DE744105C - Process for increasing the secondary emission yield of secondary emission-capable layers - Google Patents

Process for increasing the secondary emission yield of secondary emission-capable layers

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Publication number
DE744105C
DE744105C DEZ25471D DEZ0025471D DE744105C DE 744105 C DE744105 C DE 744105C DE Z25471 D DEZ25471 D DE Z25471D DE Z0025471 D DEZ0025471 D DE Z0025471D DE 744105 C DE744105 C DE 744105C
Authority
DE
Germany
Prior art keywords
secondary emission
layers
glow discharge
increasing
yield
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEZ25471D
Other languages
German (de)
Inventor
Dr Paul Goerlich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeiss Ikon AG
Original Assignee
Zeiss Ikon AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Ikon AG filed Critical Zeiss Ikon AG
Priority to DEZ25471D priority Critical patent/DE744105C/en
Application granted granted Critical
Publication of DE744105C publication Critical patent/DE744105C/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
    • H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/32—Secondary emission electrodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Description

Verfahren zur Erhöhung der Sekundäremissionsausbeute von sekundäremissionsfähigen Schichten Es hat sich gezeigt, daß Alkalimetalle bei Beschießung mit Elektronen in kompakter Form verhältnismäßig geringe Ausbeuten an Sekundärelektronen ergeben. Man ist deshalb dazu übergegangen, Alkalimetalle als dünne Schichten auf oxydierte Metallunterlagen aufzubringen. Die Ausbeute an Sekundärelektronen ist dann wesentlich größer. Man ist auch schon so vorgegangen, daß man, insbesondere bei den Erdalkalimetallen., Schichten auf Metallunterlagen aufgedampft und diese dann einer Temperatur- oder Sauerstoffbehandlung unterworfen hat. Die Größe des jeweils erzielten Sekundärelektronenfaktors hängt naturgemäß außer von dem Behandlungsverfahren von den jeweils verwendeten Stoffen (Metallunterlage und sekundäremissionsempfindliche Schicht) ab. So ergeben oxydierte Alkalimetalle auf Metallunterlagen bekanntlich eine höhere Ausbeute als in gleicher Weise behandelte Erdalkalimetallschichten. Die vorliegende Erfindung befaßt sich mit einem Verfahren zur Erhöhung der Sekundäremission. Die Erfindung besteht darin, daß die sekundäremissionsfähige Schicht eine bestimmte Zeit lang einer Glimmentladung in einem chemisch inaktiven Gas, beispielsweise Edelgas, ausgesetzt wird. Als besonders günstig haben sich Aufdampfschichten von Alkali-bzw. Erdalkalimetallen auf Wolfram-,. Silber-und Tantalunterlagen erwiesen. Auch oxydierte Aufdampfschichten können nach dem erfindungsgemäßen Verfahren behandelt werden.Method for increasing the secondary emission yield of secondary emissive Layers It has been shown that alkali metals when bombarded with electrons result in relatively low yields of secondary electrons in compact form. One has therefore gone over to oxidizing alkali metals as thin layers Apply metal pads. The yield of secondary electrons is then essential greater. One has already proceeded in such a way that, especially with the alkaline earth metals., Layers evaporated on metal substrates and these then a temperature or Has subjected to oxygen treatment. The size of the secondary electron factor achieved in each case naturally depends not only on the treatment method but also on the one used Substances (metal base and secondary emission-sensitive layer). So devoted oxidized alkali metals on metal substrates are known to have a higher yield than alkaline earth metal layers treated in the same way. The present invention deals with a method to increase secondary emissions. The invention is that the secondary emissive layer lasts for a certain time exposed to a glow discharge in a chemically inactive gas, for example noble gas will. Evaporation layers of alkali or. Alkaline earth metals on tungsten ,. Silver and tantalum backing proven. Also oxidized vapor deposition can be treated according to the method according to the invention.

Ein Beispiel soll zeigen, welche Erfolge mit dem Verfahren nach der Erfindung erzielbar sind.An example should show the successes achieved with the procedure according to the Invention are achievable.

