GB2368597A - Rectangular cathodic arc source and method of steering an arc spot - Google Patents
Rectangular cathodic arc source and method of steering an arc spotInfo
- Publication number
- GB2368597A GB2368597A GB0125844A GB0125844A GB2368597A GB 2368597 A GB2368597 A GB 2368597A GB 0125844 A GB0125844 A GB 0125844A GB 0125844 A GB0125844 A GB 0125844A GB 2368597 A GB2368597 A GB 2368597A
- Authority
- GB
- United Kingdom
- Prior art keywords
- target
- steering
- plasma
- long sides
- provides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors disposed along the short sides of a rectangular target behind the target, and a magnetic focusing system disposed along the long sides of the target in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides of the target. The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor can be controlled independently. In a further embodiment, electrically independent steering conductors are disposed along opposite long sides of the cathode plate, and by selectively varying a current through one conductor, the path of the arc spot shifts to widen an erosion corridor. The invention also provides a plurality of internal anodes, and optionally a surrounding anode for deflecting the plasma flow and preserving a high ionization level of the plasma. The invention also provides a shield at floating potential, restricting the cathode spot from migrating into selected regions of the target evaporation surface outside of the desired erosion zone. The shield may be positioned immediately above the region of the target surface in the vicinity of the anode, protecting the anode from deposition of cathodic evaporate and providing better distribution of cathodic evaporate over the substrates to be coated. The invention further provides correcting magnets adjacent to the short sides of the target, to move the arc spot between the long sides.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002268659A CA2268659C (en) | 1999-04-12 | 1999-04-12 | Rectangular cathodic arc source and method of steering an arc spot |
PCT/CA2000/000380 WO2000062327A2 (en) | 1999-04-12 | 2000-04-07 | Rectangular cathodic arc source and method of steering an arc spot |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0125844D0 GB0125844D0 (en) | 2001-12-19 |
GB2368597A true GB2368597A (en) | 2002-05-08 |
GB2368597B GB2368597B (en) | 2003-08-27 |
Family
ID=4163456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0125844A Expired - Fee Related GB2368597B (en) | 1999-04-12 | 2000-04-07 | Rectangular cathodic arc source and method of steering an arc spot |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP4689843B2 (en) |
AU (1) | AU762277B2 (en) |
CA (1) | CA2268659C (en) |
DE (1) | DE10084452B3 (en) |
GB (1) | GB2368597B (en) |
WO (1) | WO2000062327A2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3555844B2 (en) | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | Sliding member and manufacturing method thereof |
US6929727B2 (en) * | 1999-04-12 | 2005-08-16 | G & H Technologies, Llc | Rectangular cathodic arc source and method of steering an arc spot |
CA2305938C (en) | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
US6969198B2 (en) | 2002-11-06 | 2005-11-29 | Nissan Motor Co., Ltd. | Low-friction sliding mechanism |
JP4863152B2 (en) | 2003-07-31 | 2012-01-25 | 日産自動車株式会社 | gear |
US7771821B2 (en) | 2003-08-21 | 2010-08-10 | Nissan Motor Co., Ltd. | Low-friction sliding member and low-friction sliding mechanism using same |
US7381311B2 (en) * | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
DE102010020737A1 (en) * | 2010-05-17 | 2011-11-17 | Oerlikon Trading Ag, Trübbach | Target for spark evaporation with spatial limitation of the propagation of the spark |
CN103132020B (en) * | 2013-03-17 | 2018-04-20 | 广东世创金属科技股份有限公司 | The electric arc target and its control system of a kind of improved structure |
KR102037910B1 (en) | 2017-03-27 | 2019-10-30 | 세메스 주식회사 | Coating apparatus and coating method |
SK500322019A3 (en) * | 2019-07-11 | 2021-01-13 | STATON, s. r. o. | Plasma source using a cathodic vacuum arc with an improved magnetic field configuration and method of operation |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4724058A (en) * | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
EP0495447A1 (en) * | 1991-01-17 | 1992-07-22 | KABUSHIKI KAISHA KOBE SEIKO SHO also known as Kobe Steel Ltd. | Method of controlling an arc spot in vacuum arc vapor deposition and an evaporation source |
EP0511153A1 (en) * | 1991-04-22 | 1992-10-28 | Multi-Arc Scientific Coatings | Plasma enhancement apparatus and method for physical vapor deposition |
DE4223592A1 (en) * | 1992-06-24 | 1994-01-05 | Leybold Ag | Arc vaporising apparatus - with movable magnetic coil below target to adjust magnetic field and ensure uniform target vaporisation |
US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
US5387326A (en) * | 1987-02-03 | 1995-02-07 | Balzers Ag | Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices |
US5435900A (en) * | 1992-11-04 | 1995-07-25 | Gorokhovsky; Vladimir I. | Apparatus for application of coatings in vacuum |
US5468363A (en) * | 1994-04-25 | 1995-11-21 | Regents Of The University Of California | Magnetic-cusp, cathodic-arc source |
US5840163A (en) * | 1994-04-25 | 1998-11-24 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
DE19739527A1 (en) * | 1997-09-09 | 1999-03-11 | Rossendorf Forschzent | Magnetically filtered vacuum arc plasma source |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3793179A (en) * | 1971-07-19 | 1974-02-19 | L Sablev | Apparatus for metal evaporation coating |
US4448659A (en) * | 1983-09-12 | 1984-05-15 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization including initial target cleaning |
US4673477A (en) * | 1984-03-02 | 1987-06-16 | Regents Of The University Of Minnesota | Controlled vacuum arc material deposition, method and apparatus |
US5380421A (en) * | 1992-11-04 | 1995-01-10 | Gorokhovsky; Vladimir I. | Vacuum-arc plasma source |
US5587207A (en) * | 1994-11-14 | 1996-12-24 | Gorokhovsky; Vladimir I. | Arc assisted CVD coating and sintering method |
KR100230279B1 (en) * | 1997-03-31 | 1999-11-15 | 윤종용 | Coating apparatus by using cathodic arc discharge |
US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
-
1999
- 1999-04-12 CA CA002268659A patent/CA2268659C/en not_active Expired - Fee Related
-
2000
- 2000-04-07 GB GB0125844A patent/GB2368597B/en not_active Expired - Fee Related
- 2000-04-07 WO PCT/CA2000/000380 patent/WO2000062327A2/en active IP Right Grant
- 2000-04-07 DE DE10084452.9T patent/DE10084452B3/en not_active Expired - Fee Related
- 2000-04-07 JP JP2000611303A patent/JP4689843B2/en not_active Expired - Fee Related
- 2000-04-07 AU AU39509/00A patent/AU762277B2/en not_active Ceased
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4724058A (en) * | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
US5387326A (en) * | 1987-02-03 | 1995-02-07 | Balzers Ag | Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices |
US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
EP0495447A1 (en) * | 1991-01-17 | 1992-07-22 | KABUSHIKI KAISHA KOBE SEIKO SHO also known as Kobe Steel Ltd. | Method of controlling an arc spot in vacuum arc vapor deposition and an evaporation source |
EP0511153A1 (en) * | 1991-04-22 | 1992-10-28 | Multi-Arc Scientific Coatings | Plasma enhancement apparatus and method for physical vapor deposition |
DE4223592A1 (en) * | 1992-06-24 | 1994-01-05 | Leybold Ag | Arc vaporising apparatus - with movable magnetic coil below target to adjust magnetic field and ensure uniform target vaporisation |
US5435900A (en) * | 1992-11-04 | 1995-07-25 | Gorokhovsky; Vladimir I. | Apparatus for application of coatings in vacuum |
US5468363A (en) * | 1994-04-25 | 1995-11-21 | Regents Of The University Of California | Magnetic-cusp, cathodic-arc source |
US5840163A (en) * | 1994-04-25 | 1998-11-24 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
DE19739527A1 (en) * | 1997-09-09 | 1999-03-11 | Rossendorf Forschzent | Magnetically filtered vacuum arc plasma source |
Also Published As
Publication number | Publication date |
---|---|
JP4689843B2 (en) | 2011-05-25 |
AU762277B2 (en) | 2003-06-19 |
CA2268659A1 (en) | 2000-10-12 |
GB0125844D0 (en) | 2001-12-19 |
GB2368597B (en) | 2003-08-27 |
CA2268659C (en) | 2008-12-30 |
DE10084452B3 (en) | 2016-03-17 |
JP2002541335A (en) | 2002-12-03 |
AU3950900A (en) | 2000-11-14 |
DE10084452T1 (en) | 2002-06-20 |
WO2000062327A3 (en) | 2001-01-18 |
WO2000062327A2 (en) | 2000-10-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20160407 |