DK131010B - Photosensitive material for the manufacture of an offset printing plate. - Google Patents
Photosensitive material for the manufacture of an offset printing plate.Info
- Publication number
- DK131010B DK131010B DK567166A DK567166A DK131010B DK 131010 B DK131010 B DK 131010B DK 567166 A DK567166 A DK 567166A DK 567166 A DK567166 A DK 567166A DK 131010 B DK131010 B DK 131010B
- Authority
- DK
- Denmark
- Prior art keywords
- manufacture
- printing plate
- photosensitive material
- offset printing
- offset
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Polyurethanes Or Polyureas (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2426965 | 1965-11-02 | ||
IT4224266 | 1966-10-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
DK131010B true DK131010B (en) | 1975-05-12 |
DK131010C DK131010C (en) | 1975-11-03 |
Family
ID=26328489
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK567166A DK131010B (en) | 1965-11-02 | 1966-11-01 | Photosensitive material for the manufacture of an offset printing plate. |
Country Status (10)
Country | Link |
---|---|
AT (1) | AT286323B (en) |
BE (1) | BE689129A (en) |
CH (1) | CH487433A (en) |
DE (1) | DE1522524A1 (en) |
DK (1) | DK131010B (en) |
ES (1) | ES332941A1 (en) |
GB (1) | GB1166065A (en) |
NL (2) | NL6615389A (en) |
NO (1) | NO122574B (en) |
SE (1) | SE332753B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4656217A (en) * | 1983-05-31 | 1987-04-07 | Nippon Shokubai Kagaku Kogyo Co. Ltd. | Reactive polymer, method for manufacturing thereof and use thereof |
US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
US6517988B1 (en) * | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
-
0
- NL NL134142D patent/NL134142C/xx active
-
1966
- 1966-10-25 SE SE1461966A patent/SE332753B/xx unknown
- 1966-10-27 CH CH1555966A patent/CH487433A/en not_active IP Right Cessation
- 1966-10-31 BE BE689129D patent/BE689129A/xx unknown
- 1966-10-31 AT AT1012666A patent/AT286323B/en not_active IP Right Cessation
- 1966-10-31 ES ES0332941A patent/ES332941A1/en not_active Expired
- 1966-11-01 GB GB4900566A patent/GB1166065A/en not_active Expired
- 1966-11-01 NL NL6615389A patent/NL6615389A/xx unknown
- 1966-11-01 DE DE19661522524 patent/DE1522524A1/en active Pending
- 1966-11-01 DK DK567166A patent/DK131010B/en unknown
- 1966-11-01 NO NO16542166A patent/NO122574B/no unknown
Also Published As
Publication number | Publication date |
---|---|
ES332941A1 (en) | 1967-10-16 |
BE689129A (en) | 1967-05-02 |
DK131010C (en) | 1975-11-03 |
SE332753B (en) | 1971-02-15 |
AT286323B (en) | 1970-12-10 |
NL134142C (en) | |
GB1166065A (en) | 1969-10-01 |
DE1522524A1 (en) | 1969-09-11 |
NO122574B (en) | 1971-07-12 |
CH487433A (en) | 1970-03-15 |
NL6615389A (en) | 1967-05-03 |
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