DE69813500D1 - Verfahren und Vorrichtung für Dimensionsmessung und Inspektion von Strukturen - Google Patents

Verfahren und Vorrichtung für Dimensionsmessung und Inspektion von Strukturen

Info

Publication number
DE69813500D1
DE69813500D1 DE69813500T DE69813500T DE69813500D1 DE 69813500 D1 DE69813500 D1 DE 69813500D1 DE 69813500 T DE69813500 T DE 69813500T DE 69813500 T DE69813500 T DE 69813500T DE 69813500 D1 DE69813500 D1 DE 69813500D1
Authority
DE
Germany
Prior art keywords
inspection
structures
dimension measurement
dimension
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69813500T
Other languages
English (en)
Other versions
DE69813500T2 (de
Inventor
Dr Frosien
Akira Kintaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Application granted granted Critical
Publication of DE69813500D1 publication Critical patent/DE69813500D1/de
Publication of DE69813500T2 publication Critical patent/DE69813500T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2814—Measurement of surface topography

Landscapes

  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69813500T 1998-01-23 1998-01-23 Verfahren und Vorrichtung für Dimensionsmessung und Inspektion von Strukturen Expired - Fee Related DE69813500T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP98101206A EP0932022B1 (de) 1998-01-23 1998-01-23 Verfahren und Vorrichtung für Dimensionsmessung und Inspektion von Strukturen

Publications (2)

Publication Number Publication Date
DE69813500D1 true DE69813500D1 (de) 2003-05-22
DE69813500T2 DE69813500T2 (de) 2004-02-19

Family

ID=8231304

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69813500T Expired - Fee Related DE69813500T2 (de) 1998-01-23 1998-01-23 Verfahren und Vorrichtung für Dimensionsmessung und Inspektion von Strukturen

Country Status (4)

Country Link
US (1) US6093512A (de)
EP (1) EP0932022B1 (de)
JP (1) JPH11223522A (de)
DE (1) DE69813500T2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7388218B2 (en) * 2005-04-04 2008-06-17 Fei Company Subsurface imaging using an electron beam

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
US5741614A (en) * 1995-10-16 1998-04-21 Nikon Corporation Atomic force microscope measurement process for dense photoresist patterns

Also Published As

Publication number Publication date
DE69813500T2 (de) 2004-02-19
EP0932022A1 (de) 1999-07-28
EP0932022B1 (de) 2003-04-16
US6093512A (en) 2000-07-25
JPH11223522A (ja) 1999-08-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee