of Cu, Ag, Au, Co, Ni, Pd and Pt, olefins, nitriles or 1,3-dicarbonyl compounds being used as organic constituents, very particularly compounds of the divalent Palladium and platinum with olefins, e.g. Butadiene palladium dichloride, with nitriles, e.g. Diacetonitrile palladium dichloride, diacetonitrile platinum dichloride or dibenzonitrile palladium dichloride, also acetylacetonates of divalent palladium and platinum and olefin complexes - of monovalent gold, e.g. Dicyclopentadiene gold (I) chloride, are dissolved in an organic solvent. Mixtures of the abovementioned compounds can of course also be used. The concentration of organometallic compound should be between 0.01 g and 10 g per liter, but in special cases can also be below or above.
Als organische Lösungsmittel sind besonders polare protische und aprotische Lösungsmittel wie Methylenchlorid, Chloroform, 1,1,1-Trichlorethan, Trichlorethylen, Perchlorethylen, Aceton, Methylethylketon, Butanol, Ethylenglykol, Dioxan und Tetrahydrofuran geeignet.Particularly suitable organic solvents are polar protic and aprotic solvents such as methylene chloride, chloroform, 1,1,1-trichloroethane, trichlorethylene, perchlorethylene, acetone, methyl ethyl ketone, butanol, ethylene glycol, dioxane and tetrahydrofuran.
Selbstverständlich können auch Gemische obiger Lösungsmittel und-Verschnitte mit anderen Lösungsmitteln, wie Benzin, Ligroin, Toluol, usw. verwendet werden. Mit diesen Lösungen werden bei dem erfindungsgemäßen Verfahren die Oberflächen der zu metallisierenden Substrate benetzt, wobei die Einwirkungsdauer vorzugsweise 1 Sekunde bis 1 Minute beträgt. Besonders geeignet sind dazu Verfahren wie das Eintauchen des Substrats in die Lösungen oder das Besprühen von Substratoberflächen mit den Aktivierungslösungen. Selbstverständlich ist es bei dem neuen Verfahren auch möglich, die Aktivierungslösungen durch Stempeln oder durch Druckverfahren aufzubringen.Mixtures of the above solvents and blends with other solvents such as gasoline, ligroin, toluene, etc. can of course also be used. With the solutions according to the invention, the surfaces of the substrates to be metallized are wetted with these solutions, the duration of action preferably being 1 second to 1 minute. Methods such as immersing the substrate in the solutions or spraying substrate surfaces with the activation solutions are particularly suitable for this purpose. Of course, with the new process it is also possible to apply the activation solutions by stamping or by printing processes.
Als Substrate für das erfindungsgemäße Verfahren eignen sich: Stähle, Titan, Glas, Quarz, Keramik, Kohlenstoff, Papier, Polyethylen, Polypropylen, ABS-Kunststoffe, Epoxyharze, Polyester, Polyamide, Polycarbonate und textile Flächengebilde, Fäden und Fasern aus Polyamid, Polyester, Polyalkylen, Polyacrylnitril, Polyvinylhalogeniden, Baumwolle und Wolle, sowie deren Mischungen oder Mischpolymerisaten.Suitable substrates for the process according to the invention are: steels, titanium, glass, quartz, ceramic, carbon, paper, polyethylene, polypropylene, ABS plastics, epoxy resins, polyesters, polyamides, polycarbonates and textile fabrics, threads and fibers made of polyamide, polyester, Polyalkylene, polyacrylonitrile, polyvinyl halides, cotton and wool, and their mixtures or copolymers.
Nach der Benetzung wird das organische Lösungsmittel entfernt. Dabei werden niedrig siedene Lösungsmittel bevorzugt durch Verdampfen, z.B. im Vakuum entfernt. Bei höher siedenden Lösungsmitteln sind andere Verfahren, wie Extraktion mit einem Lösungsmittel, in dem die organometallischen Verbindungen unlöslich sind, angebracht.After wetting, the organic solvent is removed. Low boiling solvents are preferred by evaporation, e.g. removed in vacuum. For higher boiling solvents, other methods, such as extraction with a solvent in which the organometallic compounds are insoluble, are appropriate.
