CA931806A - Light-sensitive material for the preparation of a multi-metal offset printing plate, and process for the preparation thereof - Google Patents

Light-sensitive material for the preparation of a multi-metal offset printing plate, and process for the preparation thereof

Info

Publication number
CA931806A
CA931806A CA069223A CA69223A CA931806A CA 931806 A CA931806 A CA 931806A CA 069223 A CA069223 A CA 069223A CA 69223 A CA69223 A CA 69223A CA 931806 A CA931806 A CA 931806A
Authority
CA
Canada
Prior art keywords
preparation
light
printing plate
sensitive material
offset printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA069223A
Inventor
Uhlig Fritz
Berghauser Gunter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Application granted granted Critical
Publication of CA931806A publication Critical patent/CA931806A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/10—Printing plates or foils; Materials therefor metallic for lithographic printing multiple
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C08G8/32—Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CA069223A 1968-12-27 1969-12-08 Light-sensitive material for the preparation of a multi-metal offset printing plate, and process for the preparation thereof Expired CA931806A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1817107A DE1817107C3 (en) 1968-12-27 1968-12-27 Presensitized multi-metal offset printing plate

Publications (1)

Publication Number Publication Date
CA931806A true CA931806A (en) 1973-08-14

Family

ID=5717460

Family Applications (1)

Application Number Title Priority Date Filing Date
CA069223A Expired CA931806A (en) 1968-12-27 1969-12-08 Light-sensitive material for the preparation of a multi-metal offset printing plate, and process for the preparation thereof

Country Status (14)

Country Link
AT (1) AT292034B (en)
BE (1) BE741743A (en)
BR (1) BR6914931D0 (en)
CA (1) CA931806A (en)
CH (1) CH530656A (en)
CS (1) CS151538B2 (en)
DE (1) DE1817107C3 (en)
DK (1) DK133207C (en)
ES (1) ES373504A1 (en)
FR (1) FR2027168A1 (en)
GB (1) GB1286879A (en)
IL (1) IL33511A (en)
NL (1) NL6918151A (en)
SE (1) SE355088B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en) * 1972-05-05 1974-11-27
US4268610A (en) 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
DE3114163C2 (en) * 1981-04-08 1983-12-29 Renker GmbH & Co KG, 5160 Düren Negative photomechanical recording material
DE3211547C2 (en) * 1982-03-29 1984-08-09 Renker GmbH & Co KG, 5160 Düren Use of a plastic film coated with photoresist as a labeling template
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4684599A (en) * 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer

Also Published As

Publication number Publication date
DE1817107A1 (en) 1970-07-09
NL6918151A (en) 1970-06-30
DE1817107C3 (en) 1980-09-11
DK133207C (en) 1976-08-30
IL33511A (en) 1973-07-30
DE1817107B2 (en) 1980-01-17
SE355088B (en) 1973-04-02
SU403207A3 (en) 1973-10-19
BE741743A (en) 1970-05-14
ES373504A1 (en) 1972-02-01
FR2027168A1 (en) 1970-09-25
CH530656A (en) 1972-11-15
AT292034B (en) 1971-08-10
DK133207B (en) 1976-04-05
CS151538B2 (en) 1973-10-19
GB1286879A (en) 1972-08-23
BR6914931D0 (en) 1973-01-25
IL33511A0 (en) 1970-02-19

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