DE69920656D1 - Röntgenquelle enthaltende röntgen-bestrahlungsvorrichtung mit einem kapillaren optischen system - Google Patents

Röntgenquelle enthaltende röntgen-bestrahlungsvorrichtung mit einem kapillaren optischen system

Info

Publication number
DE69920656D1
DE69920656D1 DE69920656T DE69920656T DE69920656D1 DE 69920656 D1 DE69920656 D1 DE 69920656D1 DE 69920656 T DE69920656 T DE 69920656T DE 69920656 T DE69920656 T DE 69920656T DE 69920656 D1 DE69920656 D1 DE 69920656D1
Authority
DE
Germany
Prior art keywords
optical system
ray
radiation device
source containing
capillary optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69920656T
Other languages
English (en)
Other versions
DE69920656T2 (de
Inventor
Sprang A Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Malvern Panalytical BV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE69920656D1 publication Critical patent/DE69920656D1/de
Application granted granted Critical
Publication of DE69920656T2 publication Critical patent/DE69920656T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/02—Constructional details

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)
DE69920656T 1998-10-21 1999-09-22 Röntgenquelle enthaltende röntgen-bestrahlungsvorrichtung mit einem kapillaren optischen system Expired - Lifetime DE69920656T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98203546 1998-10-21
EP98203546 1998-10-21
PCT/EP1999/007034 WO2000024029A1 (en) 1998-10-21 1999-09-22 X-ray irradiation apparatus including an x-ray source provided with a capillary optical system

Publications (2)

Publication Number Publication Date
DE69920656D1 true DE69920656D1 (de) 2004-11-04
DE69920656T2 DE69920656T2 (de) 2005-10-13

Family

ID=8234246

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69920656T Expired - Lifetime DE69920656T2 (de) 1998-10-21 1999-09-22 Röntgenquelle enthaltende röntgen-bestrahlungsvorrichtung mit einem kapillaren optischen system

Country Status (5)

Country Link
US (1) US6233306B1 (de)
EP (1) EP1044457B1 (de)
JP (1) JP4370057B2 (de)
DE (1) DE69920656T2 (de)
WO (1) WO2000024029A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133421A (ja) * 1999-11-01 2001-05-18 Ours Tex Kk Ｘ線分光装置およびｘ線分析装置
DE10120335C2 (de) * 2001-04-26 2003-08-07 Bruker Daltonik Gmbh Ionenmobilitätsspektrometer mit nicht-radioaktiver Ionenquelle
JP4731749B2 (ja) * 2001-07-13 2011-07-27 株式会社堀場製作所 Ｘ線分析装置
US20030053591A1 (en) * 2001-08-07 2003-03-20 Dunham Bruce M. Direct delivery of radiation for radiation therapy
DE10204218C2 (de) * 2002-01-29 2003-12-24 Iap Inst Fuer Angewandte Photo Vorrichtung zum Schutz eines mit einer Strahlung beaufschlagten, tiefgekühlten Strahlungsempfängers vor Infrarotstrahlung
DE10230990A1 (de) * 2002-07-10 2004-02-05 Elisabeth Katz Vorrichtung zur Durchführung einer Online-Elementanalyse
DE102004012704B4 (de) 2004-03-16 2008-01-03 Katz, Elisabeth Vorrichtung zur online-Analyse und Verwendung einer solchen Vorrichtung
WO2006069009A2 (en) * 2004-12-21 2006-06-29 Parsons Laboratories Company Limited Method of producing target foil material for x-ray tubes
US7985467B1 (en) 2007-05-23 2011-07-26 The United States Of America As Represented By The United States Department Of Energy Radiation-transparent windows, method for imaging fluid transfers
DE102009009602A1 (de) * 2008-10-27 2010-04-29 Ifg - Institute For Scientific Instruments Gmbh Spektralauflösende elektronische Röntgenkamera

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6244940A (ja) * 1985-08-22 1987-02-26 Shimadzu Corp Ｘ線源
US4951304A (en) * 1989-07-12 1990-08-21 Adelphi Technology Inc. Focused X-ray source
DE3927132A1 (de) 1989-08-17 1991-02-21 Philips Patentverwaltung Verfahren zur herstellung von freitragenden duennen folien
WO1992008235A1 (en) * 1990-10-31 1992-05-14 X-Ray Optical Systems, Inc. Device for controlling beams of particles, x-ray and gamma quanta and uses thereof
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
SE9404149D0 (sv) * 1994-11-30 1994-11-30 X Ray Capillary Optics Ab Bärbar mikroröntgen spektrometer
US5570408A (en) * 1995-02-28 1996-10-29 X-Ray Optical Systems, Inc. High intensity, small diameter x-ray beam, capillary optic system
US5604353A (en) * 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
CN1069136C (zh) * 1996-02-17 2001-08-01 北京师范大学 整体x光透镜及其制造方法及使用整体x光透镜的设备
JPH10339798A (ja) * 1997-06-07 1998-12-22 Horiba Ltd Ｘ線集光用ミラー

Also Published As

Publication number Publication date
JP4370057B2 (ja) 2009-11-25
EP1044457A1 (de) 2000-10-18
US6233306B1 (en) 2001-05-15
EP1044457B1 (de) 2004-09-29
WO2000024029A1 (en) 2000-04-27
DE69920656T2 (de) 2005-10-13
JP2002528859A (ja) 2002-09-03

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANALYTICAL B.V., ALMELO, NL

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWAELTE RUFF, WILHELM, BEIER, DAUSTER & PAR