JP3734204B2
(ja)
*
|
1998-04-01 |
2006-01-11 |
株式会社小松製作所 |
パルスレーザの発光タイミング制御装置
|
US6327286B1
(en)
*
|
1998-04-27 |
2001-12-04 |
Cymer, Inc. |
High speed magnetic modulator voltage and temperature timing compensation circuit
|
US6567450B2
(en)
|
1999-12-10 |
2003-05-20 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
US20020127497A1
(en)
*
|
1998-09-10 |
2002-09-12 |
Brown Daniel J. W. |
Large diffraction grating for gas discharge laser
|
US6865210B2
(en)
|
2001-05-03 |
2005-03-08 |
Cymer, Inc. |
Timing control for two-chamber gas discharge laser system
|
US7856044B2
(en)
*
|
1999-05-10 |
2010-12-21 |
Cymer, Inc. |
Extendable electrode for gas discharge laser
|
US6625191B2
(en)
|
1999-12-10 |
2003-09-23 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
US6549551B2
(en)
|
1999-09-27 |
2003-04-15 |
Cymer, Inc. |
Injection seeded laser with precise timing control
|
US6590922B2
(en)
|
1999-09-27 |
2003-07-08 |
Cymer, Inc. |
Injection seeded F2 laser with line selection and discrimination
|
US6801560B2
(en)
|
1999-05-10 |
2004-10-05 |
Cymer, Inc. |
Line selected F2 two chamber laser system
|
US6556600B2
(en)
|
1999-09-27 |
2003-04-29 |
Cymer, Inc. |
Injection seeded F2 laser with centerline wavelength control
|
US9607041B2
(en)
*
|
1999-07-15 |
2017-03-28 |
Gula Consulting Limited Liability Company |
System and method for efficiently accessing internet resources
|
US6941259B2
(en)
*
|
2000-03-01 |
2005-09-06 |
Lamda Physik Ag |
Laser software control system
|
US20010049618A1
(en)
*
|
2000-03-23 |
2001-12-06 |
Rainer Patzel |
Method for allocating predictable costs for consumable items
|
US6834066B2
(en)
|
2000-04-18 |
2004-12-21 |
Lambda Physik Ag |
Stabilization technique for high repetition rate gas discharge lasers
|
US6862307B2
(en)
*
|
2000-05-15 |
2005-03-01 |
Lambda Physik Ag |
Electrical excitation circuit for a pulsed gas laser
|
US7180081B2
(en)
*
|
2000-06-09 |
2007-02-20 |
Cymer, Inc. |
Discharge produced plasma EUV light source
|
US6904073B2
(en)
*
|
2001-01-29 |
2005-06-07 |
Cymer, Inc. |
High power deep ultraviolet laser with long life optics
|
US6693939B2
(en)
|
2001-01-29 |
2004-02-17 |
Cymer, Inc. |
Laser lithography light source with beam delivery
|
US6914919B2
(en)
*
|
2000-06-19 |
2005-07-05 |
Cymer, Inc. |
Six to ten KHz, or greater gas discharge laser system
|
US6912052B2
(en)
*
|
2000-11-17 |
2005-06-28 |
Cymer, Inc. |
Gas discharge MOPA laser spectral analysis module
|
US6839372B2
(en)
*
|
2000-11-17 |
2005-01-04 |
Cymer, Inc. |
Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
|
US7190707B2
(en)
*
|
2001-01-29 |
2007-03-13 |
Cymer, Inc. |
Gas discharge laser light source beam delivery unit
|
US20050025882A1
(en)
*
|
2001-01-29 |
2005-02-03 |
Partlo William N. |
Optical elements with protective undercoating
|
US6704340B2
(en)
|
2001-01-29 |
2004-03-09 |
Cymer, Inc. |
Lithography laser system with in-place alignment tool
|
US6704339B2
(en)
|
2001-01-29 |
2004-03-09 |
Cymer, Inc. |
Lithography laser with beam delivery and beam pointing control
|
JP4877692B2
(ja)
*
|
2001-03-21 |
2012-02-15 |
株式会社小松製作所 |
注入同期式又はmopa方式のレーザ装置
|
US7079564B2
(en)
*
|
2001-04-09 |
2006-07-18 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
US7230964B2
(en)
*
|
2001-04-09 |
