Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KKfiledCriticalShowa Denko KK
Priority claimed from PCT/JP1998/003589external-prioritypatent/WO1999009457A1/ja
Publication of DE69818836D1publicationCriticalpatent/DE69818836D1/de
Application grantedgrantedCritical
Publication of DE69818836T2publicationCriticalpatent/DE69818836T2/de
DE69818836T1997-08-141998-08-12Resistharz, resistharzzusammensetzung und diese verwendendes verfahren zur herstellung von mustern
Expired - Fee RelatedDE69818836T2
(de)
Photoempfindliche Verbindungen, photoempfindliche Harzzusammensetzungen, und Verfahren zur Herstellung von Mustern unter Verwendung dieser Verbindungen oder dieser Zusammensetzungen