DK504987D0 - Faststof-laser med et halvlederlag dopet med ioner af sjaeldne jordarter - Google Patents

Faststof-laser med et halvlederlag dopet med ioner af sjaeldne jordarter

Info

Publication number
DK504987D0
DK504987D0 DK504987A DK504987A DK504987D0 DK 504987 D0 DK504987 D0 DK 504987D0 DK 504987 A DK504987 A DK 504987A DK 504987 A DK504987 A DK 504987A DK 504987 D0 DK504987 D0 DK 504987D0
Authority
DK
Denmark
Prior art keywords
iones
drawn
semiconductor
rare earth
solid laser
Prior art date
Application number
DK504987A
Other languages
English (en)
Other versions
DK504987A (da
Inventor
Won-Tien Tsang
Original Assignee
American Telephone & Telegraph
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone & Telegraph filed Critical American Telephone & Telegraph
Publication of DK504987D0 publication Critical patent/DK504987D0/da
Publication of DK504987A publication Critical patent/DK504987A/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1608—Solid materials characterised by an active (lasing) ion rare earth erbium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1628—Solid materials characterised by a semiconducting matrix
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3068—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure deep levels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S372/00—Coherent light generators
    • Y10S372/704—Summary reference

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
DK504987A 1986-09-26 1987-09-25 Faststof-laser med et halvlederlag dopet med ioner af sjaeldne jordarter DK504987A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/911,976 US4737960A (en) 1986-09-26 1986-09-26 Rare earth doped semiconductor laser

Publications (2)

Publication Number Publication Date
DK504987D0 true DK504987D0 (da) 1987-09-25
DK504987A DK504987A (da) 1988-03-27

Family

ID=25431206

Family Applications (1)

Application Number Title Priority Date Filing Date
DK504987A DK504987A (da) 1986-09-26 1987-09-25 Faststof-laser med et halvlederlag dopet med ioner af sjaeldne jordarter

Country Status (9)

Country Link
US (1) US4737960A (da)
EP (1) EP0261875B1 (da)
JP (1) JPS63102292A (da)
KR (1) KR910009909B1 (da)
CA (1) CA1288157C (da)
DE (1) DE3788768T2 (da)
DK (1) DK504987A (da)
ES (1) ES2047492T3 (da)
HK (1) HK104894A (da)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4928285A (en) * 1988-02-23 1990-05-22 Kabushiki Kaisha Toshiba Impurity-doped semiconductor laser device for single wavelength oscillation
US5050179A (en) * 1989-04-20 1991-09-17 Massachusetts Institute Of Technology External cavity semiconductor laser
US5160492A (en) * 1989-04-24 1992-11-03 Hewlett-Packard Company Buried isolation using ion implantation and subsequent epitaxial growth
FR2648281B1 (fr) * 1989-06-08 1993-12-24 Etat Francais Cnet Laser a semi-conducteur stabilise en longueur d'onde
US5048036A (en) * 1989-09-18 1991-09-10 Spectra Diode Laboratories, Inc. Heterostructure laser with lattice mismatch
US4984242A (en) * 1989-09-18 1991-01-08 Spectra Diode Laboratories, Inc. GaAs/AlGaAs heterostructure laser containing indium
US5045498A (en) * 1990-08-10 1991-09-03 Hewlett-Packard Company Method of fabricating an atomic element doped semiconductor injection laser using ion implantation and epitaxial growth on the implanted surface
US5335240A (en) * 1992-12-22 1994-08-02 Iowa State University Research Foundation, Inc. Periodic dielectric structure for production of photonic band gap and devices incorporating the same
US5406573A (en) * 1992-12-22 1995-04-11 Iowa State University Research Foundation Periodic dielectric structure for production of photonic band gap and method for fabricating the same
JPH07197629A (ja) * 1993-12-29 1995-08-01 Sumitomo Rubber Ind Ltd 二重床用パネルの支持脚
US5796771A (en) * 1996-08-19 1998-08-18 The Regents Of The University Of California Miniature self-pumped monolithically integrated solid state laser
US7440180B2 (en) * 2004-02-13 2008-10-21 Tang Yin S Integration of rare-earth doped amplifiers into semiconductor structures and uses of same
GB201019725D0 (en) * 2010-11-22 2011-01-05 Univ Surrey Optoelectronic devices
DE102018115222A1 (de) * 2018-06-25 2020-01-02 Otto-Von-Guericke-Universität Magdeburg Halbleiterschichtstapel und Verfahren zu dessen Herstellung
CN109705674B (zh) * 2019-01-23 2020-09-11 闽江学院 一种聚乙烯醇缩丁醛树脂基激光防护涂层及其制备方法
US20240195140A1 (en) * 2021-04-21 2024-06-13 Massachusetts Institute Of Technology Methods And Apparatus To Generate Macroscopic Fock And Other Sub-Poissonian States Of Radiation
CN114300946A (zh) * 2021-12-30 2022-04-08 北京工业大学 一种稀土掺杂的光子级联边发射半导体激光器及制备方法
CN114336285A (zh) * 2021-12-30 2022-04-12 北京工业大学 稀土掺杂的光子级联vcsel激光器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1236687B (de) * 1962-01-10 1967-03-16 Varian Associates Optischer Sender oder Verstaerker fuer phasenkohaerente Strahlung
US3748593A (en) * 1970-11-17 1973-07-24 Method and means of construction of a semiconductor material for use as a laser
US4081763A (en) * 1973-01-04 1978-03-28 Natalya Andreevna Vlasenko Electroluminescent laser
US4193044A (en) * 1978-01-26 1980-03-11 The United States Of America As Represented By The Secretary Of The Army Rare earth semiconductor laser
DE3344138A1 (de) * 1982-12-11 1984-06-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Optoelektronisches bauelement, insbesondere eine laserdiode oder eine leuchtdiode
US4577322A (en) * 1983-10-19 1986-03-18 General Motors Corporation Lead-ytterbium-tin telluride heterojunction semiconductor laser
US4637025A (en) * 1984-10-22 1987-01-13 Polaroid Corporation Super radiant light source

Also Published As

Publication number Publication date
DE3788768D1 (de) 1994-02-24
ES2047492T3 (es) 1994-03-01
EP0261875A3 (en) 1989-04-05
CA1288157C (en) 1991-08-27
KR880004612A (ko) 1988-06-07
DE3788768T2 (de) 1994-04-28
EP0261875B1 (en) 1994-01-12
HK104894A (en) 1994-10-07
JPS63102292A (ja) 1988-05-07
DK504987A (da) 1988-03-27
EP0261875A2 (en) 1988-03-30
JPH0552073B2 (da) 1993-08-04
KR910009909B1 (ko) 1991-12-03
US4737960A (en) 1988-04-12

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Legal Events

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