Die so imprägnierten Oberflächen müssen anschließend durch Reduktion aktiviert werden. Dazu können bevorzugt die in der Galvanotechnik üblichen Reduktionsmittel, wie Hydrazinhydrat, Formaldehyd, Hypophosphit oder Borane verwendet werden. Natürlich sind auch andere Reduktionsmittel möglich. Bevorzugt wird die Reduktion in wässriger Lösung durchgeführt. Es sind aber auch andere Lösungsmittel wie Alkohole, Ether, Kohlenwasserstoffe einsetzbar. Selbstverständlich können auch Suspensionen oder Aufschlämmungen der Reduktionsmittel verwendet werden.The surfaces impregnated in this way must then be activated by reduction. For this purpose, the reductions customary in electroplating can preferably be used agents such as hydrazine hydrate, formaldehyde, hypophosphite or boranes can be used. Of course, other reducing agents are also possible. The reduction is preferably carried out in aqueous solution. However, other solvents such as alcohols, ethers, hydrocarbons can also be used. Of course, suspensions or slurries of the reducing agents can also be used.
Die so aktivierten Oberflächen können direkt zur stromlosen Metallisierung eingesetzt werden. Es kann aber auch erforderlich sein, die Oberflächen durch Spülen von den Reduktionsmittelresten zu reinigen.The surfaces activated in this way can be used directly for electroless metallization. However, it may also be necessary to rinse the surfaces of the reducing agent residues.
Eine ganz besonders bevorzugte Ausführungsform des erfindungsgemäßen Verfahrens besteht darin, daß die Reduktion im Metallisierungsbad gleich mit dem Reduktionsmittel der stromlosen Metallisierung durchgeführt wird. Diese Ausführung stellt eine bisher nicht mögliche Vereinfachung der stromlosen Metallisierung dar. Diese ganz einfache Ausführungsform besteht nur noch aus den drei.Arbeitsgängen Eintauchen des Substrates in die Lösung der organischen Verbindung, Verdampfen des Lösungsmittels und Eintauchen der so imprägnierten Oberflächen in das Metallisierungsbad (Reduktion und Metallisierung).A very particularly preferred embodiment of the method according to the invention consists in that the reduction in the metallization bath is carried out immediately with the reducing agent of the electroless metallization. This version represents a simplification of the electroless metallization that has not been possible until now. This very simple embodiment only consists of the three operations. Immersing the substrate in the solution of the organic compound, evaporating the solvent and immersing the surfaces thus impregnated in the metallization bath (reduction and Metallization).
Diese Ausführungsform ist ganz besonders für aminboranhaltige Nickelbäder oder formalinhaltige Kupferbäder geeignet.This embodiment is very particular for nickel baths containing amine borane or copper containing formalins suitable for baths.
Als in dem erfindungsgemäßen Verfahren einsetzbare Metallisierungsbäder kommen bevorzugt Bäder mit Nickelsalzen, Cobaltsalzen, Eisensalzen oder deren Gemische mit Kupfersalzen, Gold- und Silbersalzen in Betracht. Derartige Metallisierungsbäder sind in der Technik der stromlosen Metallisierung bekannt.Metallization baths which can be used in the process according to the invention are preferably baths with nickel salts, cobalt salts, iron salts or mixtures thereof with copper salts, gold and silver salts. Such metallization baths are known in the electroless metallization art.
Ein ABS-Kunststoffteil mit einer struktuierten Oberfläche wird gleichmäßig mit einer Lösung von 0,1 g Butadienpalladiumdichlorid pro 1 Chloroform besprüht (Treibmittel Frigen).An ABS plastic part with a structured surface is sprayed evenly with a solution of 0.1 g butadiene palladium dichloride per 1 chloroform (blowing agent Frigen).
Anschließend wird es bei Raumtemperatur getrocknet und dann in ein alkalisches Vernickelungsbad getaucht, das 30 g/1 Nickelchlorid, 3 g/1 Dimethylaminboran und 10 g/1 Citronensäure enthält und mit Ammoniak auf pH 8,1 eingestellt wurde. Nach etwa 30 Sekunden beginnt sich die Oberfläche dunkel zu färben und nach 10 Minuten war eine gut haftende, metallisch glänzende Nickelschicht abgeschieden worden.It is then dried at room temperature and then immersed in an alkaline nickel plating bath which contains 30 g / 1 nickel chloride, 3 g / 1 dimethylamine borane and 10 g / 1 citric acid and was adjusted to pH 8.1 with ammonia. After about 30 seconds the surface begins to turn dark and after 10 minutes a well adhering, shiny metallic nickel layer had been deposited.