2007-06-12 |
Cymer, Inc. |
Lithography laser with beam delivery and beam pointing control
|
US6690704B2
(en)
|
2001-04-09 |
2004-02-10 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
US7039086B2
(en)
*
|
2001-04-09 |
2006-05-02 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
US7061959B2
(en)
*
|
2001-04-18 |
2006-06-13 |
Tcz Gmbh |
Laser thin film poly-silicon annealing system
|
US7009140B2
(en)
*
|
2001-04-18 |
2006-03-07 |
Cymer, Inc. |
Laser thin film poly-silicon annealing optical system
|
US7167499B2
(en)
*
|
2001-04-18 |
2007-01-23 |
Tcz Pte. Ltd. |
Very high energy, high stability gas discharge laser surface treatment system
|
US7372056B2
(en)
*
|
2005-06-29 |
2008-05-13 |
Cymer, Inc. |
LPP EUV plasma source material target delivery system
|
US7598509B2
(en)
*
|
2004-11-01 |
2009-10-06 |
Cymer, Inc. |
Laser produced plasma EUV light source
|
US7439530B2
(en)
*
|
2005-06-29 |
2008-10-21 |
Cymer, Inc. |
LPP EUV light source drive laser system
|
US7465946B2
(en)
*
|
2004-03-10 |
2008-12-16 |
Cymer, Inc. |
Alternative fuels for EUV light source
|
US7378673B2
(en)
*
|
2005-02-25 |
2008-05-27 |
Cymer, Inc. |
Source material dispenser for EUV light source
|
US20050259709A1
(en)
|
2002-05-07 |
2005-11-24 |
Cymer, Inc. |
Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
|
US6928093B2
(en)
*
|
2002-05-07 |
2005-08-09 |
Cymer, Inc. |
Long delay and high TIS pulse stretcher
|
US7088758B2
(en)
|
2001-07-27 |
2006-08-08 |
Cymer, Inc. |
Relax gas discharge laser lithography light source
|
US7830934B2
(en)
*
|
2001-08-29 |
2010-11-09 |
Cymer, Inc. |
Multi-chamber gas discharge laser bandwidth control through discharge timing
|
US6963595B2
(en)
|
2001-08-29 |
2005-11-08 |
Cymer, Inc. |
Automatic gas control system for a gas discharge laser
|
US20050100072A1
(en)
*
|
2001-11-14 |
2005-05-12 |
Rao Rajasekhar M. |
High power laser output beam energy density reduction
|
JP3806025B2
(ja)
*
|
2001-11-29 |
2006-08-09 |
株式会社小松製作所 |
ガスレーザ装置
|
US7671349B2
(en)
*
|
2003-04-08 |
2010-03-02 |
Cymer, Inc. |
Laser produced plasma EUV light source
|
US6798812B2
(en)
|
2002-01-23 |
2004-09-28 |
Cymer, Inc. |
Two chamber F2 laser system with F2 pressure based line selection
|
US7016388B2
(en)
*
|
2002-05-07 |
2006-03-21 |
Cymer, Inc. |
Laser lithography light source with beam delivery
|
US6993052B2
(en)
*
|
2002-05-22 |
2006-01-31 |
Lambda Physik Ag |
System and method for delay compensation for a pulsed laser
|
US7741639B2
(en)
*
|
2003-01-31 |
2010-06-22 |
Cymer, Inc. |
Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
|
US7217941B2
(en)
*
|
2003-04-08 |
2007-05-15 |
Cymer, Inc. |
Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
|
US7277188B2
(en)
*
|
2003-04-29 |
2007-10-02 |
Cymer, Inc. |
Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
|
US7209507B2
(en)
|
2003-07-30 |
2007-04-24 |
Cymer, Inc. |
Method and apparatus for controlling the output of a gas discharge MOPA laser system
|
US6873418B1
(en)
|
2003-09-30 |
2005-03-29 |
Cymer, Inc. |
Optical mountings for gas discharge MOPA laser spectral analysis module
|
US6894785B2
(en)
*
|
2003-09-30 |
2005-05-17 |
Cymer, Inc. |
Gas discharge MOPA laser spectral analysis module
|
US7277464B2
(en)
*
|
2003-12-18 |
2007-10-02 |
