DE69842167D1 - Photoneutralisierung von ph-empfindlichen wässrigen polymerdispersionen und verfahren zur deren verwendung - Google Patents

Photoneutralisierung von ph-empfindlichen wässrigen polymerdispersionen und verfahren zur deren verwendung

Info

Publication number
DE69842167D1
DE69842167D1 DE69842167T DE69842167T DE69842167D1 DE 69842167 D1 DE69842167 D1 DE 69842167D1 DE 69842167 T DE69842167 T DE 69842167T DE 69842167 T DE69842167 T DE 69842167T DE 69842167 D1 DE69842167 D1 DE 69842167D1
Authority
DE
Germany
Prior art keywords
neutralization
photo
aqueous polymer
polymer dispersions
sensitive aqueous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69842167T
Other languages
English (en)
Inventor
John Rooney
Subhankar Chatterjee
Mikhail Laksin
Jean-Dominque Turgis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Chemical Corp
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Application granted granted Critical
Publication of DE69842167D1 publication Critical patent/DE69842167D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C08J3/16—Powdering or granulating by coagulating dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/02—Emulsion paints including aerosols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Dispersion Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
DE69842167T 1997-10-16 1998-10-16 Photoneutralisierung von ph-empfindlichen wässrigen polymerdispersionen und verfahren zur deren verwendung Expired - Lifetime DE69842167D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6218597P 1997-10-16 1997-10-16
PCT/US1998/022035 WO1999019369A2 (en) 1997-10-16 1998-10-16 PHOTONEUTRALIZATION OF pH SENSITIVE AQUEOUS POLYMERIC DISPERSIONS AND METHODS FOR USING SAME

Publications (1)

Publication Number Publication Date
DE69842167D1 true DE69842167D1 (de) 2011-04-21

Family

ID=22040758

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69842167T Expired - Lifetime DE69842167D1 (de) 1997-10-16 1998-10-16 Photoneutralisierung von ph-empfindlichen wässrigen polymerdispersionen und verfahren zur deren verwendung

Country Status (5)

Country Link
US (1) US6559222B1 (de)
EP (1) EP1023360B1 (de)
CA (1) CA2306478A1 (de)
DE (1) DE69842167D1 (de)
WO (1) WO1999019369A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7037953B2 (en) 2000-03-29 2006-05-02 Sun Chemical Corporation Radiation curable aqueous compositions
US20040180226A1 (en) * 2000-03-29 2004-09-16 Subhankar Chatterjee Radiation curable aqueous compositions for low extractable film packaging
US6803112B1 (en) 2000-03-29 2004-10-12 Sun Chemical Corporation Radiation curable aqueous compositions for low extractable film packaging
TW562844B (en) * 2001-01-19 2003-11-21 Kolon Inc Ink composition for solder resist
WO2002081576A1 (en) * 2001-04-03 2002-10-17 Sun Chemical Corporation Radiaton curable aqueous compositions for low extractable film packaging
EP1792956B1 (de) 2002-05-06 2008-07-16 Sun Chemical Corporation Einphasige energiehärtbare Zusammensetzungen auf Wasserbasis
US7226959B2 (en) 2003-11-06 2007-06-05 Sun Chemical Corporation Water soluble energy curable stereo-crosslinkable ionomer compositions
US7820323B1 (en) 2006-09-07 2010-10-26 The United States Of America As Represented By The Secretary Of The Army Metal borate synthesis process
US7833660B1 (en) 2006-09-07 2010-11-16 The United States Of America As Represented By The Secretary Of The Army Fluorohaloborate salts, synthesis and use thereof
GB0912949D0 (en) * 2009-07-24 2009-09-02 Sericol Ltd Printing ink
JP5570924B2 (ja) 2010-09-17 2014-08-13 富士フイルム株式会社 インク組成物、インクセットおよび画像形成方法

