DE69923182D1 - Röntgendiffraktometer mit einstellbarem bildabstand - Google Patents

Röntgendiffraktometer mit einstellbarem bildabstand

Info

Publication number
DE69923182D1
DE69923182D1 DE69923182T DE69923182T DE69923182D1 DE 69923182 D1 DE69923182 D1 DE 69923182D1 DE 69923182 T DE69923182 T DE 69923182T DE 69923182 T DE69923182 T DE 69923182T DE 69923182 D1 DE69923182 D1 DE 69923182D1
Authority
DE
Germany
Prior art keywords
ray
rays
gradometer
sample
image distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69923182T
Other languages
English (en)
Other versions
DE69923182T2 (de
Inventor
Boris Verman
Licai Jiang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osmic Inc
Original Assignee
Osmic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic Inc filed Critical Osmic Inc
Publication of DE69923182D1 publication Critical patent/DE69923182D1/de
Application granted granted Critical
Publication of DE69923182T2 publication Critical patent/DE69923182T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20016Goniometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20025Sample holders or supports therefor
DE69923182T 1998-04-07 1999-03-17 Röntgendiffraktometer mit einstellbarem bildabstand Expired - Lifetime DE69923182T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US56654 1998-04-07
US09/056,654 US6069934A (en) 1998-04-07 1998-04-07 X-ray diffractometer with adjustable image distance
PCT/US1999/005876 WO1999051972A2 (en) 1998-04-07 1999-03-17 X-ray diffractometer with adjustable image distance

Publications (2)

Publication Number Publication Date
DE69923182D1 true DE69923182D1 (de) 2005-02-17
DE69923182T2 DE69923182T2 (de) 2005-12-29

Family

ID=22005817

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69923182T Expired - Lifetime DE69923182T2 (de) 1998-04-07 1999-03-17 Röntgendiffraktometer mit einstellbarem bildabstand

Country Status (6)

Country Link
US (1) US6069934A (de)
EP (1) EP1090285B1 (de)
AT (1) ATE287082T1 (de)
AU (1) AU3356999A (de)
DE (1) DE69923182T2 (de)
WO (1) WO1999051972A2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
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DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
ATE357656T1 (de) * 1999-04-06 2007-04-15 Univ Alabama Res Found Vorrichtung zum screening von kristallisierungsbedingungen in lösungen zur kristallzüchtung
US7250305B2 (en) * 2001-07-30 2007-07-31 Uab Research Foundation Use of dye to distinguish salt and protein crystals under microcrystallization conditions
US20020164812A1 (en) * 1999-04-06 2002-11-07 Uab Research Foundation Method for screening crystallization conditions in solution crystal growth
US7247490B2 (en) * 1999-04-06 2007-07-24 Uab Research Foundation Method for screening crystallization conditions in solution crystal growth
US7244396B2 (en) * 1999-04-06 2007-07-17 Uab Research Foundation Method for preparation of microarrays for screening of crystal growth conditions
US7214540B2 (en) * 1999-04-06 2007-05-08 Uab Research Foundation Method for screening crystallization conditions in solution crystal growth
US6389100B1 (en) 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
US6630006B2 (en) * 1999-06-18 2003-10-07 The Regents Of The University Of California Method for screening microcrystallizations for crystal formation
US6421417B1 (en) 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6453006B1 (en) * 2000-03-16 2002-09-17 Therma-Wave, Inc. Calibration and alignment of X-ray reflectometric systems
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
US6744850B2 (en) * 2001-01-11 2004-06-01 Therma-Wave, Inc. X-ray reflectance measurement system with adjustable resolution
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
US7670429B2 (en) * 2001-04-05 2010-03-02 The California Institute Of Technology High throughput screening of crystallization of materials
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
ATE329254T1 (de) 2002-01-15 2006-06-15 Avantium Int Bv Verfahren zur durchführung einer leistungsbeugungsanalyse
EP1490671B1 (de) * 2002-03-21 2012-05-09 Bruker AXS, Inc. Screening mittels eines Röntgendiffraktometers in Transmissionsgeometrie
US20070026528A1 (en) * 2002-05-30 2007-02-01 Delucas Lawrence J Method for screening crystallization conditions in solution crystal growth
AU2003256469A1 (en) * 2002-07-10 2004-01-23 Uab Research Foundation Method for distinguishing between biomolecule and non-biomolecule crystals
JP3697246B2 (ja) * 2003-03-26 2005-09-21 株式会社リガク X線回折装置
RU2242748C1 (ru) * 2003-08-19 2004-12-20 Общество с ограниченной ответственностью "Институт рентгеновской оптики" Детектирующий узел для рентгеновских дифракционных измерений
US7801272B2 (en) * 2007-09-28 2010-09-21 Rigaku Corporation X-ray diffraction apparatus and X-ray diffraction method
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US7720197B2 (en) * 2008-05-30 2010-05-18 Rigaku Innovative Technologies, Inc. High intensity x-ray beam system
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク X線トポグラフィ装置
JP6322172B2 (ja) * 2015-09-11 2018-05-09 株式会社リガク X線小角光学系装置
CN109997031B (zh) * 2016-09-19 2022-05-10 索雷克核研究中心 用于检测材料的x射线荧光系统和方法以及控制系统
US10753890B2 (en) * 2017-03-09 2020-08-25 Malvern Panalytical B.V. High resolution X-ray diffraction method and apparatus
JP6886731B2 (ja) 2017-03-30 2021-06-16 株式会社リガク X線分析補助装置及びx線分析装置
DE102017221005A1 (de) * 2017-11-23 2019-05-23 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Kalibrierung einer diffraktiven Messstruktur
CN111722264B (zh) * 2020-06-24 2023-02-03 中国科学院物理研究所 一种x射线多层膜反射镜的调节方法及应用

