DE69924024D1 - Verfahren und vorrichtung zum entfernen von gussgraten - Google Patents

Verfahren und vorrichtung zum entfernen von gussgraten

Info

Publication number
DE69924024D1
DE69924024D1 DE69924024T DE69924024T DE69924024D1 DE 69924024 D1 DE69924024 D1 DE 69924024D1 DE 69924024 T DE69924024 T DE 69924024T DE 69924024 T DE69924024 T DE 69924024T DE 69924024 D1 DE69924024 D1 DE 69924024D1
Authority
DE
Germany
Prior art keywords
purchases
removing purchases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69924024T
Other languages
English (en)
Inventor
Yongfeng Lu
Hui Sim
Qiong Chen
Chen Lai
Othman Rustam
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Data Storage Institute
Advanced Systems Automation Ltd Singapore
Original Assignee
Data Storage Institute
Advanced Systems Automation Ltd Singapore
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Data Storage Institute, Advanced Systems Automation Ltd Singapore filed Critical Data Storage Institute
Application granted granted Critical
Publication of DE69924024D1 publication Critical patent/DE69924024D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Laser Beam Processing (AREA)
DE69924024T 1998-12-07 1999-12-03 Verfahren und vorrichtung zum entfernen von gussgraten Expired - Lifetime DE69924024D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SG9805236A SG84519A1 (en) 1998-12-07 1998-12-07 Method and apparatus for removal of mold flash
PCT/SG1999/000153 WO2000037209A1 (en) 1998-12-07 1999-12-03 Method and apparatus for removal of mold flash

Publications (1)

Publication Number Publication Date
DE69924024D1 true DE69924024D1 (de) 2005-04-07

Family

ID=20430172

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69924024T Expired - Lifetime DE69924024D1 (de) 1998-12-07 1999-12-03 Verfahren und vorrichtung zum entfernen von gussgraten

Country Status (9)

Country Link
US (1) US6576867B1 (de)
EP (1) EP1148968B1 (de)
JP (1) JP2003504836A (de)
CN (1) CN1335798A (de)
DE (1) DE69924024D1 (de)
MY (1) MY130881A (de)
SG (1) SG84519A1 (de)
TW (1) TW402765B (de)
WO (1) WO2000037209A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG96648A1 (en) * 2001-10-01 2003-06-16 Inst Data Storage Method and apparatus for deflashing of integrated circuit packages
DE10236854B4 (de) * 2002-08-07 2004-09-23 Samsung SDI Co., Ltd., Suwon Verfahren und Vorrichtung zur Strukturierung von Elektroden von organischen lichtemittierenden Elementen
KR100490680B1 (ko) * 2003-05-12 2005-05-19 주식회사 젯텍 사이드플래시에 절취홈을 갖는 반도체 패키지 및 그형성방법, 그리고 이를 이용한 디플래시 방법
KR100475750B1 (ko) * 2004-09-30 2005-03-14 주식회사 이오테크닉스 반도체 패키지의 디플래싱 장치 및 방법
US7635418B2 (en) * 2004-12-03 2009-12-22 Nordson Corporation Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate
US7842223B2 (en) * 2004-12-22 2010-11-30 Nordson Corporation Plasma process for removing excess molding material from a substrate
US20060201910A1 (en) * 2004-12-22 2006-09-14 Nordson Corporation Methods for removing extraneous amounts of molding material from a substrate
US8842951B2 (en) 2012-03-02 2014-09-23 Analog Devices, Inc. Systems and methods for passive alignment of opto-electronic components
US9716193B2 (en) 2012-05-02 2017-07-25 Analog Devices, Inc. Integrated optical sensor module
US9381548B2 (en) 2013-01-02 2016-07-05 The Boeing Company Systems for removing lubricants from superplastic-forming or hot-forming dies
US9272312B1 (en) 2013-01-02 2016-03-01 The Boeing Company Methods and systems for removing lubricants from superplastic-forming or hot-forming dies
US10884551B2 (en) 2013-05-16 2021-01-05 Analog Devices, Inc. Integrated gesture sensor module
TWI653692B (zh) * 2013-09-26 2019-03-11 蔡宜興 四方平面無引腳封裝晶片之除膠方法
US9590129B2 (en) 2014-11-19 2017-03-07 Analog Devices Global Optical sensor module
CN105161445B (zh) * 2015-09-18 2017-12-22 天水华天机械有限公司 集成电路封装后去除溢料装置
CN106925896B (zh) * 2015-12-31 2019-03-19 无锡华润安盛科技有限公司 散热片表面溢料处理方法
US10737303B2 (en) * 2017-06-23 2020-08-11 Lockheed Martin Corporation Nutplate preparation laser system
US10712197B2 (en) 2018-01-11 2020-07-14 Analog Devices Global Unlimited Company Optical sensor package
CN111151884B (zh) * 2018-11-06 2022-06-17 大族激光科技产业集团股份有限公司 一种利用激光去除塑胶溢边的方法及设备
CN115301636A (zh) * 2022-08-12 2022-11-08 阳程科技股份有限公司 激光除胶方法及采用该方法的除胶设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3673773D1 (de) * 1985-06-11 1990-10-04 American Telephone & Telegraph Leiterrahmengratentfernung.
US5099101A (en) * 1989-02-27 1992-03-24 National Semiconductor Corporation Laser trimming system for semiconductor integrated circuit chip packages
US5144747A (en) * 1991-03-27 1992-09-08 Integrated System Assemblies Corporation Apparatus and method for positioning an integrated circuit chip within a multichip module
JPH05243296A (ja) * 1992-02-27 1993-09-21 Nippon Denki Laser Kiki Eng Kk Icリードのモールド材除去方法
US5257706A (en) * 1992-09-29 1993-11-02 Bausch & Lomb Incorporated Method of cleaning laser ablation debris
US5961860A (en) * 1995-06-01 1999-10-05 National University Of Singapore Pulse laser induced removal of mold flash on integrated circuit packages
JP3369410B2 (ja) * 1996-09-02 2003-01-20 松下電器産業株式会社 半導体装置の実装方法

Also Published As

Publication number Publication date
EP1148968A1 (de) 2001-10-31
MY130881A (en) 2007-07-31
EP1148968B1 (de) 2005-03-02
SG84519A1 (en) 2001-11-20
WO2000037209A1 (en) 2000-06-29
CN1335798A (zh) 2002-02-13
US6576867B1 (en) 2003-06-10
TW402765B (en) 2000-08-21
JP2003504836A (ja) 2003-02-04

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Legal Events

Date Code Title Description
8332 No legal effect for de