DK164875A - - Google Patents

Info

Publication number
DK164875A
DK164875A DK164875A DK164875A DK164875A DK 164875 A DK164875 A DK 164875A DK 164875 A DK164875 A DK 164875A DK 164875 A DK164875 A DK 164875A DK 164875 A DK164875 A DK 164875A
Authority
DK
Denmark
Application number
DK164875A
Other languages
Danish (da)
Inventor
F Imaizumi
I Nagaoka
M Kurokawa
K Komatsu
Y Takimoto
H Kusuda
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4411674A external-priority patent/JPS50141321A/ja
Priority claimed from JP2868875A external-priority patent/JPS51104903A/ja
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Publication of DK164875A publication Critical patent/DK164875A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DK164875A 1974-04-18 1975-04-17 DK164875A (en:Method)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4411674A JPS50141321A (en:Method) 1974-04-18 1974-04-18
JP2868875A JPS51104903A (en) 1975-03-11 1975-03-11 Kankoseizairyo oyobi insatsuyogenpan

Publications (1)

Publication Number Publication Date
DK164875A true DK164875A (en:Method) 1975-10-19

Family

ID=26366829

Family Applications (1)

Application Number Title Priority Date Filing Date
DK164875A DK164875A (en:Method) 1974-04-18 1975-04-17

Country Status (6)

Country Link
US (1) US4023973A (en:Method)
AU (1) AU476446B2 (en:Method)
CA (1) CA1054840A (en:Method)
DE (1) DE2517034C3 (en:Method)
DK (1) DK164875A (en:Method)
GB (1) GB1508315A (en:Method)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4167415A (en) * 1975-07-11 1979-09-11 Kansai Paint Co., Ltd. Photocurable composition comprising copolymer of maleic acid monoester and α-olefin compound
US4144153A (en) * 1975-10-03 1979-03-13 Takiron Co., Ltd. Radiation process for producing 1,2-polybutadiene foamed products
US4192684A (en) * 1976-01-24 1980-03-11 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions containing hydrogenated 1,2-polybutadiene
DE2720228B2 (de) * 1976-05-06 1979-10-18 Japan Synthetic Rubber Co., Ltd., Tokio Photopolymerisierbares Gemisch und seine Verwendung
JPS5994B2 (ja) * 1976-09-14 1984-01-05 富士写真フイルム株式会社 感光性組成物
DE2720560A1 (de) * 1977-05-07 1978-11-09 Basf Ag Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
US4330612A (en) * 1979-01-23 1982-05-18 Japan Synthetic Rubber Co., Ltd. Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer
US4292150A (en) * 1979-06-26 1981-09-29 Uniroyal, Inc. Iodine treated elastomeric article
US4265986A (en) * 1979-11-21 1981-05-05 Uniroyal, Inc. Photopolymerizable composition containing chlorosulfonated polyethylene
JPS56141321A (en) * 1980-04-08 1981-11-05 Mitsubishi Gas Chem Co Inc Photosetting resin composition
US4394435A (en) * 1981-10-01 1983-07-19 Uniroyal, Inc. Syndiotactic polybutadiene composition for a photosensitive printing plate
GB2108986B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable composition for producing screen printing stencils
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
DE3468542D1 (en) * 1983-11-03 1988-02-11 Basf Ag Photopolymerisable registration material for the preparation of printing forms and process for the production of printing forms with this materials
JP2962739B2 (ja) * 1988-07-30 1999-10-12 日本石油化学株式会社 光硬化塗膜の形成方法
CA1321671C (en) * 1989-05-11 1993-08-24 Paul J. Shustack Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith
US5536529A (en) * 1989-05-11 1996-07-16 Borden, Inc. Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith
US5407784A (en) * 1990-04-26 1995-04-18 W. R. Grace & Co.-Conn. Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolymers
US5268257A (en) * 1990-08-01 1993-12-07 W. R. Grace & Co.-Conn. Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom
JP2847321B2 (ja) * 1990-08-14 1999-01-20 日本石油株式会社 ポジ型フォトレジスト組成物
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates
US5290663A (en) * 1991-03-01 1994-03-01 W. R. Grace & Co.-Conn. Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates
US5462835A (en) * 1991-09-16 1995-10-31 P T Sub Inc. Photocurable composition, flexible, photosensitive articles made therefrom, and methods of improving solvent resistance and flexibility of those articles
JPH0659453A (ja) * 1992-08-07 1994-03-04 Nippon Oil Co Ltd ポジ型感光性樹脂組成物
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate
US5362806A (en) * 1993-01-07 1994-11-08 W. R. Grace & Co.-Conn. Toughened photocurable polymer composition for processible flexographic printing plates
US5362605A (en) * 1993-05-10 1994-11-08 W. R. Grace & Co.-Conn. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
KR960008405A (ko) 1994-08-10 1996-03-22 알베르투스 빌헬무스·요아네스 째스트라텐 광경화가능한 탄성중합체 조성물로부터의 플렉서 인쇄판
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US6066436A (en) 1996-09-09 2000-05-23 Polyfibron Technologies, Inc. Aqueous developable photosensitive polyurethane-methacrylate
JP5019800B2 (ja) * 2006-06-16 2012-09-05 富士フイルム株式会社 インクジェット記録用インク組成物

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
US2980534A (en) * 1956-12-17 1961-04-18 Monsanto Chemicals Photographic compositions and photographic elements
BE595534A (en:Method) * 1959-10-02
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers
DE1447593A1 (de) * 1964-12-24 1969-04-30 Agfa Gevaert Ag Lichtvernetzbare Schichten
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
DE1597614B2 (de) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt Lichtempfindliche kopiermasse
US3840449A (en) * 1968-12-13 1974-10-08 Bridgestone Tire Co Ltd Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization
US3948667A (en) * 1971-06-21 1976-04-06 Japan Synthetic Rubber Company Limited Photosensitive compositions
US3905820A (en) * 1972-01-27 1975-09-16 Hoechst Ag Light sensitive copolymers, a process for their manufacture and copying compositions containing them
JPS5529106B2 (en:Method) * 1972-12-14 1980-08-01
US3933746A (en) * 1973-06-14 1976-01-20 Ball Corporation Photopolymerizable polymers having anhydride-containing groups
US3888670A (en) * 1973-11-02 1975-06-10 Xerox Corp Imaging method

Also Published As

Publication number Publication date
AU8015675A (en) 1976-09-23
DE2517034C3 (de) 1980-01-31
US4023973A (en) 1977-05-17
DE2517034A1 (de) 1975-11-20
AU476446B2 (en) 1976-09-23
GB1508315A (en) 1978-04-19
CA1054840A (en) 1979-05-22
DE2517034B2 (de) 1979-05-17

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PBP Patent lapsed