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL139600B (nl) * 1968-12-10 1973-08-15 Enraf Nonius Goniometrische inrichting, in het bijzonder voor een diffractometer.
DE2933047C2 (de) * 1979-08-16 1982-12-30 Stoe & Cie. GmbH, 6100 Darmstadt Verfahren und Vorrichtung der Röntgendiffraktion
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4958363A (en) * 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
US5027377A (en) * 1990-01-09 1991-06-25 The United States Of America As Represented By The United States Department Of Energy Chromatic X-ray magnifying method and apparatus by Bragg reflective planes on the surface of Abbe sphere
US5127039A (en) * 1991-01-16 1992-06-30 The United States Of America As Represented By The United States Department Of Energy Sample holder for X-ray diffractometry
JPH04323545A (ja) * 1991-04-22 1992-11-12 Nec Corp 全反射x線回折顕微方法
GB9122085D0 (en) * 1991-10-17 1991-11-27 Cambridge Surface Analytics X-ray diffractometer
US5373544A (en) * 1992-08-12 1994-12-13 Siemens Aktiengesellschaft X-ray diffractometer
US5359640A (en) * 1993-08-10 1994-10-25 Siemens Industrial Automation, Inc. X-ray micro diffractometer sample positioner
US5418828A (en) * 1993-09-08 1995-05-23 The United States Of America As Represented By The Department Of Energy Nondestructive method and apparatus for imaging grains in curved surfaces of polycrystalline articles
AU2641495A (en) * 1994-05-11 1995-12-05 Regents Of The University Of Colorado, The Spherical mirror grazing incidence x-ray optics
JPH0949812A (ja) * 1995-08-08 1997-02-18 Rigaku Corp X線回折装置の試料ホルダ

Also Published As

Publication number Publication date
WO1999051972A2 (en) 1999-10-14
EP1090285B1 (de) 2005-01-12
WO1999051972A3 (en) 2001-02-01
EP1090285A2 (de) 2001-04-11
US6069934A (en) 2000-05-30
DE69923182T2 (de) 2005-12-29
ATE287082T1 (de) 2005-01-15
AU3356999A (en) 1999-10-25

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