Eine auf Silber aufgedampfte Berylliumschicht zeigte ohne Vorbehandlung einen Sekundäremissionsfaktor zwischen 1,2 und 1,5. Nach z1/2stündiger Glimmentladung im Argon gemäß der Erfindung dagegen konnte ein Sekundüremissionsfaktor in der Größe von 3,2 bis 3,5 erhalten werden. Wesentlich ist hierbei die Glimmentladung. Die alleinige Berührung der jeweiligen Schicht mit einem inaktiven Gas,, insbesondere Edelgas, reicht nicht aus, um einer Erhöhung der Ausbeute an Sekundärelektronen zu erzielen. Bei Ver-' Wendung von Edelgasen wählt man etwa einen Druck zwischen i und io inm Hg.A beryllium layer vapor-deposited on silver showed a secondary emission factor between 1.2 and 1.5 without pretreatment. After about 1/2 hour glow discharge in argon according to the invention, on the other hand, a secondary emission factor of 3.2 to 3.5 could be obtained. The glow discharge is essential here. The mere contact of the respective layer with an inactive gas, in particular noble gas, is not sufficient to achieve an increase in the yield of secondary electrons. When using noble gases one chooses a pressure between i and io in Hg.

Claims (3)

PATENTANSPRÜCHE: i. Verfahren zur Erhöhung der Sekundäremissionsausbeute von sekundäreinissionsfäliien Schichten, dadurch gekennzeichnet,' daß diese eine bestimmte Zeit lang einer Glimmentladung . in einem chemisch inaktiven Gas, beispielsweise Edelgas, ausgesetzt werden. PATENT CLAIMS: i. Method for increasing the secondary emission yield of secondary emission layers, characterized in that they are subjected to a glow discharge for a specific time. in a chemically inactive gas, such as noble gas. 2. Verfahren nach Anspruch i, dadurch gekennzeichnet, daß bei Verwendung von auf Silber aufgedampften Bervlliumschichteil eine etwa iif.stündige Glimmentladung im Argon bei einem Druck von etwa i bis io mm Hg vorgenommen wird. 2. The method according to claim i, characterized in that that when using a part of the Bervllium layer vapor-deposited on silver it takes about iif.hour Glow discharge is carried out in argon at a pressure of about 1 to 10 mm Hg. 3. Verfahren nach Anspruch i, dadurch gekennzeichnet, daß Aufdampfschichten von Alkali- oder Erdalkalimetallen auf Wolfram-, Silber- oder Tantaltinterlagcn \Terwendung finden. .f. Verfahren nach Anspruch i, dadurch gekennzeichnet, daß die Aufdanipfschichten vor Anwendung der Glimmentladung oxydiert werden. Zur Abgrenzung des Anmeldungsgegenstandes vom Stand der Technik sind im Erteilungsverfahren folgende Druckschriften in Betracht gezogen worden: französische Patentschrift . . . 'N r. ##24 36.5; britische - . , . - 332 0o;.3. The method according to claim i, characterized in that vapor-deposited layers of alkali or alkaline earth metals on tungsten, silver or tantaltic interlayers are used. .f. Process according to Claim i, characterized in that the deposition layers are oxidized before the glow discharge is applied. In order to distinguish the subject matter of the application from the state of the art, the following publications were considered in the grant procedure: French patent specification. . . 'No. ## 24 36.5; British -. ,. - 332 0o ;.
DEZ25471D 1939-09-14 1939-09-14 Process for increasing the secondary emission yield of secondary emission-capable layers Expired DE744105C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DEZ25471D DE744105C (en) 1939-09-14 1939-09-14 Process for increasing the secondary emission yield of secondary emission-capable layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEZ25471D DE744105C (en) 1939-09-14 1939-09-14 Process for increasing the secondary emission yield of secondary emission-capable layers

Publications (1)

Publication Number Publication Date
DE744105C true DE744105C (en) 1944-01-10

Family

ID=7626380

Family Applications (1)

Application Number Title Priority Date Filing Date
DEZ25471D Expired DE744105C (en) 1939-09-14 1939-09-14 Process for increasing the secondary emission yield of secondary emission-capable layers

Country Status (1)

Country Link
DE (1) DE744105C (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB332002A (en) * 1929-05-27 1930-07-17 Gen Electric Co Ltd Improvements in the manufacture of photoelectric cells
FR824365A (en) * 1936-10-23 1938-02-07 Radio Electr Soc Fr Electrodes for discharge lamps

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB332002A (en) * 1929-05-27 1930-07-17 Gen Electric Co Ltd Improvements in the manufacture of photoelectric cells
FR824365A (en) * 1936-10-23 1938-02-07 Radio Electr Soc Fr Electrodes for discharge lamps

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