Ein 13 x 13 cm großes Quadrat eines Polyester/Baumwoll-Gewebes (Leinwandbindung) wird 30 Sekunden in eine Lösung von 0,3 g Dicyclopentadien-Gold(I)-chlorid in 1 1 Chloroform getaucht, bei Raumtemperatur getrocknet und dann 20 Minuten in einem alkalischen Vernicklungsbad gemäß Beispiel 1 vernickelt. Man erhält ein metallisch glänzendes Stoffstück mit einer Metallauflage von 12 Gew.-% Nickel. Der elektrische Widerstand beträgt in Kettrichtung 1,7 Ohm und in Schußrichtung 3,5 Ohm.A 13 x 13 cm square of a polyester / cotton fabric (plain weave) is immersed in a solution of 0.3 g of dicyclopentadiene-gold (I) chloride in 1 l of chloroform for 30 seconds, dried at room temperature and then in one alkaline nickel plating bath nickel-plated according to Example 1. A shiny metallic piece of fabric with a metal coating of 12% by weight of nickel is obtained. The electrical resistance is 1.7 ohms in the warp direction and 3.5 ohms in the weft direction.
Ein 13 x 13 cm großes Quadrat eines Polyacrylnitrilgewebes (Copolymerisat auf 93,6 % Acrylnitril, 5,7 % Methylacrylat und 0,7 % Natriummethalylsulfonat;) Leinwandbindung wird 30 Sekunden in eine Lösung von 0,01 g Diacetronitrilpalladiumdichlorid in 100 ml Methylenchlorid getaucht, bei Raumtemperatur getrocknet und dann 10 Minuten in einem alkalischen Vernicklungsbad gemäß Beispiel 1 vernickelt. Man erhält ein metallisch glänzendes Stoffstück mit einer Metallauflage von 10 Gew.-% Nickel, dessen Widerstand 2,8 Ohm in Kettrichtung und 6,7 Ohm in Schußrichtung beträgt.A 13 x 13 cm square of a polyacrylonitrile fabric (copolymer on 93.6% acrylonitrile, 5.7% methyl acrylate and 0.7% sodium methalylsulfonate;) plain weave is immersed in a solution of 0.01 g diacetronitrile palladium dichloride in 100 ml methylene chloride for 30 seconds, dried at room temperature and then nickel-plated for 10 minutes in an alkaline nickel plating bath according to Example 1. This gives a shiny metallic piece of fabric with a metal coating of 10% by weight of nickel, the resistance of which is 2.8 ohms in the warp direction and 6.7 ohms in the weft direction.
Ein 13 x 13 cm großes Quadrat aus einem Polyacrylnitrilgewebe (Copolymerisat wie in Beispiel 3) wird 20 Sekunden in eine Lösung von 0,1 g Acetylacetonato- platin(II)chlorid in 100 ml Methylenchlorid getaucht, getrocknet und anschließend 1 Minute in einer 1 %-igen wäßrigen Natriumborhydridlösung reduziert. Anschließend wird das Stoffstück 10 Minuten in einem alkalischen Vernickelungsbad metallisiert, das 25 g / 1 Nickelsulfat, 20 g / 1 Citronensäure und 24 g / 1 Natriumhyphosphit enthält und dessen pH mit Ammoniak auf 8,8 eingestellt wurde. Man erhält ein metallisch glänzendes Stoffstück mit einer Nickelauflage von 12 Gew.-%.A 13 x 13 cm square made of a polyacrylonitrile fabric (copolymer as in Example 3) is immersed in a solution of 0.1 g of acetylacetonatoplatinum (II) chloride in 100 ml of methylene chloride for 20 seconds, dried and then 1 minute in a 1% -reduced aqueous sodium borohydride solution. The piece of fabric is then metallized for 10 minutes in an alkaline nickel plating bath which contains 25 g / 1 nickel sulfate, 20 g / 1 citric acid and 24 g / 1 sodium hyphosphite and the pH of which has been adjusted to 8.8 with ammonia. A piece of shiny metallic fabric with a nickel coating of 12% by weight is obtained.
Ein Gestrick (Wevenit) aus einem Fasergarn (Nm 40) aus einem Polyesterpolymerisat (100 % Polyethylenterephthalat) wird bei Raumtemperatur 30 Sekunden in eine Aktivierungslösung gemäß Beispiel 3 getaucht. Man läßt das Lösungsmittel bei Raumtemperatur verdampfen und taucht anschließend das Gestrick 1 Minute in eine Lösung, die 0,5 g/1 Natriumborhydrid enthält. Das Gut wird dann mit Wasser gespült. Anschließend trägt man das Gut in eine wäßrige Lösung von 0,2 mol/1 Nickel-II-chlorid, 0,15 mol/1 Citronensäure, 0,2 mol/1 Natriumhypophosphit ein, die bei 25°C mit Ammonaik auf pH 9,0 eingestellt ist. Nach ca. 15 Sekunden beginnt sich die Oberfläche des textilen Flächengebildes dunkel zu verfärben. Bereits nach 30 Sekunden ist das Gut mit einer feinen Nickelmetallschicht bedeckt und dunkel verfärbt.A knitted fabric (Wevenit) made from a fiber yarn (Nm 40) made from a polyester polymer (100% polyethylene terephthalate) is immersed in an activation solution according to Example 3 at room temperature for 30 seconds. The solvent is allowed to evaporate at room temperature and then the knitted fabric is immersed for 1 minute in a solution containing 0.5 g / 1 sodium borohydride. The goods are then rinsed with water. The product is then introduced into an aqueous solution of 0.2 mol / 1 nickel (II) chloride, 0.15 mol / 1 citric acid, 0.2 mol / 1 sodium hypophosphite, which is brought to pH 9 at 25 ° C. with ammonia. 0 is set. After approx. 15 seconds the surface of the textile fabric begins to discolor. After only 30 seconds, the goods are covered with a fine layer of nickel metal and discolored darkly.
Nach ca. 10 Minuten hat die Nickelschicht eine Dicke von 0,2 µm. Das Gut wird dem Bad entnommen, mit Wasser gespült und getrocknet.After about 10 minutes the nickel layer has a thickness of 0.2 µm. The goods are removed from the bath, rinsed with water and dried.
Die Gewichtszunahme betrug 23 % bezogen auf das Rohgewicht des Gestricks.The weight gain was 23% based on the raw weight of the knitted fabric.
Der Oberflächenwiderstand eines Quadrats von 10 x 10 cm, das aus dem Gut ausgeschnitten wurde, betrug 3,6 Ohm in Stäbchenrichtung und 4,2 Ohm quer dazu.The surface resistance of a 10 x 10 cm square cut out of the material was 3.6 ohms in the direction of the rods and 4.2 ohms across.
Ein Gewebe aus einem Polyacrylnitril-Multifilamentgarn (100 %-iges Polyacrylnitril) wird 1 Minute in eine Aktivierungslösung gemäß Beispiel 1 getaucht. Anschließend wird die Probe bei 40°C getrocknet und in ein alkalisches Kupferbad aus 10 g/1 Kupfersulfat, 15 g/1 Seignette-Salz und 20 ml/1 35 Gew.-%ige Formaldehydlösung gebracht, das mit Natronlauge auf pH 12 - 13 eingestellt wurde.A fabric made of a polyacrylonitrile multifilament yarn (100% polyacrylonitrile) is immersed in an activation solution according to Example 1 for 1 minute. The sample is then dried at 40 ° C. and placed in an alkaline copper bath composed of 10 g / 1 copper sulfate, 15 g / 1 Seignette salt and 20 ml / 1 35% by weight formaldehyde solution, which is brought to pH 12-13 with sodium hydroxide solution was discontinued.
Nach etwa 45 Sekunden beginnt sich die Oberfläche des Gewebes dunkel zu verfärben, nach etwa 2 Minuten entwickelt sich bereits metallischer Kupferglanz. Nach ca. 20 Minuten wurde die Probe dem Metallisierungsbad entnommen, gründlich gespült und an der Luft getrocknet. Die Schichtdicke des Kupfers betrug ca. 0,2 µm.After about 45 seconds, the surface of the fabric begins to turn dark, after about 2 minutes metallic copper luster develops. After about 20 minutes, the sample was removed from the metallization bath, rinsed thoroughly and air-dried. The layer thickness of the copper was approx. 0.2 µm.
