DE69830736D1 - Dampfniederschlag-beschichtungsvorrichtung - Google Patents

Dampfniederschlag-beschichtungsvorrichtung

Info

Publication number
DE69830736D1
DE69830736D1 DE69830736T DE69830736T DE69830736D1 DE 69830736 D1 DE69830736 D1 DE 69830736D1 DE 69830736 T DE69830736 T DE 69830736T DE 69830736 T DE69830736 T DE 69830736T DE 69830736 D1 DE69830736 D1 DE 69830736D1
Authority
DE
Germany
Prior art keywords
coating
magnetic field
vapor deposition
field lines
coating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69830736T
Other languages
English (en)
Other versions
DE69830736T2 (de
Inventor
Patrick Monaghan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gencoa Ltd
Original Assignee
Gencoa Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gencoa Ltd filed Critical Gencoa Ltd
Application granted granted Critical
Publication of DE69830736D1 publication Critical patent/DE69830736D1/de
Publication of DE69830736T2 publication Critical patent/DE69830736T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Supports For Pipes And Cables (AREA)
  • Power Steering Mechanism (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
DE69830736T 1997-01-07 1998-01-07 Dampfniederschlag-beschichtungsvorrichtung Expired - Fee Related DE69830736T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9700158.0A GB9700158D0 (en) 1997-01-07 1997-01-07 Versatile coating deposition system
GB9700158 1997-01-07
PCT/GB1998/000047 WO1998031041A1 (en) 1997-01-07 1998-01-07 Vapour deposition coating apparatus

Publications (2)

Publication Number Publication Date
DE69830736D1 true DE69830736D1 (de) 2005-08-04
DE69830736T2 DE69830736T2 (de) 2006-05-18

Family

ID=10805582

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69830736T Expired - Fee Related DE69830736T2 (de) 1997-01-07 1998-01-07 Dampfniederschlag-beschichtungsvorrichtung

Country Status (8)

Country Link
US (1) US6383565B1 (de)
EP (1) EP1016121B1 (de)
JP (1) JP2001507756A (de)
CN (1) CN1243599A (de)
AT (1) ATE298928T1 (de)
DE (1) DE69830736T2 (de)
GB (1) GB9700158D0 (de)
WO (1) WO1998031041A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2340845B (en) * 1998-08-19 2001-01-31 Kobe Steel Ltd Magnetron sputtering apparatus
JP4219566B2 (ja) * 2001-03-30 2009-02-04 株式会社神戸製鋼所 スパッタ装置
JP4812991B2 (ja) * 2001-09-20 2011-11-09 東京エレクトロン株式会社 プラズマ処理装置
JP2009531545A (ja) * 2006-03-28 2009-09-03 ナムローゼ・フェンノートシャップ・ベーカート・ソシエテ・アノニム コーティング装置
DE102006020004B4 (de) * 2006-04-26 2011-06-01 Systec System- Und Anlagentechnik Gmbh & Co.Kg Vorrichtung und Verfahren zur homogenen PVD-Beschichtung
TW201144462A (en) * 2010-06-10 2011-12-16 Hon Hai Prec Ind Co Ltd Coating device
US9957609B2 (en) 2011-11-30 2018-05-01 Corning Incorporated Process for making of glass articles with optical and easy-to-clean coatings
US10077207B2 (en) 2011-11-30 2018-09-18 Corning Incorporated Optical coating method, apparatus and product
EP3696293A1 (de) 2011-11-30 2020-08-19 Corning Incorporated Optisches beschichtungsverfahren, vorrichtung dafür und produkt damit
CN102912297A (zh) * 2012-10-22 2013-02-06 东莞市汇成真空科技有限公司 卧式滚筒真空镀膜机
CN114214596B (zh) * 2021-11-09 2023-09-29 维达力实业(深圳)有限公司 磁控溅射镀膜腔室、镀膜机以及镀膜方法
CN114574830B (zh) * 2022-03-11 2024-03-26 陕西理工大学 用于磁控溅射靶阴极的磁铁布置结构

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905887A (en) 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma
JPS59172225A (ja) 1983-03-18 1984-09-28 Matsushita Electric Ind Co Ltd 薄膜磁性体の作製法
US4871433A (en) * 1986-04-04 1989-10-03 Materials Research Corporation Method and apparatus for improving the uniformity ion bombardment in a magnetron sputtering system
JPS63262462A (ja) 1987-04-17 1988-10-28 Ube Ind Ltd プラズマ制御マグネトロンスパツタリング装置及び方法
US4851095A (en) 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
DE4009151A1 (de) 1990-03-22 1991-09-26 Leybold Ag Vorrichtung zum beschichten von substraten durch katodenzerstaeubung
DE4038497C1 (de) * 1990-12-03 1992-02-20 Leybold Ag, 6450 Hanau, De
JP3343620B2 (ja) 1992-04-09 2002-11-11 アネルバ株式会社 マグネトロンスパッタリングによる薄膜形成方法および装置
US5907220A (en) * 1996-03-13 1999-05-25 Applied Materials, Inc. Magnetron for low pressure full face erosion

Also Published As

Publication number Publication date
CN1243599A (zh) 2000-02-02
US20020050453A1 (en) 2002-05-02
WO1998031041A1 (en) 1998-07-16
DE69830736T2 (de) 2006-05-18
JP2001507756A (ja) 2001-06-12
ATE298928T1 (de) 2005-07-15
EP1016121A1 (de) 2000-07-05
US6383565B1 (en) 2002-05-07
GB9700158D0 (en) 1997-02-26
EP1016121B1 (de) 2005-06-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee