DK160907C - Fotosensitive optegnelsesmaterialer med elastomere podecopolymerisat-bindemidler samt reliefforme fremstillet paa basis deraf - Google Patents

Fotosensitive optegnelsesmaterialer med elastomere podecopolymerisat-bindemidler samt reliefforme fremstillet paa basis deraf

Info

Publication number
DK160907C
DK160907C DK555086A DK555086A DK160907C DK 160907 C DK160907 C DK 160907C DK 555086 A DK555086 A DK 555086A DK 555086 A DK555086 A DK 555086A DK 160907 C DK160907 C DK 160907C
Authority
DK
Denmark
Prior art keywords
photosensitive recording
recording layer
graft copolymers
weight
components
Prior art date
Application number
DK555086A
Other languages
English (en)
Other versions
DK555086A (da
DK555086D0 (da
DK160907B (da
Inventor
Gerhard Hoffmann
Horst Koch
Guenther Schulz
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of DK555086D0 publication Critical patent/DK555086D0/da
Publication of DK555086A publication Critical patent/DK555086A/da
Publication of DK160907B publication Critical patent/DK160907B/da
Application granted granted Critical
Publication of DK160907C publication Critical patent/DK160907C/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyethers (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DK555086A 1985-11-21 1986-11-20 Fotosensitive optegnelsesmaterialer med elastomere podecopolymerisat-bindemidler samt reliefforme fremstillet paa basis deraf DK160907C (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19853541162 DE3541162A1 (de) 1985-11-21 1985-11-21 Photoempfindliche aufzeichnungsmaterialien mit elastomeren pfropfcopolymerisat-bindemitteln sowie reliefformen daraus
DE3541162 1985-11-21

Publications (4)

Publication Number Publication Date
DK555086D0 DK555086D0 (da) 1986-11-20
DK555086A DK555086A (da) 1987-05-22
DK160907B DK160907B (da) 1991-04-29
DK160907C true DK160907C (da) 1991-10-14

Family

ID=6286466

Family Applications (1)

Application Number Title Priority Date Filing Date
DK555086A DK160907C (da) 1985-11-21 1986-11-20 Fotosensitive optegnelsesmaterialer med elastomere podecopolymerisat-bindemidler samt reliefforme fremstillet paa basis deraf

Country Status (9)

Country Link
US (1) US4849307A (da)
EP (1) EP0224164B1 (da)
JP (1) JPS62121447A (da)
AT (1) ATE54210T1 (da)
AU (1) AU587085B2 (da)
CA (1) CA1314751C (da)
DE (2) DE3541162A1 (da)
DK (1) DK160907C (da)
ES (1) ES2015522B3 (da)

Families Citing this family (30)

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NZ223178A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of being hot melt molded, printing plates therefrom and methods of preparation
NZ223177A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of hot melt molding and printing plate therefrom
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
DE3719871A1 (de) * 1987-06-13 1988-12-29 Basf Ag Durch photopolymerisation vernetzbare heisspraegeplatten
DE3824146A1 (de) * 1988-07-16 1990-02-22 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten
US5204222A (en) * 1988-07-16 1993-04-20 Hoechst Aktiengesellschaft Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates
DE3843506A1 (de) * 1988-12-23 1990-06-28 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
DE3843505A1 (de) * 1988-12-23 1990-07-05 Hoechst Ag Carbonsaeureester von hydroxylgruppenhaltigen pfropfpolymerisaten und verfahren zu ihrer herstellung
DE3844451A1 (de) * 1988-12-31 1990-07-05 Basf Ag Photopolymerisierbares system
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen
DE3916463A1 (de) * 1989-05-20 1990-11-22 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
DE3928289A1 (de) * 1989-08-26 1991-02-28 Basf Ag Wasserloesliches oder -dispergierbares photopolymerisierbares gemisch und seine verwendung zu druckzwecken
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
DE19536806A1 (de) * 1995-10-02 1997-04-03 Basf Lacke & Farben Verfahren zur Herstellung von photopolymeren Tiefdruckplatten
DE19824546A1 (de) 1998-06-03 1999-12-09 Basf Drucksysteme Gmbh Herstellung vernetzbarer wasserlöslicher oder wasserdispergierbarer Zusammensetzungen und daraus erhältlicher strahlungsempfindlicher Gemische
DE19838315A1 (de) 1998-08-24 2000-03-02 Basf Drucksysteme Gmbh Material für die Gravur-Aufzeichnung mittels kohärenter elektromagnetischer Strahlung und Druckplatte damit
EP1136254B1 (de) * 2000-03-23 2003-05-28 BASF Drucksysteme GmbH Verwendung von Pfropfcopolymeren zur Herstellung lasergravierbarer Reliefdruckelementen
JP4607521B2 (ja) * 2004-08-25 2011-01-05 コダック株式会社 平版印刷版原版の現像処理方法及び装置
JP5305793B2 (ja) * 2008-03-31 2013-10-02 富士フイルム株式会社 レリーフ印刷版及びレリーフ印刷版の製造方法
AR081806A1 (es) * 2010-03-08 2012-10-24 Basf Se Composicion que comprende una sustancia activa y un polimero injertado de vinilester de oxido de polialquileno
BR112012025857A2 (pt) 2010-04-13 2016-06-28 Basf Se método para a redução de pelo menos um componente orgânico volátil em uma composição de polímero
WO2019072701A1 (de) 2017-10-10 2019-04-18 Flint Group Germany Gmbh Reliefvorläufer mit geringem cupping und fluting
TWI806932B (zh) 2017-11-29 2023-07-01 德商可樂麗歐洲有限公司 用於製造官能化聚乙酸乙烯酯之方法
WO2019110809A1 (de) 2017-12-08 2019-06-13 Flint Group Germany Gmbh Verfahren zur kennzeichnung eines reliefvorläufers zur herstellung einer reliefstruktur
NL2020109B1 (en) 2017-12-18 2019-06-25 Xeikon Prepress Nv Method for fixing and treating a flexible plate on a drum, and flexible plate for use therein
CN112512811A (zh) 2018-04-26 2021-03-16 赛康印前公众有限公司 具有输送系统的用于处理凸版板前体的装置和方法
EP3629089A1 (en) 2018-09-26 2020-04-01 Flint Group Germany GmbH Method for thermally developing relief precursors
EP3835869A1 (de) 2019-12-12 2021-06-16 Flint Group Germany GmbH Fotopolymerisierbarer reliefvorläufer mit einstellbaren oberflächeneigenschaften
NL2028208B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh Flexographic printing element precursor with high melt flow index
NL2028207B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh A relief precursor with vegetable oils as plasticizers suitable for printing plates

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GB815277A (en) * 1954-10-08 1959-06-24 Du Pont Photo sensitive addition polymerisable compositions and products made therefrom
US2929710A (en) * 1954-10-08 1960-03-22 Du Pont Polyvinyl acetal with terminal vinylidene groups
NL103565C (da) * 1956-08-27
GB1090142A (en) * 1965-02-26 1967-11-08 Agfa Gevaert Nv Photochemical insolubilisation of polymers
JPS4833905A (da) * 1971-09-02 1973-05-15
US3825430A (en) * 1972-02-09 1974-07-23 Minnesota Mining & Mfg Light-sensitive composition and method
US3899338A (en) * 1972-02-09 1975-08-12 Horizons Inc Photosensitive material suitable for use as a photoresist
US4497889A (en) * 1972-03-16 1985-02-05 E. I. Du Pont De Nemours And Company Release compound in negative acting photopolymerizable element
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
US4264703A (en) * 1974-05-02 1981-04-28 General Electric Company Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts
DE2846647A1 (de) * 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
US4272608A (en) * 1979-04-05 1981-06-09 E. I. Du Pont De Nemours And Company Photosensitive compositions containing thermoplastic ionomeric elastomers useful in flexographic printing plates
US4247624A (en) * 1979-05-29 1981-01-27 E. I. Du Pont De Nemours And Company Photopolymerizable elastomeric compositions with carbamated poly(vinyl alcohol) binder
US4415649A (en) * 1981-02-25 1983-11-15 E. I. Du Pont De Nemours & Co. Flexographic printing plates containing blended adhesives
DE3144905A1 (de) * 1981-11-12 1983-05-19 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials
CA1203107A (en) * 1982-08-31 1986-04-15 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent
DE3322993A1 (de) * 1983-06-25 1985-01-03 Basf Ag, 6700 Ludwigshafen Verfahren zur acylierung von polyvinylalkoholen und so acylierte produkte enthaltende photopolymerisierbare und/oder photovernetzbare mischungen

Also Published As

Publication number Publication date
EP0224164A2 (de) 1987-06-03
DK555086A (da) 1987-05-22
EP0224164B1 (de) 1990-06-27
ES2015522B3 (es) 1990-09-01
JPH0571942B2 (da) 1993-10-08
CA1314751C (en) 1993-03-23
US4849307A (en) 1989-07-18
JPS62121447A (ja) 1987-06-02
EP0224164A3 (en) 1988-08-24
DK555086D0 (da) 1986-11-20
AU6553586A (en) 1987-05-28
ATE54210T1 (de) 1990-07-15
DE3541162A1 (de) 1987-05-27
DK160907B (da) 1991-04-29
DE3672305D1 (de) 1990-08-02
AU587085B2 (en) 1989-08-03

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