Der Oberflächenwiderstand betrug 0,6 Ohm, gemessen als Widerstand eines Quadrats von 10 x 10 cm in Kettrichtung.The surface resistance was 0.6 ohms, measured as the resistance of a square of 10 × 10 cm in the warp direction.
Ein 10 x 10 cm großes Quadrat eines Kohlenstoff-Fasergewebes wird 30 Sekunden in eine Lösung von 0,05 g Butadienpalladiumdichlorid pro 1 Methylenchlorid getaucht, bei Raumtemperatur getrocknet und dann 20 Minuten in einen alkalischen Vernicklungsbad gemäß Beispiel 1 vernickelt. Man erhält ein metallisch glänzendes Stoff stück mit einer Metallauflage von 16,9 Gew.-%, dessen Widerstand 0,3. Ohm beträgt.A 10 x 10 cm square of carbon fiber fabric is immersed in a solution of 0.05 g of butadiene palladium dichloride per 1 methylene chloride for 30 seconds, dried at room temperature and then in an alkaline nickel plating for 20 minutes Bad nickel plated according to Example 1. This gives a shiny metallic piece of material with a metal coating of 16.9 wt .-%, the resistance 0.3. Is ohms.
Eine Glasplatte von 30 x 30 cm wird mit einer Aktivierungslösung gemäß Beispiel 1 gleichmäßig besprüht, getrocknet und anschließend 7 Minuten in ein alkalisches Vernicklungsbad gemäß Beispiel 1 getaucht. Nach 80 Sekunden färbt sich die Oberfläche dunkel und nach 5 Minuten wird eine metallisch glänzende Schicht beobachtet. Die nach der Metallisierung gewaschene und getrocknete Glasscheibe ist mit einer spiegelnden Metallschicht überzogen.A glass plate of 30 × 30 cm is sprayed uniformly with an activation solution according to Example 1, dried and then immersed in an alkaline nickel plating bath according to Example 1 for 7 minutes. After 80 seconds the surface turns dark and after 5 minutes a shiny metallic layer is observed. The glass pane washed and dried after metallization is covered with a reflective metal layer.
Eine Polyethylenfolie von 30 x 30 cm wird mit Methylenchlorid entfettet und anschließend einseitig mit einer Aktivierungslösung gemäß Beispiel 1 besprüht. Nach dem Trocknen wird die Folien 20 Minuten in einem Vernickelungsbad gemäß Beispiel 1 metallisiert. Man erhält eine einseitig vernickelte Folie mit einem Nickelgehalt von 10,8 g/m2.A 30 x 30 cm polyethylene film is degreased with methylene chloride and then sprayed on one side with an activation solution according to Example 1. After drying, the films are metallized in a nickel plating bath according to Example 1 for 20 minutes. A film nickel-plated on one side with a nickel content of 10.8 g / m 2 is obtained .
In einer Klotzvorrichtung wird eine 10 m lange und 15 cm breite Stoffbahn bei einer Geschwindigkeit von 160 m/h durch eine Lösung von 0,1 g Butadienpalladiumdichlorid pro 1 Methylenchlorid gezogen und spannungsfrei bei 40°C getrocknet. Anschließend wird die Stoffbahn mit einer Geschwindigkeit von 25 m/h durch ein Metallisierungsbad gezogen, das 27 g/1 Nickelsulfat, 3 g/1 Dimethylaminboran und 14 g/1 Citronensäure enthält. Die Badverweilzeit beträgt 10 Minuten. Während der Metallisierung werden pH-Wert, Nickelkonzentration und Reduktionsmittelkonzentration durch kontinuierliche Ergänzung konstant gehalten. Das Gut wird anschließend gewaschen und getrocknet. Man erhält eine gleichmäßig vernickelte Stoffbahn mit einer Nickelauflage von 30,5 g/m2.A 10 m long and 15 cm wide fabric at a speed of 160 m / h through a solution of 0.1 g of butadiene palladium dichloride per 1 methylene chloride and dried stress-free at 40 ° C. The fabric web is then drawn through a metallization bath containing 25 g / 1 nickel sulfate, 3 g / 1 dimethylamine borane and 14 g / 1 citric acid at a speed of 25 m / h. The bath time is 10 minutes. During the metallization, the pH value, nickel concentration and reducing agent concentration are kept constant by continuous addition. The goods are then washed and dried. A uniformly nickel-plated fabric web with a nickel coating of 30.5 g / m 2 is obtained .
Ein Stempelkissen wird mit einer Anreibung von 1 g Dibenzonitrilpalladiumdichlorid in 20 ml Ethylenglykol benetzt. Anschließend werden dann mit einem Stempel Buchstaben auf eine Polyethylenfolie gestempelt. Die Folie wird 30 Sekunden in ein Wasserbad getaucht und anschließend in einem Metallisierungsbad gemäß Beispiel 1 vernickelt. Nach 5 Minuten waren die Buchstaben als metallisch glänzende Flächen klar erkennbar.A stamp pad is wetted with 1 gram of dibenzonitrile palladium dichloride in 20 ml of ethylene glycol. Letters are then stamped onto a polyethylene film using a stamp. The film is immersed in a water bath for 30 seconds and then nickel-plated in a metallization bath as in Example 1. After 5 minutes the letters were clearly recognizable as shiny metallic surfaces.
Eine 30 x 26 cm große Stahlplatte wird mit 1,1,1-Trichlorethan entfettet, anschließend einseitig mit einer Aktivierungslösung gemäß Beispiel 1 besprüht und getrocknet. Dann wird die Platte 20 Minuten in ein Metallisierungsbad gemäß Beispiel 1 getaucht.A 30 x 26 cm steel plate is degreased with 1,1,1-trichloroethane, then sprayed on one side with an activation solution according to Example 1 and dried. The plate is then immersed in a metallization bath according to Example 1 for 20 minutes.
Man erhält eine gleichmäßig mit einer Nickelschicht von ca. 2gm beschichtete Stahlplatte.A steel plate evenly coated with a nickel layer of approximately 2 gm is obtained.
Ein 14 cm x 14 cm großes Polypropylenteil wird von einer Seite gleichmäßig mit einer Lösung von 0,1 g Butadienpalladiumdichlorid pro Liter Methylenchlorid besprüht (Treibmittel Frigen), bei Raumtemperatur getrocknet und dann 15 Minuten in einem alkalischen Nickelbad gemäß Beispiel 1 vernickelt. Man erhält eine metallisch glänzende, gut haftende Nickelschicht auf dem Polypropylenteil, die einen elektrischen Widerstand von 7 cm Ohm aufweist.A 14 cm x 14 cm polypropylene part is sprayed uniformly from one side with a solution of 0.1 g of butadiene palladium dichloride per liter of methylene chloride (blowing agent Frigen), dried at room temperature and then nickel-plated in an alkaline nickel bath according to Example 1 for 15 minutes. A shiny metallic, well adhering nickel layer is obtained on the polypropylene part, which has an electrical resistance of 7 cm ohms.
Ein 8 cm x 11 cm großes Polypropylennetz wird gleichmäßig mit einer Lösung von 0,1 g Butadienpalladiumdichlorid pro Liter Methylenchlorid besprüht (Treibmittel Frigen), bei Raumtemperatur getrocknet und dann 15 Minuten in einem alkalischen Nickelbad gemäß Beispiel 1 vernickelt. Man erhält ein metallisch glänzendes, gut vernickeltes Polypropylennetz, das einem elektrischen Widerstand von 3 Ohm aufweist.An 8 cm x 11 cm polypropylene network is sprayed uniformly with a solution of 0.1 g of butadiene palladium dichloride per liter of methylene chloride (blowing agent Frigen), dried at room temperature and then nickel-plated in an alkaline nickel bath as in Example 1 for 15 minutes. A glossy, well-nickel-plated polypropylene network with an electrical resistance of 3 ohms is obtained.
Eine 4cm x 6cm große Polyamidplatte wird mit einer Aktivierungslösung gemäß Beispiel 1 besprüht. Nach dem Trocknen wird die Platte 10 Minuten in ein Vernickelungsbad gemäß Beispiel 1 getaucht. Man erhält eine einseitig vernickelte Platte mit einem Nickelgehalt von 4,2 g/m2 und einem Widerstand von 5 Ohm.A 4 cm x 6 cm polyamide sheet is sprayed with an activation solution according to Example 1. After drying, the plate is immersed in a nickel plating bath according to Example 1 for 10 minutes. A plate nickel-plated on one side with a nickel content of 4.2 g / m 2 and a resistance of 5 ohms is obtained.
