DK183888D0 - Fremgangsmaade og middel til fremkaldelse af en billedvist eksponeret, positivt arbejdende quinondiazidfotomodstand - Google Patents

Fremgangsmaade og middel til fremkaldelse af en billedvist eksponeret, positivt arbejdende quinondiazidfotomodstand

Info

Publication number
DK183888D0
DK183888D0 DK183888A DK183888A DK183888D0 DK 183888 D0 DK183888 D0 DK 183888D0 DK 183888 A DK183888 A DK 183888A DK 183888 A DK183888 A DK 183888A DK 183888 D0 DK183888 D0 DK 183888D0
Authority
DK
Denmark
Prior art keywords
inposing
quinondiazide
exposed
procedure
image
Prior art date
Application number
DK183888A
Other languages
English (en)
Other versions
DK183888A (da
Inventor
Richard M Lazarus
Kenneth L Bell
Carla M Bauer
Original Assignee
Thiokol Morton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/035,413 external-priority patent/US4808513A/en
Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc
Publication of DK183888D0 publication Critical patent/DK183888D0/da
Publication of DK183888A publication Critical patent/DK183888A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DK183888A 1987-04-06 1988-04-05 Fremgangsmaade og middel til fremkaldelse af en billedvist eksponeret, positivt arbejdende quinondiazidfotomodstand DK183888A (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/035,413 US4808513A (en) 1987-04-06 1987-04-06 Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US16063988A 1988-03-10 1988-03-10

Publications (2)

Publication Number Publication Date
DK183888D0 true DK183888D0 (da) 1988-04-05
DK183888A DK183888A (da) 1988-10-07

Family

ID=26712093

Family Applications (1)

Application Number Title Priority Date Filing Date
DK183888A DK183888A (da) 1987-04-06 1988-04-05 Fremgangsmaade og middel til fremkaldelse af en billedvist eksponeret, positivt arbejdende quinondiazidfotomodstand

Country Status (6)

Country Link
EP (1) EP0286272B1 (da)
JP (1) JPS6419345A (da)
KR (1) KR940007785B1 (da)
AU (1) AU606667B2 (da)
DE (1) DE3886971T2 (da)
DK (1) DK183888A (da)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4997748A (en) * 1988-08-26 1991-03-05 Tokyo Ohka Kogyo Co., Ltd. Developer solution for positive-working resist composition
JPH02151866A (ja) * 1988-11-21 1990-06-11 Macdermid Inc フォトレジスト現像液
DE58908699D1 (de) * 1989-03-20 1995-01-12 Siemens Ag Verfahren zum Erzeugen einer Photoresiststruktur.
DE3941394A1 (de) * 1989-12-15 1991-06-20 Basf Ag Waessrige entwicklerloesung und verfahren zum entwickeln von photoresisten
US5998102A (en) * 1997-10-06 1999-12-07 Agfa Corporation Etch inhibitors in developer for lithographic printing plates
JP2002505766A (ja) * 1998-04-15 2002-02-19 エテック システムズ インコーポレイテッド ホトレジスト現像剤および現像方法
US20050260528A1 (en) * 2004-05-22 2005-11-24 Hynix Semiconductor Inc. Liquid composition for immersion lithography and lithography method using the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
JPS57114141A (en) * 1981-01-06 1982-07-15 San Ei Chem Ind Ltd Increasing method for developing power of developer for positive type photosensitive resin
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
US4710449A (en) * 1986-01-29 1987-12-01 Petrarch Systems, Inc. High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
JPH0638159B2 (ja) * 1986-07-18 1994-05-18 東京応化工業株式会社 ポジ型ホトレジスト用現像液

Also Published As

Publication number Publication date
EP0286272B1 (en) 1994-01-12
KR880013043A (ko) 1988-11-29
KR940007785B1 (ko) 1994-08-25
DE3886971D1 (de) 1994-02-24
DE3886971T2 (de) 1994-05-19
DK183888A (da) 1988-10-07
JPS6419345A (en) 1989-01-23
EP0286272A2 (en) 1988-10-12
AU1386888A (en) 1988-10-06
EP0286272A3 (en) 1989-03-22
AU606667B2 (en) 1991-02-14

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment