JPS56161538A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS56161538A
JPS56161538A JP6477980A JP6477980A JPS56161538A JP S56161538 A JPS56161538 A JP S56161538A JP 6477980 A JP6477980 A JP 6477980A JP 6477980 A JP6477980 A JP 6477980A JP S56161538 A JPS56161538 A JP S56161538A
Authority
JP
Japan
Prior art keywords
cinnamic acid
principal
bond
side chain
polymerizable monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6477980A
Other languages
Japanese (ja)
Inventor
Hideki Nagasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP6477980A priority Critical patent/JPS56161538A/en
Publication of JPS56161538A publication Critical patent/JPS56161538A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Abstract

PURPOSE:To obtain an image with superior chemical resistance by making combined use of a photocrosslinking type polymer having cinnamic acid groups in the principal or side chain and a polymerizable monomer having an ethylenic unsatd. bond to facilitate the peeling development of a photosensitive resist and inhibit O2 from hindering photopolymn. CONSTITUTION:A photosensitive composition is prepared by combining a 30- 95wt% photocrosslinking type polymer such as a polycondensate of phenylenediacrylic acid or its alkyl ester and polyol having cinnamic acid groups in the principal or side chain or a homo- or copolymer of the esterification product of polyepichlorohydrin or the like and cinnamic acid or cinnamate with a 70-5wt% polymerizable monomer such as (meth)acrylic ester, pentaerythritol triacrylate having an ethylenic unsatd. bond. The composition is used as a photoresist for forming a lithographic plate, an electronic circuit, etc. The sensitivity of this superior resist is not hindered by O2, etc. in air.
JP6477980A 1980-05-16 1980-05-16 Photosensitive composition Pending JPS56161538A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6477980A JPS56161538A (en) 1980-05-16 1980-05-16 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6477980A JPS56161538A (en) 1980-05-16 1980-05-16 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS56161538A true JPS56161538A (en) 1981-12-11

Family

ID=13268031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6477980A Pending JPS56161538A (en) 1980-05-16 1980-05-16 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS56161538A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7709519B2 (en) 2004-06-04 2010-05-04 Astellas Pharma Inc. Benzimidazolylidene propane-1,3 dione derivative or salt thereof
US7960562B2 (en) 2005-03-31 2011-06-14 Astellas Pharma Inc. Propane-1,3-dione derivative or salt thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7709519B2 (en) 2004-06-04 2010-05-04 Astellas Pharma Inc. Benzimidazolylidene propane-1,3 dione derivative or salt thereof
US8076367B2 (en) 2004-06-04 2011-12-13 Astellas Pharma Inc. Benzimidazolylidene propane-1,3-dione derivative or salt thereof
US7960562B2 (en) 2005-03-31 2011-06-14 Astellas Pharma Inc. Propane-1,3-dione derivative or salt thereof

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