Eine 15cm x 15cm große Polycarbonatplatte wird mit einer Aktivierungslösung gemäß Beispiel 1 besprüht. Nach dem Trocknen wird die Platte 15 Minuten in ein Vernickelungsbad gemäß Beispiel 1 getaucht. Nach dem Waschen und Trocknen ist die Polycarbonatplatte mit einer spiegelnden Metallschicht überzogen, die einen Widerstand von 4 Ohm aufweist.A 15 cm x 15 cm polycarbonate sheet is sprayed with an activation solution according to Example 1. After drying, the plate is immersed in a nickel plating bath according to Example 1 for 15 minutes. After washing and drying, the polycarbonate plate is coated with a reflective metal layer that has a resistance of 4 ohms.
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT81104782T ATE13319T1 (en) | 1980-07-04 | 1981-06-22 | METHOD OF ACTIVATING SURFACES FOR ELECTRICAL METALLIZATION. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3025307 | 1980-07-04 | ||
DE19803025307 DE3025307A1 (en) | 1980-07-04 | 1980-07-04 | METHOD FOR ACTIVATING SURFACES FOR ELECTRIC METALLIZATION |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0043485A1 true EP0043485A1 (en) | 1982-01-13 |
EP0043485B1 EP0043485B1 (en) | 1985-05-15 |
Family
ID=6106372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP81104782A Expired EP0043485B1 (en) | 1980-07-04 | 1981-06-22 | Method of activating surfaces for electroless plating |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0043485B1 (en) |
JP (1) | JPS5743977A (en) |
AT (1) | ATE13319T1 (en) |
CA (1) | CA1169720A (en) |
DE (2) | DE3025307A1 (en) |
ES (1) | ES8205269A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0082438B1 (en) * | 1981-12-23 | 1985-10-09 | Bayer Ag | Process for the activation of surfaces for electroless metallization |
EP0163805A1 (en) * | 1984-06-07 | 1985-12-11 | Bayer Ag | Composite material |
US4575467A (en) * | 1983-07-08 | 1986-03-11 | Bayer Aktiengesellschaft | Process for activating substrates for electroless metallization |
EP0214097A1 (en) * | 1985-08-23 | 1987-03-11 | Ciba-Geigy Ag | Mixture of an olefin and dibenzal acetone palladium complex and its use |
US4657786A (en) * | 1982-10-22 | 1987-04-14 | Bayer Aktiengesellschaft | Black-metallized substrate surfaces |
US4659592A (en) * | 1982-11-13 | 1987-04-21 | Bayer Aktiengesellschaft | Process for the production of laminated materials |
US4668533A (en) * | 1985-05-10 | 1987-05-26 | E. I. Du Pont De Nemours And Company | Ink jet printing of printed circuit boards |
DE3938710A1 (en) * | 1989-11-17 | 1991-05-23 | Schering Ag | COMPLEX CONNECTIONS WITH OLIGOMEREM TO POLYMERIC CHARACTER |
US5183611A (en) * | 1987-11-30 | 1993-02-02 | Nisshinbo Industries, Inc. | Method of producing polymer article having metallized surface |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3146235A1 (en) * | 1981-11-21 | 1983-05-26 | Bayer Ag, 5090 Leverkusen | Self-adhering metallised textile sheet materials |
JPS58189365A (en) * | 1982-04-28 | 1983-11-05 | Okuno Seiyaku Kogyo Kk | Composition for chemical plating |
JPS6079604A (en) * | 1983-10-05 | 1985-05-07 | 株式会社村田製作所 | Method of producing polyacrylonitrile conductive film |
DE3337941A1 (en) * | 1983-10-19 | 1985-05-09 | Bayer Ag, 5090 Leverkusen | Passive radar reflectors |
US5182135A (en) * | 1986-08-12 | 1993-01-26 | Bayer Aktiengesellschaft | Process for improving the adherency of metallic coatings deposited without current on plastic surfaces |
US5200272A (en) * | 1988-04-29 | 1993-04-06 | Miles Inc. | Process for metallizing substrate surfaces |
US5238702A (en) * | 1988-10-27 | 1993-08-24 | Henning Giesecke | Electrically conductive patterns |