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NL281797A (de) 1961-08-08
US3380831A (en) 1964-05-26 1968-04-30 Du Pont Photopolymerizable compositions and elements
US3356461A (en) 1965-04-26 1967-12-05 Marco Dev Co Inc Condensate dome for continuous chemical reactors
US3825430A (en) 1972-02-09 1974-07-23 Minnesota Mining & Mfg Light-sensitive composition and method
US3862067A (en) 1972-04-13 1975-01-21 Atlantic Richfield Co Flexible electrocoating composition derived from a low molecular weight copolymer of styrene and maleic anhydride
US3912670A (en) 1973-02-28 1975-10-14 O Brien Corp Radiation curable can coating composition
US3884856A (en) 1973-11-19 1975-05-20 Atlantic Richfield Co Electrocoating composition containing styrene-maleic anhydride copolymer and epoxy ester resin exhibiting high throwing power
FR2253772A1 (en) 1973-12-05 1975-07-04 Quadrimetal Offset Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc.
US4025548A (en) 1974-02-04 1977-05-24 The O'brien Corporation Radiation curable oligomers
US4183796A (en) 1978-02-09 1980-01-15 Desoto, Inc. Radiation curable oligomers based on tris(2-hydroxyethyl) isocyanurate
US4243500A (en) 1978-12-04 1981-01-06 International Coatings, Co., Inc. Pressure sensitive adhesives
JPS5622364A (en) 1979-08-01 1981-03-02 Matsushita Electric Ind Co Ltd Coating composition
JPS5713444A (en) 1980-06-27 1982-01-23 Tamura Kaken Kk Photosensitive composition
US4360540A (en) 1980-12-30 1982-11-23 Rohm And Haas Company Radiation curable compositions containing cyanoalkoxyalkyl and cyanothiaalkylalkyl acrylates
US4401793A (en) 1981-09-04 1983-08-30 National Starch And Chemical Corporation Polymeric adducts with pendant polymerizable double bonds, their preparation and use as reactive thickeners in improved anaerobic compositions
JPS60233114A (ja) * 1984-05-07 1985-11-19 Mitsui Toatsu Chem Inc 架橋性重合体
US4745138A (en) 1985-08-05 1988-05-17 Pony Industries, Inc. Radiation curable partial esters of anhydride-containing copolymers
CA1308596C (en) 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture
US5300380A (en) 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
EP0267554A3 (de) 1986-11-12 1990-09-19 S.C. Johnson & Son, Inc. Durch kationische Photo-Initiierung vernetzbare wässerige Polymersysteme und Verfahren zu deren Verwendung zu Substraten
US4994346A (en) 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
BR9103260A (pt) 1990-08-02 1992-02-18 Ppg Industries Inc Composicao de resina fotossensivel que pode ser eletrodepositada e pode receber fotoimagem
US5206116A (en) 1991-03-04 1993-04-27 Shipley Company Inc. Light-sensitive composition for use as a soldermask and process
JP3000745B2 (ja) 1991-09-19 2000-01-17 富士通株式会社 レジスト組成物とレジストパターンの形成方法
US5296332A (en) 1991-11-22 1994-03-22 International Business Machines Corporation Crosslinkable aqueous developable photoresist compositions and method for use thereof
US5384229A (en) 1992-05-07 1995-01-24 Shipley Company Inc. Photoimageable compositions for electrodeposition
JPH06233114A (ja) 1993-02-05 1994-08-19 Sharp Corp ステープル機能付複写機
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
US5308744A (en) 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
DE4307766C1 (de) 1993-03-11 1994-09-15 Zeller & Gmelin Gmbh & Co UV-Flexodruckfarbe, Verfahren zu deren Herstellung und Verwendung
US5374500A (en) 1993-04-02 1994-12-20 International Business Machines Corporation Positive photoresist composition containing photoacid generator and use thereof
US6255364B1 (en) * 1994-06-21 2001-07-03 Shell Oil Company Crosslinkable waterborne dispersions of epoxidized polydiene block copolymers and amino resins
JP3429592B2 (ja) 1995-02-10 2003-07-22 富士通株式会社 レジストパターンの形成方法
AT500395A1 (de) * 1996-06-20 2005-12-15 Teich Ag Tiefdruckverfahren unter anwendung eines mit wasser verdünnbaren druckfarbensystems
US6210790B1 (en) * 1998-07-15 2001-04-03 Rensselaer Polytechnic Institute Glass-like composites comprising a surface-modified colloidal silica and method of making thereof

Also Published As

Publication number Publication date
WO1999019369A3 (en) 1999-06-24
US6559222B1 (en) 2003-05-06
EP1023360B1 (de) 2011-03-09
EP1023360A2 (de) 2000-08-02
WO1999019369A2 (en) 1999-04-22
CA2306478A1 (en) 1999-04-22

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