DE69933726D1 - Verfahren und Apparat für verbesserte Inspektionsmessungen - Google Patents
Verfahren und Apparat für verbesserte InspektionsmessungenInfo
- Publication number
- DE69933726D1 DE69933726D1 DE69933726T DE69933726T DE69933726D1 DE 69933726 D1 DE69933726 D1 DE 69933726D1 DE 69933726 T DE69933726 T DE 69933726T DE 69933726 T DE69933726 T DE 69933726T DE 69933726 D1 DE69933726 D1 DE 69933726D1
- Authority
- DE
- Germany
- Prior art keywords
- improved inspection
- inspection measurements
- measurements
- improved
- inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/30—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring roughness or irregularity of surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Indication And Recording Devices For Special Purposes And Tariff Metering Devices (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5228298A | 1998-03-31 | 1998-03-31 | |
US52282 | 1998-03-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69933726D1 true DE69933726D1 (de) | 2006-12-07 |
DE69933726T2 DE69933726T2 (de) | 2007-10-04 |
Family
ID=21976580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69933726T Expired - Fee Related DE69933726T2 (de) | 1998-03-31 | 1999-03-31 | Verfahren und Apparat für verbesserte Inspektionsmessungen |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0947828B1 (de) |
JP (1) | JPH11325877A (de) |
KR (1) | KR19990078430A (de) |
CN (1) | CN1238461A (de) |
DE (1) | DE69933726T2 (de) |
TW (1) | TW414992B (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW494519B (en) * | 2000-06-19 | 2002-07-11 | Infineon Technologies Corp | Method for determining overlay measurement uncertainty |
US6727989B1 (en) | 2000-06-20 | 2004-04-27 | Infineon Technologies Ag | Enhanced overlay measurement marks for overlay alignment and exposure tool condition control |
US7541201B2 (en) | 2000-08-30 | 2009-06-02 | Kla-Tencor Technologies Corporation | Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
US7068833B1 (en) | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
WO2002019415A1 (en) * | 2000-08-30 | 2002-03-07 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
US7804994B2 (en) | 2002-02-15 | 2010-09-28 | Kla-Tencor Technologies Corporation | Overlay metrology and control method |
US7075639B2 (en) | 2003-04-25 | 2006-07-11 | Kla-Tencor Technologies Corporation | Method and mark for metrology of phase errors on phase shift masks |
US7608468B1 (en) | 2003-07-02 | 2009-10-27 | Kla-Tencor Technologies, Corp. | Apparatus and methods for determining overlay and uses of same |
US7346878B1 (en) | 2003-07-02 | 2008-03-18 | Kla-Tencor Technologies Corporation | Apparatus and methods for providing in-chip microtargets for metrology or inspection |
US9927718B2 (en) | 2010-08-03 | 2018-03-27 | Kla-Tencor Corporation | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems |
US10890436B2 (en) | 2011-07-19 | 2021-01-12 | Kla Corporation | Overlay targets with orthogonal underlayer dummyfill |
WO2013150585A1 (ja) * | 2012-04-02 | 2013-10-10 | 三菱電機株式会社 | エッジ検出装置 |
CN103995439B (zh) * | 2014-06-12 | 2016-03-02 | 上海华力微电子有限公司 | 一种在线确定光刻工艺窗口的方法 |
US10451412B2 (en) | 2016-04-22 | 2019-10-22 | Kla-Tencor Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
EP3499311A1 (de) * | 2017-12-14 | 2019-06-19 | ASML Netherlands B.V. | Verfahren zur steuerung einer fertigungsvorrichtung und zugehörige vorrichtungen |
EP3779882B1 (de) * | 2019-08-16 | 2022-07-20 | Sick IVP AB | Bereitstellen einer intensitätsspitzenposition in bilddaten aus der lichttriangulation in einem system zur dreidimensionalen bildgebung |
CN112631090B (zh) * | 2019-09-24 | 2022-09-27 | 长鑫存储技术有限公司 | 套刻标记和套刻误差测试方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4149085A (en) * | 1978-01-16 | 1979-04-10 | International Business Machines Corporation | Automatic overlay measurements using an electronic beam system as a measurement tool |
US5124927A (en) * | 1990-03-02 | 1992-06-23 | International Business Machines Corp. | Latent-image control of lithography tools |
GB9603262D0 (en) * | 1996-02-16 | 1996-04-17 | Bio Rad Micromeasurements Ltd | Positional measurements |
JP2842362B2 (ja) * | 1996-02-29 | 1999-01-06 | 日本電気株式会社 | 重ね合わせ測定方法 |
-
1999
- 1999-03-30 JP JP11089121A patent/JPH11325877A/ja not_active Withdrawn
- 1999-03-31 CN CN99104625A patent/CN1238461A/zh active Pending
- 1999-03-31 EP EP99302557A patent/EP0947828B1/de not_active Expired - Lifetime
- 1999-03-31 KR KR1019990011140A patent/KR19990078430A/ko not_active Application Discontinuation
- 1999-03-31 DE DE69933726T patent/DE69933726T2/de not_active Expired - Fee Related
- 1999-05-10 TW TW088104995A patent/TW414992B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW414992B (en) | 2000-12-11 |
DE69933726T2 (de) | 2007-10-04 |
CN1238461A (zh) | 1999-12-15 |
EP0947828A3 (de) | 2001-10-31 |
EP0947828A2 (de) | 1999-10-06 |
EP0947828B1 (de) | 2006-10-25 |
JPH11325877A (ja) | 1999-11-26 |
KR19990078430A (ko) | 1999-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: INTERNATIONAL BUSINESS MACHINES CORP., ARMONK,, US Owner name: QIMONDA AG, 81739 MUENCHEN, DE |
|
8339 | Ceased/non-payment of the annual fee |