DE3914726A1 (en) * | 1989-05-04 | 1990-11-08 | Deutsche Automobilgesellsch | DEVICE FOR CHEMICALLY METALLIZING OPEN-POROUS FOAMS, FLEECE MATERIALS, NEEDLE FELTS MADE OF PLASTIC OR TEXTILE MATERIAL |
DE4209708A1 (en) * | 1992-03-25 | 1993-09-30 | Bayer Ag | Process for improving the adhesive strength of electrolessly deposited metal layers |
DE4418016A1 (en) * | 1994-05-24 | 1995-11-30 | Wilfried Neuschaefer | Metallisation of articles made of non-conductive materials |
US7166152B2 (en) | 2002-08-23 | 2007-01-23 | Daiwa Fine Chemicals Co., Ltd. | Pretreatment solution for providing catalyst for electroless plating, pretreatment method using the solution, and electroless plated film and/or plated object produced by use of the method |
GB2395365B8 (en) * | 2002-11-13 | 2006-11-02 | Peter Leslie Moran | Electrical circuit board |
JP4605074B2 (en) * | 2006-03-31 | 2011-01-05 | Tdk株式会社 | Electroless plating solution and method for manufacturing ceramic electronic component |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT286058B (en) * | 1968-01-09 | 1970-11-25 | Photocircuits Corp | Process for preparing materials in a molded or unshaped state, preferably insulating materials for electroless metallization |
DE2451217A1 (en) * | 1974-10-29 | 1976-05-13 | Basf Ag | ACTIVATION OF SUBSTRATES FOR ELECTRIC METALIZATION |
-
1980
- 1980-07-04 DE DE19803025307 patent/DE3025307A1/en not_active Withdrawn
-
1981
- 1981-06-22 DE DE8181104782T patent/DE3170482D1/en not_active Expired
- 1981-06-22 EP EP81104782A patent/EP0043485B1/en not_active Expired
- 1981-06-22 AT AT81104782T patent/ATE13319T1/en not_active IP Right Cessation
- 1981-07-02 CA CA000380974A patent/CA1169720A/en not_active Expired
- 1981-07-03 JP JP56103474A patent/JPS5743977A/en active Granted
- 1981-07-03 ES ES503645A patent/ES8205269A1/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT286058B (en) * | 1968-01-09 | 1970-11-25 | Photocircuits Corp | Process for preparing materials in a molded or unshaped state, preferably insulating materials for electroless metallization |
DE2451217A1 (en) * | 1974-10-29 | 1976-05-13 | Basf Ag | ACTIVATION OF SUBSTRATES FOR ELECTRIC METALIZATION |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0082438B1 (en) * | 1981-12-23 | 1985-10-09 | Bayer Ag | Process for the activation of surfaces for electroless metallization |
US4657786A (en) * | 1982-10-22 | 1987-04-14 | Bayer Aktiengesellschaft | Black-metallized substrate surfaces |
US4659592A (en) * | 1982-11-13 | 1987-04-21 | Bayer Aktiengesellschaft | Process for the production of laminated materials |
US4575467A (en) * | 1983-07-08 | 1986-03-11 | Bayer Aktiengesellschaft | Process for activating substrates for electroless metallization |
EP0163805A1 (en) * | 1984-06-07 | 1985-12-11 | Bayer Ag | Composite material |
US4668533A (en) * | 1985-05-10 | 1987-05-26 | E. I. Du Pont De Nemours And Company | Ink jet printing of printed circuit boards |
EP0214097A1 (en) * | 1985-08-23 | 1987-03-11 | Ciba-Geigy Ag | Mixture of an olefin and dibenzal acetone palladium complex and its use |
US5183611A (en) * | 1987-11-30 | 1993-02-02 | Nisshinbo Industries, Inc. | Method of producing polymer article having metallized surface |
DE3938710A1 (en) * | 1989-11-17 | 1991-05-23 | Schering Ag | COMPLEX CONNECTIONS WITH OLIGOMEREM TO POLYMERIC CHARACTER |
Also Published As
Publication number | Publication date |
---|---|
ES503645A0 (en) | 1982-06-01 |
JPS6354791B2 (en) | 1988-10-31 |
EP0043485B1 (en) | 1985-05-15 |
DE3170482D1 (en) | 1985-06-20 |
JPS5743977A (en) | 1982-03-12 |
CA1169720A (en) | 1984-06-26 |
ES8205269A1 (en) | 1982-06-01 |
DE3025307A1 (en) | 1982-01-28 |
ATE13319T1 (en) | 1985-06-15 |
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