DE69815511D1 - Photoaktive coumarinsulfonat-verbindungen - Google Patents
Photoaktive coumarinsulfonat-verbindungenInfo
- Publication number
- DE69815511D1 DE69815511D1 DE69815511T DE69815511T DE69815511D1 DE 69815511 D1 DE69815511 D1 DE 69815511D1 DE 69815511 T DE69815511 T DE 69815511T DE 69815511 T DE69815511 T DE 69815511T DE 69815511 D1 DE69815511 D1 DE 69815511D1
- Authority
- DE
- Germany
- Prior art keywords
- coumarine
- photoactive
- sulphonate compounds
- sulphonate
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/74—Benzo[b]pyrans, hydrogenated in the carbocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/06—Benzothiopyrans; Hydrogenated benzothiopyrans
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
- C07D311/42—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms in positions 2 and 4
- C07D311/56—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms in positions 2 and 4 without hydrogen atoms in position 3
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Pyrane Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/813,099 US5739295A (en) | 1997-03-07 | 1997-03-07 | Photoactive coumarin sulfonate compounds |
US813099 | 1997-03-07 | ||
PCT/US1998/003425 WO1998039320A1 (en) | 1997-03-07 | 1998-02-23 | Photoactive coumarin sulfonate compounds |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69815511D1 true DE69815511D1 (de) | 2003-07-17 |
DE69815511T2 DE69815511T2 (de) | 2004-05-13 |
Family
ID=25211450
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69815511T Expired - Fee Related DE69815511T2 (de) | 1997-03-07 | 1998-02-23 | Photoaktive coumarinsulfonat-verbindungen |
Country Status (8)
Country | Link |
---|---|
US (1) | US5739295A (de) |
EP (1) | EP0968203B1 (de) |
JP (1) | JP2001515476A (de) |
KR (1) | KR100456685B1 (de) |
CN (1) | CN1251585A (de) |
DE (1) | DE69815511T2 (de) |
TW (1) | TW538042B (de) |
WO (1) | WO1998039320A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010057984A2 (en) * | 2008-11-24 | 2010-05-27 | Basf Se | Photocurable polymeric dielectrics and methods of preparation and use thereof |
US9383644B2 (en) * | 2014-09-18 | 2016-07-05 | Heraeus Precious Metals North America Daychem LLC | Sulfonic acid derivative compounds as photoacid generators in resist applications |
KR101893515B1 (ko) | 2017-06-09 | 2018-08-30 | 영남대학교 산학협력단 | 구리 촉매를 이용한 4-하이드록시-3-설파닐쿠마린 유도체 또는 4-하이드록시-3-설파닐퀴놀리논 유도체의 신규 제조방법 및 이로 제조된 유도체 화합물과 이의 용도 |
CN109232517B (zh) * | 2018-10-16 | 2020-06-12 | 郑州大学第一附属医院 | 一组磺酰香豆素类衍生物及其在制备抗肿瘤药物中的应用 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB772517A (en) * | 1954-02-06 | 1957-04-17 | Kalle & Co Ag | Improvements in or relating to photo-mechanical reproduction |
US4211791A (en) * | 1975-09-23 | 1980-07-08 | Beecham Group Limited | Indanediones |
US4339552A (en) * | 1978-09-18 | 1982-07-13 | National Starch & Chemical Corporation | Vinyl ester aqueous adhesive emulsions including acrylamide |
US4339522A (en) * | 1979-06-18 | 1982-07-13 | International Business Machines Corporation | Ultra-violet lithographic resist composition and process |
US4588670A (en) * | 1985-02-28 | 1986-05-13 | American Hoechst Corporation | Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist |
US5128230A (en) * | 1986-12-23 | 1992-07-07 | Shipley Company Inc. | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate |
DE3721851A1 (de) * | 1987-07-02 | 1989-01-12 | Bayer Ag | Herstellung von diazo- und azoverbindungen |
US4853315A (en) * | 1988-01-15 | 1989-08-01 | International Business Machines Corporation | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists |
JPH0261640A (ja) * | 1988-08-26 | 1990-03-01 | Toshiba Corp | 感光性組成物 |
JP2825543B2 (ja) * | 1989-08-23 | 1998-11-18 | 日本化薬株式会社 | ネガ型放射線感応性樹脂組成物 |
JP2571136B2 (ja) * | 1989-11-17 | 1997-01-16 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JPH07199455A (ja) * | 1993-12-28 | 1995-08-04 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物 |
US5541033A (en) * | 1995-02-01 | 1996-07-30 | Ocg Microelectronic Materials, Inc. | Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions |
-
1997
- 1997-03-07 US US08/813,099 patent/US5739295A/en not_active Expired - Fee Related
-
1998
- 1998-02-23 JP JP53798298A patent/JP2001515476A/ja active Pending
- 1998-02-23 CN CN98803148A patent/CN1251585A/zh active Pending
- 1998-02-23 KR KR10-1999-7008097A patent/KR100456685B1/ko not_active IP Right Cessation
- 1998-02-23 DE DE69815511T patent/DE69815511T2/de not_active Expired - Fee Related
- 1998-02-23 WO PCT/US1998/003425 patent/WO1998039320A1/en active IP Right Grant
- 1998-02-23 EP EP98906629A patent/EP0968203B1/de not_active Expired - Lifetime
- 1998-03-05 TW TW087103231A patent/TW538042B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW538042B (en) | 2003-06-21 |
JP2001515476A (ja) | 2001-09-18 |
KR100456685B1 (ko) | 2004-11-10 |
KR20000076011A (ko) | 2000-12-26 |
CN1251585A (zh) | 2000-04-26 |
DE69815511T2 (de) | 2004-05-13 |
US5739295A (en) | 1998-04-14 |
EP0968203A1 (de) | 2000-01-05 |
EP0968203B1 (de) | 2003-06-11 |
WO1998039320A1 (en) | 1998-09-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |