DE9204528U1 - - Google Patents

Info

Publication number
DE9204528U1
DE9204528U1 DE9204528U DE9204528U DE9204528U1 DE 9204528 U1 DE9204528 U1 DE 9204528U1 DE 9204528 U DE9204528 U DE 9204528U DE 9204528 U DE9204528 U DE 9204528U DE 9204528 U1 DE9204528 U1 DE 9204528U1
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE9204528U
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heidelberg Instruments Mikrotechnik 6900 Heidelberg De GmbH
Original Assignee
Heidelberg Instruments Mikrotechnik 6900 Heidelberg De GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heidelberg Instruments Mikrotechnik 6900 Heidelberg De GmbH filed Critical Heidelberg Instruments Mikrotechnik 6900 Heidelberg De GmbH
Priority to DE9204528U priority Critical patent/DE9204528U1/de
Publication of DE9204528U1 publication Critical patent/DE9204528U1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
    • G01S17/06—Systems determining position data of a target
    • G01S17/08—Systems determining position data of a target for measuring distance only
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
DE9204528U 1992-04-02 1992-04-02 Expired - Lifetime DE9204528U1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE9204528U DE9204528U1 (de) 1992-04-02 1992-04-02

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE9204528U DE9204528U1 (de) 1992-04-02 1992-04-02

Publications (1)

Publication Number Publication Date
DE9204528U1 true DE9204528U1 (de) 1992-09-17

Family

ID=6878056

Family Applications (1)

Application Number Title Priority Date Filing Date
DE9204528U Expired - Lifetime DE9204528U1 (de) 1992-04-02 1992-04-02

Country Status (1)

Country Link
DE (1) DE9204528U1 (de)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3528684A1 (de) * 1984-08-31 1986-03-06 Aktiebolaget Electrolux, Stockholm Messanordnung zum ermitteln des oberflaechenprofils eines objekts
DE3719422A1 (de) * 1986-12-19 1988-06-30 Hommelwerke Gmbh Vorrichtung zur beruehrungsfreien messung eines abstandes von einer oberflaeche, insbesondere zur abtastung einer kontur einer oberflaeche eines werkstueckes laengs eines messweges
DE3817337A1 (de) * 1987-05-21 1988-12-01 Anritsu Corp System zur messung von oberflaechenprofilen
US4959552A (en) * 1988-02-09 1990-09-25 Carl-Zeiss-Stiftung Microscope arranged for measuring microscopic structures
DE4017935A1 (de) * 1990-06-05 1991-12-12 Leonhardt Klaus Prof Dr Mikro-ellipso-profilometrie

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3528684A1 (de) * 1984-08-31 1986-03-06 Aktiebolaget Electrolux, Stockholm Messanordnung zum ermitteln des oberflaechenprofils eines objekts
DE3719422A1 (de) * 1986-12-19 1988-06-30 Hommelwerke Gmbh Vorrichtung zur beruehrungsfreien messung eines abstandes von einer oberflaeche, insbesondere zur abtastung einer kontur einer oberflaeche eines werkstueckes laengs eines messweges
DE3817337A1 (de) * 1987-05-21 1988-12-01 Anritsu Corp System zur messung von oberflaechenprofilen
US4959552A (en) * 1988-02-09 1990-09-25 Carl-Zeiss-Stiftung Microscope arranged for measuring microscopic structures
DE4017935A1 (de) * 1990-06-05 1991-12-12 Leonhardt Klaus Prof Dr Mikro-ellipso-profilometrie

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