CH530656A - Photosensitive material for making a multi-metal offset printing plate and method for making it - Google Patents

Photosensitive material for making a multi-metal offset printing plate and method for making it

Info

Publication number
CH530656A
CH530656A CH1723469A CH1723469A CH530656A CH 530656 A CH530656 A CH 530656A CH 1723469 A CH1723469 A CH 1723469A CH 1723469 A CH1723469 A CH 1723469A CH 530656 A CH530656 A CH 530656A
Authority
CH
Switzerland
Prior art keywords
making
printing plate
photosensitive material
offset printing
metal offset
Prior art date
Application number
CH1723469A
Other languages
German (de)
Inventor
Fritz Dr Uhlig
Berghaeuser Guenter
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH530656A publication Critical patent/CH530656A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/04Printing plates or foils; Materials therefor metallic
    • B41N1/08Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/10Printing plates or foils; Materials therefor metallic for lithographic printing multiple
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/20Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28Chemically modified polycondensates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28Chemically modified polycondensates
    • C08G8/32Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CH1723469A 1968-12-27 1969-11-19 Photosensitive material for making a multi-metal offset printing plate and method for making it CH530656A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1817107A DE1817107C3 (en) 1968-12-27 1968-12-27 Presensitized multi-metal offset printing plate

Publications (1)

Publication Number Publication Date
CH530656A true CH530656A (en) 1972-11-15

Family

ID=5717460

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1723469A CH530656A (en) 1968-12-27 1969-11-19 Photosensitive material for making a multi-metal offset printing plate and method for making it

Country Status (14)

Country Link
AT (1) AT292034B (en)
BE (1) BE741743A (en)
BR (1) BR6914931D0 (en)
CA (1) CA931806A (en)
CH (1) CH530656A (en)
CS (1) CS151538B2 (en)
DE (1) DE1817107C3 (en)
DK (1) DK133207C (en)
ES (1) ES373504A1 (en)
FR (1) FR2027168A1 (en)
GB (1) GB1286879A (en)
IL (1) IL33511A (en)
NL (1) NL6918151A (en)
SE (1) SE355088B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en) * 1972-05-05 1974-11-27
US4268610A (en) 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
DE3114163C2 (en) * 1981-04-08 1983-12-29 Renker GmbH & Co KG, 5160 Düren Negative photomechanical recording material
DE3211547C2 (en) * 1982-03-29 1984-08-09 Renker GmbH & Co KG, 5160 Düren Use of a plastic film coated with photoresist as a labeling template
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US4684599A (en) * 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer

Also Published As

Publication number Publication date
CA931806A (en) 1973-08-14
DE1817107B2 (en) 1980-01-17
FR2027168A1 (en) 1970-09-25
DK133207B (en) 1976-04-05
DK133207C (en) 1976-08-30
NL6918151A (en) 1970-06-30
IL33511A0 (en) 1970-02-19
CS151538B2 (en) 1973-10-19
GB1286879A (en) 1972-08-23
SU403207A3 (en) 1973-10-19
SE355088B (en) 1973-04-02
DE1817107A1 (en) 1970-07-09
BE741743A (en) 1970-05-14
BR6914931D0 (en) 1973-01-25
DE1817107C3 (en) 1980-09-11
ES373504A1 (en) 1972-02-01
IL33511A (en) 1973-07-30
AT292034B (en) 1971-08-10

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Legal Events

Date Code Title Description
PL Patent ceased