ES332941A1 - Procedure for preparing possibiliate posstitutional offset printing matrixes. (Machine-translation by Google Translate, not legally binding) - Google Patents

Procedure for preparing possibiliate posstitutional offset printing matrixes. (Machine-translation by Google Translate, not legally binding)

Info

Publication number
ES332941A1
ES332941A1 ES0332941A ES332941A ES332941A1 ES 332941 A1 ES332941 A1 ES 332941A1 ES 0332941 A ES0332941 A ES 0332941A ES 332941 A ES332941 A ES 332941A ES 332941 A1 ES332941 A1 ES 332941A1
Authority
ES
Spain
Prior art keywords
procedure
translation
preparing
machine
legally binding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES0332941A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ferrania SpA
Original Assignee
Ferrania SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ferrania SpA filed Critical Ferrania SpA
Publication of ES332941A1 publication Critical patent/ES332941A1/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/62Polymers of compounds having carbon-to-carbon double bonds
    • C08G18/6216Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
    • C08G18/625Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polyurethanes Or Polyureas (AREA)

Abstract

Procedure for preparing presensitized, positive offset printing matrices, according to the diazotyping procedure, where the photosensitive material or materials are in the presence of a resin or resin mixture, insoluble in the alkaline solution usually used in the diazotyping procedures, in the treatments of development, but, nevertheless, permeable for said solutions. (Machine-translation by Google Translate, not legally binding)
ES0332941A 1965-11-02 1966-10-31 Procedure for preparing possibiliate posstitutional offset printing matrixes. (Machine-translation by Google Translate, not legally binding) Expired ES332941A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT2426965 1965-11-02
IT4224266 1966-10-18

Publications (1)

Publication Number Publication Date
ES332941A1 true ES332941A1 (en) 1967-10-16

Family

ID=26328489

Family Applications (1)

Application Number Title Priority Date Filing Date
ES0332941A Expired ES332941A1 (en) 1965-11-02 1966-10-31 Procedure for preparing possibiliate posstitutional offset printing matrixes. (Machine-translation by Google Translate, not legally binding)

Country Status (10)

Country Link
AT (1) AT286323B (en)
BE (1) BE689129A (en)
CH (1) CH487433A (en)
DE (1) DE1522524A1 (en)
DK (1) DK131010B (en)
ES (1) ES332941A1 (en)
GB (1) GB1166065A (en)
NL (2) NL6615389A (en)
NO (1) NO122574B (en)
SE (1) SE332753B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4656217A (en) * 1983-05-31 1987-04-07 Nippon Shokubai Kagaku Kogyo Co. Ltd. Reactive polymer, method for manufacturing thereof and use thereof
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
US6517988B1 (en) * 2001-07-12 2003-02-11 Kodak Polychrome Graphics Llc Radiation-sensitive, positive working coating composition based on carboxylic copolymers

Also Published As

Publication number Publication date
SE332753B (en) 1971-02-15
BE689129A (en) 1967-05-02
NL6615389A (en) 1967-05-03
AT286323B (en) 1970-12-10
DE1522524A1 (en) 1969-09-11
NO122574B (en) 1971-07-12
CH487433A (en) 1970-03-15
GB1166065A (en) 1969-10-01
DK131010C (en) 1975-11-03
DK131010B (en) 1975-05-12
NL134142C (en)

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