ES373504A1 - Improvements in and relating to light-sensitive materials for the preparation of multi-metal offset printing plates - Google Patents

Improvements in and relating to light-sensitive materials for the preparation of multi-metal offset printing plates

Info

Publication number
ES373504A1
ES373504A1 ES373504A ES373504A ES373504A1 ES 373504 A1 ES373504 A1 ES 373504A1 ES 373504 A ES373504 A ES 373504A ES 373504 A ES373504 A ES 373504A ES 373504 A1 ES373504 A1 ES 373504A1
Authority
ES
Spain
Prior art keywords
resin
weight
layer
novolac
vinyl compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES373504A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle G A
Original Assignee
Kalle G A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle G A filed Critical Kalle G A
Publication of ES373504A1 publication Critical patent/ES373504A1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/10—Printing plates or foils; Materials therefor metallic for lithographic printing multiple
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C08G8/32—Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

A process for the manufacture of a photosensitive material that is used to make polymetallic plates for offset printing, in which on the chromium layer of a copolymer layer polymetallic carrier, placed on a copper or copper alloy layer, A solution containing a photosensitive quinondiazide compound, alkali-soluble resin and, possibly, additions is applied, drying the applied solution, characterized in that the copying layer thereby produced contains, as a diazo compound, at least one iminoquinondiazide itself known of the general formula ** (See formula) ** where R means aryl or aryl substituted in the nucleus R'hydrogen or alcoholic, R'', alcohol, carbocyclic or heterocyclic aryl, or aryl substituted in the nucleus, or in which R'and R''represent, together with the N to which they are linked, a heterocyclic group, and R''', hydrogen, halogen, alcohol or alkoxy, and 33 to 100% resin in relation to the amount of the iminoquinondiazide; because of the resin at least 30% are novolac or condensed modified novolac with monochloroacetic acid, or epoxy resin or a mixed polymer of vinyl compounds with carboxylic group content, and the remaining part a polymer free of carboxylic groups and forming of movie; because at least 20% by weight are polymerized free of carboxylic groups and film-forming, or a mixed polymer of vinyl compounds with content of carboxyl groups, while from the resin they are 0 to 50% by weight condensation modified novolac with monochloroacetic acid, 0 to 80% by weight novolac or epoxy resin, and 0 to 100% by weight mixed polymerization of vinyl compounds with carboxyl group content, and because the copying layer has a thickness of 2 to 6 microns. (Machine-translation by Google Translate, not legally binding)
ES373504A 1968-12-27 1969-11-13 Improvements in and relating to light-sensitive materials for the preparation of multi-metal offset printing plates Expired ES373504A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1817107A DE1817107C3 (en) 1968-12-27 1968-12-27 Presensitized multi-metal offset printing plate

Publications (1)

Publication Number Publication Date
ES373504A1 true ES373504A1 (en) 1972-02-01

Family

ID=5717460

Family Applications (1)

Application Number Title Priority Date Filing Date
ES373504A Expired ES373504A1 (en) 1968-12-27 1969-11-13 Improvements in and relating to light-sensitive materials for the preparation of multi-metal offset printing plates

Country Status (14)

Country Link
AT (1) AT292034B (en)
BE (1) BE741743A (en)
BR (1) BR6914931D0 (en)
CA (1) CA931806A (en)
CH (1) CH530656A (en)
CS (1) CS151538B2 (en)
DE (1) DE1817107C3 (en)
DK (1) DK133207C (en)
ES (1) ES373504A1 (en)
FR (1) FR2027168A1 (en)
GB (1) GB1286879A (en)
IL (1) IL33511A (en)
NL (1) NL6918151A (en)
SE (1) SE355088B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en) * 1972-05-05 1974-11-27
US4268610A (en) 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
DE3114163C2 (en) * 1981-04-08 1983-12-29 Renker GmbH & Co KG, 5160 Düren Negative photomechanical recording material
DE3211547C2 (en) * 1982-03-29 1984-08-09 Renker GmbH & Co KG, 5160 Düren Use of a plastic film coated with photoresist as a labeling template
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4684599A (en) * 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer

Also Published As

Publication number Publication date
CS151538B2 (en) 1973-10-19
SU403207A3 (en) 1973-10-19
AT292034B (en) 1971-08-10
DE1817107C3 (en) 1980-09-11
DK133207C (en) 1976-08-30
BE741743A (en) 1970-05-14
SE355088B (en) 1973-04-02
IL33511A (en) 1973-07-30
NL6918151A (en) 1970-06-30
DK133207B (en) 1976-04-05
BR6914931D0 (en) 1973-01-25
CH530656A (en) 1972-11-15
FR2027168A1 (en) 1970-09-25
DE1817107A1 (en) 1970-07-09
DE1817107B2 (en) 1980-01-17
GB1286879A (en) 1972-08-23
IL33511A0 (en) 1970-02-19
CA931806A (en) 1973-08-14

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