DK0559259T3 - Fremgangsmåde til transformering af et væskeflow til et gasflow samt apparat til udøvelse af fremgangsmåden - Google Patents

Fremgangsmåde til transformering af et væskeflow til et gasflow samt apparat til udøvelse af fremgangsmåden

Info

Publication number
DK0559259T3
DK0559259T3 DK93200361T DK93200361T DK0559259T3 DK 0559259 T3 DK0559259 T3 DK 0559259T3 DK 93200361 T DK93200361 T DK 93200361T DK 93200361 T DK93200361 T DK 93200361T DK 0559259 T3 DK0559259 T3 DK 0559259T3
Authority
DK
Denmark
Prior art keywords
gas flow
flow
transforming
liquid
carrying
Prior art date
Application number
DK93200361T
Other languages
English (en)
Inventor
Hendrik Jan Boer
Original Assignee
Berkin Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Berkin Bv filed Critical Berkin Bv
Application granted granted Critical
Publication of DK0559259T3 publication Critical patent/DK0559259T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/16—Evaporating by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
    • B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/12—Mixing gases with gases with vaporisation of a liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DK93200361T 1992-03-06 1993-02-11 Fremgangsmåde til transformering af et væskeflow til et gasflow samt apparat til udøvelse af fremgangsmåden DK0559259T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9200415A NL9200415A (nl) 1992-03-06 1992-03-06 Werkwijze voor het omzetten van een vloeistofstroom in een gasstroom, en inrichting voor het uitvoeren van de werkwijze.

Publications (1)

Publication Number Publication Date
DK0559259T3 true DK0559259T3 (da) 1998-09-14

Family

ID=19860524

Family Applications (1)

Application Number Title Priority Date Filing Date
DK93200361T DK0559259T3 (da) 1992-03-06 1993-02-11 Fremgangsmåde til transformering af et væskeflow til et gasflow samt apparat til udøvelse af fremgangsmåden

Country Status (8)

Country Link
US (1) US5431736A (da)
EP (1) EP0559259B1 (da)
JP (1) JP3352751B2 (da)
AT (1) ATE162412T1 (da)
DE (1) DE69316409T2 (da)
DK (1) DK0559259T3 (da)
ES (1) ES2113467T3 (da)
NL (1) NL9200415A (da)

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US5575854A (en) * 1993-12-30 1996-11-19 Tokyo Electron Limited Semiconductor treatment apparatus
US5531111A (en) * 1994-04-28 1996-07-02 Nippondenso Co., Ltd. Structure of a volumetric measuring apparatus
DE19502944C2 (de) * 1995-01-31 2000-10-19 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Überführung eines Flüssigkeitsstromes in einen Gasstrom
US5653813A (en) * 1995-04-03 1997-08-05 Novellus Systems, Inc. Cyclone evaporator
TW393521B (en) * 1996-05-23 2000-06-11 Ebara Corp Vaporizer apparatus and film deposition apparatus therewith
US6012647A (en) * 1997-12-01 2000-01-11 3M Innovative Properties Company Apparatus and method of atomizing and vaporizing
US6045864A (en) * 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
DE19755643C2 (de) * 1997-12-15 2001-05-03 Martin Schmaeh Vorrichtung zum Verdampfen von Flüssigkeit und zum Herstellen von Gas/Dampf-Gemischen
KR100460746B1 (ko) * 1999-04-13 2004-12-09 주식회사 하이닉스반도체 반도체 소자의 구리 금속 배선 형성 방법
JP4393677B2 (ja) * 1999-09-14 2010-01-06 株式会社堀場エステック 液体材料気化方法および装置並びに制御バルブ
DE19947609C1 (de) * 1999-10-04 2001-05-03 Univ Muenchen Tech Vorrichtung zur Erzeugung von Ein- oder Mehrkomponenten-Prüfgas organisch-chemischer Stoffe
US6761109B2 (en) * 2001-03-28 2004-07-13 The Boc Group, Inc. Apparatus and method for mixing a gas and a liquid
US7008658B2 (en) * 2002-05-29 2006-03-07 The Boc Group, Inc. Apparatus and method for providing treatment to a continuous supply of food product by impingement
US20030228401A1 (en) * 2002-06-06 2003-12-11 Newman Michael D. System and method of using non-volatile microbiocidal application agents
TW201209219A (en) * 2010-08-16 2012-03-01 Hon Hai Prec Ind Co Ltd Coating apparatus and coating method
JP2012205970A (ja) * 2011-03-29 2012-10-25 Chino Corp 蒸発装置
US9302291B2 (en) 2011-08-05 2016-04-05 3M Innovative Properties Company Systems and methods for processing vapor
US20180141080A1 (en) 2015-06-30 2018-05-24 3M Innovative Properties Company Discontinuous coatings and methods of forming the same
WO2017172531A1 (en) 2016-04-01 2017-10-05 3M Innovative Properties Company Roll-to-roll atomic layer deposition apparatus and method
EP3409812A1 (de) 2017-05-31 2018-12-05 Meyer Burger (Germany) AG Gasversorgungssystem und gasversorgungsverfahren

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL72520C (da) *
US921934A (en) * 1908-05-07 1909-05-18 John M Willard Apparatus for producing gas from liquid hydrocarbons.
US1122703A (en) * 1913-07-21 1914-12-29 Lester M Dull Carbureter.
US1202771A (en) * 1914-04-08 1916-10-31 Miles E Babbitt Carbureter.
US1207664A (en) * 1914-09-03 1916-12-05 Thurston Motor Fuel Gasifier Company Of California Gaseous heater.
US1798065A (en) * 1927-12-28 1931-03-24 Clark Rice Owen Carburetor
US1965144A (en) * 1932-11-01 1934-07-03 Kane Carburetor Corp Carburetor
GB578783A (en) * 1943-03-24 1946-07-11 British Thomson Houston Co Ltd Improvements in apparatus for producing aerosols
NL142338B (nl) * 1968-02-28 1974-06-17 Showa Denko Kk Toestel ten gebruike bij een inrichting voor het bereiden van een aerosol van een chemische verbinding.
DE2151007B2 (de) * 1971-10-08 1976-08-19 Auergesellschaft Gmbh, 1000 Berlin Verfahren und vorrichtung zum kontinuierlichen herstellen eines gemisches von gas mit dampf
US4916077A (en) * 1987-02-27 1990-04-10 Shell Oil Company Method and apparatus for oxidative decomposition and analysis of a sample
US4950456A (en) * 1987-02-27 1990-08-21 Shell Oil Company Apparatus for analysis of a sample for sulphur
JPH0784662B2 (ja) * 1989-12-12 1995-09-13 アプライドマテリアルズジャパン株式会社 化学的気相成長方法とその装置
US5204314A (en) * 1990-07-06 1993-04-20 Advanced Technology Materials, Inc. Method for delivering an involatile reagent in vapor form to a CVD reactor
FR2669555B1 (fr) * 1990-11-27 1993-07-23 Ass Gestion Ecole Fr Papeterie Dispositif de conditionnement de gaz.

Also Published As

Publication number Publication date
JP3352751B2 (ja) 2002-12-03
EP0559259A1 (en) 1993-09-08
DE69316409T2 (de) 1998-08-27
US5431736A (en) 1995-07-11
EP0559259B1 (en) 1998-01-21
ES2113467T3 (es) 1998-05-01
JPH0620977A (ja) 1994-01-28
DE69316409D1 (de) 1998-02-26
ATE162412T1 (de) 1998-02-15
NL9200415A (nl) 1993-10-01

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