DK133207B - LIGHT-SENSITIVE MATERIAL FOR USE IN MANUFACTURING A MULTI-METAL OFFSET PRINTING PLATE - Google Patents

LIGHT-SENSITIVE MATERIAL FOR USE IN MANUFACTURING A MULTI-METAL OFFSET PRINTING PLATE

Info

Publication number
DK133207B
DK133207B DK589769AA DK589769A DK133207B DK 133207 B DK133207 B DK 133207B DK 589769A A DK589769A A DK 589769AA DK 589769 A DK589769 A DK 589769A DK 133207 B DK133207 B DK 133207B
Authority
DK
Denmark
Prior art keywords
manufacturing
light
printing plate
sensitive material
offset printing
Prior art date
Application number
DK589769AA
Other languages
Danish (da)
Other versions
DK133207C (en
Inventor
F Uhlig
G Bergheuser
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of DK133207B publication Critical patent/DK133207B/en
Application granted granted Critical
Publication of DK133207C publication Critical patent/DK133207C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/10—Printing plates or foils; Materials therefor metallic for lithographic printing multiple
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C08G8/32—Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
DK589769A 1968-12-27 1969-11-07 LIGHT-SENSITIVE MATERIAL FOR USE IN MANUFACTURING A MULTI-METAL OFFSET PRINTING PLATE DK133207C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1817107A DE1817107C3 (en) 1968-12-27 1968-12-27 Presensitized multi-metal offset printing plate

Publications (2)

Publication Number Publication Date
DK133207B true DK133207B (en) 1976-04-05
DK133207C DK133207C (en) 1976-08-30

Family

ID=5717460

Family Applications (1)

Application Number Title Priority Date Filing Date
DK589769A DK133207C (en) 1968-12-27 1969-11-07 LIGHT-SENSITIVE MATERIAL FOR USE IN MANUFACTURING A MULTI-METAL OFFSET PRINTING PLATE

Country Status (14)

Country Link
AT (1) AT292034B (en)
BE (1) BE741743A (en)
BR (1) BR6914931D0 (en)
CA (1) CA931806A (en)
CH (1) CH530656A (en)
CS (1) CS151538B2 (en)
DE (1) DE1817107C3 (en)
DK (1) DK133207C (en)
ES (1) ES373504A1 (en)
FR (1) FR2027168A1 (en)
GB (1) GB1286879A (en)
IL (1) IL33511A (en)
NL (1) NL6918151A (en)
SE (1) SE355088B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en) * 1972-05-05 1974-11-27
US4268610A (en) 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
DE3114163C2 (en) * 1981-04-08 1983-12-29 Renker GmbH & Co KG, 5160 Düren Negative photomechanical recording material
DE3211547C2 (en) * 1982-03-29 1984-08-09 Renker GmbH & Co KG, 5160 Düren Use of a plastic film coated with photoresist as a labeling template
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US4684599A (en) * 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer

Also Published As

Publication number Publication date
CH530656A (en) 1972-11-15
CA931806A (en) 1973-08-14
DE1817107B2 (en) 1980-01-17
FR2027168A1 (en) 1970-09-25
DK133207C (en) 1976-08-30
NL6918151A (en) 1970-06-30
IL33511A0 (en) 1970-02-19
CS151538B2 (en) 1973-10-19
GB1286879A (en) 1972-08-23
SU403207A3 (en) 1973-10-19
SE355088B (en) 1973-04-02
DE1817107A1 (en) 1970-07-09
BE741743A (en) 1970-05-14
BR6914931D0 (en) 1973-01-25
DE1817107C3 (en) 1980-09-11
ES373504A1 (en) 1972-02-01
IL33511A (en) 1973-07-30
AT292034B (en) 1971-08-10

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