DK1127173T3 - Apparat til flow-line-behandling af genstande i et kunstigt medium - Google Patents

Apparat til flow-line-behandling af genstande i et kunstigt medium

Info

Publication number
DK1127173T3
DK1127173T3 DK99949474T DK99949474T DK1127173T3 DK 1127173 T3 DK1127173 T3 DK 1127173T3 DK 99949474 T DK99949474 T DK 99949474T DK 99949474 T DK99949474 T DK 99949474T DK 1127173 T3 DK1127173 T3 DK 1127173T3
Authority
DK
Denmark
Prior art keywords
cavity
chamber
working chamber
locks
flow
Prior art date
Application number
DK99949474T
Other languages
Danish (da)
English (en)
Inventor
Arthur Zeberinsh
Original Assignee
Sidrabe As
Vacumetal B V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidrabe As, Vacumetal B V filed Critical Sidrabe As
Application granted granted Critical
Publication of DK1127173T3 publication Critical patent/DK1127173T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Pretreatment Of Seeds And Plants (AREA)
  • Electrotherapy Devices (AREA)
  • Paper (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Prostheses (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Furnace Charging Or Discharging (AREA)
DK99949474T 1998-10-13 1999-10-13 Apparat til flow-line-behandling af genstande i et kunstigt medium DK1127173T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98203444A EP0995812A1 (en) 1998-10-13 1998-10-13 Apparatus for flow-line treatment of articles in an artificial medium
PCT/NL1999/000634 WO2000022186A1 (en) 1998-10-13 1999-10-13 Apparatus for flow-line treatment of articles in an artificial medium

Publications (1)

Publication Number Publication Date
DK1127173T3 true DK1127173T3 (da) 2003-05-26

Family

ID=8234215

Family Applications (1)

Application Number Title Priority Date Filing Date
DK99949474T DK1127173T3 (da) 1998-10-13 1999-10-13 Apparat til flow-line-behandling af genstande i et kunstigt medium

Country Status (9)

Country Link
US (1) US6517692B1 (es)
EP (2) EP0995812A1 (es)
AT (1) ATE232244T1 (es)
AU (1) AU6233799A (es)
CA (1) CA2346895C (es)
DE (1) DE69905274T2 (es)
DK (1) DK1127173T3 (es)
ES (1) ES2188253T3 (es)
WO (1) WO2000022186A1 (es)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6676810B2 (en) * 2000-01-12 2004-01-13 D2 In-Line Solutions, Llc Method of coating insulative substrates
WO2003085301A1 (en) * 2002-03-29 2003-10-16 D2 In-Line Solutions, Llc Rotary barrel gate valve
US20060237398A1 (en) * 2002-05-08 2006-10-26 Dougherty Mike L Sr Plasma-assisted processing in a manufacturing line
EP1577419A1 (de) * 2004-03-16 2005-09-21 Applied Films GmbH & Co. KG Anlage zum Beschichten von Hohlkörpern, insbesondere von Kunststoffflaschen, mit einem Hochvakuumbereich und einer Schleuse
DE102004012663A1 (de) * 2004-03-16 2005-10-06 Applied Films Gmbh & Co. Kg Anlage zum Beschichten von Hohlkörpern, insbesondere von Kunststoffflaschen, mit einem Hochvakuumbereich und einer Schleuse
DE102004044357B4 (de) * 2004-09-14 2007-09-20 Eisenlohr, Jörg Vorrichtung zur Durchführung der Oberflächenbehandlung von Bauteilen in der Plasmatechnik
TWI257959B (en) * 2005-01-20 2006-07-11 Uvat Technology Co Ltd Continuous vacuum film deposition machine with built-in electrostatic dust removal mechanism
TW200704810A (en) * 2005-07-21 2007-02-01 Hsiuping Inst Technology Automatic in-line sputtering system with an integrated surface corona pretreatment
US20090304907A1 (en) * 2008-06-09 2009-12-10 Applied Materials, Inc. Coating system and method for coating a substrate
WO2009156196A1 (en) 2008-06-27 2009-12-30 Applied Materials Inc. Processing system and method of operating a processing system
US20090324368A1 (en) * 2008-06-27 2009-12-31 Applied Materials, Inc. Processing system and method of operating a processing system
US9297064B2 (en) * 2009-01-16 2016-03-29 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
KR101932578B1 (ko) * 2010-04-30 2018-12-28 어플라이드 머티어리얼스, 인코포레이티드 수직 인라인 화학기상증착 시스템
DE102011083139B4 (de) * 2011-09-21 2013-12-24 Von Ardenne Anlagentechnik Gmbh Substratbehandlungsverfahren und Substratbehandlungsanlage
CN104471697B (zh) * 2011-12-27 2018-03-16 因特瓦克公司 用于组合式静态和经过处理的系统体系结构
ITMI20121358A1 (it) * 2012-08-01 2014-02-02 Tapematic Spa Macchina per la verniciatura e linea per la finitura di oggetti tridimensionali di piccole dimensioni e relativi metodi
KR20200035283A (ko) 2017-07-26 2020-04-02 발라드 파워 시스템즈 인크. 플루오로 알킬 화합물 첨가제를 갖는 막 전극 어셈블리

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3260383A (en) * 1964-08-04 1966-07-12 Vacuum Processes Inc Method and apparatus for loading and unloading a high vacuum process chamber
FR1496205A (fr) * 1966-08-18 1967-09-29 S E A V O M Dispositif pour le traitement sous vide de pièces diverses et notamment de pièces en forme de corps roulants
US3833018A (en) * 1973-02-21 1974-09-03 Pass Port Syst Corp Low leakage vacuum valve and chamber using same
DE4111384C2 (de) * 1991-04-09 1999-11-04 Leybold Ag Vorrichtung zur Beschichtung von Substraten
US6086728A (en) * 1994-12-14 2000-07-11 Schwartz; Vladimir Cross flow metalizing of compact discs
DE19642852A1 (de) * 1996-10-17 1998-04-23 Leybold Systems Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf dreidimensionale, schalenförmige oder prismatische Substrate

Also Published As

Publication number Publication date
AU6233799A (en) 2000-05-01
CA2346895A1 (en) 2000-04-20
CA2346895C (en) 2008-03-18
DE69905274D1 (de) 2003-03-13
US6517692B1 (en) 2003-02-11
ATE232244T1 (de) 2003-02-15
EP1127173B1 (en) 2003-02-05
DE69905274T2 (de) 2003-11-20
EP1127173A1 (en) 2001-08-29
EP0995812A1 (en) 2000-04-26
WO2000022186A1 (en) 2000-04-20
ES2188253T3 (es) 2003-06-16

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