CA2268659A1 - Rectangular cathodic arc source and method of steering an arc spot - Google Patents

Rectangular cathodic arc source and method of steering an arc spot Download PDF

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Publication number
CA2268659A1
CA2268659A1 CA002268659A CA2268659A CA2268659A1 CA 2268659 A1 CA2268659 A1 CA 2268659A1 CA 002268659 A CA002268659 A CA 002268659A CA 2268659 A CA2268659 A CA 2268659A CA 2268659 A1 CA2268659 A1 CA 2268659A1
Authority
CA
Canada
Prior art keywords
steering
plasma
conductor
cathode
target surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002268659A
Other languages
French (fr)
Other versions
CA2268659C (en
Inventor
Vladimir I. Gorokhovsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
G&H Technologies LLC
Original Assignee
Vladimir I. Gorokhovsky
G & H Technologies Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to CA002268659A priority Critical patent/CA2268659C/en
Application filed by Vladimir I. Gorokhovsky, G & H Technologies Llc filed Critical Vladimir I. Gorokhovsky
Priority to JP2000611303A priority patent/JP4689843B2/en
Priority to DE10084452.9T priority patent/DE10084452B3/en
Priority to GB0125844A priority patent/GB2368597B/en
Priority to PCT/CA2000/000380 priority patent/WO2000062327A2/en
Priority to AU39509/00A priority patent/AU762277B2/en
Publication of CA2268659A1 publication Critical patent/CA2268659A1/en
Priority to US10/667,279 priority patent/US6929727B2/en
Application granted granted Critical
Publication of CA2268659C publication Critical patent/CA2268659C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention provides an arc coating apparatus having a steering magnetic field source comprising a plurality of electrically independent closed-loop steering conductors disposed in the vicinity of the target surface, each steering conductor being controlled independently of the other steering conductors. Increasing the current through one steering conductor increases the strength of the magnetic field generated by that conductor relative to the steering conductor along the opposite side of the cathode plate, shifting the magnetic field on the opposite side of the cathode plate transversely. Selective unbalancing of the steering conductor currents thus increases the effective breadth of the erosion zone to provide more uniform erosion of the target surface. The steering conductors may be disposed in front of or behind the target surface of the cathode plate. In a further embodiment, groups of steering conductors are disposed along opposite sides of the cathode plate. By selectively applying a current through one conductor in each group, the path of the arc spot shifts to an erosion corridor defined by the active steering conductor. The invention also provides a plurality of internal anodes disposed within the plasma duct, for deflecting the plasma flow and preserving a high ionization level of the plasma. The invention also provides a magnetic focusing system which confines the flow of plasma between magnetic fields generated on opposite sides of the coating chamber. The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode, to remove the neutral component of the plasma which otherwise constitutes a contaminant, by disposing the plasma focusing coils in progressively asymmetric relation to the working axis of the cathode, to deflect the flow of plasma along a curvate path toward a substrate holder. The invention also provides a shield at floating potential, restricting the cathode spot from migrating into selected regions of the target evaporation surface outside of the desired erosion zone. The shield may be positioned immediately above the region of the target surface in the vicinity of the anode, protecting the anode from deposition of cathodic evaporate and providing better distribution of cathodic evaporate over the substrates to be coated.
CA002268659A 1999-04-12 1999-04-12 Rectangular cathodic arc source and method of steering an arc spot Expired - Fee Related CA2268659C (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CA002268659A CA2268659C (en) 1999-04-12 1999-04-12 Rectangular cathodic arc source and method of steering an arc spot
DE10084452.9T DE10084452B3 (en) 1999-04-12 2000-04-07 Arc source with rectangular cathode and method for guiding an arc spot
GB0125844A GB2368597B (en) 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot
PCT/CA2000/000380 WO2000062327A2 (en) 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot
JP2000611303A JP4689843B2 (en) 1999-04-12 2000-04-07 Rectangular cathode arc source and arc spot pointing method
AU39509/00A AU762277B2 (en) 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot
US10/667,279 US6929727B2 (en) 1999-04-12 2003-09-18 Rectangular cathodic arc source and method of steering an arc spot

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA002268659A CA2268659C (en) 1999-04-12 1999-04-12 Rectangular cathodic arc source and method of steering an arc spot

Publications (2)

Publication Number Publication Date
CA2268659A1 true CA2268659A1 (en) 2000-10-12
CA2268659C CA2268659C (en) 2008-12-30

Family

ID=4163456

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002268659A Expired - Fee Related CA2268659C (en) 1999-04-12 1999-04-12 Rectangular cathodic arc source and method of steering an arc spot

Country Status (6)

Country Link
JP (1) JP4689843B2 (en)
AU (1) AU762277B2 (en)
CA (1) CA2268659C (en)
DE (1) DE10084452B3 (en)
GB (1) GB2368597B (en)
WO (1) WO2000062327A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (en) 1999-04-09 2004-08-18 三宅 正二郎 Sliding member and manufacturing method thereof
US6929727B2 (en) 1999-04-12 2005-08-16 G & H Technologies, Llc Rectangular cathodic arc source and method of steering an arc spot
CA2305938C (en) 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (en) 2003-07-31 2012-01-25 日産自動車株式会社 gear
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
US7381311B2 (en) * 2003-10-21 2008-06-03 The United States Of America As Represented By The Secretary Of The Air Force Filtered cathodic-arc plasma source
DE102010020737A1 (en) * 2010-05-17 2011-11-17 Oerlikon Trading Ag, Trübbach Target for spark evaporation with spatial limitation of the propagation of the spark
CN103132020B (en) * 2013-03-17 2018-04-20 广东世创金属科技股份有限公司 The electric arc target and its control system of a kind of improved structure
KR102037910B1 (en) * 2017-03-27 2019-10-30 세메스 주식회사 Coating apparatus and coating method
SK500322019A3 (en) * 2019-07-11 2021-01-13 STATON, s. r. o. Plasma source using a cathodic vacuum arc with an improved magnetic field configuration and method of operation

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US4448659A (en) * 1983-09-12 1984-05-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization including initial target cleaning
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
JPH04236770A (en) * 1991-01-17 1992-08-25 Kobe Steel Ltd Method for controlling arc spot in vacuum arc deposition and vaporization source
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
DE4223592C2 (en) * 1992-06-24 2001-05-17 Leybold Ag Arc vaporization device
US5380421A (en) * 1992-11-04 1995-01-10 Gorokhovsky; Vladimir I. Vacuum-arc plasma source
US5435900A (en) * 1992-11-04 1995-07-25 Gorokhovsky; Vladimir I. Apparatus for application of coatings in vacuum
US5468363A (en) * 1994-04-25 1995-11-21 Regents Of The University Of California Magnetic-cusp, cathodic-arc source
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method
KR100230279B1 (en) * 1997-03-31 1999-11-15 윤종용 Coating apparatus by using cathodic arc discharge
DE19739527C2 (en) * 1997-09-09 2003-10-16 Rossendorf Forschzent Vacuum arc plasma source with magnetic particle filter
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source

Also Published As

Publication number Publication date
GB2368597B (en) 2003-08-27
JP4689843B2 (en) 2011-05-25
GB0125844D0 (en) 2001-12-19
WO2000062327A3 (en) 2001-01-18
DE10084452B3 (en) 2016-03-17
GB2368597A (en) 2002-05-08
WO2000062327A2 (en) 2000-10-19
JP2002541335A (en) 2002-12-03
DE10084452T1 (en) 2002-06-20
CA2268659C (en) 2008-12-30
AU3950900A (en) 2000-11-14
AU762277B2 (en) 2003-06-19

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Effective date: 20170412