DK103053C - Sure bade tilt elektrolytisk udfældning af metaller. - Google Patents

Sure bade tilt elektrolytisk udfældning af metaller.

Info

Publication number
DK103053C
DK103053C DK46962AA DK46962A DK103053C DK 103053 C DK103053 C DK 103053C DK 46962A A DK46962A A DK 46962AA DK 46962 A DK46962 A DK 46962A DK 103053 C DK103053 C DK 103053C
Authority
DK
Denmark
Prior art keywords
tilt
metals
electrolytic precipitation
acidic baths
baths
Prior art date
Application number
DK46962AA
Other languages
Danish (da)
English (en)
Inventor
Alfred Kirstahler
Gregor Michael
Wolf-Dieter Willmund
Original Assignee
Dehydag Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dehydag Gmbh filed Critical Dehydag Gmbh
Application granted granted Critical
Publication of DK103053C publication Critical patent/DK103053C/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
    • C07D295/20—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
    • C07D295/21—Radicals derived from sulfur analogues of carbonic acid
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/30—Oxygen or sulfur atoms
    • C07D233/42—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/08—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
DK46962AA 1961-02-02 1962-02-01 Sure bade tilt elektrolytisk udfældning af metaller. DK103053C (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DED35328A DE1146322B (de) 1961-02-02 1961-02-02 Saure galvanische Metallbaeder

Publications (1)

Publication Number Publication Date
DK103053C true DK103053C (da) 1965-11-08

Family

ID=7042588

Family Applications (1)

Application Number Title Priority Date Filing Date
DK46962AA DK103053C (da) 1961-02-02 1962-02-01 Sure bade tilt elektrolytisk udfældning af metaller.

Country Status (7)

Country Link
US (1) US3203878A (ja)
BE (1) BE613365A (ja)
CH (1) CH427447A (ja)
DE (1) DE1146322B (ja)
DK (1) DK103053C (ja)
GB (1) GB928011A (ja)
NL (2) NL274211A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1248415B (de) * 1964-03-07 1967-08-24 Dehydag Gmbh Saure galvanische Kupferbaeder
US3414493A (en) * 1965-10-19 1968-12-03 Lea Ronal Inc Electrodeposition of copper
US3725220A (en) * 1972-04-27 1973-04-03 Lea Ronal Inc Electrodeposition of copper from acidic baths
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives
GB2109815B (en) * 1981-11-18 1985-09-04 Ibm Electrodepositing chromium
US4786746A (en) * 1987-09-18 1988-11-22 Pennsylvania Research Corporation Copper electroplating solutions and methods of making and using them
EP2128903B1 (en) * 2008-05-30 2017-02-22 ATOTECH Deutschland GmbH Electroplating additive for the deposition of a metal, a binary, ternary, quaternary or pentanary alloy of elements of group 11 (IB)-group 13 (IIIA)-group 16 (VIA)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL202744A (ja) * 1953-09-19
DE1007592B (de) * 1955-01-19 1957-05-02 Dehydag Gmbh Bad zur Herstellung von galvanischen Metallueberzuegen
US3006954A (en) * 1957-12-27 1961-10-31 Shell Oil Co Urea and thiourea compounds
US2948752A (en) * 1959-05-18 1960-08-09 Monsanto Canada Ltd Combined fungistatic and bacteriostatic agents

Also Published As

Publication number Publication date
DE1146322B (de) 1963-03-28
GB928011A (en) 1963-06-06
US3203878A (en) 1965-08-31
NL134137C (ja)
CH427447A (de) 1966-12-31
NL274211A (ja)
BE613365A (fr) 1962-05-29

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