Cymer, Inc. |
Method and apparatus for controlling the output of a gas discharge laser system
|
US20060146906A1
(en)
*
|
2004-02-18 |
2006-07-06 |
Cymer, Inc. |
LLP EUV drive laser
|
US7196342B2
(en)
*
|
2004-03-10 |
2007-03-27 |
Cymer, Inc. |
Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
|
US7522650B2
(en)
*
|
2004-03-31 |
2009-04-21 |
Cymer, Inc. |
Gas discharge laser chamber improvements
|
US7006547B2
(en)
*
|
2004-03-31 |
2006-02-28 |
Cymer, Inc. |
Very high repetition rate narrow band gas discharge laser system
|
US20050286599A1
(en)
*
|
2004-06-29 |
2005-12-29 |
Rafac Robert J |
Method and apparatus for gas discharge laser output light coherency reduction
|
US7355191B2
(en)
*
|
2004-11-01 |
2008-04-08 |
Cymer, Inc. |
Systems and methods for cleaning a chamber window of an EUV light source
|
US7482609B2
(en)
*
|
2005-02-28 |
2009-01-27 |
Cymer, Inc. |
LPP EUV light source drive laser system
|
US20060222034A1
(en)
*
|
2005-03-31 |
2006-10-05 |
Cymer, Inc. |
6 Khz and above gas discharge laser system
|
US7365349B2
(en)
*
|
2005-06-27 |
2008-04-29 |
Cymer, Inc. |
EUV light source collector lifetime improvements
|
US7633989B2
(en)
|
2005-06-27 |
2009-12-15 |
Cymer, Inc. |
High pulse repetition rate gas discharge laser
|
US7180083B2
(en)
*
|
2005-06-27 |
2007-02-20 |
Cymer, Inc. |
EUV light source collector erosion mitigation
|
US7317536B2
(en)
|
2005-06-27 |
2008-01-08 |
Cymer, Inc. |
Spectral bandwidth metrology for high repetition rate gas discharge lasers
|
US7141806B1
(en)
|
2005-06-27 |
2006-11-28 |
Cymer, Inc. |
EUV light source collector erosion mitigation
|
US7653095B2
(en)
*
|
2005-06-30 |
2010-01-26 |
Cymer, Inc. |
Active bandwidth control for a laser
|
US7394083B2
(en)
|
2005-07-08 |
2008-07-01 |
Cymer, Inc. |
Systems and methods for EUV light source metrology
|
US7317179B2
(en)
*
|
2005-10-28 |
2008-01-08 |
Cymer, Inc. |
Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
|
US7679029B2
(en)
*
|
2005-10-28 |
2010-03-16 |
Cymer, Inc. |
Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
|
US7453077B2
(en)
*
|
2005-11-05 |
2008-11-18 |
Cymer, Inc. |
EUV light source
|
US7307237B2
(en)
*
|
2005-12-29 |
2007-12-11 |
Honeywell International, Inc. |
Hand-held laser welding wand nozzle assembly including laser and feeder extension tips
|
US7812329B2
(en)
*
|
2007-12-14 |
2010-10-12 |
Cymer, Inc. |
System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
|
US7655925B2
(en)
*
|
2007-08-31 |
2010-02-02 |
Cymer, Inc. |
Gas management system for a laser-produced-plasma EUV light source
|
JP5499432B2
(ja)
*
|
2007-10-05 |
2014-05-21 |
ソニー株式会社 |
撮像装置
|
US8519366B2
(en)
*
|
2008-08-06 |
2013-08-27 |
Cymer, Inc. |
Debris protection system having a magnetic field for an EUV light source
|
US7720120B2
(en)
*
|
2008-10-21 |
2010-05-18 |
Cymer, Inc. |
Method and apparatus for laser control in a two chamber gas discharge laser
|
US7756171B2
(en)
*
|
2008-10-21 |
2010-07-13 |
Cymer, Inc. |
Method and apparatus for laser control in a two chamber gas discharge laser
|
US7751453B2
(en)
*
|
2008-10-21 |
2010-07-06 |
Cymer, Inc. |
Method and apparatus for laser control in a two chamber gas discharge laser
|
JP5687488B2
(ja)
|
2010-02-22 |
2015-03-18 |
ギガフォトン株式会社 |
極端紫外光生成装置
|